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AU2003234769A1 - Photodetector and exposure system - Google Patents

Photodetector and exposure system

Info

Publication number
AU2003234769A1
AU2003234769A1 AU2003234769A AU2003234769A AU2003234769A1 AU 2003234769 A1 AU2003234769 A1 AU 2003234769A1 AU 2003234769 A AU2003234769 A AU 2003234769A AU 2003234769 A AU2003234769 A AU 2003234769A AU 2003234769 A1 AU2003234769 A1 AU 2003234769A1
Authority
AU
Australia
Prior art keywords
photodetector
exposure system
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003234769A
Inventor
Kazutoshi Fukui
Yutaka Hamamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003234769A1 publication Critical patent/AU2003234769A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/429—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to measurement of ultraviolet light

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Light Receiving Elements (AREA)
  • Measurement Of Radiation (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU2003234769A 2002-04-30 2003-04-30 Photodetector and exposure system Abandoned AU2003234769A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002-128259 2002-04-30
JP2002128259A JP2005345102A (en) 2002-04-30 2002-04-30 Photodetector and semiconductor exposure apparatus
PCT/JP2003/005507 WO2003093905A1 (en) 2002-04-30 2003-04-30 Photodetector and exposure system

Publications (1)

Publication Number Publication Date
AU2003234769A1 true AU2003234769A1 (en) 2003-11-17

Family

ID=29397263

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003234769A Abandoned AU2003234769A1 (en) 2002-04-30 2003-04-30 Photodetector and exposure system

Country Status (3)

Country Link
JP (1) JP2005345102A (en)
AU (1) AU2003234769A1 (en)
WO (1) WO2003093905A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7629594B2 (en) * 2006-10-10 2009-12-08 Asml Netherlands B.V. Lithographic apparatus, and device manufacturing method
DE102007047446A1 (en) 2007-10-04 2009-04-09 Carl Zeiss Smt Ag Optical element with at least one electrically conductive region and illumination system with such an element

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3641736B2 (en) * 1997-12-15 2005-04-27 株式会社神戸製鋼所 Beam measurement method
JP2001284243A (en) * 2000-04-03 2001-10-12 Hitachi Ltd X-ray exposure equipment
EP1566695B1 (en) * 2000-08-25 2007-10-31 ASML Netherlands B.V. Lithographic apparatus
JP2002168998A (en) * 2000-12-04 2002-06-14 Nikon Corp Method for producing metal membrane and metal filter

Also Published As

Publication number Publication date
JP2005345102A (en) 2005-12-15
WO2003093905A1 (en) 2003-11-13

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase