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AU2003231387A1 - Line element and method of manufacturing the line element - Google Patents

Line element and method of manufacturing the line element

Info

Publication number
AU2003231387A1
AU2003231387A1 AU2003231387A AU2003231387A AU2003231387A1 AU 2003231387 A1 AU2003231387 A1 AU 2003231387A1 AU 2003231387 A AU2003231387 A AU 2003231387A AU 2003231387 A AU2003231387 A AU 2003231387A AU 2003231387 A1 AU2003231387 A1 AU 2003231387A1
Authority
AU
Australia
Prior art keywords
line element
manufacturing
line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003231387A
Inventor
Satoshi Fujimoto
Yasuhiko Kasama
Kenji Omote
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ideal Star Inc
Original Assignee
Ideal Star Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ideal Star Inc filed Critical Ideal Star Inc
Publication of AU2003231387A1 publication Critical patent/AU2003231387A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/117Shapes of semiconductor bodies
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B10/00Static random access memory [SRAM] devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/01Manufacture or treatment
    • H10B12/02Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
    • H10B12/05Making the transistor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/50Peripheral circuit region structures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B41/00Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/67Thin-film transistors [TFT]
    • H10D30/6729Thin-film transistors [TFT] characterised by the electrodes
    • H10D30/673Thin-film transistors [TFT] characterised by the electrodes characterised by the shapes, relative sizes or dispositions of the gate electrodes
    • H10D30/6735Thin-film transistors [TFT] characterised by the electrodes characterised by the shapes, relative sizes or dispositions of the gate electrodes having gates fully surrounding the channels, e.g. gate-all-around
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40Organic transistors
    • H10K10/46Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462Insulated gate field-effect transistors [IGFETs]
    • H10K10/491Vertical transistors, e.g. vertical carbon nanotube field effect transistors [CNT-FETs]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/20Carbon compounds, e.g. carbon nanotubes or fullerenes
    • H10K85/221Carbon nanotubes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60Organic compounds having low molecular weight
    • H10K85/615Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/549Organic PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Thin Film Transistor (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
AU2003231387A 2002-05-02 2003-05-02 Line element and method of manufacturing the line element Abandoned AU2003231387A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002131011 2002-05-02
JP2002-131011 2002-05-02
PCT/JP2003/005620 WO2003094237A1 (en) 2002-05-02 2003-05-02 Line element and method of manufacturing the line element

Publications (1)

Publication Number Publication Date
AU2003231387A1 true AU2003231387A1 (en) 2003-11-17

Family

ID=29397337

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003231387A Abandoned AU2003231387A1 (en) 2002-05-02 2003-05-02 Line element and method of manufacturing the line element

Country Status (7)

Country Link
US (2) US7491613B2 (en)
JP (1) JP5016190B2 (en)
KR (1) KR20040101568A (en)
CN (1) CN1650433B (en)
AU (1) AU2003231387A1 (en)
TW (1) TW200308103A (en)
WO (1) WO2003094237A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006286620A (en) * 2005-03-09 2006-10-19 Ideal Star Inc Linear light emitting device and display device
US7511344B2 (en) * 2007-01-17 2009-03-31 International Business Machines Corporation Field effect transistor
FR2941089B1 (en) * 2009-01-15 2011-01-21 Commissariat Energie Atomique SOURCE TRANSISTOR AND WIRED DRAIN
JP5941625B2 (en) * 2011-06-01 2016-06-29 太陽工業株式会社 Membrane solar power generator
KR101579101B1 (en) * 2014-06-17 2015-12-21 한국기계연구원 Organic semiconductor element and manufacturing method thereof, fabric structure and nonwoven structure using organic semiconductor element, and semiconductor device using organic semiconductor element, fabric structure or nonwoven structure
WO2015194815A1 (en) * 2014-06-17 2015-12-23 한국기계연구원 Organic semiconductor element and manufacturing method therefor, fabric structure and nonwoven structure using same, and semiconductor device using same
KR101914514B1 (en) 2017-02-08 2018-11-05 서울대학교산학협력단 Fibrous transistor, method of manufacturing thereof and textile integrated circuit involving fibrous transistor
TWI658472B (en) * 2017-04-28 2019-05-01 吳政雄 Electric conductor combined with composite conductor and manufacturing method thereof

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6129179A (en) * 1984-07-19 1986-02-10 Oki Electric Ind Co Ltd Fibrous photoelectric conversion element
DE8700578U1 (en) 1987-01-13 1988-11-10 Hoegl, Helmut, Dr., 82049 Pullach Solar cell device
JP2721183B2 (en) * 1988-07-20 1998-03-04 キヤノン株式会社 Nonlinear optical element
JP3135899B2 (en) 1989-06-06 2001-02-19 株式会社リコー Electrical element
US5719975A (en) 1996-09-03 1998-02-17 Hughes Electronics Optically reconfigurable conductive line element
JP3435304B2 (en) 1997-03-13 2003-08-11 株式会社東芝 Liquid crystal display
JP3794144B2 (en) 1997-12-26 2006-07-05 富士ゼロックス株式会社 Optical semiconductor device and manufacturing method thereof
JP2000031006A (en) 1998-07-08 2000-01-28 Asahi Optical Co Ltd Semiconductor circuit forming equipment
EP1159761B1 (en) * 1999-02-22 2010-04-21 Joseph E. Clawson, Jr. Electronic nanostructure device
JP3217764B2 (en) 1999-05-28 2001-10-15 株式会社三井ハイテック Semiconductor device using cylindrical semiconductor element
JP2001077445A (en) * 1999-06-21 2001-03-23 Sony Corp Method for manufacturing functional one-dimensional structure and method for manufacturing functional structure
AU777444B2 (en) * 1999-06-21 2004-10-14 Flexenable Limited Aligned polymers for an organic TFT
JP2002009290A (en) * 2000-06-21 2002-01-11 Fuji Xerox Co Ltd Method of manufacturing organic electronic device and organic electronic device manufactured by the method
US6437422B1 (en) * 2001-05-09 2002-08-20 International Business Machines Corporation Active devices using threads

Also Published As

Publication number Publication date
JPWO2003094237A1 (en) 2005-09-08
JP5016190B2 (en) 2012-09-05
CN1650433A (en) 2005-08-03
US7491613B2 (en) 2009-02-17
TWI335083B (en) 2010-12-21
CN1650433B (en) 2010-08-04
TW200308103A (en) 2003-12-16
US20050253134A1 (en) 2005-11-17
US8212240B2 (en) 2012-07-03
US20090152682A1 (en) 2009-06-18
WO2003094237A1 (en) 2003-11-13
KR20040101568A (en) 2004-12-02

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase