AU2003230593A8 - Refractive projection objective - Google Patents

Refractive projection objective

Info

Publication number: AU2003230593A8
Authority: AU; Australia
Prior art keywords: projection objective; refractive projection; refractive; objective; projection
Prior art date: 2002-03-01
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

AU2003230593A

Other versions

AU2003230593A1 (en

Inventor

Hans-Jurgen Rostalski

Wilhelm Ulrich

Russell Hudyma

Rolf Freimann

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Carl Zeiss SMT GmbH

Original Assignee

Carl Zeiss SMT GmbH

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2002-03-01

Filing date

2003-03-03

Publication date

2003-09-16

2003-03-03 Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH

2003-09-16 Publication of AU2003230593A1 publication Critical patent/AU2003230593A1/en

2003-09-16 Publication of AU2003230593A8 publication Critical patent/AU2003230593A8/en

Status Abandoned legal-status Critical Current

Classifications

- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70975—Assembly, maintenance, transport or storage of apparatus
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Health & Medical Sciences (AREA)
Engineering & Computer Science (AREA)
Environmental & Geological Engineering (AREA)
Epidemiology (AREA)
Public Health (AREA)
Optics & Photonics (AREA)
Lenses (AREA)
Prostheses (AREA)
Endoscopes (AREA)

AU2003230593A 2002-03-01 2003-03-03 Refractive projection objective Abandoned AU2003230593A1 (en)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
US36084502P	2002-03-01	2002-03-01
US60/360,845		2002-03-01
PCT/US2003/006592 WO2003075049A2 (en)	2002-03-01	2003-03-03	Refractive projection objective

Publications (2)

Publication Number	Publication Date
AU2003230593A1 AU2003230593A1 (en)	2003-09-16
AU2003230593A8 true AU2003230593A8 (en)	2003-09-16

Family

ID=27789034

Family Applications (2)

Application Number	Title	Priority Date	Filing Date
AU2003210214A Abandoned AU2003210214A1 (en)	2002-03-01	2003-02-06	Refractive projection lens
AU2003230593A Abandoned AU2003230593A1 (en)	2002-03-01	2003-03-03	Refractive projection objective

Family Applications Before (1)

Application Number	Title	Priority Date	Filing Date
AU2003210214A Abandoned AU2003210214A1 (en)	2002-03-01	2003-02-06	Refractive projection lens

Country Status (5)

Country	Link
EP (1)	EP1483626A2 (en)
JP (1)	JP2005519332A (en)
KR (1)	KR20040089688A (en)
AU (2)	AU2003210214A1 (en)
WO (2)	WO2003075096A2 (en)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE10229249A1 (en)	2002-03-01	2003-09-04	Zeiss Carl Semiconductor Mfg	Refractive projection lens with a waist
US8208198B2 (en)	2004-01-14	2012-06-26	Carl Zeiss Smt Gmbh	Catadioptric projection objective
AU2003304557A1 (en) *	2003-10-22	2005-06-08	Carl Zeiss Smt Ag	Refractive projection objective for immersion lithography
CN100538524C (en)	2003-12-02	2009-09-09	卡尔蔡司Smt股份有限公司	projection optical system
US20080151364A1 (en)	2004-01-14	2008-06-26	Carl Zeiss Smt Ag	Catadioptric projection objective
KR20140138350A (en)	2004-05-17	2014-12-03	칼 짜이스 에스엠티 게엠베하	Catadioptric projection objective with intermediate images
US7301707B2 (en)	2004-09-03	2007-11-27	Carl Zeiss Smt Ag	Projection optical system and method
US7508488B2 (en)	2004-10-13	2009-03-24	Carl Zeiss Smt Ag	Projection exposure system and method of manufacturing a miniaturized device
DE102005045862A1 (en)	2004-10-19	2006-04-20	Carl Zeiss Smt Ag	Optical system for ultraviolet light has liquid lens arranged in space between first and second limiting optical elements and containing liquid transparent for wavelength less than or equal to 200 nm
US7508489B2 (en)	2004-12-13	2009-03-24	Carl Zeiss Smt Ag	Method of manufacturing a miniaturized device
EP1839092A2 (en)	2004-12-30	2007-10-03	Carl Zeiss SMT AG	Projection optical system
JP2007114750A (en)	2005-09-09	2007-05-10	Asml Netherlands Bv	Projection system design method, lithographic apparatus, and device manufacturing method
EP2035897B1 (en)	2006-07-03	2015-10-28	Carl Zeiss SMT GmbH	Method for revising or repairing a lithographic projection objective
DE102006045075A1 (en)	2006-09-21	2008-04-03	Carl Zeiss Smt Ag	Controllable optical element
CN101548240B (en)	2006-12-01	2014-09-17	卡尔蔡司Smt有限责任公司	Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
DE102008000790A1 (en)	2007-03-20	2008-09-25	Carl Zeiss Smt Ag	A method for improving imaging properties of an optical system and such an optical system
EP2188673A1 (en)	2007-08-03	2010-05-26	Carl Zeiss SMT AG	Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate
DE102008041144A1 (en)	2007-08-21	2009-03-05	Carl Zeiss Smt Ag	Optical arrangement for e.g. projection lens, has structure for optimizing arrangement with respect to angle of incident angle-dependent polarization division in phase and amplitude, and another structure compensating change of wave front
CN101784954B (en)	2007-08-24	2015-03-25	卡尔蔡司Smt有限责任公司	Controllable optical element and method for operating the optical element with thermal actuators and projection exposure apparatus for semiconductor lithography
EP2048540A1 (en)	2007-10-09	2009-04-15	Carl Zeiss SMT AG	Microlithographic projection exposure apparatus
DE102007055567A1 (en)	2007-11-20	2009-05-28	Carl Zeiss Smt Ag	Optical system
WO2010032753A1 (en) *	2008-09-18	2010-03-25	株式会社ニコン	Aperture stop, optical system, exposure apparatus and electronic device manufacturing method
DE102008042356A1 (en)	2008-09-25	2010-04-08	Carl Zeiss Smt Ag	Projection exposure system with optimized adjustment option
WO2011116792A1 (en)	2010-03-26	2011-09-29	Carl Zeiss Smt Gmbh	Optical system, exposure apparatus, and waverfront correction method
WO2015032418A1 (en)	2013-09-09	2015-03-12	Carl Zeiss Smt Gmbh	Microlithographic projection exposure apparatus and method of correcting optical wavefront deformations in such an apparatus
US10139595B1 (en)	2014-03-16	2018-11-27	Navitar Industries, Llc	Optical assembly for a compact wide field of view digital camera with low first lens diameter to image diagonal ratio
US10545314B1 (en)	2014-03-16	2020-01-28	Navitar Industries, Llc	Optical assembly for a compact wide field of view digital camera with low lateral chromatic aberration
US9494772B1 (en)	2014-03-16	2016-11-15	Hyperion Development, LLC	Optical assembly for a wide field of view point action camera with low field curvature
US9726859B1 (en)	2014-03-16	2017-08-08	Navitar Industries, Llc	Optical assembly for a wide field of view camera with low TV distortion
US9091843B1 (en)	2014-03-16	2015-07-28	Hyperion Development, LLC	Optical assembly for a wide field of view point action camera with low track length to focal length ratio
US9316808B1 (en)	2014-03-16	2016-04-19	Hyperion Development, LLC	Optical assembly for a wide field of view point action camera with a low sag aspheric lens element
US10386604B1 (en)	2014-03-16	2019-08-20	Navitar Industries, Llc	Compact wide field of view digital camera with stray light impact suppression
US9316820B1 (en)	2014-03-16	2016-04-19	Hyperion Development, LLC	Optical assembly for a wide field of view point action camera with low astigmatism
US9995910B1 (en)	2014-03-16	2018-06-12	Navitar Industries, Llc	Optical assembly for a compact wide field of view digital camera with high MTF
DE102024111454A1 (en)	2024-04-24	2025-10-30	Carl Zeiss Smt Gmbh	Projection exposure process, projection lens and projection exposure system for microlithography

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP3624973B2 (en) *	1995-10-12	2005-03-02	株式会社ニコン	Projection optical system
DE19855157A1 (en) *	1998-11-30	2000-05-31	Zeiss Carl Fa	Projection lens
DE19855108A1 (en) *	1998-11-30	2000-05-31	Zeiss Carl Fa	Microlithographic reduction lens, projection exposure system and method
JP2003535356A (en) *	1999-12-29	2003-11-25	カール・ツアイス・スティフツング・トレーディング・アズ・カール・ツアイス	Projection objective lens with aspheric lens surfaces arranged adjacently

2003
- 2003-02-06 KR KR10-2004-7013547A patent/KR20040089688A/en not_active Ceased
- 2003-02-06 AU AU2003210214A patent/AU2003210214A1/en not_active Abandoned
- 2003-02-06 WO PCT/EP2003/001147 patent/WO2003075096A2/en not_active Ceased
- 2003-02-06 EP EP03743308A patent/EP1483626A2/en not_active Withdrawn
- 2003-02-06 JP JP2003573496A patent/JP2005519332A/en active Pending
- 2003-03-03 WO PCT/US2003/006592 patent/WO2003075049A2/en not_active Ceased
- 2003-03-03 AU AU2003230593A patent/AU2003230593A1/en not_active Abandoned

Also Published As

Publication number	Publication date
WO2003075096A2 (en)	2003-09-12
AU2003230593A1 (en)	2003-09-16
JP2005519332A (en)	2005-06-30
WO2003075049A3 (en)	2004-04-08
EP1483626A2 (en)	2004-12-08
AU2003210214A1 (en)	2003-09-16
WO2003075049A2 (en)	2003-09-12
KR20040089688A (en)	2004-10-21
WO2003075096A3 (en)	2003-11-13

Publication	Publication Date	Title
AU2003230593A8 (en)	2003-09-16	Refractive projection objective
GB0217606D0 (en)	2002-09-11	Intraocular lens
AU150583S (en)	2003-02-07	Eyeglasses
GB0303193D0 (en)	2003-03-19	Methods & lens
AU151212S (en)	2003-03-24	Eyeglasses
AU150584S (en)	2003-02-07	Eyeglasses
AU155116S (en)	2004-04-05	Sunglasses
AU150582S (en)	2003-02-07	Eyeglasses
AU154626S (en)	2004-02-19	Eyeglasses
AU151211S (en)	2003-03-24	Eyeglasses
AU151436S (en)	2003-04-15	Eyeglasses
AU154627S (en)	2004-02-19	Eyeglasses
AU2003235786A8 (en)	2003-07-24	Lenses having chromatic effect
EP1603491A4 (en)	2010-06-16	Intraocular lens
AU2003264933A8 (en)	2004-04-08	Optical micro-actuator
AU2003258519A8 (en)	2004-02-09	Catadioptric projection objective
GB2395024B (en)	2005-12-07	Spectacle lens
EP1491939A4 (en)	2011-03-16	Optical switch
TW547653U (en)	2003-08-11	Optical switch
AU2003265863A8 (en)	2004-03-11	Optical switch
TW547654U (en)	2003-08-11	Optical switch
TW523110U (en)	2003-03-01	Optical switch
AU150825S (en)	2003-02-24	Lens
TW575184U (en)	2004-02-01	Lens set
GB0217760D0 (en)	2002-09-11	Intraocular lens

Legal Events

Date	Code	Title	Description
2005-01-13	MK6	Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase