AU2003212341A1 - Objective lens consisting of crystal lenses - Google Patents

Objective lens consisting of crystal lenses

Info

Publication number: AU2003212341A1
Authority: AU; Australia
Prior art keywords: objective lens; lens consisting; crystal lenses; lenses; crystal
Prior art date: 2002-03-12
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

AU2003212341A

Other versions

AU2003212341A8 (en

Inventor

Aksel Goehnermeier

Daniel Kraehmer

Birgit Mecking

Alexandra Pazidis

Christoph Zaczek

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Carl Zeiss SMT GmbH

Original Assignee

Carl Zeiss SMT GmbH

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2002-03-12

Filing date

2003-03-12

Publication date

2003-09-22

2003-03-12 Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH

2003-09-22 Publication of AU2003212341A1 publication Critical patent/AU2003212341A1/en

2003-09-22 Publication of AU2003212341A8 publication Critical patent/AU2003212341A8/en

Status Abandoned legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
- G03F7/70966—Birefringence
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Optics & Photonics (AREA)
Health & Medical Sciences (AREA)
Engineering & Computer Science (AREA)
Environmental & Geological Engineering (AREA)
Epidemiology (AREA)
Public Health (AREA)
Chemical & Material Sciences (AREA)
Crystallography & Structural Chemistry (AREA)
Lenses (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

AU2003212341A 2002-03-12 2003-03-12 Objective lens consisting of crystal lenses Abandoned AU2003212341A1 (en)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
DE2002110782 DE10210782A1 (en)	2002-03-12	2002-03-12	Lens with crystal lenses
DE10210782.3		2002-03-12
PCT/EP2003/002549 WO2003077007A2 (en)	2002-03-12	2003-03-12	Objective lens consisting of crystal lenses

Publications (2)

Publication Number	Publication Date
AU2003212341A1 true AU2003212341A1 (en)	2003-09-22
AU2003212341A8 AU2003212341A8 (en)	2003-09-22

Family

ID=27797700

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AU2003212341A Abandoned AU2003212341A1 (en)	2002-03-12	2003-03-12	Objective lens consisting of crystal lenses

Country Status (6)

Country	Link
EP (1)	EP1483614A2 (en)
JP (1)	JP2005520187A (en)
CN (1)	CN1653359A (en)
AU (1)	AU2003212341A1 (en)
DE (1)	DE10210782A1 (en)
WO (1)	WO2003077007A2 (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6683710B2 (en)	2001-06-01	2004-01-27	Optical Research Associates	Correction of birefringence in cubic crystalline optical systems
US7453641B2 (en)	2001-10-30	2008-11-18	Asml Netherlands B.V.	Structures and methods for reducing aberration in optical systems
US6995908B2 (en)	2001-10-30	2006-02-07	Asml Netherlands B.V.	Methods for reducing aberration in optical systems
US6970232B2 (en)	2001-10-30	2005-11-29	Asml Netherlands B.V.	Structures and methods for reducing aberration in integrated circuit fabrication systems
JP4333078B2 (en)	2002-04-26	2009-09-16	株式会社ニコン	Projection optical system, exposure apparatus including the projection optical system, exposure method using the projection optical system, and device manufacturing method
US6958864B2 (en)	2002-08-22	2005-10-25	Asml Netherlands B.V.	Structures and methods for reducing polarization aberration in integrated circuit fabrication systems
WO2004023172A1 (en) *	2002-09-03	2004-03-18	Carl Zeiss Smt Ag	Optimization method for an objective with fluoride crystal lenses and objective with fluoride crystal lenses
US7466489B2 (en)	2003-12-15	2008-12-16	Susanne Beder	Projection objective having a high aperture and a planar end surface
US20070195676A1 (en) *	2004-01-16	2007-08-23	Koninklijke Philips Electronic, N.V.	Optical system
US7423727B2 (en) *	2005-01-25	2008-09-09	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
KR20070105976A (en) *	2005-02-25	2007-10-31	칼 짜이스 에스엠티 아게	Objectives or lighting devices for optical systems, especially microlithographic projection exposure devices
US7518797B2 (en)	2005-12-02	2009-04-14	Carl Zeiss Smt Ag	Microlithographic exposure apparatus
WO2007063136A2 (en) *	2005-12-02	2007-06-07	Carl Zeiss Smt Ag	Optical element comprising a double-refractive coating
DE102007058862A1 (en)	2007-12-06	2009-06-10	Carl Zeiss Smt Ag	Optical system, particularly for microlithographic projection illumination system, has transparent optical element during working wavelength
US9599787B2 (en)	2011-12-27	2017-03-21	Tera Xtal Technology Corporation	Using sapphire lens to protect the lens module
DE102012206154A1 (en)	2012-04-16	2013-06-06	Carl Zeiss Smt Gmbh	Optical system for microlithographic projection exposure system utilized for manufacturing e.g. LCD, has mirror elements adjusted independent of each other, and retarding layer arranged on reflection surface of one of mirror elements
DE102013108321B3 (en) *	2013-08-02	2014-10-23	Leibniz-Institut für Analytische Wissenschaften-ISAS-e.V.	Fresnel parallelepiped
DE102022118146B3 (en) *	2022-07-20	2023-12-07	Carl Zeiss Jena Gmbh	Method for producing an optical element for a lithography system

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6201634B1 (en) *	1998-03-12	2001-03-13	Nikon Corporation	Optical element made from fluoride single crystal, method for manufacturing optical element, method for calculating birefringence of optical element and method for determining direction of minimum birefringence of optical element
WO2002093209A2 (en) *	2001-05-15	2002-11-21	Carl Zeiss	Lens system consisting of fluoride crystal lenses
JP2004531764A (en) *	2001-05-16	2004-10-14	コーニングインコーポレイテッド	Cubic crystal material optical element having preferred crystal orientation
JP2003050349A (en) *	2001-05-30	2003-02-21	Nikon Corp	Optical system and exposure apparatus having the optical system
US6683710B2 (en) *	2001-06-01	2004-01-27	Optical Research Associates	Correction of birefringence in cubic crystalline optical systems
JP3639807B2 (en) *	2001-06-27	2005-04-20	キヤノン株式会社	Optical element and manufacturing method
JPWO2003003429A1 (en) *	2001-06-28	2004-10-21	株式会社ニコン	Projection optical system, exposure apparatus and method
US6831731B2 (en) *	2001-06-28	2004-12-14	Nikon Corporation	Projection optical system and an exposure apparatus with the projection optical system
TW571344B (en) *	2001-07-10	2004-01-11	Nikon Corp	Manufacturing method for projection optic system
US6788389B2 (en) *	2001-07-10	2004-09-07	Nikon Corporation	Production method of projection optical system

2002
- 2002-03-12 DE DE2002110782 patent/DE10210782A1/en not_active Withdrawn
2003
- 2003-03-12 CN CN 03810840 patent/CN1653359A/en active Pending
- 2003-03-12 JP JP2003575170A patent/JP2005520187A/en active Pending
- 2003-03-12 EP EP03708221A patent/EP1483614A2/en not_active Withdrawn
- 2003-03-12 AU AU2003212341A patent/AU2003212341A1/en not_active Abandoned
- 2003-03-12 WO PCT/EP2003/002549 patent/WO2003077007A2/en not_active Ceased

Also Published As

Publication number	Publication date
CN1653359A (en)	2005-08-10
WO2003077007A2 (en)	2003-09-18
JP2005520187A (en)	2005-07-07
DE10210782A1 (en)	2003-10-09
EP1483614A2 (en)	2004-12-08
AU2003212341A8 (en)	2003-09-22
WO2003077007A3 (en)	2004-04-08

Publication	Publication Date	Title
AU2003212341A1 (en)	2003-09-22	Objective lens consisting of crystal lenses
AU2003245640A1 (en)	2004-01-19	Intraocular lens
AU2003227720A1 (en)	2003-12-31	Optical lens with soft-focus effect
AU2002312872A1 (en)	2003-09-22	High-aperture projection lens
AU2003223220A1 (en)	2003-09-22	Accommodating intraocular lens
AU2003210214A1 (en)	2003-09-16	Refractive projection lens
AU2003202957A1 (en)	2003-10-08	Optical imaging of nanostructured substrates
AU2003209035A1 (en)	2003-10-20	Adjustable intraocular lens
AU2003250690A1 (en)	2004-02-16	Auto-characterization of optical devices
AU2003296503A1 (en)	2004-06-30	Accomodating multifocal intraocular lens
AU2003252137A1 (en)	2004-02-16	Intraocular lens system
AU2003274597A1 (en)	2004-06-23	Manufacturing of lens elements
AU2003209463A1 (en)	2003-09-29	Fabrication of microstructured optical fibre
AU2003220360A1 (en)	2003-11-17	Intraocular lens
AU2003235418A2 (en)	2005-06-30	Double-sided aspheric varifocal power lens
AU2003247494A1 (en)	2004-01-23	Photosensitive optical glass
AU2003235786A1 (en)	2003-07-24	Lenses having chromatic effect
AU2003260689A1 (en)	2004-02-16	Delivery of ophthalmic lenses
AU2002364974A1 (en)	2004-03-29	Objective with birefringent lenses
AU2003219480A1 (en)	2003-09-29	Sharp angle intraocular lens optic
AU2003241740A1 (en)	2003-12-31	Lens for eye
AU2003235425A1 (en)	2003-12-19	Variable-focus lens and lens controller
AU2003235323A1 (en)	2003-12-02	Objective lens driver
GB0321204D0 (en)	2003-10-08	Spectacle lens
AU2003268377A1 (en)	2004-11-26	Hydrogel contact lens and method of producing for correction of higher order optical aberrations of the eye

Legal Events

Date	Code	Title	Description
2004-12-02	MK6	Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase