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AU2003296167A1 - Illumination optical system, illuminating device, projection exposure apparatus and exposure method - Google Patents

Illumination optical system, illuminating device, projection exposure apparatus and exposure method

Info

Publication number
AU2003296167A1
AU2003296167A1 AU2003296167A AU2003296167A AU2003296167A1 AU 2003296167 A1 AU2003296167 A1 AU 2003296167A1 AU 2003296167 A AU2003296167 A AU 2003296167A AU 2003296167 A AU2003296167 A AU 2003296167A AU 2003296167 A1 AU2003296167 A1 AU 2003296167A1
Authority
AU
Australia
Prior art keywords
optical system
illumination optical
illuminating device
exposure apparatus
exposure method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003296167A
Inventor
Kiyoshi Mitarai
Kenji Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003296167A1 publication Critical patent/AU2003296167A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU2003296167A 2002-12-26 2003-12-26 Illumination optical system, illuminating device, projection exposure apparatus and exposure method Abandoned AU2003296167A1 (en)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2002377149 2002-12-26
JP2002-377149 2002-12-26
JP2003076492 2003-03-19
JP2003-076492 2003-03-19
JP2003-173974 2003-06-18
JP2003173974 2003-06-18
PCT/JP2003/017043 WO2004068564A1 (en) 2002-12-26 2003-12-26 Illumination optical system, illuminating device, projection exposure apparatus and exposure method

Publications (1)

Publication Number Publication Date
AU2003296167A1 true AU2003296167A1 (en) 2004-08-23

Family

ID=32830620

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003296167A Abandoned AU2003296167A1 (en) 2002-12-26 2003-12-26 Illumination optical system, illuminating device, projection exposure apparatus and exposure method

Country Status (3)

Country Link
JP (1) JPWO2004068564A1 (en)
AU (1) AU2003296167A1 (en)
WO (1) WO2004068564A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7405804B2 (en) * 2004-10-06 2008-07-29 Asml Netherlands B.V. Lithographic apparatus with enhanced spectral purity, device manufacturing method and device manufactured thereby
WO2010108516A1 (en) 2009-03-27 2010-09-30 Carl Zeiss Smt Ag Illumination optical system for euv microlithography and euv attenuator for an illumination optical system of this kind, illumination system and projection exposure installation having an illumination optical system of this kind
DE102014223454A1 (en) * 2014-11-18 2016-05-19 Carl Zeiss Smt Gmbh Illumination optics for illuminating a lighting field and projection exposure apparatus with such an illumination optics

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3521506B2 (en) * 1994-11-24 2004-04-19 株式会社ニコン Illumination device and exposure device
JP3706691B2 (en) * 1996-08-26 2005-10-12 キヤノン株式会社 X-ray reduction projection exposure apparatus and semiconductor device manufacturing method using the same
JPH10340843A (en) * 1997-06-06 1998-12-22 Nikon Corp Illuminating equipment and aligner
JP4238390B2 (en) * 1998-02-27 2009-03-18 株式会社ニコン LIGHTING APPARATUS, EXPOSURE APPARATUS PROVIDED WITH THE ILLUMINATION APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE EXPOSURE APPARATUS
JP2000162414A (en) * 1998-09-22 2000-06-16 Nikon Corp Method for manufacturing a reflecting mirror, reflection type illumination device, or semiconductor exposure device
JP2001332472A (en) * 2000-05-19 2001-11-30 Canon Inc X-ray exposure equipment
JP2002311216A (en) * 2001-04-19 2002-10-23 Nikon Corp Method of manufacturing reflector, reflection type illumination device or semiconductor exposure device

Also Published As

Publication number Publication date
JPWO2004068564A1 (en) 2006-05-25
WO2004068564A1 (en) 2004-08-12

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase