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AU2003295517A8 - Anti-reflective coatings for photolithography and methods of preparation thereof - Google Patents

Anti-reflective coatings for photolithography and methods of preparation thereof

Info

Publication number
AU2003295517A8
AU2003295517A8 AU2003295517A AU2003295517A AU2003295517A8 AU 2003295517 A8 AU2003295517 A8 AU 2003295517A8 AU 2003295517 A AU2003295517 A AU 2003295517A AU 2003295517 A AU2003295517 A AU 2003295517A AU 2003295517 A8 AU2003295517 A8 AU 2003295517A8
Authority
AU
Australia
Prior art keywords
photolithography
preparation
methods
reflective coatings
coatings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003295517A
Other versions
AU2003295517A1 (en
Inventor
Teresa Baldwin
Jason Stuck
Tadashi Nakano
Mello Hebert
Joseph Kennedy
Arlene Suedemeyer
Bo Li
Nancy Iwamoto
William Bedwell
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
Honeywell International Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/US2002/036327 external-priority patent/WO2003044078A1/en
Application filed by Honeywell International Inc filed Critical Honeywell International Inc
Publication of AU2003295517A1 publication Critical patent/AU2003295517A1/en
Publication of AU2003295517A8 publication Critical patent/AU2003295517A8/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
AU2003295517A 2002-11-12 2003-11-12 Anti-reflective coatings for photolithography and methods of preparation thereof Abandoned AU2003295517A1 (en)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US44469702P 2002-11-12 2002-11-12
US60/444,697 2002-11-12
AU2002359387 2002-11-12
PCT/US2002/036327 WO2003044078A1 (en) 2001-11-15 2002-11-12 Anti-reflective coatings for photolithography and methods of preparation thereof
US50919903P 2003-10-07 2003-10-07
US60/509,199 2003-10-07
PCT/US2003/036354 WO2004044025A2 (en) 2002-11-12 2003-11-12 Anti-reflective coatings for photolithography and methods of preparation thereof

Publications (2)

Publication Number Publication Date
AU2003295517A1 AU2003295517A1 (en) 2004-06-03
AU2003295517A8 true AU2003295517A8 (en) 2004-06-03

Family

ID=32685877

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003295517A Abandoned AU2003295517A1 (en) 2002-11-12 2003-11-12 Anti-reflective coatings for photolithography and methods of preparation thereof

Country Status (2)

Country Link
AU (1) AU2003295517A1 (en)
WO (1) WO2004044025A2 (en)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000077575A1 (en) 1999-06-10 2000-12-21 Alliedsignal Inc. Spin-on-glass anti-reflective coatings for photolithography
ATE377036T1 (en) 2003-05-23 2007-11-15 Dow Corning SILOXANE RESIN BASED ANTI-REFLECTION COATING WITH HIGH WET ETCHING SPEED
KR101191098B1 (en) 2004-12-17 2012-10-15 다우 코닝 코포레이션 Siloxane resin coating
ATE400672T1 (en) 2004-12-17 2008-07-15 Dow Corning METHOD FOR FORMING AN ANTIREFLECTION COATING
NO325797B1 (en) * 2005-10-14 2008-07-21 Nor X Ind As Light preservative based on organic / inorganic hybrid polymer, process for preparation and use of same
EP1989593A2 (en) * 2006-02-13 2008-11-12 Dow Corning Corporation Antireflective coating material
US7550249B2 (en) 2006-03-10 2009-06-23 Az Electronic Materials Usa Corp. Base soluble polymers for photoresist compositions
JP2009540084A (en) * 2006-06-13 2009-11-19 ブラゴーン オサケ ユキチュア Inorganic-organic hybrid polymer composition for antireflection coating
US7704670B2 (en) * 2006-06-22 2010-04-27 Az Electronic Materials Usa Corp. High silicon-content thin film thermosets
US7759046B2 (en) 2006-12-20 2010-07-20 Az Electronic Materials Usa Corp. Antireflective coating compositions
US8026040B2 (en) 2007-02-20 2011-09-27 Az Electronic Materials Usa Corp. Silicone coating composition
TWI439494B (en) * 2007-02-27 2014-06-01 Braggone Oy Process for producing an organosiloxane polymer
CN101622296B (en) 2007-02-27 2013-10-16 Az电子材料美国公司 Silicon-based antifrelective coating compositions
US8987039B2 (en) 2007-10-12 2015-03-24 Air Products And Chemicals, Inc. Antireflective coatings for photovoltaic applications
KR20100126295A (en) 2008-01-08 2010-12-01 다우 코닝 도레이 캄파니 리미티드 Silsesquioxane Resin
CN101910253B (en) 2008-01-15 2013-04-10 陶氏康宁公司 Silsesquioxane resins
KR20100134578A (en) 2008-03-04 2010-12-23 다우 코닝 코포레이션 Silsesquioxane Resin
KR101541939B1 (en) 2008-03-05 2015-08-04 다우 코닝 코포레이션 Silsesquioxane resins
KR20110096063A (en) 2008-12-10 2011-08-26 다우 코닝 코포레이션 Silsesquioxane Resin
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
JP2015534652A (en) * 2012-08-31 2015-12-03 ハネウェル・インターナショナル・インコーポレーテッド High durability anti-reflective coating
US10544329B2 (en) 2015-04-13 2020-01-28 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6368400B1 (en) * 2000-07-17 2002-04-09 Honeywell International Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography

Also Published As

Publication number Publication date
AU2003295517A1 (en) 2004-06-03
WO2004044025A8 (en) 2004-10-07
WO2004044025A2 (en) 2004-05-27
WO2004044025A3 (en) 2004-07-15

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase