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AU2003289146A1 - Shape measurement method, shape measurement device, tilt measurement method, stage device, exposure device, exposure method, and device manufacturing method - Google Patents

Shape measurement method, shape measurement device, tilt measurement method, stage device, exposure device, exposure method, and device manufacturing method

Info

Publication number
AU2003289146A1
AU2003289146A1 AU2003289146A AU2003289146A AU2003289146A1 AU 2003289146 A1 AU2003289146 A1 AU 2003289146A1 AU 2003289146 A AU2003289146 A AU 2003289146A AU 2003289146 A AU2003289146 A AU 2003289146A AU 2003289146 A1 AU2003289146 A1 AU 2003289146A1
Authority
AU
Australia
Prior art keywords
exposure
shape measurement
measurement method
tilt
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003289146A
Inventor
Saburo Kamiya
Yutaka Kanakutsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003289146A1 publication Critical patent/AU2003289146A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
AU2003289146A 2002-12-03 2003-12-03 Shape measurement method, shape measurement device, tilt measurement method, stage device, exposure device, exposure method, and device manufacturing method Abandoned AU2003289146A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002-351650 2002-12-03
JP2002351650 2002-12-03
PCT/JP2003/015491 WO2004051184A1 (en) 2002-12-03 2003-12-03 Shape measurement method, shape measurement device, tilt measurement method, stage device, exposure device, exposure method, and device manufacturing method

Publications (1)

Publication Number Publication Date
AU2003289146A1 true AU2003289146A1 (en) 2004-06-23

Family

ID=32463162

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003289146A Abandoned AU2003289146A1 (en) 2002-12-03 2003-12-03 Shape measurement method, shape measurement device, tilt measurement method, stage device, exposure device, exposure method, and device manufacturing method

Country Status (3)

Country Link
JP (1) JPWO2004051184A1 (en)
AU (1) AU2003289146A1 (en)
WO (1) WO2004051184A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4775709B2 (en) * 2006-06-26 2011-09-21 横河電機株式会社 XY stage
KR101585370B1 (en) * 2006-08-31 2016-01-14 가부시키가이샤 니콘 Mobile body drive method and mobile body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
JP5370106B2 (en) * 2009-11-30 2013-12-18 株式会社ニコン Interferometer system, stage apparatus and exposure apparatus

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0382013A (en) * 1989-08-24 1991-04-08 Canon Inc Stage positioning control method
JPH11186129A (en) * 1997-12-19 1999-07-09 Nikon Corp Scanning exposure method and apparatus

Also Published As

Publication number Publication date
WO2004051184A1 (en) 2004-06-17
JPWO2004051184A1 (en) 2006-04-06

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase