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AU2003277515A1 - Extreme ultraviolet light exposure system and vacuum chamber - Google Patents

Extreme ultraviolet light exposure system and vacuum chamber

Info

Publication number
AU2003277515A1
AU2003277515A1 AU2003277515A AU2003277515A AU2003277515A1 AU 2003277515 A1 AU2003277515 A1 AU 2003277515A1 AU 2003277515 A AU2003277515 A AU 2003277515A AU 2003277515 A AU2003277515 A AU 2003277515A AU 2003277515 A1 AU2003277515 A1 AU 2003277515A1
Authority
AU
Australia
Prior art keywords
ultraviolet light
vacuum chamber
light exposure
extreme ultraviolet
exposure system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003277515A
Inventor
Katsuhiko Murakami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003277515A1 publication Critical patent/AU2003277515A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU2003277515A 2002-10-25 2003-10-23 Extreme ultraviolet light exposure system and vacuum chamber Abandoned AU2003277515A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002/311741 2002-10-25
JP2002311741 2002-10-25
PCT/JP2003/013515 WO2004038773A1 (en) 2002-10-25 2003-10-23 Extreme ultraviolet light exposure system and vacuum chamber

Publications (1)

Publication Number Publication Date
AU2003277515A1 true AU2003277515A1 (en) 2004-05-13

Family

ID=32171096

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003277515A Abandoned AU2003277515A1 (en) 2002-10-25 2003-10-23 Extreme ultraviolet light exposure system and vacuum chamber

Country Status (3)

Country Link
JP (1) JPWO2004038773A1 (en)
AU (1) AU2003277515A1 (en)
WO (1) WO2004038773A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101273740B1 (en) * 2004-09-22 2013-06-12 가부시키가이샤 니콘 Lighting apparatus, exposure apparatus and maicrodevice manufacturing method
KR101119576B1 (en) 2004-11-17 2012-03-16 가부시키가이샤 니콘 Lighting apparatus, exposure apparatus and micro device manufacturing method
WO2006082738A1 (en) * 2005-02-03 2006-08-10 Nikon Corporation Optical integrator, illumination optical device, exposure device, and exposure method
CN109143768A (en) * 2018-09-13 2019-01-04 杭州行开科技有限公司 A kind of naked eye 3D display system suitable for laser projection

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3366865D1 (en) * 1983-03-23 1986-11-20 Alfer Alu Fertigbau Back square
EP1039510A4 (en) * 1997-11-14 2003-11-12 Nikon Corp Exposure apparatus and method of manufacturing the same, and exposure method
AU2549899A (en) * 1998-03-02 1999-09-20 Nikon Corporation Method and apparatus for exposure, method of manufacture of exposure tool, device, and method of manufacture of device
JP2000091220A (en) * 1998-09-08 2000-03-31 Nikon Corp Projection exposure apparatus and projection exposure method
JP2000100694A (en) * 1998-09-22 2000-04-07 Nikon Corp Reflection reduction projection optical system, projection exposure apparatus having the optical system, and exposure method using the apparatus

Also Published As

Publication number Publication date
WO2004038773A1 (en) 2004-05-06
JPWO2004038773A1 (en) 2006-02-23

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase