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AU2003262070A1 - Process for production of fluoropolymers for resist - Google Patents

Process for production of fluoropolymers for resist

Info

Publication number
AU2003262070A1
AU2003262070A1 AU2003262070A AU2003262070A AU2003262070A1 AU 2003262070 A1 AU2003262070 A1 AU 2003262070A1 AU 2003262070 A AU2003262070 A AU 2003262070A AU 2003262070 A AU2003262070 A AU 2003262070A AU 2003262070 A1 AU2003262070 A1 AU 2003262070A1
Authority
AU
Australia
Prior art keywords
fluoropolymers
resist
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003262070A
Other versions
AU2003262070A8 (en
Inventor
Takayuki Araki
Takamitsu Furukawa
Takuji Ishikawa
Toshiro Itani
Meiten Koh
Minoru Toriumi
Tamio Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Semiconductor Leading Edge Technologies Inc
Original Assignee
Daikin Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daikin Industries Ltd filed Critical Daikin Industries Ltd
Publication of AU2003262070A1 publication Critical patent/AU2003262070A1/en
Publication of AU2003262070A8 publication Critical patent/AU2003262070A8/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F214/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
    • C08F214/18—Monomers containing fluorine

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
AU2003262070A 2002-09-13 2003-09-11 Process for production of fluoropolymers for resist Abandoned AU2003262070A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2002268739 2002-09-13
JP2002-268739 2002-09-13
JP2003044455 2003-02-21
JP2003-44455 2003-02-21
PCT/JP2003/011605 WO2004024787A1 (en) 2002-09-13 2003-09-11 Process for production of fluoropolymers for resist

Publications (2)

Publication Number Publication Date
AU2003262070A1 true AU2003262070A1 (en) 2004-04-30
AU2003262070A8 AU2003262070A8 (en) 2004-04-30

Family

ID=31996178

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003262070A Abandoned AU2003262070A1 (en) 2002-09-13 2003-09-11 Process for production of fluoropolymers for resist

Country Status (4)

Country Link
JP (1) JPWO2004024787A1 (en)
AU (1) AU2003262070A1 (en)
TW (1) TW200408649A (en)
WO (1) WO2004024787A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4551704B2 (en) * 2004-07-08 2010-09-29 富士フイルム株式会社 Protective film forming composition for immersion exposure and pattern forming method using the same
JP2006085081A (en) * 2004-09-17 2006-03-30 Daikin Ind Ltd Fine pattern forming method and resist composition used therefor
JP5163287B2 (en) * 2008-05-26 2013-03-13 旭硝子株式会社 Fluorine-containing elastic copolymer, process for producing the same, and crosslinked rubber
TWI510507B (en) * 2009-05-29 2015-12-01 Nissan Chemical Ind Ltd Fluorine-containing highly branched polymer and resin composition containing the ploymer

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0662720B2 (en) * 1986-03-25 1994-08-17 旭硝子株式会社 Manufacturing method of heat resistant resin
EP1275666A4 (en) * 2000-04-04 2007-10-24 Daikin Ind Ltd FLUOROPOLYMER COMPRISING A GROUP THAT REACTS TO ACIDS AND PHOTORESIST COMPOSITION WITH CHEMICAL AMPLIFICATION CONTAINING SAID FLUOROPOLYMER
JP4010160B2 (en) * 2002-03-04 2007-11-21 旭硝子株式会社 Resist composition

Also Published As

Publication number Publication date
WO2004024787A1 (en) 2004-03-25
AU2003262070A8 (en) 2004-04-30
TW200408649A (en) 2004-06-01
JPWO2004024787A1 (en) 2006-01-05

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase