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AU2003243309A1 - Cooling mechanisms for shaft coupled to a rotary seal - Google Patents

Cooling mechanisms for shaft coupled to a rotary seal

Info

Publication number
AU2003243309A1
AU2003243309A1 AU2003243309A AU2003243309A AU2003243309A1 AU 2003243309 A1 AU2003243309 A1 AU 2003243309A1 AU 2003243309 A AU2003243309 A AU 2003243309A AU 2003243309 A AU2003243309 A AU 2003243309A AU 2003243309 A1 AU2003243309 A1 AU 2003243309A1
Authority
AU
Australia
Prior art keywords
rotary seal
shaft coupled
cooling mechanisms
mechanisms
cooling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003243309A
Inventor
William Leavitt
Richard Muka
Steven Richards
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ibis Technology Corp
Original Assignee
Ibis Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibis Technology Corp filed Critical Ibis Technology Corp
Publication of AU2003243309A1 publication Critical patent/AU2003243309A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • H01L21/67103Apparatus for thermal treatment mainly by conduction
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • C23C14/505Substrate holders for rotation of the substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/20Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2001Maintaining constant desired temperature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physical Vapour Deposition (AREA)
AU2003243309A 2002-05-29 2003-05-27 Cooling mechanisms for shaft coupled to a rotary seal Abandoned AU2003243309A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/157,687 US6863736B2 (en) 2002-05-29 2002-05-29 Shaft cooling mechanisms
US10/157,687 2002-05-29
PCT/US2003/016544 WO2003102261A1 (en) 2002-05-29 2003-05-27 Cooling mechanisms for shaft coupled to a rotary seal

Publications (1)

Publication Number Publication Date
AU2003243309A1 true AU2003243309A1 (en) 2003-12-19

Family

ID=29582530

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003243309A Abandoned AU2003243309A1 (en) 2002-05-29 2003-05-27 Cooling mechanisms for shaft coupled to a rotary seal

Country Status (3)

Country Link
US (1) US6863736B2 (en)
AU (1) AU2003243309A1 (en)
WO (1) WO2003102261A1 (en)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040187787A1 (en) * 2003-03-31 2004-09-30 Dawson Keith E. Substrate support having temperature controlled substrate support surface
US20090103684A1 (en) * 2004-10-26 2009-04-23 Koninklijke Philips Electronics, N.V. Molybdenum-molybdenum brazing and rotary-anode x-ray tube comprising such a brazing
KR101121417B1 (en) * 2004-10-28 2012-03-15 주성엔지니어링(주) Manufacturing apparatus for display device
US8450193B2 (en) * 2006-08-15 2013-05-28 Varian Semiconductor Equipment Associates, Inc. Techniques for temperature-controlled ion implantation
US8422193B2 (en) * 2006-12-19 2013-04-16 Axcelis Technologies, Inc. Annulus clamping and backside gas cooled electrostatic chuck
CN100458243C (en) * 2007-04-29 2009-02-04 浙江工业大学 Magnetofluid seal driving device for vacuum equipment driving shaft
US9036326B2 (en) * 2008-04-30 2015-05-19 Axcelis Technologies, Inc. Gas bearing electrostatic chuck
US9558980B2 (en) 2008-04-30 2017-01-31 Axcelis Technologies, Inc. Vapor compression refrigeration chuck for ion implanters
JP2010015774A (en) * 2008-07-02 2010-01-21 Sumco Corp Ion implantation apparatus
JP2013532354A (en) 2010-05-28 2013-08-15 アクセリス テクノロジーズ, インコーポレイテッド Heated rotary seal and bearing for cooled ion implantation system
US8481969B2 (en) * 2010-06-04 2013-07-09 Axcelis Technologies, Inc. Effective algorithm for warming a twist axis for cold ion implantations
WO2013096462A1 (en) * 2011-12-20 2013-06-27 R. Morley Inc. Shaft for rotating machinery and methods of making and using same
US9711324B2 (en) 2012-05-31 2017-07-18 Axcelis Technologies, Inc. Inert atmospheric pressure pre-chill and post-heat
JP2017199610A (en) * 2016-04-28 2017-11-02 株式会社ニューフレアテクノロジー Stage mechanism
AU2019277655B2 (en) * 2018-05-31 2022-02-17 Wavetamer Llc Gyroscopic Boat Roll Stabilizer
WO2021178201A1 (en) 2020-03-02 2021-09-10 Wavetamer Llc Gyroscopic boat roll stabilizer with bearing cooling
WO2022072433A1 (en) 2020-09-30 2022-04-07 Wavetamer Llc Gyroscopic roll stabilizer with flywheel cavity seal arrangement
AU2021353490B2 (en) 2020-09-30 2023-09-28 Wavetamer Llc Gyroscopic roll stabilizer with flywheel shaft through passage
CN116951003A (en) * 2022-04-20 2023-10-27 江苏鲁汶仪器股份有限公司 Magnetic fluid shaft

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4256453A (en) * 1978-10-16 1981-03-17 Selas Corporation Of America Calciner screw construction
DE3407275A1 (en) * 1984-02-28 1985-08-29 Kraftwerk Union AG, 4330 Mülheim DEVICE ON A ROTATING MACHINE FOR HEAT-MOVABLE AND SEALING COUPLING OF TWO CONCENTRIC SHAFTS
JPS61160671A (en) 1984-12-29 1986-07-21 Nippon Fueroo Furuideikusu Kk Magnetic fluid seal device
US4592557A (en) * 1985-02-07 1986-06-03 Iversen Arthur H Liquid cooled rotating seals
JPH05326388A (en) * 1992-05-18 1993-12-10 Canon Inc Thin film forming method, coating type thin film forming apparatus, etching method, etching apparatus, and ferroelectric liquid crystal injection method
US5830277A (en) * 1995-05-26 1998-11-03 Mattson Technology, Inc. Thermal processing system with supplemental resistive heater and shielded optical pyrometry
US5641969A (en) * 1996-03-28 1997-06-24 Applied Materials, Inc. Ion implantation apparatus
US5826885A (en) * 1996-10-02 1998-10-27 Rigaku/Usa, Inc. Magnetic fluid sealing device
GB2354062A (en) * 1999-09-13 2001-03-14 British Broadcasting Corp Cooling system for use in cooling electronic equipment

Also Published As

Publication number Publication date
US20030221626A1 (en) 2003-12-04
US6863736B2 (en) 2005-03-08
WO2003102261A1 (en) 2003-12-11

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase