AU2002307885A1 - Process for the preparation of cefpodoxime acid - Google Patents
Process for the preparation of cefpodoxime acidInfo
- Publication number
- AU2002307885A1 AU2002307885A1 AU2002307885A AU2002307885A AU2002307885A1 AU 2002307885 A1 AU2002307885 A1 AU 2002307885A1 AU 2002307885 A AU2002307885 A AU 2002307885A AU 2002307885 A AU2002307885 A AU 2002307885A AU 2002307885 A1 AU2002307885 A1 AU 2002307885A1
- Authority
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- Australia
- Prior art keywords
- formula
- compound
- process according
- acid
- iii
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- LTINZAODLRIQIX-FBXRGJNPSA-N cefpodoxime proxetil Chemical compound N([C@H]1[C@@H]2N(C1=O)C(=C(CS2)COC)C(=O)OC(C)OC(=O)OC(C)C)C(=O)C(=N/OC)\C1=CSC(N)=N1 LTINZAODLRIQIX-FBXRGJNPSA-N 0.000 title claims description 30
- 229960004797 cefpodoxime proxetil Drugs 0.000 title claims description 30
- 238000000034 method Methods 0.000 title claims description 29
- 238000002360 preparation method Methods 0.000 title claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 37
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 21
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 18
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims description 18
- 238000006243 chemical reaction Methods 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- 239000002253 acid Substances 0.000 claims description 12
- 150000002148 esters Chemical class 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 11
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 claims description 9
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 claims description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 9
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 9
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 claims description 8
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 6
- 150000001734 carboxylic acid salts Chemical class 0.000 claims description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 4
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 claims description 4
- 239000012736 aqueous medium Substances 0.000 claims description 4
- 125000001246 bromo group Chemical group Br* 0.000 claims description 4
- 229910052736 halogen Inorganic materials 0.000 claims description 4
- 239000003960 organic solvent Substances 0.000 claims description 4
- 239000001632 sodium acetate Substances 0.000 claims description 4
- 235000017281 sodium acetate Nutrition 0.000 claims description 4
- 229910000030 sodium bicarbonate Inorganic materials 0.000 claims description 4
- 235000017557 sodium bicarbonate Nutrition 0.000 claims description 4
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 3
- 125000005843 halogen group Chemical group 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 3
- XZVBIIRIWFZJOE-UHFFFAOYSA-N 1-iodoethyl propan-2-yl carbonate Chemical compound CC(C)OC(=O)OC(C)I XZVBIIRIWFZJOE-UHFFFAOYSA-N 0.000 claims description 2
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 claims description 2
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical group CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 claims 1
- 239000000243 solution Substances 0.000 description 13
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000002585 base Substances 0.000 description 6
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- -1 2-mercapto-5-methyl-1 ,3,4- thiadiazolyl ester Chemical class 0.000 description 3
- 150000008065 acid anhydrides Chemical class 0.000 description 3
- 238000004128 high performance liquid chromatography Methods 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 238000007363 ring formation reaction Methods 0.000 description 3
- WYUSVOMTXWRGEK-PBOXCSIMSA-N (6r)-7-[[(2z)-2-(2-amino-1,3-thiazol-4-yl)-2-methoxyiminoacetyl]amino]-3-(methoxymethyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylic acid Chemical compound C1([C@@H]2N(C1=O)C(=C(CS2)COC)C(O)=O)NC(=O)C(=N/OC)\C1=CSC(N)=N1 WYUSVOMTXWRGEK-PBOXCSIMSA-N 0.000 description 2
- BDSDFCVDQUGOFB-XNCJUZBTSA-N (6s,7s)-7-amino-3-(methoxymethyl)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylic acid Chemical compound S1CC(COC)=C(C(O)=O)N2C(=O)[C@H](N)[C@H]12 BDSDFCVDQUGOFB-XNCJUZBTSA-N 0.000 description 2
- MASDFXZJIDNRTR-UHFFFAOYSA-N 1,3-bis(trimethylsilyl)urea Chemical compound C[Si](C)(C)NC(=O)N[Si](C)(C)C MASDFXZJIDNRTR-UHFFFAOYSA-N 0.000 description 2
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical compound CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 2
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 125000002346 iodo group Chemical group I* 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- AMTTUPGTZVAKBF-DAXSKMNVSA-N (2z)-4-bromo-2-methoxyimino-3-oxobutanoic acid Chemical compound CO\N=C(/C(O)=O)C(=O)CBr AMTTUPGTZVAKBF-DAXSKMNVSA-N 0.000 description 1
- NDVMCQUOSYOQMZ-UHFFFAOYSA-N 2,2-bis(trimethylsilyl)acetamide Chemical compound C[Si](C)(C)C(C(N)=O)[Si](C)(C)C NDVMCQUOSYOQMZ-UHFFFAOYSA-N 0.000 description 1
- CWTBMAZXSUIRNE-NBWCZPENSA-N BrCC(/C(/C(=O)NC1[C@@H]2N(C(=C(CS2)COC)C(=O)O)C1=O)=N/OC)=O Chemical compound BrCC(/C(/C(=O)NC1[C@@H]2N(C(=C(CS2)COC)C(=O)O)C1=O)=N/OC)=O CWTBMAZXSUIRNE-NBWCZPENSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- QOSSAOTZNIDXMA-UHFFFAOYSA-N Dicylcohexylcarbodiimide Chemical compound C1CCCCC1N=C=NC1CCCCC1 QOSSAOTZNIDXMA-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 125000000738 acetamido group Chemical group [H]C([H])([H])C(=O)N([H])[*] 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001339 alkali metal compounds Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 239000003242 anti bacterial agent Substances 0.000 description 1
- 229940088710 antibiotic agent Drugs 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- 230000003115 biocidal effect Effects 0.000 description 1
- 235000013877 carbamide Nutrition 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- QQVDYSUDFZZPSU-UHFFFAOYSA-M chloromethylidene(dimethyl)azanium;chloride Chemical compound [Cl-].C[N+](C)=CCl QQVDYSUDFZZPSU-UHFFFAOYSA-M 0.000 description 1
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010511 deprotection reaction Methods 0.000 description 1
- 238000005828 desilylation reaction Methods 0.000 description 1
- HPYNZHMRTTWQTB-UHFFFAOYSA-N dimethylpyridine Natural products CC1=CC=CN=C1C HPYNZHMRTTWQTB-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- CXHHBNMLPJOKQD-UHFFFAOYSA-N methyl hydrogen carbonate Chemical compound COC(O)=O CXHHBNMLPJOKQD-UHFFFAOYSA-N 0.000 description 1
- 244000005700 microbiome Species 0.000 description 1
- UHZYTMXLRWXGPK-UHFFFAOYSA-N phosphorus pentachloride Chemical compound ClP(Cl)(Cl)(Cl)Cl UHZYTMXLRWXGPK-UHFFFAOYSA-N 0.000 description 1
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 1
- IUGYQRQAERSCNH-UHFFFAOYSA-N pivalic acid Chemical compound CC(C)(C)C(O)=O IUGYQRQAERSCNH-UHFFFAOYSA-N 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001981 tert-butyldimethylsilyl group Chemical group [H]C([H])([H])[Si]([H])(C([H])([H])[H])[*]C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000004665 trialkylsilyl group Chemical group 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Description
PROCESS FOR THE PREPARATION OF CEFPODOXIME ACID
FIELD OF THE INVENTION
The present invention relates to an improved and cost effective process for the industrial preparation of cefpodoxime acid of Formula I
FORMULA I
and a pharmaceutically acceptable ester thereof.
BACKGROUND OF THE INVENTION
Chemically, cefpodoxime acid is [(6R-[6α,7β(Z)]]-7-[2-(2-aminothiazol-
4-yl)-2-methoxyimino) acetamido]-3-cephem-4-carboxylic acid having Formula I, and is known from U.S. Patent No. 4,409,215. Although cefpodoxime acid is not suitable for oral administration, its ester derivative, 1- (isoproxycarbonyloxyl)ethyl ester i.e. cefpodoxime proxetil of Formula II,
is a valuable orally administered antibiotic characterized by high broad spectrum activity against gram positive and gram negative microorganisms.
A number of processes have been outlined in U.S. Patent Nos. 4,409,215, 5,109,131 , GB 2012276 and WO 00/63214 for the preparation of cepholosporin antibiotics. However, attempts to extend these processes for preparing cefpodoxime acid at an industrial scale did not give the desired results with respect to yield and quality. More particularly, the synthetic process comprising coupling of reactive acid derivative of compound of Formula 111,
FORMULA III
with a reactive derivative of an open chain compound of Formula IV,
FORMULA IV
wherein X is a halogen selected from chloro, bromo and iodo, to get a compound of Formula V,
FORMULA V
and its subsequent cyclization with thiourea to obtain cefpodoxime acid of Formula I, was found to be unsatisfactory at a commercial scale. Processes described in U.S. Patent No. 4,409,215 and GB 2012276 require protection at the carboxylic position of the compound of Formula III followed by the steps of coupling, cyclization and hydrolysis to get cefpodoxime acid. The additional steps of protection and deprotection result in low yields and high costs. The processes described in PCT Application WO 00/63214 and U.S. Patent No. 5,109,131 require formation of compound of Formula V and its subsequent
cyclization with thiourea in a mixture of organic solvent and water to afford cefpodoxime acid. Cefpodoxime acid thus obtained is of poor quality and contains anti isomer of cefpodoxime acid as a major impurity.
Accordingly, none of the processes described heretofore are completely satisfactory for various reasons.
SUMMARY OF THE INVENTION
It is an object of the present invention to provide a process for the preparation of cefpodoxime acid and a pharmaceutically acceptable ester thereof in good yields and high purity (99%) by HPLC. The process is simple and provides obvious benefits with respect to economics and convenience to operate at a commercial scale.
Accordingly, the present invention provides a process for the preparation of cefpodoxime acid of Formula I
FORMULA I and a pharmaceutically acceptable ester thereof comprising:
reacting a compound of Formula VI,
FORMULA VI
wherein R is hydrogen or a silyl group and R' is a silyl group or COOR' is a carboxylic acid salt, with a compound of Formula IV,
FORMULA IV
or its reactive acid derivatives, wherein X is a halogen, to obtain a compound of Formula VII,
FORMULA VII
wherein X and R' are as defined above;
(ii) desilylating or acidifying the compound of Formula VII to isolate the compound of formula V; and
FORMULA V
(iii) reacting the compound of Formula V with thiourea in aqueous medium in the presence of a weak base to obtain cefpodoxime acid of Formula I.
Cefpodoxime acid, so obtained may be converted into its ester such as cefpodoxime proxetil by methods known in the art.
The carboxylic acid salts of Formula VI include salts with a metal such as sodium or potassium, or salt with an organic amine such as triethylamine, pyridine, diclyclohexylamine or N, N-dimethylaniline.
R and R' in the compound of Formula VI may be silyl groups which may be same or different. Suitable silyl groups are trialkyl silyl groups wherein the alkyl substitutents may be same or different. Preferred alkyl substituents are methyl, ethyl, isopropyl and tert-butyl. Preferred silyl groups are trimethylsilyl and tert-butyldimethylsilyl.
X in the compounds of Formula IV, V and VIII is a halogen selected from chloro, bromo and iodo. X is preferably bromo.
The reactive acid derivatives of Formula IV include the acid halides, the acid anhydride, mixed acid anhydrides, reactive esters, reactive amides and the acid azide. Preferred mixed acid anhydrides include anhydrides with lower alkanoic acids such as pivalic acid, trichloroacetic acid and anhydrides with a carbonic acid such as monomethylcarbonate. Preferred reactive esters include p-nitrophenylester, N-hydroxysuccinimido ester, N-hydroxyphthalimido ester, 2-mercaptobenzothioazolyl ester and 2-mercapto-5-methyl-1 ,3,4- thiadiazolyl ester. Among the reactive acid derivatives of Formula IV, acid halides are preferred.
Where the compound of Formula IV is employed in the form of a free acid, the reaction step (i) is carried out in the presence of a condensing agent such as dicylohexylcarbodiimide, or a "Vilsmeier reagent" formed by the reaction of an amide compound such as dimethylformamide with a halogen compound such as phosphorous oxychloride.
Where a reactive derivative of the acid of Formula IV is employed, the use of such a condensing agent is not required, however, it may be desirable to carry out the reaction in the presence of a base. Examples of suitable bases include alkali metal compound such as sodium bicarbonate, sodium
carbonate and potassium carbonate or an organic amine such as triethylamine, lutidine or pyridine.
The reaction of step (i) is usually carried out in a suitable solvent. When R, R' or both are silyl in the compound of Formula VI, suitable solvents for the reaction include halogenated hydrocarbons such as methylene chloride, hydrocarbons such as toluene, ethers such as tetrahydrofuran or polar solvents such as dimethylformamide, or a mixture thereof. When R is hydrogen and COOR' is a carboxylic acid salt in the compound of Formula VI, suitable solvents for the reaction include methanol, ethanol, acetonitrile, dimethylformamide, water, or a mixture thereof.
The starting compounds of Formula VI wherein R, R' or both are silyl may be obtained by silylating the corresponding 7-amino-3-methoxymethyl 3- cephem-4-carboxylic acid of Formula III with a suitable silylating agent. Appropriate silylating agents include halosilanes such as trimethylsilylchlo de (TMCS), dimethyldichlorosilane (DMDCS), silylated amides such as N, 0- bistrimethylsilyl acetamide (BSA), silazanes such as 1 ,1 ,1 ,3,3,3- hexamethyldisilazane (HMDS), silylated ureas such as N, N'-bis- (trimethylsilyl) urea (BSU), or a mixture thereof
Where COOR' is a carboxylic acid salt in the compound of Formula VI, it may be obtained in a conventional manner, for example by treatment of a compound of Formula III with a base such as sodium bicarbonate, triethylamine etc.
Compounds of Formula III and IV may be obtained by methods known in the art.
The desilylation (step ii) of the compound of Formula VII (wherein R' is a silyl group) may be carried out according to conventional methods such as treatment with methanol / water to isolate compound of Formula V.
We believe that the isolation of the compound of Formula V plays a crucial role in obtaining the compound of Formula I in high yields and good quality. The reactions of steps (i) and (ii) result in the formation of impurities alongwith the desired product which are automatically removed during the isolation of compound of Formula V.
The reaction of a compound of Formula V with thiourea is carried out in the presence of a weak base such as sodium acetate and sodium bicarbonate in an aqueous medium comprising water and a water-miscible organic solvent such as ethanol, methanol, isopropanol, acetone, tetrahydrofuran, acetonitrile, N, N-dimethylformamide, or a mixture thereof. The compound of Formula V is added to an aqueous solution of a weak base at a temperature of about 0 to 5QC. Thereafter, an aqueous solution of thiourea is added to the above mixture at a temperature of about 0 to 10-C. The reaction may then be carried out a temperature of about 0 to 609C, preferably at 0-259C, more preferably at 10-20QC. Cefpodoxime acid of purity 99% is obtained by
washing the reaction mixture with ethyl acetate and acidifying the aqueous layer to a pH of about 2.5 to 3.
However, the reaction of compound of Formula V with thiourea is best carried out in water since a mixture of solvent and water may carryover impurities to the aqueous layer which may then precipitate along with the desired product. Also, lower yields are obtained as cefpodoxime acid is soluble in the water-miscible solvents mentioned above.
Cefpodoxime acid so obtained may be converted to cefpodoxime proxetil by methods known in the art such as reaction with 1- iodoethylisopropyl carbonate in the presence of 1 ,8-diazabicyclo [5.4.0] undec-7-ene (DBU) in N, N-dimethylformamide.
DETAILED DESCRIPTION OF THE INVENTION
In the following section a preferred embodiment is described by way of example to illustrate the process of this invention. However, it is not intended in any way to limit the scope of the present invention.
EXAMPLE
Preparation of cefpodoxime acid
(i) 7-[4-bromo-3-oxo-(Z)-2-methoxyiminobutyrylamino]-3-methoxymethyl- 3-cephem-4-carboxylic acid
Solution A
Hexamethyldisilazane (73.9g) and acetamide (54.2g) were refluxed in dichloromethane (560ml) in the presence of a catalytic amount of imidazole. 7-amino-3-methoxymethyl-3-cephem-4-carboxylic acid (80. Og) was added to the resulting solution and refluxed for 1 hour to obtain almost a clear solution.
Solution B
Phosphorous pentachloride (66.2g) was added to a solution of 4-bromo-2- methoxyimino-3-oxobutyric acid (69.8g) in dichloromethane at about -20 to - 10QC and stirred for about one hour.
Solution A was added to solution B at about -70 to -50eC and further stirred at about -30 to -10QC for two hours. The reaction mixture was then poured into a mixture of water and methanol. The organic layer was separated, concentrated to about 240ml and toluene (800ml) was added to the concentrated mass to obtain the title compound (110g) after filtration and drying at 30QC.
(ii) 7-[2-(aminothiazol-4-yl)-2-(Z)-methoxyiminoacetamido]-3- methoxymethyl-3-cephem-4-carboxylic acid
7-[4-bromo-3-oxo-(Z)-2-methoxyiminobutyryIamino]-3-methoxymethyl-3- cephem-4-carboxyIic acid (90g)obtained from step (i) was added to a cold (2- 5SC) solution of sodium acetate (163.2g) in water (720ml). Thereafter, a solution of thiourea (18.3g) in water was added to it at 0-10QC. The mixture was stirred at 15-20SC for about two hours. The reaction mixture was then washed with ethyl acetate and pH of the aqueous layer was adjusted to about 2.5 - 3 to obtain cefpodoxime acid (70g; purity by HPLC = 99%) after filtration and drying at 45-50sC.
Preparation of cefpodoxime proxetil
1-isopropoxycarbonyIoxyethyI-7-[2-(2-aminothiazol-4-yl)-2-(Z)- methoxyiminoacetamido]-3-methoxymethyl-3-cephem-4-carboxylate
7-[2-(2-aminothiazol-4-yl)-2-(Z)-methoxyiminoacetamido]-3-methoxymethyl-3- cephem-4-carboxylic acid (50g) was dissolved in N, N-dimethylacetamide (300ml) and to this solution was added 1 ,8-diazabicyclo[5,4,0]undec-7-ene (DBU) (17.11 g) at -10 to 0QC. lodoethylisopropyl carbonate (30.19g) was then added to the resulting mixture at the same temperature. The reaction was worked up after stirring for two hours at -10 to -5SC by addition of ethyl acetate and water. The organic layer was separated and successively washed with 0.2% aqueous hydrochloric acid solution, 1 % aqueous sodium bicarbonate solution and finally 1 % aqueous sodium thiosulfate solution.
The organic layer was concentrated to about 200ml and the product precipitated with cyclohexane (1500ml). The product so obtained was purified by reprecipitation with methanol/water to obtain pure cefpodoxime proxetil (48g; purity by HPLC = 98%).
While this invention has been described by reference to specific examples, this was for the purpose of illustration only. Numerous alternative embodiments will be apparent to those skilled in the art and are considered to be within the scope of this invention.
Claims (13)
- WE CLAIM:A process for the preparation of cefpodoxime acid of Formula I,FORMULA Iand a pharmaceutically acceptable ester thereof, comprising(i) reacting a compound of Formula VI,F ORMULA VIwherein R is hydrogen or a silyl group and R' is a silyl group or COOR" is a carboxylic acid salt, with a compound of Formula IV,FORMULA IV or its reactive acid derivatives, wherein X is a halogen, to obtain a compound of Formula VII,FORMULA VII wherein X and R' are as defined above;(ϋ) desilylating or acidifying the compound of Formula VII to isolate the compound of formula V; andFORMULA V (iii) reacting the compound of Formula V with thiourea in aqueous medium in the presence of a weak base to obtain cefpodoxime acid of Formula I.
- 2. The process according to claim 1 wherein both R and R' are trimethylsilyl in the compound of Formula VI.
- 3. The process according to claim 1 wherein X is chloro or bromo in the compound of Formula IV.
- 4. The process according to claim 1 wherein the reactive derivative of Formula IV is acid chloride.
- 5. The process according to claim 1 wherein the reaction of step (iii) in aqueous medium comprises reacting in water and a water-miscible organic solvent.
- 6. The process according to claim 5 wherein the water-miscible organic solvent is selected from the group consisting of ethanol, methanol, isopropanol, acetone, tetrahydrofuran, acetonitrile, N,N-dimethylformamide, or a mixture thereof.
- 7. The process according to claim 5 wherein the reaction of step (iii) is carried out in water alone.
- 8. The process accounting to claim 1 wherein the weak base in step (iii) is selected from the group consisting of sodium acetate or sodium bicarbonate.
- 9. The process according to claim 1 wherein in step (iii), the compound of Formula V is added to an aqueous solution of sodium acetate or sodium bicarbonate at a temperature of about 0 to 5eC.
- 10. The process according to claim 1 wherein in step (iii), the thiourea is added at a temperature of about 0 to 10QC.
- 11. The process according to claim 1 wherein the reaction of step (iii) is carried out at a temperature of about 10 to 20QC.
- 12. The process according to claim 1 wherein the cefpodoxime acid is obtained at a pH of about 2.5 to 3.0.
- 13. The process according to claim 1 wherein the cefpodoxime acid of Formula I is reacted with 1 -iodoethylisopropyl carbonate in the presence of 1 ,8-diazabicyclo[5,4,0]undec-7-ene (DBU) in N,N- dimethylformamide to give cefpodoxime proxetil of Formula II
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IN493/DEL/01 | 2001-04-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2002307885A1 true AU2002307885A1 (en) | 2002-10-28 |
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