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AU2002360329A1 - Structures and methods for reducing aberration in optical systems - Google Patents

Structures and methods for reducing aberration in optical systems

Info

Publication number
AU2002360329A1
AU2002360329A1 AU2002360329A AU2002360329A AU2002360329A1 AU 2002360329 A1 AU2002360329 A1 AU 2002360329A1 AU 2002360329 A AU2002360329 A AU 2002360329A AU 2002360329 A AU2002360329 A AU 2002360329A AU 2002360329 A1 AU2002360329 A1 AU 2002360329A1
Authority
AU
Australia
Prior art keywords
structures
methods
optical systems
reducing aberration
aberration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002360329A
Inventor
James Mcguire Jr.
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Optical Research Associates
Original Assignee
Optical Research Associates
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/178,935 external-priority patent/US6844972B2/en
Priority claimed from US10/178,621 external-priority patent/US6970232B2/en
Priority claimed from US10/178,937 external-priority patent/US6995908B2/en
Priority claimed from US10/178,601 external-priority patent/US7453641B2/en
Application filed by Optical Research Associates filed Critical Optical Research Associates
Publication of AU2002360329A1 publication Critical patent/AU2002360329A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Polarising Elements (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU2002360329A 2001-10-30 2002-10-30 Structures and methods for reducing aberration in optical systems Abandoned AU2002360329A1 (en)

Applications Claiming Priority (19)

Application Number Priority Date Filing Date Title
US33509301P 2001-10-30 2001-10-30
US60/335,093 2001-10-30
US33218301P 2001-11-21 2001-11-21
US60/332,183 2001-11-21
US36380802P 2002-03-12 2002-03-12
US60/363,808 2002-03-12
US36791102P 2002-03-26 2002-03-26
US60/367,911 2002-03-26
US38542702P 2002-05-31 2002-05-31
US60/385,427 2002-05-31
US10/178,935 US6844972B2 (en) 2001-10-30 2002-06-20 Reducing aberration in optical systems comprising cubic crystalline optical elements
US10/178,621 US6970232B2 (en) 2001-10-30 2002-06-20 Structures and methods for reducing aberration in integrated circuit fabrication systems
US10/178,621 2002-06-20
US10/178,937 US6995908B2 (en) 2001-10-30 2002-06-20 Methods for reducing aberration in optical systems
US10/178,601 US7453641B2 (en) 2001-10-30 2002-06-20 Structures and methods for reducing aberration in optical systems
US10/178,935 2002-06-20
US10/178,601 2002-06-20
US10/178,937 2002-06-20
PCT/US2002/034828 WO2003038479A2 (en) 2001-10-30 2002-10-30 Structures and methods for reducing aberration in optical systems

Publications (1)

Publication Number Publication Date
AU2002360329A1 true AU2002360329A1 (en) 2003-05-12

Family

ID=27578632

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002360329A Abandoned AU2002360329A1 (en) 2001-10-30 2002-10-30 Structures and methods for reducing aberration in optical systems

Country Status (4)

Country Link
EP (1) EP1451619A4 (en)
JP (1) JP2005508018A (en)
AU (1) AU2002360329A1 (en)
WO (1) WO2003038479A2 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10123725A1 (en) 2001-05-15 2002-11-21 Zeiss Carl Objective for microlithographic projection, includes lens element with axis perpendicular to specified fluoride crystal plane
US7239447B2 (en) 2001-05-15 2007-07-03 Carl Zeiss Smt Ag Objective with crystal lenses
JP2004526331A (en) 2001-05-15 2004-08-26 カール・ツアイス・エスエムテイ・アーゲー Objective lens including fluoride crystal lens
JP3639807B2 (en) 2001-06-27 2005-04-20 キヤノン株式会社 Optical element and manufacturing method
US7292388B2 (en) 2002-05-08 2007-11-06 Carl Zeiss Smt Ag Lens made of a crystalline material
DE10328938A1 (en) 2003-06-27 2005-01-20 Carl Zeiss Smt Ag Correction device for compensation of disturbances of the polarization distribution and projection objective for microlithography
KR101199076B1 (en) * 2004-06-04 2012-11-07 칼 짜이스 에스엠티 게엠베하 Projection system with compensation of intensity variations and compensation element therefor
DE102005030839A1 (en) * 2005-07-01 2007-01-11 Carl Zeiss Smt Ag Projection exposure system with a plurality of projection lenses
DE102007055063A1 (en) * 2007-11-16 2009-05-28 Carl Zeiss Smt Ag Illumination device of a microlithographic projection exposure apparatus
DE102007055567A1 (en) * 2007-11-20 2009-05-28 Carl Zeiss Smt Ag Optical system

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3052152A (en) * 1959-03-27 1962-09-04 American Optical Corp Optical compensating system
US3758201A (en) * 1971-07-15 1973-09-11 American Optical Corp Optical system for improved eye refraction
US4239329A (en) * 1978-08-04 1980-12-16 Nippon Telegraph And Telephone Public Corporation Optical nonreciprocal device
US4534649A (en) * 1981-10-30 1985-08-13 Downs Michael J Surface profile interferometer
US4576479A (en) * 1982-05-17 1986-03-18 Downs Michael J Apparatus and method for investigation of a surface
US4918395A (en) * 1988-11-21 1990-04-17 Spectra-Physics Multipass laser amplifier with at least one expanded pass
US5033830A (en) * 1989-10-04 1991-07-23 At&T Bell Laboratories Polarization independent optical isolator
US5537260A (en) * 1993-01-26 1996-07-16 Svg Lithography Systems, Inc. Catadioptric optical reduction system with high numerical aperture
JP3083957B2 (en) * 1994-06-16 2000-09-04 株式会社ニコン Fluorite for optical lithography
JP4014716B2 (en) * 1997-06-24 2007-11-28 オリンパス株式会社 Optical system having polarization compensation optical system
DE19807120A1 (en) * 1998-02-20 1999-08-26 Zeiss Carl Fa Optical system with polarization compensator
JP3239881B2 (en) * 1998-11-16 2001-12-17 キヤノン株式会社 Optical system and projection device using the same
JP2000164489A (en) * 1998-11-26 2000-06-16 Nikon Corp Scanning projection exposure equipment
JP2001210497A (en) * 2000-01-26 2001-08-03 Mitsubishi Electric Corp Accelerator
JP2001228401A (en) * 2000-02-16 2001-08-24 Canon Inc Projection optical system, projection exposure apparatus using the projection optical system, and device manufacturing method
US7301605B2 (en) * 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices

Also Published As

Publication number Publication date
WO2003038479A2 (en) 2003-05-08
WO2003038479A3 (en) 2004-01-29
EP1451619A2 (en) 2004-09-01
JP2005508018A (en) 2005-03-24
EP1451619A4 (en) 2007-10-03

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase