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AU2002242923A1 - Plasma surface treatment method and device for carrying out said method - Google Patents

Plasma surface treatment method and device for carrying out said method

Info

Publication number
AU2002242923A1
AU2002242923A1 AU2002242923A AU2002242923A AU2002242923A1 AU 2002242923 A1 AU2002242923 A1 AU 2002242923A1 AU 2002242923 A AU2002242923 A AU 2002242923A AU 2002242923 A AU2002242923 A AU 2002242923A AU 2002242923 A1 AU2002242923 A1 AU 2002242923A1
Authority
AU
Australia
Prior art keywords
plasma
surface treatment
treated
carrying
plasma surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002242923A
Inventor
Alexander Cherepanov
Pavel Koulik
Evguenii Petrov
Mickhail Samsonov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
APIT Corp SA
Original Assignee
APIT Corp SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by APIT Corp SA filed Critical APIT Corp SA
Publication of AU2002242923A1 publication Critical patent/AU2002242923A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32321—Discharge generated by other radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Cleaning In General (AREA)
  • Details Of Rigid Or Semi-Rigid Containers (AREA)
  • Drying Of Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

The invention relates to a plasma surface treatment method for the surface of an object or particles to be treated consisting in creating a plasma and applying said plasma against the surface to be treated. The inventive method is characterised in that the surface to be treated is excited or the plasma is made to vibrate acoustically in order to create a relative wave motion between the plasma and the surface to be treated.
AU2002242923A 2001-03-27 2002-03-26 Plasma surface treatment method and device for carrying out said method Abandoned AU2002242923A1 (en)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
EP01810318 2001-03-27
EP01810318.4 2001-03-27
EP01120974 2001-08-31
EP01120974.9 2001-08-31
EP01810915.7 2001-09-20
EP01810915 2001-09-20
PCT/IB2002/001001 WO2002076511A2 (en) 2001-03-27 2002-03-26 Plasma surface treatment method and device for carrying out said method

Publications (1)

Publication Number Publication Date
AU2002242923A1 true AU2002242923A1 (en) 2002-10-08

Family

ID=27224223

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002242923A Abandoned AU2002242923A1 (en) 2001-03-27 2002-03-26 Plasma surface treatment method and device for carrying out said method

Country Status (10)

Country Link
EP (1) EP1374276B1 (en)
JP (1) JP2004527077A (en)
CN (1) CN100437883C (en)
AT (1) ATE373314T1 (en)
AU (1) AU2002242923A1 (en)
BR (1) BR0208242A (en)
DE (1) DE60222391T2 (en)
ES (1) ES2294112T3 (en)
MX (1) MXPA03008615A (en)
WO (1) WO2002076511A2 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2911610B1 (en) * 2007-01-24 2012-09-21 Air Liquide PROCESS FOR SURFACE TREATMENT OF POLYMER SUBSTRATES, SUBSTRATES THUS OBTAINED AND THEIR USE FOR THE PRODUCTION OF MULTILAYER MATERIALS
NL1033408C2 (en) * 2007-02-16 2008-08-19 Omve Netherlands B V Disinfection of e.g. foodstuffs or packaging, comprises exposure to combination of ultrasonic vibration and plasma
ES2662029T3 (en) * 2007-05-11 2018-04-05 Force Technology Improvement of the modification of a surface with plasma through the use of high intensity and high power ultrasonic acoustic waves
NL1033958C2 (en) * 2007-06-11 2008-12-12 Omve Netherlands B V Plastic bottles i.e. polyethylene terephthalate bottles, disinfecting method, for packaging food items, involves exposing inner side of sensitive material to hot medium such as hot liquid, and exposing outerside of sensitive material
CN101974298A (en) * 2010-11-11 2011-02-16 复旦大学 Method for treating metal surface with argon plasma
EP2678046B1 (en) * 2011-02-25 2015-01-21 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Disinfection appliance, container, use of a container and disinfection method for disinfecting a container, in particular for a food container
DE102012206081A1 (en) * 2012-04-13 2013-10-17 Krones Ag Coating of containers with plasma nozzles
CN102785376B (en) * 2012-08-14 2016-03-30 明尼苏达矿业制造特殊材料（上海）有限公司 Polyethylene surface treatment method
JP6328537B2 (en) * 2014-10-31 2018-05-23 エア・ウォーター・マッハ株式会社 Plasma processing method and plasma processing apparatus
JP5795427B1 (en) * 2014-12-26 2015-10-14 竹本容器株式会社 Manufacturing method of resin container with coating and resin container coating apparatus
US20190093226A1 (en) * 2016-04-08 2019-03-28 Sio2 Medical Products, Inc. Method for applying a pecvd lubricity layer with a moving gas inlet
CN106944419A (en) * 2017-05-12 2017-07-14 中国工程物理研究院核物理与化学研究所 A kind of plasma decontamination system of removal surface tritium pollution

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4778583A (en) * 1987-05-11 1988-10-18 Eastman Kodak Company Semiconductor etching process which produces oriented sloped walls
JPH01111333A (en) * 1987-10-26 1989-04-28 Oki Electric Ind Co Ltd Dry etching apparatus
DE3900768C1 (en) * 1989-01-12 1990-02-22 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De Plasma etching device and method for operating it
JPH04111313A (en) * 1990-08-31 1992-04-13 Mitsubishi Electric Corp Microfabrication equipment and method
US5277740A (en) * 1990-08-31 1994-01-11 Mitsubishi Denki Kabushiki Kaisha Apparatus and method for forming a fine pattern
JPH04357662A (en) * 1991-04-19 1992-12-10 Matsushita Electric Works Ltd Electrodeless discharge lamp
RU2000890C1 (en) * 1992-01-16 1993-10-15 Совместное межотраслевое и межрегиональное производственно-торговое объединение "Край" Installation for production of ultradispersed powder
US5569502A (en) * 1992-09-11 1996-10-29 Semiconductor Energy Laboratory Co., Ltd. Film formation apparatus and method for forming a film
JP3297881B2 (en) * 1992-10-27 2002-07-02 イーシー化学株式会社 Ultrafine particle surface treatment method
JPH07106092A (en) * 1993-10-04 1995-04-21 Matsushita Electric Ind Co Ltd Shock wave plasma generator
JPH07155529A (en) * 1993-12-01 1995-06-20 Takuma Co Ltd Gas treating device and operating method thereof
JP3459672B2 (en) * 1993-12-01 2003-10-20 株式会社タクマ Gas treatment equipment
JP3287124B2 (en) * 1994-08-17 2002-05-27 ソニー株式会社 Method for forming SiN-based insulating film
JP3309581B2 (en) * 1994-08-31 2002-07-29 ソニー株式会社 Dry etching method for perovskite oxide film
JP3428169B2 (en) * 1994-08-31 2003-07-22 ソニー株式会社 Dry etching method for niobium thin film
DE4438359C2 (en) * 1994-10-27 2001-10-04 Schott Glas Plastic container with a barrier coating
JP3806847B2 (en) * 1995-11-24 2006-08-09 イーシー化学株式会社 Powder processing method and apparatus using atmospheric pressure glow discharge plasma
JPH09157845A (en) * 1995-12-06 1997-06-17 Hitachi Ltd Chaotic film forming apparatus, chaotic film forming method, and chaotic film forming medium
FR2744805B1 (en) * 1996-02-13 1998-03-20 Pechiney Aluminium CATHODE SPRAY TARGETS SELECTED BY ULTRASONIC CONTROL FOR THEIR LOW PARTICLE EMISSION RATES
JPH1033976A (en) * 1996-05-24 1998-02-10 Sekisui Chem Co Ltd Discharge plasma processing method and apparatus therefor
JPH1187098A (en) * 1997-09-03 1999-03-30 Toshiba Corp Plasma processing equipment
US6423924B1 (en) * 1998-03-10 2002-07-23 Tepla Ag Method for treating the surface of a material or an object and implementing device
JP3572942B2 (en) * 1998-05-22 2004-10-06 日新電機株式会社 Discharge gas treatment equipment
JP2000077372A (en) * 1998-08-31 2000-03-14 Sumitomo Metal Ind Ltd Method for manufacturing semiconductor wafer for vapor phase growth
JP3555470B2 (en) * 1998-12-04 2004-08-18 セイコーエプソン株式会社 Etching method by atmospheric pressure high frequency plasma
US6231933B1 (en) * 1999-03-18 2001-05-15 Primaxx, Inc. Method and apparatus for metal oxide chemical vapor deposition on a substrate surface
JP4372918B2 (en) * 1999-06-30 2009-11-25 パナソニック電工株式会社 Plasma processing apparatus and plasma processing method
JP2001035691A (en) * 1999-07-16 2001-02-09 Japan Atom Energy Res Inst Formation method of plasma channel for laser light guide by Z-pinch discharge

Also Published As

Publication number Publication date
EP1374276B1 (en) 2007-09-12
DE60222391D1 (en) 2007-10-25
EP1374276A2 (en) 2004-01-02
CN100437883C (en) 2008-11-26
JP2004527077A (en) 2004-09-02
DE60222391T2 (en) 2008-06-05
CN1511333A (en) 2004-07-07
ATE373314T1 (en) 2007-09-15
MXPA03008615A (en) 2005-03-07
ES2294112T3 (en) 2008-04-01
WO2002076511A3 (en) 2003-04-17
WO2002076511A2 (en) 2002-10-03
BR0208242A (en) 2004-04-13

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase