[go: up one dir, main page]

AU2001235267A1 - Photopolymerizable composition sensitive to light in a green to infrared region of the optical spectrum - Google Patents

Photopolymerizable composition sensitive to light in a green to infrared region of the optical spectrum

Info

Publication number
AU2001235267A1
AU2001235267A1 AU2001235267A AU3526701A AU2001235267A1 AU 2001235267 A1 AU2001235267 A1 AU 2001235267A1 AU 2001235267 A AU2001235267 A AU 2001235267A AU 3526701 A AU3526701 A AU 3526701A AU 2001235267 A1 AU2001235267 A1 AU 2001235267A1
Authority
AU
Australia
Prior art keywords
light
green
polymer
infrared region
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001235267A
Inventor
Tigran Galstian
Amir Tork
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Universite Laval
Original Assignee
Universite Laval
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Universite Laval filed Critical Universite Laval
Publication of AU2001235267A1 publication Critical patent/AU2001235267A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/30—Details of photosensitive recording material not otherwise provided for
    • G03H2260/33—Having dispersed compound
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2270/00—Substrate bearing the hologram
    • G03H2270/53—Recording material dispersed into porous substrate

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Liquid Crystal (AREA)
  • Holo Graphy (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

The invention is concerned with a photopolymerizable composition sensitive to light in a green to infrared region of the optical spectrum, comprising (a) a photopolymerizable monomer or oligomer, or a mixture thereof, capable of forming a polymer having predetermined optical properties; (b) a photoinitiator sensitive to light in the aforesaid region; (c) an additive for increasing the refractive index and decreasing the viscosity of the composition; and (d) a filler having optical properties selected to contrast with the optical properties of the polymer. The composition of the invention is particularly useful for producing holographic polymer dispersed liquid crystal materials and reversible dye doped polymer materials having improved electrical and optical switching characteristics.
AU2001235267A 2000-02-14 2001-02-14 Photopolymerizable composition sensitive to light in a green to infrared region of the optical spectrum Abandoned AU2001235267A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CA2298354 2000-02-14
CA002298354A CA2298354C (en) 2000-02-14 2000-02-14 Photopolymerizable composition sensitive to light in a green to infrared region of the optical spectrum
PCT/CA2001/000163 WO2001059521A2 (en) 2000-02-14 2001-02-14 Photopolymerizable composition sensitive to light in a green to infrared region of the optical spectrum

Publications (1)

Publication Number Publication Date
AU2001235267A1 true AU2001235267A1 (en) 2001-08-20

Family

ID=4165295

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001235267A Abandoned AU2001235267A1 (en) 2000-02-14 2001-02-14 Photopolymerizable composition sensitive to light in a green to infrared region of the optical spectrum

Country Status (6)

Country Link
EP (1) EP1264214B1 (en)
AT (1) ATE281662T1 (en)
AU (1) AU2001235267A1 (en)
CA (1) CA2298354C (en)
DE (1) DE60106880T2 (en)
WO (1) WO2001059521A2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8033054B2 (en) 2008-06-21 2011-10-11 Lensvector Inc. Electro-optical devices using dynamic reconfiguration of effective electrode structures
WO2009153764A2 (en) 2008-06-21 2009-12-23 Lensvector Inc. Electro-optical devices using dynamic reconfiguration of effective electrode structures
RU2752026C1 (en) * 2020-12-15 2021-07-22 федеральное государственное автономное образовательное учреждение высшего образования "Национальный исследовательский университет ИТМО" (Университет ИТМО) Holographic photopolymerisable material
CN118259511A (en) * 2022-12-20 2024-06-28 中兴通讯股份有限公司 Holographic metamaterial film, holographic metamaterial optical device preparation system and method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0269397A3 (en) * 1986-11-21 1988-12-07 EASTMAN KODAK COMPANY (a New Jersey corporation) Dye sensitized photographic imaging system
JPH0717737B2 (en) * 1987-11-30 1995-03-01 太陽インキ製造株式会社 Photosensitive thermosetting resin composition and method for forming solder resist pattern
CA2025198A1 (en) * 1989-10-25 1991-04-26 Daniel F. Varnell Liquid solder mask composition
DE19603577C2 (en) * 1996-02-01 2003-11-13 Heraeus Kulzer Gmbh & Co Kg adhesive
DE69832480T2 (en) * 1997-04-16 2006-06-08 Dentsply International Inc. METHOD AND COMPOSITION FOR ADHERENCE TO DENTAL STRUCTURES

Also Published As

Publication number Publication date
WO2001059521A2 (en) 2001-08-16
ATE281662T1 (en) 2004-11-15
DE60106880D1 (en) 2004-12-09
EP1264214B1 (en) 2004-11-03
CA2298354C (en) 2007-06-05
DE60106880T2 (en) 2005-10-27
CA2298354A1 (en) 2001-08-14
WO2001059521A3 (en) 2002-03-14
WO2001059521B1 (en) 2002-04-04
EP1264214A2 (en) 2002-12-11

Similar Documents

Publication Publication Date Title
US6319963B1 (en) Reflective film
TW200613801A (en) High-efficient, tuneable and switchable optical elements based on polymer-liquid crystal composites and films, mixtures and a method for their production
JP3304054B2 (en) Switchable liquid crystal device and method of manufacturing the same
EP1662322A3 (en) Positive type photo-sensitive siloxane composition, curing film formed by the composition and device with the curing film
JP2002525646A (en) Holographic lighting equipment
JP7644807B2 (en) Customized Polymer/Glass Diffractive Waveguide Stacks for Augmented/Mixed Reality Applications
AU2003289498A1 (en) Optical waveguide device, coherent light source using same and optical apparatus having same
EP1229352A3 (en) Photosensitive acrylate composition and waveguide device
TW200617036A (en) Curable formulations, cured compositions, and articles derived thereform
AU2001235267A1 (en) Photopolymerizable composition sensitive to light in a green to infrared region of the optical spectrum
Lee et al. Hysteresis-free and submillisecond-response polymer network liquid crystal
CN109143711B (en) Transparent blue-light-proof protective film and preparation method thereof
TW201426097A (en) Cholesteric liquid crystal display and method for fabricating thereof
EP0806697A3 (en) Optically anisotropic film and liquid crystal display apparatus
Nataj et al. Holographic polymer dispersed liquid crystal enhanced by introducing urethane<? A3B2 show [pmg: line-break justify=" yes"/]?> trimethacrylate
CN115627175B (en) Liquid crystal composition and liquid crystal optical element
WO2006055919A3 (en) Electrooptic chromophores with large optical birefringence for applications at high speed and short wavelengths
Huang et al. Effects of terpene alcohol dopant on the morphology and electro‐optical properties of polymer‐dispersed liquid‐crystal composite films
DE602004017039D1 (en) ÜSSIGKRISTALL
AU2001237156A1 (en) Near infrared sensitive photopolymerizable composition
KR100812276B1 (en) Prepolymer Composition and Polymer Dispersed Liquid Crystal Composite Film Using the Same
JP3981164B2 (en) Manufacturing method of liquid crystal display device
JP3864429B2 (en) LCD device
Chen et al. PDLC-based VOA with a small polarization dependent loss
JP2503830B2 (en) Liquid crystal display element