AU2001233136A1 - Wet processing method for the electronic components using liquids of varying density - Google Patents
Wet processing method for the electronic components using liquids of varying densityInfo
- Publication number
- AU2001233136A1 AU2001233136A1 AU2001233136A AU3313601A AU2001233136A1 AU 2001233136 A1 AU2001233136 A1 AU 2001233136A1 AU 2001233136 A AU2001233136 A AU 2001233136A AU 3313601 A AU3313601 A AU 3313601A AU 2001233136 A1 AU2001233136 A1 AU 2001233136A1
- Authority
- AU
- Australia
- Prior art keywords
- liquids
- processing method
- electronic components
- wet processing
- varying density
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000007788 liquid Substances 0.000 title 1
- 238000003672 processing method Methods 0.000 title 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US49539900A | 2000-01-31 | 2000-01-31 | |
| US09/495,399 | 2000-01-31 | ||
| PCT/US2001/003040 WO2001054835A1 (fr) | 2000-01-31 | 2001-01-31 | Procedes de traitement par voie humide de composants electroniques au moyen liquides de densite variable |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2001233136A1 true AU2001233136A1 (en) | 2001-08-07 |
Family
ID=23968505
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2001233136A Abandoned AU2001233136A1 (en) | 2000-01-31 | 2001-01-31 | Wet processing method for the electronic components using liquids of varying density |
Country Status (3)
| Country | Link |
|---|---|
| AU (1) | AU2001233136A1 (fr) |
| TW (1) | TW492102B (fr) |
| WO (1) | WO2001054835A1 (fr) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4911761A (en) * | 1984-05-21 | 1990-03-27 | Cfm Technologies Research Associates | Process and apparatus for drying surfaces |
| US4795497A (en) * | 1985-08-13 | 1989-01-03 | Mcconnell Christopher F | Method and system for fluid treatment of semiconductor wafers |
| JP3154814B2 (ja) * | 1991-06-28 | 2001-04-09 | 株式会社東芝 | 半導体ウエハの洗浄方法および洗浄装置 |
| US5656097A (en) * | 1993-10-20 | 1997-08-12 | Verteq, Inc. | Semiconductor wafer cleaning system |
| US5811358A (en) * | 1997-01-03 | 1998-09-22 | Mosel Vitelic Inc. | Low temperature dry process for stripping photoresist after high dose ion implantation |
-
2001
- 2001-01-31 WO PCT/US2001/003040 patent/WO2001054835A1/fr not_active Ceased
- 2001-01-31 AU AU2001233136A patent/AU2001233136A1/en not_active Abandoned
- 2001-03-23 TW TW90106912A patent/TW492102B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| TW492102B (en) | 2002-06-21 |
| WO2001054835A1 (fr) | 2001-08-02 |
| WO2001054835A9 (fr) | 2002-10-24 |
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