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AU2001228987A1 - A mold for nano imprinting - Google Patents

A mold for nano imprinting

Info

Publication number
AU2001228987A1
AU2001228987A1 AU2001228987A AU2898701A AU2001228987A1 AU 2001228987 A1 AU2001228987 A1 AU 2001228987A1 AU 2001228987 A AU2001228987 A AU 2001228987A AU 2898701 A AU2898701 A AU 2898701A AU 2001228987 A1 AU2001228987 A1 AU 2001228987A1
Authority
AU
Australia
Prior art keywords
mold
layer
nano imprinting
reaction
nano
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001228987A
Inventor
Babak Heidari
Torbjorn Ling
Lars Montelius
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Obducat AB
Original Assignee
Obducat AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from SE0000173A external-priority patent/SE517093C2/en
Application filed by Obducat AB filed Critical Obducat AB
Publication of AU2001228987A1 publication Critical patent/AU2001228987A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/887—Nanoimprint lithography, i.e. nanostamp

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

A metal mold for use in a nano-imprinting process comprises a firmly adhering monomolecular non-sticking layer. The layer was obtained by subjecting the mold to a reaction with a fluoroalkyl compound having a mercapto group. As a result of said reaction, the layer comprises an organic sulfide of said metal.
AU2001228987A 2000-01-21 2001-01-19 A mold for nano imprinting Abandoned AU2001228987A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US17728400P 2000-01-21 2000-01-21
SE0000173A SE517093C2 (en) 2000-01-21 2000-01-21 Metal mold for use in nano-imprint lithography, comprises monomolecular non-sticking layer obtained by subjecting mold to reaction with fluoroalkyl compound having mercapto group
SE0000173 2000-01-21
US60177284 2000-01-21
PCT/SE2001/000087 WO2001053889A1 (en) 2000-01-21 2001-01-19 A mold for nano imprinting

Publications (1)

Publication Number Publication Date
AU2001228987A1 true AU2001228987A1 (en) 2001-07-31

Family

ID=26654958

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001228987A Abandoned AU2001228987A1 (en) 2000-01-21 2001-01-19 A mold for nano imprinting

Country Status (6)

Country Link
US (1) US6923930B2 (en)
EP (1) EP1257878B1 (en)
AT (1) ATE332517T1 (en)
AU (1) AU2001228987A1 (en)
DE (1) DE60121302T2 (en)
WO (1) WO2001053889A1 (en)

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US6916584B2 (en) 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
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CN100473535C (en) * 2002-11-21 2009-04-01 科学和工业研究协会 Color nanolithography on glass and plastic substrates
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ATE501464T1 (en) * 2003-11-21 2011-03-15 Obducat Ab NANOIMPRINT LITHOGRAPHY IN A MULTI-LAYER SYSTEM
US9040090B2 (en) 2003-12-19 2015-05-26 The University Of North Carolina At Chapel Hill Isolated and fixed micro and nano structures and methods thereof
KR101376715B1 (en) 2003-12-19 2014-03-27 더 유니버시티 오브 노쓰 캐롤라이나 엣 채플 힐 Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography
KR100595515B1 (en) * 2003-12-31 2006-07-03 엘지전자 주식회사 Single layer film release agent coating method of mold for forming microstructure and mold for forming microstructure
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US8158728B2 (en) 2004-02-13 2012-04-17 The University Of North Carolina At Chapel Hill Methods and materials for fabricating microfluidic devices
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TWI240328B (en) * 2004-08-27 2005-09-21 Univ Nat Cheng Kung Pretreatment process of substrate in micro-nano imprinting technology
US7676088B2 (en) * 2004-12-23 2010-03-09 Asml Netherlands B.V. Imprint lithography
US7490547B2 (en) * 2004-12-30 2009-02-17 Asml Netherlands B.V. Imprint lithography
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US20060144814A1 (en) * 2004-12-30 2006-07-06 Asml Netherlands B.V. Imprint lithography
US7686970B2 (en) * 2004-12-30 2010-03-30 Asml Netherlands B.V. Imprint lithography
US7354698B2 (en) * 2005-01-07 2008-04-08 Asml Netherlands B.V. Imprint lithography
WO2006084202A2 (en) * 2005-02-03 2006-08-10 The University Of North Carolina At Chapel Hill Low surface energy polymeric material for use in liquid crystal displays
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Also Published As

Publication number Publication date
DE60121302D1 (en) 2006-08-17
WO2001053889A1 (en) 2001-07-26
US20030127580A1 (en) 2003-07-10
US6923930B2 (en) 2005-08-02
DE60121302T2 (en) 2007-06-28
ATE332517T1 (en) 2006-07-15
EP1257878A1 (en) 2002-11-20
EP1257878B1 (en) 2006-07-05

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