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AU2001288818A1 - Modular exposure apparatus with removable optical device and improved isolation of the optical device - Google Patents

Modular exposure apparatus with removable optical device and improved isolation of the optical device

Info

Publication number
AU2001288818A1
AU2001288818A1 AU2001288818A AU8881801A AU2001288818A1 AU 2001288818 A1 AU2001288818 A1 AU 2001288818A1 AU 2001288818 A AU2001288818 A AU 2001288818A AU 8881801 A AU8881801 A AU 8881801A AU 2001288818 A1 AU2001288818 A1 AU 2001288818A1
Authority
AU
Australia
Prior art keywords
optical device
exposure apparatus
improved isolation
removable
modular
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001288818A
Inventor
Alton H. Phillips
Douglas C. Watson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2001288818A1 publication Critical patent/AU2001288818A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU2001288818A 2000-09-08 2001-09-07 Modular exposure apparatus with removable optical device and improved isolation of the optical device Abandoned AU2001288818A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/658,615 US6774981B1 (en) 2000-09-08 2000-09-08 Modular exposure apparatus with removable optical device and improved isolation of the optical device
US09658615 2000-09-08
PCT/US2001/027639 WO2002021207A1 (en) 2000-09-08 2001-09-07 Modular exposure apparatus with removable optical device and improved isolation of the optical device

Publications (1)

Publication Number Publication Date
AU2001288818A1 true AU2001288818A1 (en) 2002-03-22

Family

ID=24641967

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001288818A Abandoned AU2001288818A1 (en) 2000-09-08 2001-09-07 Modular exposure apparatus with removable optical device and improved isolation of the optical device

Country Status (3)

Country Link
US (1) US6774981B1 (en)
AU (1) AU2001288818A1 (en)
WO (1) WO2002021207A1 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7367042B1 (en) 2000-02-29 2008-04-29 Goldpocket Interactive, Inc. Method and apparatus for hyperlinking in a television broadcast
WO2004107416A1 (en) * 2003-05-27 2004-12-09 Nikon Corporation Exposure apparatus and device-producing method
US7061579B2 (en) 2003-11-13 2006-06-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7202956B2 (en) * 2004-10-08 2007-04-10 Asm Technology Singapore Pte Ltd. Translation mechanism for opto-mechanical inspection
KR101494115B1 (en) * 2005-03-29 2015-02-16 가부시키가이샤 니콘 Exposure apparatus, method for manufacturing exposure apparatus, and method for manufacturing microdevice
WO2007040254A1 (en) * 2005-10-05 2007-04-12 Nikon Corporation Exposure apparatus and exposure method
US7433050B2 (en) * 2005-10-05 2008-10-07 Nikon Corporation Exposure apparatus and exposure method
US7965758B2 (en) * 2006-09-15 2011-06-21 Itron, Inc. Cell isolation through quasi-orthogonal sequences in a frequency hopping network
US8139219B2 (en) * 2008-04-02 2012-03-20 Suss Microtec Lithography, Gmbh Apparatus and method for semiconductor wafer alignment
US8877080B2 (en) 2010-10-18 2014-11-04 Tokyo Electron Limited Using vacuum ultra-violet (VUV) data in microwave sources
JP5420601B2 (en) * 2011-07-25 2014-02-19 株式会社日立ハイテクノロジーズ Charged particle equipment
NL2016156A (en) * 2015-03-03 2016-09-30 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP6633986B2 (en) * 2016-07-20 2020-01-22 株式会社日立ハイテクノロジーズ Charged particle beam equipment

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL9100202A (en) 1991-02-05 1992-09-01 Asm Lithography Bv LITHOGRAPHIC DEVICE WITH A HANGING OBJECT TABLE.
JP3226704B2 (en) * 1994-03-15 2001-11-05 キヤノン株式会社 Exposure equipment
US5953105A (en) * 1995-05-30 1999-09-14 U.S. Philips Corporation Positioning device with a reference frame for a measuring system, and a lithographic device provided with such a positioning device
JPH1089403A (en) * 1996-09-10 1998-04-07 Nikon Corp Vibration control device
JP3531894B2 (en) * 1996-09-13 2004-05-31 キヤノン株式会社 Projection exposure equipment
JP3283767B2 (en) * 1996-10-02 2002-05-20 キヤノン株式会社 Exposure apparatus and device manufacturing method
WO1999026120A1 (en) 1997-11-18 1999-05-27 Nikon Corporation Vibration eliminator, aligner and projection exposure method
US6252234B1 (en) * 1998-08-14 2001-06-26 Nikon Corporation Reaction force isolation system for a planar motor
EP1248288A1 (en) 1999-12-16 2002-10-09 Nikon Corporation Exposure method and exposure apparatus

Also Published As

Publication number Publication date
WO2002021207A1 (en) 2002-03-14
US6774981B1 (en) 2004-08-10

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