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AU2001286860A1 - Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization - Google Patents

Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization

Info

Publication number
AU2001286860A1
AU2001286860A1 AU2001286860A AU8686001A AU2001286860A1 AU 2001286860 A1 AU2001286860 A1 AU 2001286860A1 AU 2001286860 A AU2001286860 A AU 2001286860A AU 8686001 A AU8686001 A AU 8686001A AU 2001286860 A1 AU2001286860 A1 AU 2001286860A1
Authority
AU
Australia
Prior art keywords
cationic polymerization
storage medium
oligomer
polyfunctional epoxy
monomer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001286860A
Inventor
Erdem A. Cetin
Richard A. Minns
David A. Waldman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aprilis Inc
Original Assignee
Aprilis Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aprilis Inc filed Critical Aprilis Inc
Publication of AU2001286860A1 publication Critical patent/AU2001286860A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32—Epoxy compounds containing three or more epoxy groups
    • C08G59/3254—Epoxy compounds containing three or more epoxy groups containing atoms other than carbon, hydrogen, oxygen or nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/2403—Layers; Shape, structure or physical properties thereof
    • G11B7/24035—Recording layers
    • G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions, e.g. volume storage
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
    • G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026—Recording materials or recording processes
    • G03H2001/0264—Organic recording material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Holo Graphy (AREA)
  • Epoxy Resins (AREA)

Abstract

Disclosed is a holographic recording medium. The novel holographic recording mediums disclosed herein comprises: a) at least one polyfunctional epoxide monomer or oligomer which undergoes acid initiated cationic polymerization. Each epoxide in the monomer or oligomer is linked by group comprising a siloxane to a silicon atom and each monomer or oligomer has an epoxy equivalent weight of greater than about 300 grams/mole epoxide; b) a binder which is capable of supporting cationic polymerization; c) an acid generator capable of producing an acid upon exposure to actinic radiation; and optionally d) a sensitizer.
AU2001286860A 2000-08-28 2001-08-28 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization Abandoned AU2001286860A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US22812100P 2000-08-28 2000-08-28
US60/228,121 2000-08-28
PCT/US2001/026828 WO2002019040A2 (en) 2000-08-28 2001-08-28 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization

Publications (1)

Publication Number Publication Date
AU2001286860A1 true AU2001286860A1 (en) 2002-03-13

Family

ID=22855887

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001286860A Abandoned AU2001286860A1 (en) 2000-08-28 2001-08-28 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization

Country Status (10)

Country Link
US (4) US6784300B2 (en)
EP (1) EP1317498B1 (en)
JP (1) JP2004507513A (en)
KR (1) KR100749304B1 (en)
AT (1) ATE328939T1 (en)
AU (1) AU2001286860A1 (en)
CA (1) CA2424366A1 (en)
DE (1) DE60120432T2 (en)
TW (1) TWI251000B (en)
WO (1) WO2002019040A2 (en)

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AU2001264832A1 (en) * 2000-05-23 2001-12-03 Aprilis, Inc. Data storage medium comprising colloidal metal and preparation process thereof
DE60120432T2 (en) * 2000-08-28 2007-01-04 Aprilis, Inc., Maynard HOLOGRAPHIC STORAGE MEDIUM CONTAINING POLYFUNCTIONAL EPOXY MONOMERS CAPABLE OF CATIONIC POLYMERIZATION
DE60312191T2 (en) * 2002-07-30 2007-11-22 Toagosei Co., Ltd. COMPOSITION FOR HOLOGRAM RECORDING; Curing method therefor and hardened object
US6859293B2 (en) 2002-10-22 2005-02-22 Zebra Imaging, Inc. Active digital hologram display
EP1578870A2 (en) 2002-12-23 2005-09-28 Aprilis, Inc. Sensitizer dyes for photoacid generating systems
US20050187308A1 (en) * 2004-02-20 2005-08-25 Korea Advanced Institute Of Science And Technology Method of preparing photopolymer with enhanced optical quality using nanoporous membrane and photopolymer prepared by the same
US20070260089A1 (en) * 2004-03-26 2007-11-08 Albemarle Corporation Method for the Synthesis of Quaternary Ammonium Compounds and Compositions Thereof
JP4629367B2 (en) * 2004-05-31 2011-02-09 東レ・ダウコーニング株式会社 Active energy ray-curable organopolysiloxane resin composition, optical transmission member and method for producing the same
US7122290B2 (en) * 2004-06-15 2006-10-17 General Electric Company Holographic storage medium
US7111806B2 (en) 2004-08-05 2006-09-26 Esselte Spool for supply of image receiving medium
US7897296B2 (en) * 2004-09-30 2011-03-01 General Electric Company Method for holographic storage
US20060078802A1 (en) * 2004-10-13 2006-04-13 Chan Kwok P Holographic storage medium
US20060199081A1 (en) * 2005-03-04 2006-09-07 General Electric Company Holographic storage medium, article and method
US8034514B2 (en) * 2005-03-08 2011-10-11 Nippon Steel Chemical Co., Ltd. Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same
WO2007047840A2 (en) * 2005-10-18 2007-04-26 Dce Aprilis, Inc. Photopolymerizable medium comprising siloxane compounds that support cationic polymerization for holographic storage
US20070167407A1 (en) * 2005-12-20 2007-07-19 Albemarle Corporation Quaternary ammonium borate compositions and substrate preservative solutions containing them
US7964693B2 (en) * 2005-12-29 2011-06-21 The University Of Akron Photocurable polymers for ophthalmic applications
WO2007102470A1 (en) * 2006-03-09 2007-09-13 Nippon Steel Chemical Co., Ltd. Photosensitive resin composition for volume phase hologram recording and optical information recording medium using same
US8222364B2 (en) * 2006-04-11 2012-07-17 Dow Corning Corporation Composition including a siloxane and a method of forming the same
WO2007124459A2 (en) * 2006-04-20 2007-11-01 Inphase Technologies, Inc. Index-contrasting-photoactive polymerizable materials, and articles and methods using same
JP2008195616A (en) 2007-02-08 2008-08-28 Fujifilm Corp Polymerizable compound, optical recording composition, holographic recording medium, and information recording method
CA2683905A1 (en) 2007-04-11 2008-10-23 Bayer Materialscience Ag Advantageous recording media for holographic applications
JP2010202801A (en) * 2009-03-04 2010-09-16 Nitto Denko Corp Composition for thermosetting silicone resin
WO2010107784A1 (en) 2009-03-16 2010-09-23 Stx Aprilis, Inc. Methods for activation control of photopolymerization for holographic data storage using at least two wavelengths
US8323854B2 (en) * 2009-04-23 2012-12-04 Akonia Holographics, Llc Photopolymer media with enhanced dynamic range
WO2011065432A1 (en) 2009-11-25 2011-06-03 大日精化工業株式会社 Polysiloxane-modified polyhydroxy polyurethane resin, method for producing same, heat-sensitive recording material using the resin, imitation leather, thermoplastic polyolefin resin skin material, material for weather strip, and weather strip
JP2011132208A (en) * 2009-11-25 2011-07-07 Dainichiseika Color & Chem Mfg Co Ltd Five-membered cyclocarbonate polysiloxane compound, and method for producing the same
WO2011065433A1 (en) 2009-11-26 2011-06-03 大日精化工業株式会社 Polysiloxane-modified polyhydroxy polyurethane resin, method for producing same, heat-sensitive recording material using the resin, imitation leather, thermoplastic polyolefin resin skin material, material for weather strip, and weather strip
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KR101476559B1 (en) 2010-06-24 2014-12-24 다이니치 세이카 고교 가부시키가이샤 Self-crosslinkable polyhydroxy polyurethane resin, resinaceous material that contains the resin, process for production of the resin, and imitation leather, surfacing material and weatherstrip material, using the resin
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Also Published As

Publication number Publication date
WO2002019040A3 (en) 2002-05-30
US7070886B2 (en) 2006-07-04
ATE328939T1 (en) 2006-06-15
JP2004507513A (en) 2004-03-11
WO2002019040A2 (en) 2002-03-07
US20070293637A1 (en) 2007-12-20
KR20030045790A (en) 2003-06-11
EP1317498A2 (en) 2003-06-11
EP1317498B1 (en) 2006-06-07
US7332249B2 (en) 2008-02-19
US6784300B2 (en) 2004-08-31
KR100749304B1 (en) 2007-08-14
DE60120432D1 (en) 2006-07-20
DE60120432T2 (en) 2007-01-04
CA2424366A1 (en) 2002-03-07
US20020068223A1 (en) 2002-06-06
US20100280260A1 (en) 2010-11-04
WO2002019040A9 (en) 2002-07-25
US20040249181A1 (en) 2004-12-09
TWI251000B (en) 2006-03-11

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