AU2001284499A1 - Photosensitive composition, cured article thereof, and printed circuit board using the same - Google Patents
Photosensitive composition, cured article thereof, and printed circuit board using the sameInfo
- Publication number
- AU2001284499A1 AU2001284499A1 AU2001284499A AU8449901A AU2001284499A1 AU 2001284499 A1 AU2001284499 A1 AU 2001284499A1 AU 2001284499 A AU2001284499 A AU 2001284499A AU 8449901 A AU8449901 A AU 8449901A AU 2001284499 A1 AU2001284499 A1 AU 2001284499A1
- Authority
- AU
- Australia
- Prior art keywords
- circuit board
- same
- printed circuit
- photosensitive composition
- cured article
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials For Photolithography (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (13)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000275704 | 2000-09-11 | ||
| JP2000-275704 | 2000-09-11 | ||
| US23804600P | 2000-10-06 | 2000-10-06 | |
| US60238046 | 2000-10-06 | ||
| JP2000367131 | 2000-12-01 | ||
| JP2000-367131 | 2000-12-01 | ||
| US25691600P | 2000-12-21 | 2000-12-21 | |
| US60256916 | 2000-12-21 | ||
| JP2001088113A JP4611554B2 (en) | 2000-12-01 | 2001-03-26 | Photosensitive composition, cured product thereof, and printed wiring board using the same |
| JP2001-088113 | 2001-03-26 | ||
| JP2001-268392 | 2001-09-05 | ||
| JP2001268392A JP4623890B2 (en) | 2000-09-11 | 2001-09-05 | Photosensitive composition, cured product thereof and printed wiring board using the same |
| PCT/JP2001/007826 WO2002023273A2 (en) | 2000-09-11 | 2001-09-10 | Photosensitive composition, cured article thereof, and printed circuit board using the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2001284499A1 true AU2001284499A1 (en) | 2002-03-26 |
Family
ID=27554841
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2001284499A Abandoned AU2001284499A1 (en) | 2000-09-11 | 2001-09-10 | Photosensitive composition, cured article thereof, and printed circuit board using the same |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6818382B2 (en) |
| EP (1) | EP1317691A2 (en) |
| KR (1) | KR100515218B1 (en) |
| CN (1) | CN1306338C (en) |
| AU (1) | AU2001284499A1 (en) |
| WO (1) | WO2002023273A2 (en) |
Families Citing this family (44)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100748219B1 (en) * | 2000-03-29 | 2007-08-09 | 각고우호우진 가나가와 다이가쿠 | Photocurable thermosetting resin composition, photosensitive dry film thereof and pattern forming method using same |
| WO2002031066A1 (en) * | 2000-10-10 | 2002-04-18 | Toyo Ink Mfg. Co., Ltd. | Actinic radiation curing jet printing ink |
| AU2003277605A1 (en) | 2002-11-08 | 2004-06-07 | Mitsubishi Chemical Corporation | Radiation curing resin composition and cured product thereof |
| EP1600812A1 (en) * | 2003-03-06 | 2005-11-30 | Nippon Kayaku Kabushiki Kaisha | Photosensitive resin composition and curing product thereof |
| CN100578359C (en) * | 2003-03-06 | 2010-01-06 | 日本化药株式会社 | Photosensitive resin composition and cured product thereof |
| CN100524021C (en) * | 2003-03-07 | 2009-08-05 | 旭硝子株式会社 | Photosensitive resin composition and coating film cured product thereof |
| JP4267974B2 (en) * | 2003-07-10 | 2009-05-27 | 日本メクトロン株式会社 | Circuit board and manufacturing method thereof |
| WO2005078531A1 (en) * | 2004-02-13 | 2005-08-25 | Toagosei Co., Ltd. | Volume hologram recording material and volume hologram recording medium |
| JP4587865B2 (en) * | 2004-04-22 | 2010-11-24 | 昭和電工株式会社 | Photosensitive resin composition, cured product thereof, and method for producing printed wiring board using them |
| JP4509638B2 (en) * | 2004-04-26 | 2010-07-21 | 東京応化工業株式会社 | Photosensitive resin composition and photosensitive dry film using the same |
| TW200613903A (en) * | 2004-05-26 | 2006-05-01 | Showa Denko Kk | Photosensitive resin composition, and cured product and use thereof |
| KR101189646B1 (en) * | 2004-09-21 | 2012-10-12 | 쇼와 덴코 가부시키가이샤 | Heat-curable urethane resin composition |
| TW200630447A (en) * | 2004-11-19 | 2006-09-01 | Showa Denko Kk | Resin cured film for flexible printed wiring board and production process thereof |
| TWI388584B (en) * | 2005-03-04 | 2013-03-11 | Showa Denko Kk | The film is formed with a paste |
| US20090082518A1 (en) * | 2005-05-16 | 2009-03-26 | Showa Denko K.K. | Carboxyl group-containing polyurethane, heat-curable resin composition and uses thereof |
| WO2007015423A1 (en) * | 2005-08-03 | 2007-02-08 | Toagosei Co., Ltd. | Photosensitive resin composition, composition for solder resist, and photosensitive dry film |
| US20090163615A1 (en) * | 2005-08-31 | 2009-06-25 | Izhar Halahmi | Uv curable hybridcuring ink jet ink composition and solder mask using the same |
| US20100041785A1 (en) * | 2005-10-07 | 2010-02-18 | Hitachi Chemical Company, Ltd. | Photosensitive resin composition and photosensitive element using the same |
| JP5265854B2 (en) * | 2005-12-08 | 2013-08-14 | 昭和電工株式会社 | Thermosetting resin composition, thermoplastic resin solution and film forming material, and cured products thereof |
| EP1997843A4 (en) * | 2006-03-16 | 2009-06-17 | Showa Denko Kk | Heat curable resin composition, overcoating agent for flexible circuit board, and surface protective film |
| KR100827312B1 (en) * | 2006-10-02 | 2008-05-06 | 삼성전기주식회사 | Method of forming coverlay of printed circuit board |
| DE102007001862A1 (en) * | 2007-01-12 | 2008-07-17 | Clariant International Ltd. | Flame retardant resin formulation and its use |
| KR100957024B1 (en) * | 2007-10-04 | 2010-05-13 | 주식회사 엘지화학 | Ink composition and color filter for color filter |
| TWI464057B (en) * | 2008-04-14 | 2014-12-11 | Showa Denko Kk | Hardened film and method of manufacturing the same |
| JP5548406B2 (en) * | 2008-08-22 | 2014-07-16 | 東京応化工業株式会社 | Positive resist composition, resist pattern forming method, polymer compound |
| KR101033827B1 (en) * | 2008-11-25 | 2011-05-13 | 금호석유화학 주식회사 | Method for manufacturing flat panel display and flat panel display including curable resin composition, cured product of curable resin composition |
| WO2011064859A1 (en) * | 2009-11-26 | 2011-06-03 | 株式会社 きもと | Thermosetting protective solution for glass mask, and glass mask |
| JP5470053B2 (en) | 2010-01-05 | 2014-04-16 | 東京応化工業株式会社 | Positive resist composition and resist pattern forming method |
| JP5731229B2 (en) * | 2010-08-20 | 2015-06-10 | 株式会社タムラ製作所 | Alkali-soluble transparent resin composition |
| JP2013082863A (en) * | 2011-09-26 | 2013-05-09 | Asahi Kasei Chemicals Corp | Water-dispersible urethane (meth)acrylate and coating composition |
| JP6002378B2 (en) | 2011-11-24 | 2016-10-05 | 東京応化工業株式会社 | Method for producing polymer compound |
| JP5964608B2 (en) * | 2012-02-20 | 2016-08-03 | 株式会社タムラ製作所 | UV curable transparent resin composition |
| US8795948B2 (en) | 2012-03-22 | 2014-08-05 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition, method of forming resist pattern and polymeric compound |
| US8795947B2 (en) | 2012-03-22 | 2014-08-05 | Tokyo Ohka Kogyo Co., Ltd. | Resist composition and method of forming resist pattern |
| CN103118449B (en) * | 2013-01-31 | 2015-09-30 | 深圳市景旺电子股份有限公司 | A kind of method and pcb board utilizing anti-welding dry film making pcb board |
| KR101423223B1 (en) * | 2013-09-03 | 2014-07-24 | 주식회사 비엠솔루션 | UV resin for forming a UV pattern layer of a window for protecting a pannel |
| US10040945B2 (en) * | 2014-06-12 | 2018-08-07 | Mitsubishi Chemical Corporation | Active energy ray curable resin composition, resin molded article, and method for producing resin molded article |
| CN104152030A (en) * | 2014-06-30 | 2014-11-19 | 永利电子铜陵有限公司 | Hot steam corrosion resisting tri-proof paint for printed circuit boards |
| CN104193944A (en) * | 2014-08-21 | 2014-12-10 | 苏州瑞红电子化学品有限公司 | Controllable-acid-value photosensitive alkali-soluble polyurethane acrylate resin and photoresist composition thereof |
| JP6986340B2 (en) * | 2016-08-29 | 2021-12-22 | 株式会社タムラ製作所 | Manufacturing method of printed wiring board and printed wiring board |
| CN107172804B (en) * | 2017-07-11 | 2023-12-26 | 昆山倬跃蓝天电子科技有限公司 | Photosensitive covering film and product |
| CN109613800B (en) * | 2019-01-28 | 2020-09-01 | 深圳市华星光电技术有限公司 | Negative photoresist material and color filter |
| CN114874650B (en) * | 2022-05-17 | 2023-08-04 | 广东希贵光固化材料有限公司 | UV (ultraviolet) coating for PCB (printed circuit board) drilling wood backing plate |
| CN118778354B (en) * | 2023-05-11 | 2025-05-23 | 深圳先进电子材料国际创新研究院 | Photosensitive resin composition and application thereof |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5089376A (en) * | 1986-12-08 | 1992-02-18 | Armstrong World Industries, Inc. | Photoimagable solder mask coating |
| US5006436A (en) * | 1988-09-20 | 1991-04-09 | Atochem North America, Inc. | UV curable compositions for making tentable solder mask coating |
| JPH03191352A (en) * | 1989-12-15 | 1991-08-21 | W R Grace & Co | Photosensitive resin composite |
| DE69227982T2 (en) * | 1991-11-01 | 1999-05-12 | Macdermid Imaging Technology Inc., Waterbury, Conn. | Plasticizers containing carboxyl groups in photopolymerizable dry film compositions |
| JPH06295060A (en) * | 1992-10-29 | 1994-10-21 | Ajinomoto Co Inc | Photosensitive resin composition or photosensitive thermosetting resin composition, and photosolder resist composition using these |
| TW475098B (en) * | 1995-10-27 | 2002-02-01 | Tokyo Ohka Kogyo Co Ltd | Photosensitive resin composition and photosensitive resin laminated film containing the same |
| EP1008911A1 (en) * | 1998-12-11 | 2000-06-14 | Shipley Company LLC | Photoimageable compositions having improved flexibility and stripping ability |
| JP4237944B2 (en) * | 1999-03-19 | 2009-03-11 | 日本化薬株式会社 | Urethane oligomer, its resin composition, its cured product |
| US6268111B1 (en) * | 1999-10-20 | 2001-07-31 | Rohm And Haas Company | Photoimageable composition having photopolymerizeable binder oligomer |
| KR20030097780A (en) * | 2001-07-04 | 2003-12-31 | 쇼와 덴코 가부시키가이샤 | Resist curable resin composition and cured article thereof |
-
2001
- 2001-09-10 AU AU2001284499A patent/AU2001284499A1/en not_active Abandoned
- 2001-09-10 WO PCT/JP2001/007826 patent/WO2002023273A2/en not_active Ceased
- 2001-09-10 CN CNB018026966A patent/CN1306338C/en not_active Expired - Fee Related
- 2001-09-10 US US10/129,185 patent/US6818382B2/en not_active Expired - Lifetime
- 2001-09-10 KR KR10-2002-7005985A patent/KR100515218B1/en not_active Expired - Fee Related
- 2001-09-10 EP EP01963550A patent/EP1317691A2/en not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| WO2002023273A3 (en) | 2002-06-27 |
| KR100515218B1 (en) | 2005-09-16 |
| US6818382B2 (en) | 2004-11-16 |
| CN1392971A (en) | 2003-01-22 |
| KR20030008212A (en) | 2003-01-24 |
| CN1306338C (en) | 2007-03-21 |
| US20030003398A1 (en) | 2003-01-02 |
| WO2002023273A2 (en) | 2002-03-21 |
| EP1317691A2 (en) | 2003-06-11 |
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