AU2001274038A1 - Etching process - Google Patents
Etching processInfo
- Publication number
- AU2001274038A1 AU2001274038A1 AU2001274038A AU7403801A AU2001274038A1 AU 2001274038 A1 AU2001274038 A1 AU 2001274038A1 AU 2001274038 A AU2001274038 A AU 2001274038A AU 7403801 A AU7403801 A AU 7403801A AU 2001274038 A1 AU2001274038 A1 AU 2001274038A1
- Authority
- AU
- Australia
- Prior art keywords
- etching process
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000005530 etching Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
- H01L21/31111—Etching inorganic layers by chemical means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Weting (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2000126030 DE10026030B4 (en) | 2000-05-25 | 2000-05-25 | Etching process, its application and etching agents |
| DE10026030 | 2000-05-25 | ||
| US22702200P | 2000-08-23 | 2000-08-23 | |
| US60227022 | 2000-08-23 | ||
| PCT/EP2001/005535 WO2001090014A1 (en) | 2000-05-25 | 2001-05-16 | Etching process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2001274038A1 true AU2001274038A1 (en) | 2001-12-03 |
Family
ID=26005840
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2001274038A Abandoned AU2001274038A1 (en) | 2000-05-25 | 2001-05-16 | Etching process |
Country Status (2)
| Country | Link |
|---|---|
| AU (1) | AU2001274038A1 (en) |
| WO (1) | WO2001090014A1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ES2195770B1 (en) * | 2002-02-21 | 2005-02-16 | Jon Imanol Murua Fuertes | NON-SLIP COMPOUND |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3935117A (en) * | 1970-08-25 | 1976-01-27 | Fuji Photo Film Co., Ltd. | Photosensitive etching composition |
| US4620934A (en) * | 1984-04-26 | 1986-11-04 | Allied Corporation | Soluble fluorinated cycloalkane sulfonate surfactant additives for NH4 |
| US4852624A (en) * | 1987-09-17 | 1989-08-01 | Belrose Frank R | Tire inflation device for emergencies |
| US5918481A (en) * | 1997-11-20 | 1999-07-06 | Alliedsignal Inc. | Process for separating hydrogen fluoride from fluorocarbons |
-
2001
- 2001-05-16 AU AU2001274038A patent/AU2001274038A1/en not_active Abandoned
- 2001-05-16 WO PCT/EP2001/005535 patent/WO2001090014A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| WO2001090014A1 (en) | 2001-11-29 |
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