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AU2001274038A1 - Etching process - Google Patents

Etching process

Info

Publication number
AU2001274038A1
AU2001274038A1 AU2001274038A AU7403801A AU2001274038A1 AU 2001274038 A1 AU2001274038 A1 AU 2001274038A1 AU 2001274038 A AU2001274038 A AU 2001274038A AU 7403801 A AU7403801 A AU 7403801A AU 2001274038 A1 AU2001274038 A1 AU 2001274038A1
Authority
AU
Australia
Prior art keywords
etching process
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001274038A
Inventor
Max Braun
Carsten Brosch
Jurgen H. Bugler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE2000126030 external-priority patent/DE10026030B4/en
Application filed by Individual filed Critical Individual
Publication of AU2001274038A1 publication Critical patent/AU2001274038A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105After-treatment
    • H01L21/311Etching the insulating layers by chemical or physical means
    • H01L21/31105Etching inorganic layers
    • H01L21/31111Etching inorganic layers by chemical means
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00Surface treatment of glass, not in the form of fibres or filaments, by etching
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00Etching, surface-brightening or pickling compositions
    • C09K13/04Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/08Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Weting (AREA)
AU2001274038A 2000-05-25 2001-05-16 Etching process Abandoned AU2001274038A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
DE2000126030 DE10026030B4 (en) 2000-05-25 2000-05-25 Etching process, its application and etching agents
DE10026030 2000-05-25
US22702200P 2000-08-23 2000-08-23
US60227022 2000-08-23
PCT/EP2001/005535 WO2001090014A1 (en) 2000-05-25 2001-05-16 Etching process

Publications (1)

Publication Number Publication Date
AU2001274038A1 true AU2001274038A1 (en) 2001-12-03

Family

ID=26005840

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001274038A Abandoned AU2001274038A1 (en) 2000-05-25 2001-05-16 Etching process

Country Status (2)

Country Link
AU (1) AU2001274038A1 (en)
WO (1) WO2001090014A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2195770B1 (en) * 2002-02-21 2005-02-16 Jon Imanol Murua Fuertes NON-SLIP COMPOUND

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3935117A (en) * 1970-08-25 1976-01-27 Fuji Photo Film Co., Ltd. Photosensitive etching composition
US4620934A (en) * 1984-04-26 1986-11-04 Allied Corporation Soluble fluorinated cycloalkane sulfonate surfactant additives for NH4
US4852624A (en) * 1987-09-17 1989-08-01 Belrose Frank R Tire inflation device for emergencies
US5918481A (en) * 1997-11-20 1999-07-06 Alliedsignal Inc. Process for separating hydrogen fluoride from fluorocarbons

Also Published As

Publication number Publication date
WO2001090014A1 (en) 2001-11-29

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