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AU2001265853A1 - Electrochemical nanostructuring method and device - Google Patents

Electrochemical nanostructuring method and device

Info

Publication number
AU2001265853A1
AU2001265853A1 AU2001265853A AU6585301A AU2001265853A1 AU 2001265853 A1 AU2001265853 A1 AU 2001265853A1 AU 2001265853 A AU2001265853 A AU 2001265853A AU 6585301 A AU6585301 A AU 6585301A AU 2001265853 A1 AU2001265853 A1 AU 2001265853A1
Authority
AU
Australia
Prior art keywords
electrochemical
nanostructuring
nanostructuring method
electrochemical nanostructuring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001265853A
Inventor
Christian Klinke
Matthias Muller
Christian Obermair
Thomas Schimmel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Karlsruher Institut fuer Technologie KIT
Original Assignee
Universitaet Karlsruhe
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Universitaet Karlsruhe filed Critical Universitaet Karlsruhe
Publication of AU2001265853A1 publication Critical patent/AU2001265853A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2049Exposure; Apparatus therefor using a cantilever
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82BNANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/288Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
    • H01L21/2885Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition using an external electrical current, i.e. electro-deposition
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials Engineering (AREA)
  • Composite Materials (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
AU2001265853A 2000-03-30 2001-03-30 Electrochemical nanostructuring method and device Abandoned AU2001265853A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10015931A DE10015931A1 (en) 2000-03-30 2000-03-30 Process for electrochemical nanostructuring
DE10015931 2000-03-30
PCT/EP2001/003683 WO2001073830A2 (en) 2000-03-30 2001-03-30 Electrochemical nanostructuring method and device

Publications (1)

Publication Number Publication Date
AU2001265853A1 true AU2001265853A1 (en) 2001-10-08

Family

ID=7637045

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001265853A Abandoned AU2001265853A1 (en) 2000-03-30 2001-03-30 Electrochemical nanostructuring method and device

Country Status (4)

Country Link
US (1) US20030155246A1 (en)
AU (1) AU2001265853A1 (en)
DE (1) DE10015931A1 (en)
WO (1) WO2001073830A2 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10130219C2 (en) * 2001-06-22 2003-11-27 Univ Freiburg Cathodic structuring of monomolecular layers
RU2212375C1 (en) * 2002-11-04 2003-09-20 Фонд развития новых медицинских технологий "АЙРЭС" Process of production of thin films with fractional structure
TWI288294B (en) * 2004-03-19 2007-10-11 Hon Hai Prec Ind Co Ltd A manufacturing method of a cavity of a light guide plate
US7368045B2 (en) * 2005-01-27 2008-05-06 International Business Machines Corporation Gate stack engineering by electrochemical processing utilizing through-gate-dielectric current flow
US7651863B2 (en) * 2005-07-14 2010-01-26 3M Innovative Properties Company Surface-enhanced spectroscopic method, flexible structured substrate, and method of making the same
US7906057B2 (en) * 2005-07-14 2011-03-15 3M Innovative Properties Company Nanostructured article and method of making the same
US20070014997A1 (en) * 2005-07-14 2007-01-18 3M Innovative Properties Company Tool and method of making and using the same
DE102006013362A1 (en) * 2006-03-16 2007-09-27 Siemens Ag Method for producing an electrical component with a nanoneedle structure

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4126380A1 (en) * 1991-08-09 1993-02-11 Basf Ag METHOD FOR CARRYING OUT LOCAL-SELECTIVE CATALYTIC REACTIONS WITH OR ON SOLID-SURFACE SURFACES IN THE NANOMETER AND SUBNANOMETER AREA
US5504338A (en) * 1993-06-30 1996-04-02 The United States Of America As Represented By The Secretary Of The Navy Apparatus and method using low-voltage and/or low-current scanning probe lithography

Also Published As

Publication number Publication date
WO2001073830A3 (en) 2002-03-14
DE10015931A1 (en) 2001-10-04
WO2001073830A2 (en) 2001-10-04
US20030155246A1 (en) 2003-08-21

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