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AU2001261619A1 - System for precision control of the position of an atmospheric plasma jet - Google Patents

System for precision control of the position of an atmospheric plasma jet

Info

Publication number
AU2001261619A1
AU2001261619A1 AU2001261619A AU6161901A AU2001261619A1 AU 2001261619 A1 AU2001261619 A1 AU 2001261619A1 AU 2001261619 A AU2001261619 A AU 2001261619A AU 6161901 A AU6161901 A AU 6161901A AU 2001261619 A1 AU2001261619 A1 AU 2001261619A1
Authority
AU
Australia
Prior art keywords
plasma jet
precision control
atmospheric plasma
atmospheric
precision
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001261619A
Inventor
Lynn David Bollinger
Iskander Tokmouline
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jetek Inc
Original Assignee
Jetek Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jetek Inc filed Critical Jetek Inc
Publication of AU2001261619A1 publication Critical patent/AU2001261619A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/44—Plasma torches using an arc using more than one torch
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
AU2001261619A 2000-05-15 2001-05-15 System for precision control of the position of an atmospheric plasma jet Abandoned AU2001261619A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US20410300P 2000-05-15 2000-05-15
US60204103 2000-05-15
PCT/US2001/015678 WO2001088220A1 (en) 2000-05-15 2001-05-15 System for precision control of the position of an atmospheric plasma jet

Publications (1)

Publication Number Publication Date
AU2001261619A1 true AU2001261619A1 (en) 2001-11-26

Family

ID=22756627

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001261619A Abandoned AU2001261619A1 (en) 2000-05-15 2001-05-15 System for precision control of the position of an atmospheric plasma jet

Country Status (3)

Country Link
US (1) US6492613B2 (en)
AU (1) AU2001261619A1 (en)
WO (1) WO2001088220A1 (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6762136B1 (en) * 1999-11-01 2004-07-13 Jetek, Inc. Method for rapid thermal processing of substrates
US6955991B2 (en) * 1999-11-01 2005-10-18 Jetek, Inc. Atmospheric process and system for controlled and rapid removal of polymers from high depth to width aspect ratio holes
US7960670B2 (en) * 2005-05-03 2011-06-14 Kla-Tencor Corporation Methods of and apparatuses for measuring electrical parameters of a plasma process
JP2005528737A (en) * 2002-03-28 2005-09-22 アピト コープ．エス．アー． Atmospheric plasma surface treatment method and apparatus for executing the same
US6815246B2 (en) * 2003-02-13 2004-11-09 Rwe Schott Solar Inc. Surface modification of silicon nitride for thick film silver metallization of solar cell
NL1023491C2 (en) * 2003-05-21 2004-11-24 Otb Groep B V Cascade source.
US7375039B2 (en) * 2005-05-24 2008-05-20 International Business Machines Corporation Local plasma processing
WO2007079488A2 (en) * 2006-01-03 2007-07-12 Victor Barinov Controlled electrospinning of fibers
FR2897748B1 (en) * 2006-02-20 2008-05-16 Snecma Services Sa THERMAL BARRIER DEPOSITION METHOD BY PLASMA TORCH
US9040120B2 (en) * 2011-08-05 2015-05-26 Frito-Lay North America, Inc. Inorganic nanocoating primed organic film
US9267011B2 (en) 2012-03-20 2016-02-23 Frito-Lay North America, Inc. Composition and method for making a cavitated bio-based film
US9162421B2 (en) 2012-04-25 2015-10-20 Frito-Lay North America, Inc. Film with compostable heat seal layer
CN104395493B (en) 2012-06-23 2017-08-25 福瑞托-雷北美有限公司 Deposition of the ultra-thin inorganic oxide coating in packaging
US9090021B2 (en) 2012-08-02 2015-07-28 Frito-Lay North America, Inc. Ultrasonic sealing of packages
US9149980B2 (en) 2012-08-02 2015-10-06 Frito-Lay North America, Inc. Ultrasonic sealing of packages
CN114900940B (en) * 2022-05-09 2024-12-27 西安电子科技大学 A plasma jet electromagnetic control system

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE763709A (en) * 1971-03-03 1971-08-02 Soudure Autogene Elect CURTAIN PLASMA.
US5235160A (en) * 1990-03-22 1993-08-10 Matsushita Electric Industrial Co., Ltd. Heat-plasma-jet generator capable of conducting plasma spray or heat-plasma cvd coating in a relatively wide area
RU2030811C1 (en) * 1991-05-24 1995-03-10 Инженерный центр "Плазмодинамика" Solid body plasma processing plant
RU2032280C1 (en) 1992-02-18 1995-03-27 Инженерный центр "Плазмодинамика" Method of control over plasma flux and plasma device
US5565249A (en) 1992-05-07 1996-10-15 Fujitsu Limited Method for producing diamond by a DC plasma jet
US5767627A (en) * 1997-01-09 1998-06-16 Trusi Technologies, Llc Plasma generation and plasma processing of materials

Also Published As

Publication number Publication date
US6492613B2 (en) 2002-12-10
WO2001088220A1 (en) 2001-11-22
US20020030038A1 (en) 2002-03-14
WO2001088220A8 (en) 2002-02-07

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