AU2001249429A1 - Highly efficient compact capacitance coupled plasma reactor/generator and method - Google Patents
Highly efficient compact capacitance coupled plasma reactor/generator and methodInfo
- Publication number
- AU2001249429A1 AU2001249429A1 AU2001249429A AU4942901A AU2001249429A1 AU 2001249429 A1 AU2001249429 A1 AU 2001249429A1 AU 2001249429 A AU2001249429 A AU 2001249429A AU 4942901 A AU4942901 A AU 4942901A AU 2001249429 A1 AU2001249429 A1 AU 2001249429A1
- Authority
- AU
- Australia
- Prior art keywords
- cathode
- anode
- generator
- plasma reactor
- disclosed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 230000003068 static effect Effects 0.000 abstract 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32541—Shape
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J19/088—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
- B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
- B01J2219/0809—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes employing two or more electrodes
- B01J2219/0813—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes employing two or more electrodes employing four electrodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
- B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
- B01J2219/0824—Details relating to the shape of the electrodes
- B01J2219/0826—Details relating to the shape of the electrodes essentially linear
- B01J2219/083—Details relating to the shape of the electrodes essentially linear cylindrical
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
- B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
- B01J2219/0824—Details relating to the shape of the electrodes
- B01J2219/0832—Details relating to the shape of the electrodes essentially toroidal
- B01J2219/0833—Details relating to the shape of the electrodes essentially toroidal forming part of a full circle
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
- B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
- B01J2219/0824—Details relating to the shape of the electrodes
- B01J2219/0835—Details relating to the shape of the electrodes substantially flat
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
- B01J2219/0807—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges involving electrodes
- B01J2219/0837—Details relating to the material of the electrodes
- B01J2219/0841—Metal
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0803—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
- B01J2219/0805—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
- B01J2219/0845—Details relating to the type of discharge
- B01J2219/0847—Glow discharge
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0869—Feeding or evacuating the reactor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0894—Processes carried out in the presence of a plasma
- B01J2219/0898—Hot plasma
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- Toxicology (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Plasma Technology (AREA)
- Auxiliary Devices For And Details Of Packaging Control (AREA)
- Drying Of Semiconductors (AREA)
- Discharge Heating (AREA)
Abstract
A compact capacitively coupled electrode structure for use in a gas plasma reactor/generator is disclosed. The electrode structure comprises a parallel plate type anode and cathode spaced to define a gas flow path or volume therebetween. A plurality of electrically conductive fin elements are interposed in the space between the anode and cathode. The fin elements substantially increase the ratio of electrode surface area to volume, and subdivide the gas flow path or volume, thereby substantially increasing the efficiency of plasma gas processing that is possible over a broad range of operating parameters, without substantially increasing the spacing between the anode and cathode. Static or closed operation is also disclosed. Also disclosed is a multi-anode/multi-cathode electrode assembly embodying the basic electrode structure and a highly efficient and compact gas plasma reactor/generator employing the assembly.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/553,696 US6576202B1 (en) | 2000-04-21 | 2000-04-21 | Highly efficient compact capacitance coupled plasma reactor/generator and method |
| US09553696 | 2000-04-21 | ||
| PCT/US2001/009497 WO2001082329A2 (en) | 2000-04-21 | 2001-03-23 | Highly efficient compact capacitance coupled plasma reactor/generator and method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2001249429A1 true AU2001249429A1 (en) | 2001-11-07 |
Family
ID=24210371
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2001249429A Abandoned AU2001249429A1 (en) | 2000-04-21 | 2001-03-23 | Highly efficient compact capacitance coupled plasma reactor/generator and method |
Country Status (10)
| Country | Link |
|---|---|
| US (4) | US6576202B1 (en) |
| EP (1) | EP1277223B1 (en) |
| JP (1) | JP2003532257A (en) |
| KR (1) | KR100549251B1 (en) |
| CN (3) | CN100337301C (en) |
| AT (1) | ATE344531T1 (en) |
| AU (1) | AU2001249429A1 (en) |
| DE (1) | DE60124239T2 (en) |
| TW (1) | TWI232480B (en) |
| WO (1) | WO2001082329A2 (en) |
Families Citing this family (24)
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| US6576202B1 (en) | 2000-04-21 | 2003-06-10 | Kin-Chung Ray Chiu | Highly efficient compact capacitance coupled plasma reactor/generator and method |
| FR2836397B1 (en) * | 2002-02-27 | 2004-04-23 | Renault | REACTOR FOR THE PLASMA TREATMENT OF A GASEOUS FLOW, IN PARTICULAR EXHAUST GASES PRODUCED BY THE INTERNAL COMBUSTION ENGINE OF A MOTOR VEHICLE |
| EP1645730B1 (en) * | 2003-07-10 | 2012-02-15 | NGK Insulators, Ltd. | Plasma generating electrode and plasma reactor |
| JP2006106024A (en) * | 2004-09-09 | 2006-04-20 | Matsushita Electric Ind Co Ltd | Method for forming film on substrate and method for producing electrophotographic photosensitive member using the same |
| US7628927B2 (en) * | 2005-12-14 | 2009-12-08 | Vesitech, Inc. | Reactor for removing chemical and biological contaminants from a contaminated fluid |
| US7799237B2 (en) * | 2006-05-25 | 2010-09-21 | Sony Corporation | Method and apparatus for etching a structure in a plasma chamber |
| DE102007020419A1 (en) * | 2007-04-27 | 2008-11-06 | Forschungsverbund Berlin E.V. | Electrode for plasma generator |
| KR101842675B1 (en) * | 2009-07-08 | 2018-03-27 | 플라즈마시, 인크. | Apparatus and method for plasma processing |
| US8765232B2 (en) | 2011-01-10 | 2014-07-01 | Plasmasi, Inc. | Apparatus and method for dielectric deposition |
| LU91984B1 (en) * | 2012-04-24 | 2013-10-25 | Eltyser S A R L | Method and apparatus for sterilizing equipment |
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| US10526708B2 (en) | 2012-06-19 | 2020-01-07 | Aixtron Se | Methods for forming thin protective and optical layers on substrates |
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| US9147581B2 (en) | 2013-07-11 | 2015-09-29 | Lam Research Corporation | Dual chamber plasma etcher with ion accelerator |
| TW201621968A (en) * | 2014-12-01 | 2016-06-16 | Univ Feng Chia | Large-area plasma processing device and homogeneous plasma generation method |
| CN107018617A (en) * | 2017-03-16 | 2017-08-04 | 深圳市奥普斯等离子体科技有限公司 | A kind of material surface processing unit and method |
| CN108614029B (en) * | 2018-05-12 | 2024-05-28 | 重庆邮电大学 | High-sensitivity miniature photoionization sensor |
| US11143171B2 (en) | 2018-07-09 | 2021-10-12 | University Of Washington | Air-breathing pulsed plasma thruster with a variable spacing cathode |
| JP7166147B2 (en) * | 2018-11-14 | 2022-11-07 | 東京エレクトロン株式会社 | Plasma processing equipment |
| KR20210094694A (en) * | 2020-01-21 | 2021-07-30 | 삼성전자주식회사 | Substrate processing apparatus, material layer deposition apparatus, and apparatus for atmospheric pressure chemical vapor deposition |
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| CN117524828B (en) * | 2024-01-05 | 2024-04-09 | 合肥晶合集成电路股份有限公司 | Sputter etching method and semiconductor structure |
| CN120957302A (en) * | 2025-10-15 | 2025-11-14 | 江苏神州半导体科技有限公司 | A gas dissociation cavity discharge structure and ignition control method |
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| JPH09289196A (en) | 1996-04-22 | 1997-11-04 | Nisshinbo Ind Inc | Plasma etching electrode |
| US6119455A (en) * | 1996-08-30 | 2000-09-19 | Siemens Aktiengesellschaft | Process and device for purifying exhaust gases containing nitrogen oxides |
| US6159432A (en) * | 1997-01-23 | 2000-12-12 | The Board Of Regents Of The University Of Oklahoma | Conversion method for gas streams containing hydrocarbons |
| JPH10335091A (en) | 1997-06-03 | 1998-12-18 | Yokogawa Denshi Kiki Kk | Static eliminator |
| JPH115013A (en) * | 1997-06-16 | 1999-01-12 | Kenji Inoue | Waste gas treating device |
| US6146599A (en) * | 1999-02-24 | 2000-11-14 | Seagate Technology Llc | Dielectric barrier discharge system and method for decomposing hazardous compounds in fluids |
| US6576202B1 (en) * | 2000-04-21 | 2003-06-10 | Kin-Chung Ray Chiu | Highly efficient compact capacitance coupled plasma reactor/generator and method |
-
2000
- 2000-04-21 US US09/553,696 patent/US6576202B1/en not_active Expired - Lifetime
-
2001
- 2001-03-23 WO PCT/US2001/009497 patent/WO2001082329A2/en not_active Ceased
- 2001-03-23 CN CNB018110738A patent/CN100337301C/en not_active Expired - Fee Related
- 2001-03-23 EP EP01922652A patent/EP1277223B1/en not_active Expired - Lifetime
- 2001-03-23 DE DE60124239T patent/DE60124239T2/en not_active Expired - Lifetime
- 2001-03-23 JP JP2001579325A patent/JP2003532257A/en active Pending
- 2001-03-23 AU AU2001249429A patent/AU2001249429A1/en not_active Abandoned
- 2001-03-23 CN CNB2005100749425A patent/CN100437885C/en not_active Expired - Fee Related
- 2001-03-23 CN CN200510074943XA patent/CN1700404B/en not_active Expired - Fee Related
- 2001-03-23 AT AT01922652T patent/ATE344531T1/en not_active IP Right Cessation
- 2001-03-23 KR KR1020027014132A patent/KR100549251B1/en not_active Expired - Fee Related
- 2001-04-09 TW TW090108442A patent/TWI232480B/en not_active IP Right Cessation
-
2003
- 2003-04-16 US US10/418,562 patent/US6967007B2/en not_active Expired - Fee Related
- 2003-04-16 US US10/418,355 patent/US6998027B2/en not_active Expired - Fee Related
-
2005
- 2005-09-21 US US11/232,754 patent/US7241428B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| CN1700404B (en) | 2010-08-18 |
| CN100337301C (en) | 2007-09-12 |
| US20060013747A1 (en) | 2006-01-19 |
| CN1700403A (en) | 2005-11-23 |
| CN1436359A (en) | 2003-08-13 |
| CN1700404A (en) | 2005-11-23 |
| US20030206838A1 (en) | 2003-11-06 |
| ATE344531T1 (en) | 2006-11-15 |
| DE60124239D1 (en) | 2006-12-14 |
| DE60124239T2 (en) | 2007-06-14 |
| US20050100487A1 (en) | 2005-05-12 |
| EP1277223B1 (en) | 2006-11-02 |
| US6576202B1 (en) | 2003-06-10 |
| US6967007B2 (en) | 2005-11-22 |
| HK1079898A1 (en) | 2006-04-13 |
| WO2001082329A2 (en) | 2001-11-01 |
| KR20030014389A (en) | 2003-02-17 |
| CN100437885C (en) | 2008-11-26 |
| KR100549251B1 (en) | 2006-02-03 |
| JP2003532257A (en) | 2003-10-28 |
| TWI232480B (en) | 2005-05-11 |
| WO2001082329A3 (en) | 2002-02-07 |
| US7241428B2 (en) | 2007-07-10 |
| EP1277223A2 (en) | 2003-01-22 |
| HK1079899A1 (en) | 2006-04-13 |
| US6998027B2 (en) | 2006-02-14 |
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