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AU1504799A - Aligner, exposure method and method of manufacturing device - Google Patents

Aligner, exposure method and method of manufacturing device

Info

Publication number
AU1504799A
AU1504799A AU15047/99A AU1504799A AU1504799A AU 1504799 A AU1504799 A AU 1504799A AU 15047/99 A AU15047/99 A AU 15047/99A AU 1504799 A AU1504799 A AU 1504799A AU 1504799 A AU1504799 A AU 1504799A
Authority
AU
Australia
Prior art keywords
aligner
manufacturing device
exposure
exposure method
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU15047/99A
Inventor
Kousuke Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU1504799A publication Critical patent/AU1504799A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70525—Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU15047/99A 1997-12-16 1998-12-09 Aligner, exposure method and method of manufacturing device Abandoned AU1504799A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP36346197 1997-12-16
JP9-363461 1997-12-16
PCT/JP1998/005567 WO1999031716A1 (en) 1997-12-16 1998-12-09 Aligner, exposure method and method of manufacturing device

Publications (1)

Publication Number Publication Date
AU1504799A true AU1504799A (en) 1999-07-05

Family

ID=18479373

Family Applications (1)

Application Number Title Priority Date Filing Date
AU15047/99A Abandoned AU1504799A (en) 1997-12-16 1998-12-09 Aligner, exposure method and method of manufacturing device

Country Status (2)

Country Link
AU (1) AU1504799A (en)
WO (1) WO1999031716A1 (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101547077B1 (en) 2003-04-09 2015-08-25 가부시키가이샤 니콘 Exposure method and apparatus, and device manufacturing method
EP1646074A4 (en) * 2003-07-09 2007-10-03 Nikon Corp Exposure apparatus and method for manufacturing device
TWI573175B (en) 2003-10-28 2017-03-01 尼康股份有限公司 Optical illumination device, exposure device, exposure method and device manufacturing method
EP2267535A1 (en) * 2003-11-05 2010-12-29 ASML Netherlands BV Lithographic apparatus and device manufacturing method
TWI385414B (en) 2003-11-20 2013-02-11 尼康股份有限公司 Optical illuminating apparatus, illuminating method, exposure apparatus, exposure method and device fabricating method
TWI389174B (en) 2004-02-06 2013-03-11 尼康股份有限公司 Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
KR20180128526A (en) 2005-05-12 2018-12-03 가부시키가이샤 니콘 Projection optical system, exposure apparatus and device manufacturing method
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
JP5267029B2 (en) 2007-10-12 2013-08-21 株式会社ニコン Illumination optical apparatus, exposure apparatus, and device manufacturing method
CN101681125B (en) 2007-10-16 2013-08-21 株式会社尼康 Illumination optical system, exposure apparatus, and device manufacturing method
CN101681123B (en) 2007-10-16 2013-06-12 株式会社尼康 Illumination optical system, exposure apparatus, and device manufacturing method
US8379187B2 (en) 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
CN105606344B (en) 2008-05-28 2019-07-30 株式会社尼康 Lamp optical system, means of illumination, exposure device and exposure method
JP5383399B2 (en) * 2009-09-14 2014-01-08 キヤノン株式会社 Management apparatus, exposure method, and device manufacturing method
US10788762B2 (en) * 2019-02-25 2020-09-29 Applied Materials, Inc. Dynamic cooling control for thermal stabilization for lithography system
CN120344914A (en) * 2022-12-23 2025-07-18 Asml荷兰有限公司 Method and system for determining reticle deformation
WO2024141236A1 (en) * 2022-12-27 2024-07-04 Asml Netherlands B.V. Methods and systems for determining reticle deformation

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2550658B2 (en) * 1988-05-13 1996-11-06 株式会社ニコン Projection exposure apparatus and projection exposure method
JPH0770471B2 (en) * 1992-03-04 1995-07-31 株式会社ニコン Projection exposure method and apparatus
JP3414763B2 (en) * 1991-10-08 2003-06-09 株式会社ニコン Projection exposure apparatus and method, and circuit element forming method
JPH0888164A (en) * 1994-09-20 1996-04-02 Nikon Corp Projection exposure device
JPH0922860A (en) * 1995-07-07 1997-01-21 Nikon Corp Projection exposure equipment

Also Published As

Publication number Publication date
WO1999031716A1 (en) 1999-06-24

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase