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ATE339776T1 - Orientierte piezoelektrische schicht - Google Patents

Orientierte piezoelektrische schicht

Info

Publication number
ATE339776T1
ATE339776T1 AT02784435T AT02784435T ATE339776T1 AT E339776 T1 ATE339776 T1 AT E339776T1 AT 02784435 T AT02784435 T AT 02784435T AT 02784435 T AT02784435 T AT 02784435T AT E339776 T1 ATE339776 T1 AT E339776T1
Authority
AT
Austria
Prior art keywords
piezoelectric layer
oriented piezoelectric
seed crystal
substrate
oriented
Prior art date
Application number
AT02784435T
Other languages
English (en)
Inventor
Paul A Hoisington
Original Assignee
Dimatix Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dimatix Inc filed Critical Dimatix Inc
Application granted granted Critical
Publication of ATE339776T1 publication Critical patent/ATE339776T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/164—Manufacturing processes thin film formation
    • B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1607—Production of print heads with piezoelectric elements
    • B41J2/161—Production of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1626—Manufacturing processes etching
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1631—Manufacturing processes photolithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/164—Manufacturing processes thin film formation
    • B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/164—Manufacturing processes thin film formation
    • B41J2/1646—Manufacturing processes thin film formation thin film formation by sputtering
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/16—Oxides
    • C30B29/22—Complex oxides
    • C30B29/30—Niobates; Vanadates; Tantalates
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/16—Oxides
    • C30B29/22—Complex oxides
    • C30B29/32—Titanates; Germanates; Molybdates; Tungstates
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B5/00—Single-crystal growth from gels
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
    • H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
    • H10N30/077—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by liquid phase deposition
    • H10N30/078—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by liquid phase deposition by sol-gel deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/80—Constructional details
    • H10N30/85—Piezoelectric or electrostrictive active materials
    • H10N30/853—Ceramic compositions
    • H10N30/8548—Lead-based oxides
    • H10N30/8554—Lead-zirconium titanate [PZT] based
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/14—Structure thereof only for on-demand ink jet heads
    • B41J2/14201—Structure of print heads with piezoelectric elements
    • B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
    • B41J2002/14266—Sheet-like thin film type piezoelectric element

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Piezo-Electric Transducers For Audible Bands (AREA)
  • Producing Shaped Articles From Materials (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
AT02784435T 2001-11-15 2002-11-13 Orientierte piezoelektrische schicht ATE339776T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/987,702 US6620237B2 (en) 2001-11-15 2001-11-15 Oriented piezoelectric film

Publications (1)

Publication Number Publication Date
ATE339776T1 true ATE339776T1 (de) 2006-10-15

Family

ID=25533490

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02784435T ATE339776T1 (de) 2001-11-15 2002-11-13 Orientierte piezoelektrische schicht

Country Status (8)

Country Link
US (1) US6620237B2 (de)
EP (1) EP1444389B1 (de)
JP (2) JP4544861B2 (de)
CN (1) CN1292104C (de)
AT (1) ATE339776T1 (de)
AU (1) AU2002346368A1 (de)
DE (1) DE60214751T2 (de)
WO (1) WO2003043824A2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6515402B2 (en) * 2001-01-24 2003-02-04 Koninklijke Philips Electronics N.V. Array of ultrasound transducers
JP3902023B2 (ja) * 2002-02-19 2007-04-04 セイコーエプソン株式会社 圧電アクチュエータ、液滴噴射ヘッド、およびそれを用いた液滴噴射装置
US7785659B2 (en) * 2005-03-22 2010-08-31 Fujifilm Corporation Method of manufacturing an orientation film using aerosol deposition on a seed substrate
US9974541B2 (en) 2014-02-14 2018-05-22 Covidien Lp End stop detection
SG11201807434QA (en) 2016-03-16 2018-09-27 Xaar Technology Ltd A piezoelectric thin film element

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JPS61106463A (ja) * 1984-10-31 1986-05-24 三菱鉱業セメント株式会社 セラミツクスの製造方法
JPH062614B2 (ja) * 1984-10-31 1994-01-12 三菱マテリアル株式会社 セラミックス材料
JPH066488B2 (ja) * 1985-02-26 1994-01-26 ソニー株式会社 針状ペロブスカイト型チタン酸鉛微結晶の製造方法
JPS62172776A (ja) * 1986-01-25 1987-07-29 Matsushita Electric Works Ltd 圧電セラミツクスの製法
JPS62173209A (ja) * 1986-01-25 1987-07-30 松下電工株式会社 圧電セラミツクスの製法
EP0408306B1 (de) * 1989-07-11 1996-05-01 Ngk Insulators, Ltd. Einen piezoelektrischen/elektrostriktiven Film enthaltende piezoelektrischer/elektrostriktiver Antrieb
JP2788320B2 (ja) * 1990-02-14 1998-08-20 株式会社大真空 チタン酸金属塩繊維とその製造方法
US5265315A (en) 1990-11-20 1993-11-30 Spectra, Inc. Method of making a thin-film transducer ink jet head
US5500988A (en) 1990-11-20 1996-03-26 Spectra, Inc. Method of making a perovskite thin-film ink jet transducer
JP3080277B2 (ja) * 1992-09-29 2000-08-21 トヨタ自動車株式会社 ビスマス層状化合物の製造方法
JPH0715095B2 (ja) * 1992-10-23 1995-02-22 日本研磨材工業株式会社 セラミック砥粒及びその製造方法並びに研磨製品
US5659346A (en) 1994-03-21 1997-08-19 Spectra, Inc. Simplified ink jet head
US5825121A (en) 1994-07-08 1998-10-20 Seiko Epson Corporation Thin film piezoelectric device and ink jet recording head comprising the same
EP0747976B1 (de) 1994-12-27 2000-06-07 Seiko Epson Corporation Piezoelektrische dünnschichtanordnung, verfahren zur herstellung derselben und einen diese anordnung enthaltenden tintenstrahldruckkopf
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JP3520403B2 (ja) 1998-01-23 2004-04-19 セイコーエプソン株式会社 圧電体薄膜素子、アクチュエータ、インクジェット式記録ヘッド、及びインクジェット式記録装置
US6502928B1 (en) * 1998-07-29 2003-01-07 Seiko Epson Corporation Ink jet recording head and ink jet recording apparatus comprising the same
JP3085285B2 (ja) * 1998-08-14 2000-09-04 日本電気株式会社 強誘電体膜の形成方法
EP1024540A3 (de) * 1999-01-29 2001-09-12 Seiko Epson Corporation Piezoelectrischer Transducer und Anzeigevorrichtung mit elektrophoretischer Tinte, die den piezoelektrischen Transducer benutzt
JP3748097B2 (ja) * 1999-04-20 2006-02-22 セイコーエプソン株式会社 圧電体薄膜素子、圧電体薄膜素子を備えるアクチュエータおよびアクチュエータを備えるインクジェット式記録ヘッド
JP3841279B2 (ja) * 2001-02-09 2006-11-01 セイコーエプソン株式会社 圧電体素子の製造方法およびインクジェット式記録ヘッドの製造方法
JP5002864B2 (ja) * 2001-03-02 2012-08-15 独立行政法人国立高等専門学校機構 有機金属化合物を用いた酸化物光触媒材料およびその応用品
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Also Published As

Publication number Publication date
WO2003043824A2 (en) 2003-05-30
WO2003043824A3 (en) 2003-11-13
AU2002346368A1 (en) 2003-06-10
JP4544861B2 (ja) 2010-09-15
CN1612954A (zh) 2005-05-04
DE60214751D1 (de) 2006-10-26
US6620237B2 (en) 2003-09-16
EP1444389A2 (de) 2004-08-11
AU2002346368A8 (en) 2003-06-10
EP1444389B1 (de) 2006-09-13
CN1292104C (zh) 2006-12-27
US20030089303A1 (en) 2003-05-15
JP2010251766A (ja) 2010-11-04
HK1068508A1 (en) 2005-04-22
EP1444389A4 (de) 2005-06-01
DE60214751T2 (de) 2007-05-10
JP2005510073A (ja) 2005-04-14

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