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NZ576185A - A PVD layer system for coating workpieces with a mixed crystal layer of a polyoxide - Google Patents

A PVD layer system for coating workpieces with a mixed crystal layer of a polyoxide

Info

Publication number
NZ576185A
NZ576185A NZ576185A NZ57618507A NZ576185A NZ 576185 A NZ576185 A NZ 576185A NZ 576185 A NZ576185 A NZ 576185A NZ 57618507 A NZ57618507 A NZ 57618507A NZ 576185 A NZ576185 A NZ 576185A
Authority
NZ
New Zealand
Prior art keywords
crystal layer
mixed
polyoxide
target
corundum structure
Prior art date
Application number
NZ576185A
Inventor
Christian Wohlrab
Michael Ante
Jurgen Ramm
Beno Widrig
Original Assignee
Oerlikon Trading Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=37607420&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=NZ576185(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Oerlikon Trading Ag filed Critical Oerlikon Trading Ag
Publication of NZ576185A publication Critical patent/NZ576185A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Laminated Bodies (AREA)

Abstract

The disclosure relates to an arc evaporation deposited layer system for the coating of workpieces, comprising at least one mixed-crystal layer of a polyoxide of the following composition:(Me11-XMe2X)2O3 where 0<X<1, andwhere Me1 and Me2 each represent at least one of the elements Al, Cr, Fe, Li, Mg, Mn, Nb, Ti, Sb or V and the elements of Me1 and Me2 differ from one another, wherein the crystal lattice of the mixed-crystal layer exhibits a corundum structure which in a spectrum of the mixed crystal layer analyzed by x-ray diffractometry is characterized by at least three of the lines associated with the corundum structure. Also disclosed is a vacuum coating method for producing a mixed-crystal layer of a polyoxide on a workpiece, whereby an electric arc discharge takes place in an oxygenous process-gas atmosphere between at least one anode and a target constituting the cathode of an arc source, wherein on the target surface only an external magnetic field is generated essentially perpendicular to the target surface, comprising a vertical component BZ and a smaller, radial or surface-parallel component Br, the target being an alloy target whose composition essentially corresponds to that of the mixed-crystal layer to be deposited and wherein the process parameters are adjusted to deposit the mixed-crystal layer with a corundum structure; the polyoxide being an oxide with at least two or more metals or with at least one or more metals and additionally one or several semiconductor elements.
NZ576185A 2006-10-10 2007-09-03 A PVD layer system for coating workpieces with a mixed crystal layer of a polyoxide NZ576185A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH16142006 2006-10-10
PCT/EP2007/059196 WO2008043606A1 (en) 2006-10-10 2007-09-03 Layer system having at least one mixed crystal layer of a polyoxide

Publications (1)

Publication Number Publication Date
NZ576185A true NZ576185A (en) 2012-10-26

Family

ID=37607420

Family Applications (1)

Application Number Title Priority Date Filing Date
NZ576185A NZ576185A (en) 2006-10-10 2007-09-03 A PVD layer system for coating workpieces with a mixed crystal layer of a polyoxide

Country Status (16)

Country Link
EP (1) EP2082079B1 (en)
JP (2) JP5725466B2 (en)
KR (1) KR101508159B1 (en)
CN (1) CN101522950B (en)
AU (1) AU2007306494B2 (en)
BR (1) BRPI0719774A2 (en)
CA (1) CA2665044C (en)
IL (1) IL198044A (en)
MX (1) MX2009003130A (en)
MY (1) MY151941A (en)
NZ (1) NZ576185A (en)
RU (1) RU2456371C2 (en)
TW (1) TWI421356B (en)
UA (1) UA99819C2 (en)
WO (1) WO2008043606A1 (en)
ZA (1) ZA200902479B (en)

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CN109136871B (en) * 2018-09-04 2020-04-10 北京航空航天大学 Bipolar pulse magnetron sputtering method
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Also Published As

Publication number Publication date
MY151941A (en) 2014-07-31
KR20090074035A (en) 2009-07-03
WO2008043606A1 (en) 2008-04-17
JP6000233B2 (en) 2016-09-28
TWI421356B (en) 2014-01-01
JP5725466B2 (en) 2015-05-27
BRPI0719774A2 (en) 2014-04-22
AU2007306494A1 (en) 2008-04-17
CA2665044A1 (en) 2008-04-17
RU2009117577A (en) 2010-11-20
CA2665044C (en) 2016-08-23
CN101522950A (en) 2009-09-02
HK1135439A1 (en) 2010-06-04
CN101522950B (en) 2012-08-29
EP2082079A1 (en) 2009-07-29
ZA200902479B (en) 2010-07-28
EP2082079B1 (en) 2019-09-18
MX2009003130A (en) 2009-06-22
IL198044A0 (en) 2009-12-24
TW200833851A (en) 2008-08-16
JP2010506049A (en) 2010-02-25
AU2007306494B2 (en) 2012-05-31
KR101508159B1 (en) 2015-04-14
JP2014077201A (en) 2014-05-01
IL198044A (en) 2015-05-31
RU2456371C2 (en) 2012-07-20
UA99819C2 (en) 2012-10-10

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