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NO20083666L - Fremgangsmate og anordning for forbehandling henholdsvis bearbeiding av silisiummaterial - Google Patents

Fremgangsmate og anordning for forbehandling henholdsvis bearbeiding av silisiummaterial

Info

Publication number
NO20083666L
NO20083666L NO20083666A NO20083666A NO20083666L NO 20083666 L NO20083666 L NO 20083666L NO 20083666 A NO20083666 A NO 20083666A NO 20083666 A NO20083666 A NO 20083666A NO 20083666 L NO20083666 L NO 20083666L
Authority
NO
Norway
Prior art keywords
processing
silicon material
orientation
wetting
process medium
Prior art date
Application number
NO20083666A
Other languages
English (en)
Inventor
Heinz Kappler
Original Assignee
Schmid Gmbh & Co Geb
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schmid Gmbh & Co Geb filed Critical Schmid Gmbh & Co Geb
Publication of NO20083666L publication Critical patent/NO20083666L/no

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

En fremgangsmåte for forbehandling, henholdsvis bearbeiding av silisiummaterial (3) for gjennomføring av en rengjøringsprosess oppviser følgende trinn: fukting av silisiummaterial (3) som er rettet i en første rommelig orientering, med et første, flytende prosessmedium (7), automatisert endring av orienteringen til silisiummaterialet (3) ved hjelp av en vendeinnretning, fukting av silisiummaterialet (3) i den endrede orienteringen med det første, flytende prosessmediet (7). Til denne hører en tilsvarende rengjøringsanordning (1).
NO20083666A 2006-01-23 2008-08-25 Fremgangsmate og anordning for forbehandling henholdsvis bearbeiding av silisiummaterial NO20083666L (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102006003990A DE102006003990A1 (de) 2006-01-23 2006-01-23 Verfahren und Vorrichtung zum Aufbereiten bzw. Bearbeiten von Siliziummaterial
PCT/EP2007/000523 WO2007082772A2 (de) 2006-01-23 2007-01-23 Verfahren und vorrichtung zum aufbereiten bzw. bearbeiten von siliziummaterial

Publications (1)

Publication Number Publication Date
NO20083666L true NO20083666L (no) 2008-08-25

Family

ID=38268168

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20083666A NO20083666L (no) 2006-01-23 2008-08-25 Fremgangsmate og anordning for forbehandling henholdsvis bearbeiding av silisiummaterial

Country Status (12)

Country Link
US (1) US20080295863A1 (no)
EP (1) EP1979271A2 (no)
JP (1) JP2009523601A (no)
KR (1) KR20080087173A (no)
CN (1) CN101374763A (no)
AU (1) AU2007207104A1 (no)
CA (1) CA2639972A1 (no)
DE (1) DE102006003990A1 (no)
IL (1) IL192939A0 (no)
MX (1) MX2008009298A (no)
NO (1) NO20083666L (no)
WO (1) WO2007082772A2 (no)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007063169A1 (de) * 2007-12-19 2009-06-25 Gebr. Schmid Gmbh & Co. Verfahren und Anlage zum Bearbeiten bzw. Reinigen von Si-Blöcken
FR2943286B3 (fr) 2009-03-23 2011-02-25 Air New Zealand Ltd Ameliorations de ou concernant des sieges de passagers dans un vehicule
JP2013248550A (ja) * 2012-05-30 2013-12-12 Hamada Kousyou Co Ltd スタットボルト（ボルト、ｔナット、ナット、又は加工製品等を含む、以下同じ）清掃装置
CN102873046A (zh) * 2012-09-29 2013-01-16 苏州鑫捷顺五金机电有限公司 一种冲压件清洗系统
CN111468444A (zh) * 2020-04-20 2020-07-31 新沂市新润电子有限公司 一种高频电子变压器生产用引线自动清洗装置

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1661912A (en) * 1926-01-12 1928-03-06 Dansk Pressefabrik As Machine for manufacturing bottle caps, so called crown caps
US3869313A (en) * 1973-05-21 1975-03-04 Allied Chem Apparatus for automatic chemical processing of workpieces, especially semi-conductors
DE7815889U1 (de) * 1978-05-26 1980-04-03 Industrie- Und Handelszentrale Walcker & Co Kg, 2854 Loxstedt Waschvorrichtung fuer steigen o.dgl.
DE4121079A1 (de) * 1991-06-26 1993-01-07 Schmid Gmbh & Co Geb Vorrichtung zum behandeln von plattenfoermigen gegenstaenden
JPH0513398A (ja) * 1991-07-05 1993-01-22 Hitachi Zosen Corp 基板洗浄方法
DE4244880C2 (de) * 1992-08-21 1999-05-20 Alois Mueller Vorrichtung zum Waschen und Trocknen von mehreren Transportkästen
JP3123695B2 (ja) * 1993-01-22 2001-01-15 キヤノン株式会社 混合溶剤組成物、及びそれを利用する洗浄方法と洗浄処理装置
JP2680783B2 (ja) * 1994-07-14 1997-11-19 昭和金属工業株式会社 コインの洗浄装置
DE4446590A1 (de) * 1994-12-24 1996-06-27 Ipsen Ind Int Gmbh Verfahren zur Reinigung metallischer Werkstücke
DE19509645B4 (de) * 1995-03-17 2005-08-18 Meissner, Werner Waschanlage zum Reinigen von Gegenständen
DE19643532A1 (de) * 1996-10-23 1998-04-30 Schenck Process Gmbh Verfahren und Schwingförderrinne zum Behandeln von Reinigungsgut
JPH1128430A (ja) * 1996-12-29 1999-02-02 Yoshiya Okazaki 物品洗浄方法及び装置並びに洗浄材チップス
US5970599A (en) * 1997-07-14 1999-10-26 The Olofsson Corporation Milling machine
US6251551B1 (en) * 1997-07-17 2001-06-26 Horst Kunze-Concewitz Method and device for treating two-dimensional substrates, especially silicon slices (wafers), for producing microelectronic components
DE19805597C2 (de) * 1998-02-12 2002-02-07 Cae Beyss Gmbh Vorrichtung zum Waschen und/oder Trocknen von Werkstücken
EP1100630B1 (en) * 1998-04-16 2004-02-18 Semitool, Inc. Process and apparatus for treating a workpiece such as a semiconductor wafer
ES2186448B1 (es) * 1999-04-07 2004-08-16 Tevesa Tessuti Vetro Española, S.A. Dispositivo aplicable al lavado de recortes de fibra de vidrio, fibra de carbono, poliamida o similares preimpregnados con resina.
WO2002020845A2 (en) * 2000-09-08 2002-03-14 Thomas Jefferson University Ultra yield amplification reaction
DE10202124B4 (de) * 2002-01-22 2011-03-17 Meissner, Werner Durchlaufreinigungseinrichtung
JP4341472B2 (ja) * 2004-06-01 2009-10-07 信越半導体株式会社 物品の自動搬送水切り装置および自動搬送水切り方法、並びに物品の自動洗浄装置及び自動洗浄方法

Also Published As

Publication number Publication date
WO2007082772A3 (de) 2007-11-08
MX2008009298A (es) 2008-12-12
JP2009523601A (ja) 2009-06-25
CN101374763A (zh) 2009-02-25
DE102006003990A1 (de) 2007-08-02
US20080295863A1 (en) 2008-12-04
EP1979271A2 (de) 2008-10-15
AU2007207104A1 (en) 2007-07-26
WO2007082772A2 (de) 2007-07-26
IL192939A0 (en) 2009-02-11
KR20080087173A (ko) 2008-09-30
CA2639972A1 (en) 2007-07-26

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Legal Events

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FC2A Withdrawal, rejection or dismissal of laid open patent application