NL2037271B1 - A positioning system for positioning an object within an XYZ-system of coordinates. - Google Patents
A positioning system for positioning an object within an XYZ-system of coordinates.Info
- Publication number
- NL2037271B1 NL2037271B1 NL2037271A NL2037271A NL2037271B1 NL 2037271 B1 NL2037271 B1 NL 2037271B1 NL 2037271 A NL2037271 A NL 2037271A NL 2037271 A NL2037271 A NL 2037271A NL 2037271 B1 NL2037271 B1 NL 2037271B1
- Authority
- NL
- Netherlands
- Prior art keywords
- positioning system
- object table
- positioning
- flexure
- sarrus
- Prior art date
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7035—Proximity or contact printers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Machine Tool Units (AREA)
- Automatic Control Of Machine Tools (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
A positioning system for positioning an object within an XYZ-system of coordinates is proposed, the positioning system comprising a supporting structure, an object table for supporting the object and a positioning module structured for positioning the object table relative to the supporting structure, wherein the positioning module comprises a Sarrus linkage interconnecting the object table with the support structure as well as at least one actuator device structured for adjusting the object table in only one direction of the XYZ-system of coordinates. Figure 1A
Description
A positioning system for positioning an object within an XYZ-system of coordinates.
The present disclosure relates to the technique of positioning an object within an XYZ-system of coordinates. In particular, the disclosure pertains to so-called photolithography mask positioning systems of the Z-axis stage type. Z-axis stage type positioning systems are also known as vertical stages, which provide a controlled positioning of an object along the z-axis of an XYZ-system of coordinates. Such Z- axis stage type positioning systems are e.g. used in product processing applications under atmospheric, low and high vacuum (or clean room) conditions.
In product processing applications under low or high vacuum (or clean room) conditions or even under atmospherics conditions, for example but not limited to photolithography mask applications in the semiconductor manufacturing industry, an increasing demand for improved process reliability and stability as well as more accurate position handling combined with a higher throughput of products exists.
These requirements in vacuum operated product process environment set high standards with respect to the positioning and the orientation of a product, such as a mask, during the many, subsequent process steps. In particular, vibrations created in the process line by moving mechanical parts and/or by the electrical component circuit may adversely affect the positioning accuracy of the product to be processed within the process line.
Reduction of vibrations can be realized by implementing air bearings or roller bearings, possibly in combination with piezo-actuators. In the presently known
Z-axis stage type positioning systems, the main challenges of applying air bearings in high-tech in-vacuum systems or under atmospheric conditions is their limit in positioning performance, in particular they are vulnerable to position errors, i.e. ‘jitter’.
Accordingly, it is a goal of the present disclosure to provide a Z-axis stage type positioning system with a more sophisticated setting ability in the Z- direction and with limited position errors.
According to a first example of the disclosure, a positioning system for positioning an object within an XYZ-system of coordinates is proposed. The positioning system is composed of a supporting structure, an object table for supporting the object and a positioning module structured for positioning the object table relative to the supporting structure. In particular, the positioning module comprises a Sarrus linkage interconnecting the object table with the support structure as well as at least one actuator device structured for adjusting the object table in only one direction of the XYZ-system of coordinates.
The above defined example of the improved positioning system is capable of bridging a distance in the only one direction of 5 mm or more between an object, e.g. a photolithography mask, mounted on the object table and a wafer substrate positioned below the object table, whilst maintaining a high positioning accuracy during the last 0.1 mm. This solution enables a motion system capable of operating in only one translational direction within a small volume. During operation, it is desired that the intermediate space between the object table with the photolithography mask and the wafer substrate is kept free, while the distance between both components closes up to a minimal distance of approximately 0.1 mm.
In particular examples of the positioning system according to the disclosure, the Sarrus linkage is constructed as a two- or more sided Sarrus linkage.
The Sarrus linkage comprises at least two sets of flexure links interconnected by means of an intermediate hinge, wherein the flexure links are formed as flexure planar links. Herewith an adjustment module is created no affected by wear or friction. Accordingly, the adjustment movements will not suffer from hysteresis deviations and allows for repeatable, reproduceable operations.
In an advantageous example of the positioning system according to the disclosure, the position module is provided with reinforcement structures, which restrict any degree of freedom (DoF) of the object table except a displacement in the
Z-direction of the XYZ-system of coordinates. In particular, the reinforcement structures each constrain two rotational degrees of freedom and a translational degree of freedom.
In particular, the reinforcement structures are mounted to each link of a set of links of the Sarrus linkage and in order to ensure additional stiffness thereby restricting any movement of the object table in any degree of freedom except that in the Z-direction the reinforcement structures and the link of a set of links of the Sarrus linkage form a triangle structure. Additionally, the triangle structured reinforcements have little influence on the stiffness in Z-direction and thus increase the parasitic eigenfrequencies, while maintaining a low drive eigenfrequency.
Likewise, in an preferred example the reinforcement structures are formed as planar flexures.
The object table may be provided with at least one through opening, which through opening is in communication with a vacuum generating module, thus ensuring a proper fixation of any object positioned in the object table, for example a wafter substrate. Alternatively, the at least one through opening can be used for visualization purposes, e.g. for imaging etc.
It is preferred to have the at least one actuator device being formed as a voice coil linear actuator.
In an advantageous example according to the disclosure, the supporting structure is formed as a L-shaped base frame with both legs of the L-shaped base frame extending along the object table. This allows for a configuration having a limited volume yet sufficient stiffness, and does not obstruct the vision in the drive direction, in this case the translation along Z-axis, e.g. as the direction of adjustment of an object along the z-axis of an XYZ-system of coordinates.
In a preferred example, the position module is formed as a monolithic component. In particular, the the monolithic position module is formed by means of electrical discharge machining. This technique allows for a simple assembly with a high repeatability and high tolerances.
The disclosure will now be discussed with reference to the drawings, which show in:
Figures 1A-1D a first example of a positioning system according to the disclosure;
Figures 2A-2B an alternative example of a positioning system according to the disclosure;
Figure 3 another example of a positioning system according to the disclosure;
Figure 4 another example of a positioning system according to the disclosure;
Figure 5 yet another example of a positioning system according to the disclosure
Figure 6 yet another example of a positioning system according to the disclosure.
For a proper understanding of the disclosure, in the detailed description below corresponding elements or parts of the disclosure will be denoted with identical reference numerals in the drawings.
Figures 1A-1D show various views of a non-limiting example of a positioning system for positioning an object within an XYZ-system of coordinates. In the Figures the positioning system is denoted with reference numeral 10 and pertains so-called photolithography mask positioning systems of the Z-axis stage type. A Z- axis stage type positioning system is also known as a vertical stages, which provide a controlled positioning (or adjustment of the position) of an object along the Z-axis of an XYZ-system of coordinates. Such Z-axis stage type positioning systems are e.g. used in product processing applications under atmospheric, low and high vacuum (or clean room) conditions.
In this particular example of the disclosure, the positioning system 10 as shown in Figures 1A-1D is used to adjust the position (or distance gap) of a photolithography mask, mounted on the object table, relative to a wafer substrate positioned below the object table in the vertical Z-direction as defined by an XYZ- system of coordinates. Accordingly, such Z-axis stage type positioning system 10 can be effectively implemented in product processing applications under low or high vacuum {or clean room) conditions or even under atmospherics conditions, for example but not limited to wafer handling applications in the semiconductor manufacturing industry.
The Z-axis stage type positioning system 10 provides a solution as to the increasing demand for improved process reliability and stability as well as more accurate position handling combined with a higher throughput of products.
Accordingly, the Z-axis stage type positioning system 10 implements a more sophisticated setting ability in the Z-direction and with limited position errors and is composed of a supporting structure 11, an object table 12 for supporting the object (not shown in the Figures 1A-1D) and a positioning module 13 structured for positioning the object table 12 relative to the supporting structure 11. In particular, the positioning module 13 comprises a Sarrus linkage 14 interconnecting the object table 5 12 with the support structure 11 as well as one actuator device 15 structured for adjusting the object table 12 in the Z-direction of the XYZ-system of coordinates.
The above defined example of the improved positioning system 10 is capable of bridging a distance in the Z-direction of 5 mm or less between an object, e.g. a photolithography mask, mounted on a first surface side 12-1 of the object table 12 and a wafer substrate (not shown) positioned below the object table 12, whilst maintaining a high positioning accuracy during the last 0.1 mm. This solution enables a motion system capable of operating within a small volume. During operation, it is desired that the intermediate space between the object table 12 with the photolithography mask positioned on the first surface side 12-1 and the wafer substrate above the object table is kept free, while the distance between both components closes up to a minimal distance of approximately 0.1 mm.
In particular examples of the positioning system 10 according to the disclosure, the Sarrus linkage 14 is constructed as a two-sided Sarrus linkage comprising at least two and optionally more than two sets of flexure links each set being interconnected by means of an intermediate hinge.
In a particular example as depicted in the Figures 1A-1D the two-sided
Sarrus linkage 14 comprises two sets of flexure links, each set of flexure links being denoted with reference numeral 14, and 14, (145). Each set of flexure links 144 and 142 (14,) comprises a first flexure link 141: (1412 — 1415) and a second flexure link 1424 (1422 — 142,) respectively. The two flexure links 141,-142, of each set 14, - 142 (14,) each have a first link end 141a (142a) and a second link end 141b (142b) respectively.
Each first flexure link 141, is mounted which its first link end 141a to the supporting structure 11, whereas each second first flexure link 142, is mounted which its first link end 142a to the object table 12. Each second link end 141b-142b of the first and second flexure link 141,-142,, of each set 14, are interconnected with each other and form a hinge 1434 (1432 — 1435).
In the example of Figures 1A-1D, the supporting structure 11 is formed as a L-shaped base frame, wherein the two legs 11a and 11b of the L-shaped base frame 11 extend along the object table 12. In this particular example the object table
12 has a rectangular configuration with longitudinal dimensions 12a and 12b. The two legs 11a and 11b of the L-shaped base frame 11 may extend parallel and along the corresponding longitudinal dimensions 12a and 12b of the object table 12. The single actuator device 15 is positioned at the location where both legs 11a and 11b of the L- shaped base frame 11 meet and acts on both the L-shaped base frame 11 and the object table 12 in order to adjust their intermediate distance and the object table 12 in the Z-direction of the XYZ-system of coordinates.
In this particular example, the flexure links 141: (1412 — 141,) and 142, (1422 — 142,) are formed as planar flexure links, for example formed a strip like links having a thickness (much) smaller than their respective longitudinal (length and width) dimensions. However this configuration as planar flexure links is not limiting, also other configurations of the flexure links are envisaged. For example, the various the flexure links can differ in terms of its length characteristics such as length, width, and thickness (stiffness) or have an asymmetrical design or can be provided with openings, in order to preserve material and weight.
An example of another configuration of the flexure links is depicted in
Figure 7.
Accordingly, the elongated first link end 141a of the first planar flexure link 141 extends along and is connected with one of the legs 11a-11b of the supporting structure 11, whereas the elongated first link end 142a of the second planar flexure link 142 extends along and is connected with one of the longitudinal dimensions 12a- 12b of the object table 12. Herewith an adjustment module is created no affected by wear or friction. Accordingly, the adjustment movements will not suffer from hysteresis deviations and allows for repeatable, reproduceable operations.
In an advantageous example of the positioning system 10 according to the disclosure, reference numeral 16 denote reinforcement structures. These reinforcement structures 16 restrict any degree of freedom (DoF) of the object table 12 relative to the supporting structure 11, except for a displacement (or adjustment of displacement) in the Z-direction of the XYZ-system of coordinates. In particular, the reinforcement structures 16 each constrain two rotational degrees of freedom and a translational degree of freedom.
As depicted in the Figures 1A-1D, the reinforcement structures 16 are mounted to each flexure link 141,-142, of a set of flexure links 14, of the Sarrus linkage 14. In particular, for each set 14, of flexure links, the reinforcement structures 16 are composed of sets 164-162-16, each comprising a first reinforcement rib 161:-181z-
161, and a second reinforcement rib 1624-162,-162,. In the Figures, a first set 164 consisting of reinforcement ribs 161; and 162, is mounted to the first flexure link 1414, whereas a second set 162 consisting of reinforcement ribs 1812 and 162; is mounted to the second flexure link 1412 of each set 14, of flexure links.
The various reinforcement ribs 161: and 162; may be formed as planar reinforcement ribs each having a first and second rib end 181a (1623) and 161b (162b). The reinforcement ribs 161: and 161; may also be formed in a planar configuration, for example formed a strip like ribs having a thickness (much) smaller than their respective longitudinal (length and width) dimensions. However this configuration as planar links is not limiting, also other configurations of the reinforcement ribs are envisaged, similar as with the flexure links (thickness, weight and material preserving opening, asymmetrical design).
An example of such asymmetrical design is shown in Figure 7, showing multiple reinforcement ribs per flexure link.
As depicted in more detail in the Figures 1A-1D, each first rib end 161a of the first reinforcement rib 1614 (of the first set 164) extends along and is mounted to or connected with one of the legs 11a-11b of the supporting structure 11 as well as with the elongated first link end 141a of the first planar flexure link 141,.
Similarly, each first rib end 161a of the first reinforcement rib 1612 (of the second set 182) extends along and is mounted to or connected with a longitudinal dimension 12a-12b of the object table 12 as well as with the elongated first link end 142a of the second planar flexure link 142,.
Likewise, each first rib end 162a of the second reinforcement rib 182: (of the first set 164) and of the second reinforcement rib 1822 (of the second set 162) extends along and is mounted to the second link ends 141b-142b of the first and second flexure links 141,-142, of each set 14, of flexure links and also with the hinge 1434 (1432 — 143,5).
Of each set 16,, the second rib ends 161b-162b of the two first and second reinforcement ribs 1611-1621 form an intermediate connection of 163. The first and second reinforcement ribs 1614-1621 form together with a first flexure link 141, a triangle construction. A similar triangle construction is formed between the first and second reinforcement ribs 1612-162, and a second flexure link 142, of each set 14, of flexure links.
The triangle constructions ensure additional stiffness thereby restricting any movement of the object table 12 in any degree of freedom except that in the Z-
direction. Moreover, the triangle structured reinforcements have little influence on the stiffness in Z-direction and thus increase the parasitic eigenfrequencies, while maintaining a low drive eigenfrequency.
As shown in the Figures, the object table 12 may be provided with at least one through opening 12z. The through opening 12z is in air communication with a vacuum generating module 17 via a vacuum piping 171, and ensures a proper fixation of any object, in particular a photolithographic mask (not shown) positioned on the first surface side 12-1 on the object table 12. It is preferred to have the vacuum 1generating module 17 (vacuum pump device) positioned at the second surface side 12-2 of the object table 12, opposite to the first surface side 12-1 on which the photolithographic mask is to be positioned and fixed through vacuum. Herewith the intermediate space between the object table 12 with the photolithography mask positioned on the first surface side 12-1 and the wafer substrate above the object table is kept free allowing a proper (accurate and precise) adjustment of the object table 12 with the photolithographic mask in the Z-direction relative to the wafer substrate.
Alternatively only one large opening 12z is present which covers almost the whole surface of the object table 12, such that the object is supported by the outer circumference 12a-12b of the object table 12. Accordingly, the open object table is accessible for example for visualization, and imaging.
It is preferred to have the at least one actuator device 15 being formed as a voice coil linear actuator. It is preferred to have several actuator devices 15, for example two or three, acting on the object table 12 for a proper adjustment in the Z- direction. Their exact position of the actuator devices 15 should be determined accurately through calibration in order to establish where any resulting force should act on the object table 12 so there are no moments introduced in the configuration which may result in a deviation of the displacement of the object table 12 relative to the support structure 11.
A voice coil linear actuator are direct-driven with zero backlash and provide an ideal solution for the desired adjustment of the object table 12 in the Z- direction in a highly accurate and repetitive manner.
In another example the object table 12 may have a non-rectangular configuration, e.g. a circular shaped (see Figure 7) or triangle shaped configuration and the two legs 11a and 11b of the L-shaped base frame 11 may extend along one of the dimensions of the object table 12 with the corresponding flexure link 141-142,
being mounted to or connected with the supporting structure 11 and object table 12 respectively.
In the example of Figures 2A and 2B, the base frame 11 has a square configuration comprised of four legs 11a-11d with two actuator devices 15: and 155, each positioned at opposite corners of locations where legs 11a-11b and legs 11c- 11d of the square-shaped base frame 11 meet. Both actuator devices 15: and 15; act on both the square-shaped base frame 11 and the object table 12 in order to adjust their intermediate distance and the object table 12 in the Z-direction of the XYZ-system of coordinates.
In a preferred example, the position module is formed as a monolithic component. In particular, the monolithic position module consisting of the supporting structure 11, the object table 12 and the positioning module 13 (Sarrus linkages 14 and reinforcement structures 16) is formed by means of electrical discharge machining. This technique allows for a simple assembly with a high repeatability and high tolerances. Suitable materials are aluminum, titanium, steel or various types of plastics.
It should be noted, that the positioning system according to the disclosure is capable of adjusting in a controllable manner the position of an object in only one translational direction as defined in an XYZ-system of coordinates.
Accordingly, this single translational direction can be any direction in an XYZ-system of coordinates.
The various views of Figures 1A-1D depict an example of a so-called Z- stage positioning system, wherein the only one translational direction is defined as the vertical Z-direction, allowing the Z-stage positioning system to adjust the position of the object table 12 in the vertical Z-direction with respect to the supporting structure 11.
Further examples of the positioning system according to the disclosure capable of adjusting in a controllable manner the position of an object in only one translational direction is depicted in Figures 3-6. In these Figures the other examples of the positioning system is denoted with reference numeral 104, 102, 103 and 10..
Figure 3 depicts a positioning system 10: capable of adjusting in a controllable manner the position of an object in only one translational direction, also being the vertical Z-direction. The supporting structure 11 and the object table 12 are interconnected with each other by means of a Sarrus linkage comprising four sets of flexure links, indicated with reference numerals 144, 14, 145 and 144. The four sets of flexure links 144, 142, 143 and 144 are mounted to the respective first longitudinal dimension 11a, 12a and second longitudinal dimension 11b, 12b of the supporting structure 11 and the object table 12, respectively.
In Figure 3, the object table 12 serves to accommodate a photolithographic mask 1+. The adjustment, by means of at least one actuator device, of the object table 12 in only the Z-direction ensures a proper alignment and/or adjustment of the gap between the photolithographic mask 1: and a substrate (not depicted) positioned below the photolithographic mask 14. It should be noted that, in an alternative example, the mask 1: is accommodated below the object table 12 and the substrate is positioned below the mask 1; in a fixed manner. Also in this alternative example, the gap between the substrate (not depicted) and the photolithographic mask 1: can be accurately adjusted by means of the actuator device and the Sarrus linkage 14, sic. the four sets of flexure links 14+, 142, 14; and 144.
Figure 4 depicts yet another example according to the disclosure, wherein the positioning system 102 is used in the technical field of fiber handling.
Single-mode fiber coupling involves efficiently transferring light between a single- mode optical fiber and another optical component, such as a laser, detector, or another fiber. In-coupling refers to align, opto-mechanically, the core of the fiber with the point of focus of the light source, while out-coupling involves controlling the source divergence. Precise alignment is crucial for maximizing coupling efficiency in single- mode systems.
In the context of single-mode fiber coupling, controlling beam divergence is essential for optimizing the transfer of light. Proper alignment and focusing help minimize divergence, ensuring that the laser beam closely matches the acceptance angle of the single-mode fiber. This control is crucial in maintaining efficient in-coupling and out-coupling processes, minimizing signal loss, and maximizing the overall performance of optical communication systems.
Accordingly, in the example of Figure 4, the positioning system 102 is used to accurately align the fiber coupler 12 and more in particular the optical fiber 200 and a light source (not depicted). The fiber coupler 12 is mounted (accommodated) to the object table 122. The Sarrus linkage 14 interconnecting the supporting structure 112 and the object table 122 consists of two sets of flexure links 144, and 142. The first set of flexure links 144 is mounted to the respective first longitudinal dimension 11a, 12a of the supporting structure 112 and the object table 122, respectively. The second set of flexure links 142 is mounted to the respective second longitudinal dimension 11b and 12b of the supporting structure 112 and the object table 122, respectively.
In a similar fashion as in the other examples depicted in Figures 1A-1D, 2A-2B and 3, adjustment, by means of actuator devices 154 and 152 which are both mounted between the supporting structure 112 and the object table 122, of the object table 122 in only a horizontal X or Y-direction {or vertical Z-direction) relative to the supporting structure 112 ensures a proper alignment and/or adjustment of the optical fiber 200 and the light source, thereby optimizing the transfer of light.
Figure 5 depicts yet another example according to the disclosure, wherein the positioning system 10; is used in the technical field of optics. For instance in microscopes, a lens system is employed to shift the focal point without changing the working distance between the object and the objective lens. The positioning system 103 comprises a supporting ring structure 11; functioning as the supporting structure, whereas reference numeral 123 denotes an object ring table. The object ring table 12: is structured to accommodate a lens 1s.
Both the supporting ring structure 113 and the object ring table 12; are provided with a through opening 11z and 12v, respectively. The object ring table 123 accommodated a lens 13, which is clamped or otherwise mounted in the through opening 12v. The Sarrus linkage 14 interconnecting the supporting ring structure 113 and the object ring table 123 consists of three sets of flexure links 144, 142 and 14s.
The outer circumference of both supporting ring structure 113 and object ring table 123 are provided with mounting edges 11w-11x-11y and 12w-12x-12y, respectively for the three sets of flexure links 144, 142 and 14:. This positioning system 103 can move the lens 13 along the optical axis 300 using the actuator devices 154 and 152 with respect to the supporting ring structure 113 without inducing lateral parasitic movements, ensuring the object remains in focus. The optical axis 300 can be oriented in either X,
Y or Z-direction of the XYZ-system of coordinates.
Figure 6 depicts yet another example according to the disclosure, more or less similar as Figure 4, wherein the positioning system 10. is used to accurately align a sensor 14, for example across a surface to be analyzed or a target to be sensed.
The sensor 14 is mounted (accommodated) to the object table 124. The Sarrus linkage 14 interconnecting the supporting structure 114 and the object table 124 consists of three sets of flexure links 144, 14: and 14s. The first set of flexure links 144 is mounted to the respective first longitudinal dimension 11a, 12a of the supporting structure 114 and the object table 124, respectively. The second and third sets of flexure links 142 and 14; are mounted to the respective second longitudinal dimension 11b and 12b of the supporting structure 114 and the object table 124, respectively.
In a similar fashion as in the other examples depicted in the Figures, adjustment, by means of at least one actuator device 15, of the object table 124 in only a horizontal X or Y-direction relative to the supporting structure 114 ensures a proper alignment and/or adjustment of the sensor 14, thereby optimizing its sensitivity
LIST OF REFERENCE NUMERALS USED
14-12-13-14 object (first, second, third and fourth example) 10, 10:-..-104 positioning system (various examples) 11 supporting structure (first example) 11a first leg of L-shaped supporting structure 11b second leg of L-shaped supporting structure 11c third leg of supporting structure 11d fourth leg of supporting structure 11s supporting ring structure 11w-11x-11y mounting edge of supporting ring structure 11z through opening in supporting ring structure 12 object table 12a first longitudinal dimension of object table 12b second longitudinal dimension of object table 12z through opening or through slit 122 photolithographic mask 123 object ring table 12v through opening in object ring table 12w-12x-12y mounting edge of object ring table 13 positioning module 14 Sarrus linkage 144-142-14, set of flexure links 141, first flexure link of first, second, or n set of flexure links 141a-141b first and second end of first flexure link 142, second flexure link of first, second, or ni" set of flexure links 142a-142b first and second end of second flexure link 143, intermediate hinge of first, second, or n'" set of flexure links 15 actuator device / voice coil linear actuator 16 reinforcement structures 161, first reinforcement rib of first or second flexure link 161a-161b first and second end of first reinforcement rib 162, second reinforcement rib of first or second flexure link 162a-162b first and second end of second reinforcement rib 163, intermediate connection of first and second reinforcement ribs
17 vacuum generating module 171 vacuum piping 100 semiconductor substrate 200 optical fiber 300 optical axis
Claims (13)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2037271A NL2037271B1 (en) | 2024-03-18 | 2024-03-18 | A positioning system for positioning an object within an XYZ-system of coordinates. |
| PCT/NL2025/050123 WO2025198465A1 (en) | 2024-03-18 | 2025-03-12 | A positioning system for positioning an object within an xyz-system of coordinates |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2037271A NL2037271B1 (en) | 2024-03-18 | 2024-03-18 | A positioning system for positioning an object within an XYZ-system of coordinates. |
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| Publication Number | Publication Date |
|---|---|
| NL2037271B1 true NL2037271B1 (en) | 2025-09-29 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2037271A NL2037271B1 (en) | 2024-03-18 | 2024-03-18 | A positioning system for positioning an object within an XYZ-system of coordinates. |
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| Country | Link |
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| NL (1) | NL2037271B1 (en) |
| WO (1) | WO2025198465A1 (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060186285A1 (en) * | 2005-02-22 | 2006-08-24 | Eastman Kodak Company | Multi-axis positioning apparatus |
| KR20130064172A (en) * | 2011-12-08 | 2013-06-18 | 한국기계연구원 | Adjusting device of initial position for ultraprecision gap sensor and method for the same |
| CN116107178A (en) * | 2022-12-30 | 2023-05-12 | 天府兴隆湖实验室 | A high-precision positioning and leveling device |
-
2024
- 2024-03-18 NL NL2037271A patent/NL2037271B1/en active
-
2025
- 2025-03-12 WO PCT/NL2025/050123 patent/WO2025198465A1/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060186285A1 (en) * | 2005-02-22 | 2006-08-24 | Eastman Kodak Company | Multi-axis positioning apparatus |
| KR20130064172A (en) * | 2011-12-08 | 2013-06-18 | 한국기계연구원 | Adjusting device of initial position for ultraprecision gap sensor and method for the same |
| CN116107178A (en) * | 2022-12-30 | 2023-05-12 | 天府兴隆湖实验室 | A high-precision positioning and leveling device |
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| Publication number | Publication date |
|---|---|
| WO2025198465A1 (en) | 2025-09-25 |
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