NL2016853B1 - Apparatus and method for irradiating a surface of a sample using charged particle beams - Google Patents
Apparatus and method for irradiating a surface of a sample using charged particle beams Download PDFInfo
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- NL2016853B1 NL2016853B1 NL2016853A NL2016853A NL2016853B1 NL 2016853 B1 NL2016853 B1 NL 2016853B1 NL 2016853 A NL2016853 A NL 2016853A NL 2016853 A NL2016853 A NL 2016853A NL 2016853 B1 NL2016853 B1 NL 2016853B1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
- H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
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Abstract
The invention relates to a charged particle beam apparatus for irradiating a surface of a sample. The apparatus comprises a generator for generating a primary beam of charged particles and a charged particle optical system. The charged particle optical system comprises a condenser lens system for directing the primary beam to an intermediate section of the apparatus, a multi-beam forming unit which is arranged for transforming said primary beam into an array of charged particle beams, said unit is arranged in the intermediate section, and a projector lens system for directing the charged particle beams from the unit towards the sample and for focusing all charged particle beams into an array of individual spots on the sample surface. The apparatus is arranged for operating in a second mode of operation in which the primary beam passes through the intermediate section without being transformed into an array of charged particle beams.
Description
No. NLP199412A
Apparatus and method for irradiating a surface of a sample using charged particle beams
BACKGROUND
The invention relates to an apparatus and a method for inspecting a surface of a sample and/or for transferring a pattern on to a surface of a sample. In particular the invention relates to an apparatus which uses multiple charged particle beams for irradiating said surface of the sample, such as, such as a multi-beam scanning electron microscope, a multi-beam charged particle lithography system, or a multi electron beam induced deposition device. The apparatus and method may apply charged particles of any type, such as electrons, positrons, ions and others.
An example of a multi-beam scanning electron microscope is described in WO2013/191539. This International Patent Application publication discloses an apparatus for inspecting a surface of a sample, wherein the apparatus comprises at least one electron source for generating a diverging electron beam. The diverging electron beam is split into an array of electron beams by an aperture lens array, which array of electron beams are directed towards a sample. The array of electron beams is focused into an array of individual spots on the sample surface by means of a lens system.
Although such multi-beam systems allow to obtain a high throughput for the inspection of samples, or for the processing of samples, a disadvantage of the known multibeam systems is that the current per charged particle beam is limited. In cases where a high current charged particle beam is desired, the sample must be transferred into a single beam scanning electron microscope or a single beam lithography system, which are also known in the art.
It is an object of the present invention to ameliorate one or more of the disadvantages of the known systems or to at least provide an alternative apparatus and method for inspecting a surface of a sample and/or for transferring a pattern on to a surface of a sample.
SUMMARY OF THE INVENTION
According to a first aspect, the present invention provides a charged particle beam apparatus for irradiating a surface of a sample, wherein the apparatus comprises a charged particle beam generator for generating a primary charged particle beam and a charged particle optical system, wherein the charged particle optical system comprises : a condenser lens system for directing the primary charged particle beam to an intermediate section of the apparatus, a multi-beam forming unit which is arranged for transforming said primary charged particle beam into an array of charged particle beams, wherein the multi-beam forming unit is arranged substantially in the intermediate section of the apparatus, and a projector lens system for directing the charged particle beams from the multi-beam forming unit towards the sample surface and for focusing all charged particle beams into an array of individual spots on the sample surface, wherein the charged particle optical system is arranged for operating in a second mode of operation wherein the primary beam passes through the intermediate section without being transformed into an array of charged particle beams, and is focused in substantially one spot on the sample surface.
The charged particle optical system is arranged to operate in a first mode of operation, wherein the primary beam is transformed into an array of charged particle beams. Said first mode provides a multi-beam mode for irradiating a surface of a sample at an array of individual spots on said surface. In addition, the same apparatus can be arranged to operate in a second mode of operation in which the primary beam passes through the intermediate section without being transformed into an array of charged particle beams, and in which the primary beam is focused in substantially one spot on the sample surface. Said second mode provides a high-current singlebeam mode for irradiating a surface of a sample at a single spot on said surface. The charged particle beam apparatus of the present invention is switchable between the first mode and the second mode, and thus provides a charged particle beam apparatus which can be used in either the multi-beam mode or the high-current single-beam mode. Since both operating modes are available in one apparatus according to the invention, it is no longer necessary to have both a multi-beam apparatus and a single-beam apparatus. In addition, it is no longer necessary to transfer a sample from a multi-beam apparatus to a singlebeam apparatus, or vice versa.
In an embodiment, wherein the multi-beam forming unit comprises at least one aperture, said charged particle optical system, in particular when in said second mode of operation, is arranged for directing the primary beam substantially through said one aperture in the multi-beam forming unit. By directing the primary beam through said one aperture, the primary beam can pass the multi-beam forming unit without being transformed into an array of charged particle beams.
In a first embodiment, said primary beam is directed substantially through one aperture in the multibeam forming unit by arranging one or more lenses of said charged particle optical system for focusing said primary beam at or near said one aperture in the multi-beam forming unit. In the multi-beam mode, the primary beam is spread over an aperture array, and the charged particles which pass through one aperture of said aperture array generate one of the beams of the array of charged particle beams. In the high-current single-beam mode, the primary beam is focused in or near one aperture of the aperture array which allows substantially the whole primary beam to pass through said one single aperture. Accordingly, the primary beam passes through the multi-beam forming unit without being transformed into an array of charged particle beams, and is focused in one spot on the sample surface.
Preferably, one or more lenses of the condenser lens system is adjustable in order to focus the primary beam in or near one aperture of the aperture array for operating the charged particle beam apparatus in said second mode. Accordingly, the apparatus according to this embodiment utilizes the lenses which are already present in the charged particle beam apparatus. In particular, no extra lenses need to be arranged.
Preferably, the multi-beam forming unit comprises one or more charged particle lenses, wherein in said second mode of operation said one or more lenses of said multi-beam forming unit are arranged for focusing said primary beam in or near said one aperture in the multi-beam forming unit. Accordingly, the multi-beam forming unit is preferably provided with one or more lenses arranged upfront the aperture array, and which lenses are adjustable in order to focus the primary beam in or near one aperture of the aperture array for operating the charged particle beam apparatus in said second mode. Accordingly, the switching between the first and second mode is established substantially by the optics of the multi-beam forming unit, and substantially no adjustment of the lenses of the condenser lens system is required.
It is noted that in case the primary beam is focused near the one aperture, the primary beam is preferably focused slightly above or below said one aperture .
It is further noted that the above described preferred embodiments can also be combined, for example in a situation in which the one or more lenses of the condenser lens or of the multi-beam forming unit cannot be adjusted to an extend to provide a focus of the primary charged particle beam which is narrow enough to pass through one aperture of the aperture array.
In a second embodiment, the multi-beam forming unit comprises a first section comprising components for transforming said primary charged particle beam into an array of charged particle beams, and a second section arranged for passing the primary beam there through without being transformed into an array of charged particle beams, wherein said multi-beam forming unit is movably arranged in said charged particle beam apparatus to position the first section or the second section in the beam path of the primary charged particle beam. By positioning the first section of the multi-beam forming unit in the beam path of the primary charged particle beam, the charged particle beam apparatus can be operated in the first or multi-beam mode. By positioning the second section of the multi-beam forming unit in the beam path of the primary charged particle beam, the charged particle beam apparatus can be operated in the second or high-current single-beam mode. Preferably the positioning is established by mechanically moving the multi-beam forming unit in the charged particle beam apparatus. Said mechanical movement comprises a reciprocating translational movement or a rotating movement of the multi-beam forming unit in the charged particle beam apparatus .
In an alternative embodiment, said multi-beam forming unit is movably arranged in said charged particle beam apparatus for moving the multi-beam forming unit out of the beam path of the primary charged particle beam. By positioning the multi-beam forming unit in the beam path of the primary charged particle beam, the charged particle beam apparatus can be operated in the first or multi-beam mode. By moving the multi-beam forming unit out of the beam path of the primary charged particle beam, the charged particle beam apparatus can be operated in the second or high-current single-beam mode. Preferably the multi-beam forming unit is moved out of the beam path of the primary charged particle beam by mechanically moving the multi-beam forming unit in the charged particle beam apparatus. Said mechanical movement comprises a reciprocating translational movement or a rotating movement of the multi-beam forming unit in the charged particle beam apparatus.
In an embodiment, said multi-beam forming unit comprises an aperture array, wherein when the charged particle optical system is in a first mode of operation, the charged particle optical system is arranged for spreading the primary beam over the aperture array. The charged particles which pass through one aperture of said aperture array generate one of the beams of the array of charged particle beams.
In an embodiment, said multi-beam forming unit comprises an array of beam blanking deflectors. Such beam blanking deflectors are used for deflecting individual charged particle beams of the array of charged particle beams to a position adjacent to an aperture of a beam blanking diaphragm. The deflected individual charged particle beams are blocked by the diaphragm and are not directed to the surface of the sample. Accordingly the array of beam blanking deflectors, in combination with a beam blanking diaphragm, can be used for switching the individual charged particle beams on or off, which is particularly utilized for transferring a pattern onto a resist layer on top of a substrate.
In an embodiment, said charged particle beam apparatus further comprising a segmented detector for detecting secondary particles and/or radiation from the interaction of the focused charged particle beams with the sample, wherein said segmented detector is preferably arranged at said intermediate section comprises. In an embodiment, the projection lens system is arranged for imaging the sample surface onto the segmented detector using the secondary particles and/or radiation from the interaction of the focused charged particle beams with the sample. Such a segmented detector is in particular advantageous in cases wherein the charged particle beam apparatus of the present invention is used for inspecting a surface of a sample.
According to a second aspect, the present invention provides a multi-beam forming unit which, is arranged for transforming a primary charged particle beam into an array of charged particle beams, wherein the multi-beam forming unit is adapted to be placed in a single-beam charged particle beam apparatus in order to modify said single-beam charged particle beam apparatus into a charged particle beam apparatus as described above. Such a unit can, for example, be added to an existing single-beam Scanning Electron Microscope to convert the existing Scanning Electron Microscope into a charged particle beam apparatus of the present invention.
According to a third aspect, the present invention provides a method for inspecting a surface of a sample in a charged particle beam apparatus, wherein the method comprising the steps of: generating a primary charged particle beam; directing the primary charged particle beam to an intermediate section of the charged particle beam apparatus; transforming said primary charged particle beam into an array of charged particle beams by means of a multi-beam forming unit in said intermediate section; directing the charged particle beams from the multi-beam forming unit towards the sample surface; focusing the charged particle beams into an array of individual spots on the surface of the sample; forming an image of the sample by scanning the focused charged particle beams over the surface and detecting secondary particles and/or radiation from the interaction of the focused charged particle beams with the sample; switching or transferring the charged particle beam apparatus into a second mode of operation wherein the primary beam passes through the intermediate section without being transformed into an array of primary charged particle beams; focusing the primary charged particle beam into substantially one spot on the surface; and collecting secondary particles and/or radiation from the interaction of the primary beam with the sample.
According to a fourth aspect, the present invention provides a method for transferring a pattern onto a resist layer on top of a substrate in a charged particle beam apparatus, comprising the steps of generating a primary charged particle beam; directing the primary charged particle beam to an intermediate section of the charged particle beam apparatus; transforming said primary charged particle beam into an array of charged particle beams by means of a multi-beam forming unit in said intermediate section; directing the charged particle beams from the multi-beam forming unit towards the substrate; focusing the charged particle beams into an array of individual spots on the resist layer on top of the substrate; forming at least part of the pattern on the resist layer on top of the substrate by scanning the focused charged particle beams over the resist layer and switching the individual charged particle beams substantially on or off at appropriate times during the scan according to the pattern; switching or transferring the charged particle beam apparatus into a second mode of operation wherein the primary beam passes through the intermediate section without being transformed into an array of primary charged particle beams; focusing the primary charged particle beam into substantially one spot on the resist layer on tip of the substrate; and forming at least part of the pattern on the resist layer on top of the substrate by scanning the focused primary charged particle beam over the resist layer and switching the primary charged particle beam substantially on or off at appropriate times during the scan according to the pattern. In an embodiment, the charged particle beam apparatus comprises a beam blanking system for the on or off switching of the primary charged particle beam and/or one or more individual beams of the array of charged particle beams, preferably wherein the beam blanking system is arranged for blanking the primary charged particle beam or one or more individual beams of the array of charged particle beams for switching off said charged particle beam(s).
In an embodiment of the method according to the third or the fourth aspect, the charged particle current in the primary charged particle beam is substantially larger than the charged particle current in one charged particle beam of said array of charged particle beams.
In an embodiment of the method according to the third or the fourth aspect, the charged particle beam apparatus comprises a charged particle beam apparatus as described above.
The various aspects and features described and shown in the specification can be applied, individually, wherever possible. These individual aspects, in particular the aspects and features described in the attached dependent claims, can be made subject of divisional patent applications .
BRIEF DESCRIPTION OF THE DRAWINGS
The invention will be elucidated on the basis of exemplary embodiments shown in the attached drawings, in which:
Figure 1 schematically shows an example of a charged particle beam apparatus for irradiating a surface of a sample by an array of charged particle beams;
Figure 2 schematically shows the charged particle beam apparatus of figure 1 in a second mode of operation;
Figure 3 schematically shows a second example of a charged particle beam apparatus in a second mode of operation; and
Figure 4 schematically shows an example of a multi-beam forming unit according to the present invention.
It is noted that the same components in the various examples in the figure is provided with the same reference number.
DETAILED DESCRIPTION OF THE INVENTION
Figure 1 schematically shows a first example of a charged particle beam apparatus 1 according to the present invention. The charged particle beam apparatus 1 comprises source 2 for generating a diverging charged particle beam 21. The charged particle beam 21 is preferably an electron beam 21.
The charged particle beam apparatus 1 comprises a charged particle optical system which comprises a condenser lens system 3, a multi-beam forming unit 4 and a projector lens system 5. The condenser lens system 3 comprises charged particle lenses 31, 32 for focusing the primary beam 21 in an intermediate plane and directing the primary charged particle beam 21 to an intermediate section of the apparatus. In the example shown in figure 1, the condenser lens system 3 is arranged to spread the primary charged particle beam 21 over an aperture array 44 of the multibeam forming unit 4 which is arranged in said intermediate section .
The multi-beam forming unit 4 is arranged for transforming said primary charged particle beam 21 into an array of charged particle beams 22, 22', 22". Although also other types of multi-beam forming units can be used in the apparatus of the present invention, such as a unit comprising several arrays of lens electrodes, the multibeam forming unit 4 of the example shown in figure 1 comprises a set of two macro electrodes 42, 43 and an aperture lens array 44. In use the potential of the two macro electrodes 42, 43 are set to provide a lens effect on the aperture lens array 44. The charged particle beams 22, 22' , 22" as produces by the charged particle which pass through the apertures 4 6 of the aperture lens array 44 are focused by the same aperture lens array 44 into an intermediate plane. In particular, the image of the source 2 provided by the condenser lens system 3 is further imaged by the plurality of aperture lenses on the intermediate plane, also called the conjugate plane, where the blanking deflector array 45 is arranged.
It is noted that the lens effect as provided by the multi-beam forming unit 4, is preferably arranged to provide a correction for the field curvature of both the multi-beam forming unit 4 and the objective lens system 5.
The multi-beam forming unit 4 optionally comprises a beam deflector array 45 arranged below the aperture lens array 44. Preferably the blanking deflector array 45 is positioned substantially on the intermediate plane where the charged particle beams 22, 22' , 22" are focused. The blanking deflector array 45 comprises an array of apertures 47, and each aperture 47 is provided with at least two electrodes (see figure 4) for providing an electrostatic field for deflecting the charged particle beam that traverses the associated aperture 47.
The projector lens system 5 comprises an intermediate lens 51 and an objective lens 52. The intermediate lens 51 creates a common crossover of all beams in the coma free plane of the objective lens 52, which focuses then all the charged particle beams 22, 22', 22" an array of individual spots 61, 62, 63 on the surface of the sample 6. By means of a scanning coil system 53, the array of individual spots 61, 62, 63 can be scanned over the surface of the sample 6.
The projector lens system 5 optionally comprises a beam stopping diaphragm 54 which comprises an aperture for transmitting the charged particle beams 22, 22', 22".
In case one or more of said charged particle beams 22, 22', 22" are deflected by the beam deflector array 45, said deflected beams are directed to a position on the beam stopping diaphragm 54 adjacent to the aperture. Accordingly the deflected charged particle beams are stopped by the beam stopping diaphragm 54 and do not contribute in the irradiation of the sample 6. Viewed from the perspective of the sample 6, the deflected charged particle beams are 'switched off'. Accordingly the combination of the beam deflector array 45 and the beam stopping diaphragm 54 provides a means for switching the individual charged particle beams 22, 22', 22" on or off.
The multi-beam forming unit 4 as shown in figure 1, comprises a first section 41 comprising components for transforming said primary charged particle beam 21 into the array of charged particle beams 22, 22', 22" when said first section 41 is positioned in the beam path of the primary charged particle beam 21 as shown in figure 1 and described above.
However, the multi-beam forming unit 4 in the example shown in figure 1 further comprises a second section 48 arranged for passing the primary beam 21 there through without being transformed into an array of charged particle beams. The multi-beam forming unit 4 is movably arranged in the charged particle beam apparatus 1 to move from a first position where the first section 41 is arranged in the beam path of the primary charged particle beam 21, to a second position where the second section 42 is arranged in the beam path of the primary charged particle beam 21. Figure 2 shows the charged particle beam apparatus 1 with the multi-beam forming unit 4 in the second position in which the first section 41 is removed out of the beam path of the primary charged particle beam 21, and the second section 48 is positioned in the beam path of the primary charged particle beam 21. By positioning the second section 48 of the multi-beam forming unit 4 in the beam path of the primary charged particle beam 21, the charged particle beam apparatus 1 operates in a second or high-current single-beam mode.
In the first example as shown in figure 1 and 2, the second section 48 comprises a single current limiting aperture 49. When the charged particle optical system 1 is arranged for operating in the second mode of operation as shown in figure 2, the primary beam 21 is focused in substantially one spot 61' on the surface of the sample 6.
The positioning of the multi-beam forming unit 4 in the first or second position is established by mechanically moving the multi-beam forming unit 3 in the charged particle beam apparatus 1. In the example shown in figures 1 and 2, said mechanical movement comprises a reciprocating translational movement of the multi-beam forming unit 4 in the charged particle beam apparatus 1.
It is noted that, in stead of moving the second section 48 into the beam path of the primary charged particle beam 21, it is also possible to remove the whole multi-beam forming unit 4 out of the beam path of the primary charged particle beam 21, or even out of the charged particle beam apparatus 1.
Figure 3 shows a schematic view of a second example of a charged particle beam apparatus 1' according to the invention. In stead of moving at least the first section 41 of the multi-beam forming unit 4' out of the beam path of the primary charged particle beam 21, the primary charged particle beam 21 is focused substantially in one aperture in the multi-beam forming unit 4' when the charged particle beam apparatus 1' is in said second mode of operation. It is noted that the charged particle beam apparatus 1' in the first mode of operation substantially corresponds with the first example shown in figure 1, but then with a multi-beam forming unit 4 without the second section 48.
In the example shown in figure 3, the condenser lens system 3, in particular the focus length of the second lens 32 of the condenser lens system 3 is changed so that in the second mode of operation, the focus of the primary charged particle beam 21 is substantially arranged in the center aperture in the multi-beam forming unit 4' .
Accordingly, the primary electron beam 21 traverses said one aperture 46 and traverses said multi-beam forming unit 4' substantially unhindered. Viewed from the perspective of the sample 6, the multi-beam forming unit 4' is substantially 'transparent' for the primary beam 21, 22'.
The projector lens system 5 focuses the primary charged particle beam 22' after it traversed the multi-beam forming unit 4', into one single spot 61" on the surface of the sample 6. By means of a scanning coil system 53, the single spot 61" can be scanned over the surface of the sample 6.
Figure 4 shows a schematic cross section of multi-beam forming unit 40 according to the present invention. The multi-beam forming unit 40 comprises a multi-beam unit 410 and a single-beam unit 480. The components of the multi-beam forming unit 40 are arranged in a housing 401 which comprises an input opening 402 and an output opening 403 for the multi-beam unit 410, and an input opening 404 and an output opening 405 for the singlebeam unit 480. The housing 401 is made from an electrically conducting material and, in use, the housing 401 is usually connected to ground potential.
The multi-beam unit 410 comprises, for example, a set of two macro electrodes 420, 430, an aperture lens array 440 with an array of apertures 461, 462, 463, and a blanking deflector 450 comprising an array of apertures 471, 472, 473 provided with blanking deflector electrodes 475, 476. The potential of the two macro electrodes 420, 430 are such that a lens effect is generated on the aperture lens array 440 as well as a so called zero strength lens. For that reason, the potentials of the first macro electrode 420, the second macro electrode 430 and the aperture lens array are set such that VI > V2 > Va.
Each blanking deflector of an aperture 471, 472, 472 of the blanking deflector 450 comprises two electrodes 475, 475. One electrode 475 of each blanking deflector is connected with ground potential and the other electrode 476 is connected to a blanking signal Vsl, Vs2, Vs3. The blanking signals Vsl, Vs2, Vs3 can be driven independently from each other, allowing each beam to be deflected independently from the other beams.
The single beam unit 480 comprises of a single beam-current limiting aperture 490, which is preferably made from an electrically conducting material and, in use, is usually connected to ground potential, preferably via the housing 401.
The multi-beam forming unit 40 can be added to an existing single-beam Scanning Electron Microscope to convert the existing Scanning Electron Microscope into a charged particle beam apparatus of the present invention, in particular a charged particle beam apparatus as shown in figures 1 and 2, for example. Preferably, the multibeam forming unit 40 is arranged in an existing singlebeam Scanning Electron Microscope at a position such that there are electron lenses above and below said position.
It is to be understood that the above description is included to illustrate the operation of the preferred embodiments and is not meant to limit the scope of the invention. From the above discussion, many variations will be apparent to one skilled in the art that would yet be encompassed by the scope of the present invention.
In summary, the invention relates to a charged particle beam apparatus for irradiating a surface of a sample. The apparatus comprises a generator for generating a primary beam of charged particles and a charged particle optical system. The charged particle optical system comprises a condenser lens system for directing the primary beam to an intermediate section of the apparatus, a multibeam forming unit which is arranged for transforming said primary beam into an array of charged particle beams, said unit is arranged in the intermediate section, and a projector lens system for directing the charged particle beams from the unit towards the sample and for focusing all charged particle beams into an array of individual spots on the sample surface. The apparatus is arranged for operating in a second mode of operation in which the primary beam passes through the intermediate section without being transformed into an array of charged particle beams.
Claims (16)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL2016853A NL2016853B1 (en) | 2016-05-30 | 2016-05-30 | Apparatus and method for irradiating a surface of a sample using charged particle beams |
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| Application Number | Priority Date | Filing Date | Title |
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| NL2016853A NL2016853B1 (en) | 2016-05-30 | 2016-05-30 | Apparatus and method for irradiating a surface of a sample using charged particle beams |
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| NL2016853B1 true NL2016853B1 (en) | 2017-12-11 |
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| NL2016853A NL2016853B1 (en) | 2016-05-30 | 2016-05-30 | Apparatus and method for irradiating a surface of a sample using charged particle beams |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11651934B2 (en) | 2021-09-30 | 2023-05-16 | Kla Corporation | Systems and methods of creating multiple electron beams |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120061565A1 (en) * | 2009-05-27 | 2012-03-15 | Hitachi High-Technologies Corporation | Charged particle beam device and sample observation method |
| US20120241606A1 (en) * | 2011-03-23 | 2012-09-27 | Liqun Han | Multiple-beam system for high-speed electron-beam inspection |
-
2016
- 2016-05-30 NL NL2016853A patent/NL2016853B1/en not_active IP Right Cessation
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120061565A1 (en) * | 2009-05-27 | 2012-03-15 | Hitachi High-Technologies Corporation | Charged particle beam device and sample observation method |
| US20120241606A1 (en) * | 2011-03-23 | 2012-09-27 | Liqun Han | Multiple-beam system for high-speed electron-beam inspection |
Non-Patent Citations (1)
| Title |
|---|
| POST P C ET AL: "Parallel electron-beam-induced deposition using a multi-beam scanning electron microscope", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B, AVS / AIP, MELVILLE, NEW YORK, NY, US, vol. 29, no. 6, 1 November 2011 (2011-11-01), pages 6F310 - 6F310, XP012154888, ISSN: 1071-1023, [retrieved on 20111026], DOI: 10.1116/1.3656027 * |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11651934B2 (en) | 2021-09-30 | 2023-05-16 | Kla Corporation | Systems and methods of creating multiple electron beams |
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