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NL2003266A1 - Multi nozzle proximity sensor employing common sensing and nozzle shaping. - Google Patents

Multi nozzle proximity sensor employing common sensing and nozzle shaping. Download PDF

Info

Publication number
NL2003266A1
NL2003266A1 NL2003266A NL2003266A NL2003266A1 NL 2003266 A1 NL2003266 A1 NL 2003266A1 NL 2003266 A NL2003266 A NL 2003266A NL 2003266 A NL2003266 A NL 2003266A NL 2003266 A1 NL2003266 A1 NL 2003266A1
Authority
NL
Netherlands
Prior art keywords
nozzle
proximity sensor
shaping
sensor employing
common sensing
Prior art date
Application number
NL2003266A
Other languages
English (en)
Inventor
Joseph Lyons
Original Assignee
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Holding Nv filed Critical Asml Holding Nv
Publication of NL2003266A1 publication Critical patent/NL2003266A1/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70608—Monitoring the unpatterned workpiece, e.g. measuring thickness, reflectivity or effects of immersion liquid on resist
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL2003266A 2008-08-11 2009-07-23 Multi nozzle proximity sensor employing common sensing and nozzle shaping. NL2003266A1 (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US8790208P 2008-08-11 2008-08-11

Publications (1)

Publication Number Publication Date
NL2003266A1 true NL2003266A1 (nl) 2010-02-15

Family

ID=41652613

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2003266A NL2003266A1 (nl) 2008-08-11 2009-07-23 Multi nozzle proximity sensor employing common sensing and nozzle shaping.

Country Status (3)

Country Link
US (1) US8390782B2 (nl)
JP (1) JP4922363B2 (nl)
NL (1) NL2003266A1 (nl)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014507810A (ja) * 2011-03-11 2014-03-27 エーエスエムエル ネザーランズ ビー．ブイ． 静電クランプ装置およびリソグラフィ装置
JP5915103B2 (ja) * 2011-11-11 2016-05-11 セイコーエプソン株式会社 物理量検出器
NL2017595A (en) * 2015-11-10 2017-05-26 Asml Netherlands Bv Proximity sensor, lithographic apparatus and device manufacturing method
NL2017846A (en) * 2015-12-21 2017-06-27 Asml Netherlands Bv Height Measurement Apparatus
CN115138761A (zh) * 2022-07-07 2022-10-04 江苏大学 一种脉冲式热空化射流微成形装置及成形方法

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56111998A (en) * 1980-02-11 1981-09-04 Tokyo Shibaura Electric Co Pressure signal transmitter
US4550592A (en) 1984-05-07 1985-11-05 Dechape Michel L Pneumatic gauging circuit
JPH0762729B2 (ja) * 1986-03-31 1995-07-05 株式会社日立製作所 自動焦点調節装置
JPS639805A (ja) * 1986-06-30 1988-01-16 Hitachi Electronics Eng Co Ltd 流体噴射による位置決め装置
JPH0297643A (ja) * 1988-09-30 1990-04-10 Kubota Ltd クリープ抵抗の高い耐熱鋳造合金
US4953388A (en) 1989-01-25 1990-09-04 The Perkin-Elmer Corporation Air gauge sensor
EP0460357A3 (en) * 1990-06-08 1992-07-29 Landis & Gyr Betriebs Ag Device for optical measurement of pressure differences
US5163326A (en) 1991-03-08 1992-11-17 Rosemount Inc. Line pressure compensator for a pressure transducer
JPH07135135A (ja) * 1993-06-21 1995-05-23 Hitachi Ltd 半導体製造装置
JP3659529B2 (ja) * 1996-06-06 2005-06-15 キヤノン株式会社 露光装置およびデバイス製造方法
US5825043A (en) * 1996-10-07 1998-10-20 Nikon Precision Inc. Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
JP2002277384A (ja) * 2001-03-19 2002-09-25 Ishikawajima Inspection & Instrumentation Co 欠陥検出方法及び装置
EP1431710A3 (en) * 2002-12-19 2004-09-15 ASML Holding N.V. Liquid flow proximity sensor for use in immersion lithography
US7010958B2 (en) * 2002-12-19 2006-03-14 Asml Holding N.V. High-resolution gas gauge proximity sensor
US6945116B2 (en) * 2003-03-19 2005-09-20 California Institute Of Technology Integrated capacitive microfluidic sensors method and apparatus
US7272976B2 (en) * 2004-03-30 2007-09-25 Asml Holdings N.V. Pressure sensor
US7021120B2 (en) * 2004-04-28 2006-04-04 Asml Holding N.V. High resolution gas gauge proximity sensor
US20070074579A1 (en) * 2005-10-03 2007-04-05 Honeywell International Inc. Wireless pressure sensor and method of forming same
US20070151327A1 (en) 2005-12-29 2007-07-05 Asml Holding N.V. Gas gauge proximity sensor with internal gas flow control

Also Published As

Publication number Publication date
JP4922363B2 (ja) 2012-04-25
US8390782B2 (en) 2013-03-05
JP2010050449A (ja) 2010-03-04
US20100033705A1 (en) 2010-02-11

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NL2003266A1 (nl) Multi nozzle proximity sensor employing common sensing and nozzle shaping.

Legal Events

Date Code Title Description
AD1A A request for search or an international type search has been filed
WDAP Patent application withdrawn

Effective date: 20100705