[go: up one dir, main page]

NL1023376C2 - Dunne laag en werkwijze voor het vervaardigen van een dunne laag. - Google Patents

Dunne laag en werkwijze voor het vervaardigen van een dunne laag. Download PDF

Info

Publication number
NL1023376C2
NL1023376C2 NL1023376A NL1023376A NL1023376C2 NL 1023376 C2 NL1023376 C2 NL 1023376C2 NL 1023376 A NL1023376 A NL 1023376A NL 1023376 A NL1023376 A NL 1023376A NL 1023376 C2 NL1023376 C2 NL 1023376C2
Authority
NL
Netherlands
Prior art keywords
thin layer
sublayers
layers
layer
behavior
Prior art date
Application number
NL1023376A
Other languages
English (en)
Dutch (nl)
Inventor
Marcel Hoekman
Rene Gerrit Heideman
Joseph Wilhelmus Mari Hoekstra
Original Assignee
Lionix B V
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lionix B V filed Critical Lionix B V
Priority to NL1023376A priority Critical patent/NL1023376C2/nl
Priority to PCT/NL2004/000308 priority patent/WO2004099864A2/fr
Application granted granted Critical
Publication of NL1023376C2 publication Critical patent/NL1023376C2/nl

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/03Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect
    • G02F1/035Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on ceramics or electro-optical crystals, e.g. exhibiting Pockels effect or Kerr effect in an optical waveguide structure
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/21Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  by interference
    • G02F1/225Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  by interference in an optical waveguide structure

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Piezo-Electric Transducers For Audible Bands (AREA)
NL1023376A 2003-05-09 2003-05-09 Dunne laag en werkwijze voor het vervaardigen van een dunne laag. NL1023376C2 (nl)

Priority Applications (2)

Application Number Priority Date Filing Date Title
NL1023376A NL1023376C2 (nl) 2003-05-09 2003-05-09 Dunne laag en werkwijze voor het vervaardigen van een dunne laag.
PCT/NL2004/000308 WO2004099864A2 (fr) 2003-05-09 2004-05-10 Transducteur electro-optique

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL1023376 2003-05-09
NL1023376A NL1023376C2 (nl) 2003-05-09 2003-05-09 Dunne laag en werkwijze voor het vervaardigen van een dunne laag.

Publications (1)

Publication Number Publication Date
NL1023376C2 true NL1023376C2 (nl) 2004-11-15

Family

ID=33432525

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1023376A NL1023376C2 (nl) 2003-05-09 2003-05-09 Dunne laag en werkwijze voor het vervaardigen van een dunne laag.

Country Status (2)

Country Link
NL (1) NL1023376C2 (fr)
WO (1) WO2004099864A2 (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7657188B2 (en) * 2004-05-21 2010-02-02 Coveytech Llc Optical device and circuit using phase modulation and related methods
US7409131B2 (en) 2006-02-14 2008-08-05 Coveytech, Llc All-optical logic gates using nonlinear elements—claim set V

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4923526A (en) * 1985-02-20 1990-05-08 Mitsubishi Denki Kabushiki Kaisha Homogeneous fine grained metal film on substrate and manufacturing method thereof
EP0799906A1 (fr) * 1996-04-04 1997-10-08 Texas Instruments Incorporated Dispositif semi-conducteur
US20020102352A1 (en) * 1999-12-02 2002-08-01 Klaus Hartig Haze-resistant transparent film stacks

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1275317C (fr) * 1984-02-28 1990-10-16 Charles B. Roxlo Dispositifs electro-optiques a super-reseau
US5194983A (en) * 1986-11-27 1993-03-16 Centre National De La Recherche Scientifique (C.N.R.S.) Superlattice optical monitor
JP2606079B2 (ja) * 1993-06-25 1997-04-30 日本電気株式会社 光半導体素子
US6501092B1 (en) * 1999-10-25 2002-12-31 Intel Corporation Integrated semiconductor superlattice optical modulator
US6999219B2 (en) * 2001-01-30 2006-02-14 3Dv Systems, Ltd. Optical modulator

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4923526A (en) * 1985-02-20 1990-05-08 Mitsubishi Denki Kabushiki Kaisha Homogeneous fine grained metal film on substrate and manufacturing method thereof
EP0799906A1 (fr) * 1996-04-04 1997-10-08 Texas Instruments Incorporated Dispositif semi-conducteur
US20020102352A1 (en) * 1999-12-02 2002-08-01 Klaus Hartig Haze-resistant transparent film stacks

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
DELOACH J D ET AL: "Growth-controlled cubic zirconia microstructure in zirconia-titania nanolaminates", JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A (VACUUM, SURFACES, AND FILMS), SEPT. 2002, AIP FOR AMERICAN VACUUM SOC, USA, vol. 20, no. 5, pages 1517 - 1524, XP002266870, ISSN: 0734-2101 *
KOBAYASHI H ET AL: "FABRICATION OF PIEZOELECTRIC THIN FILM RESONATORS WITH ACOUSTIC QUARTER-WAVE MULTILAYERS", JAPANESE JOURNAL OF APPLIED PHYSICS, PUBLICATION OFFICE JAPANESE JOURNAL OF APPLIED PHYSICS. TOKYO, JP, vol. 41, no. 5B, PART 1, May 2002 (2002-05-01), pages 3455 - 3457, XP001163738, ISSN: 0021-4922 *

Also Published As

Publication number Publication date
WO2004099864A3 (fr) 2005-03-17
WO2004099864A2 (fr) 2004-11-18

Similar Documents

Publication Publication Date Title
JP5539430B2 (ja) 電子機器の製造方法
JP3521499B2 (ja) 圧電/電歪膜型素子
EP2074695B1 (fr) Resonateur en silicium de type diapason
US8148878B2 (en) Piezoelectric element and gyroscope
CN103548164B (zh) 压电元件用下部电极及具备它的压电元件
US8164234B2 (en) Sputtered piezoelectric material
US9450171B2 (en) Thin film piezoelectric element and manufacturing method thereof, micro-actuator, head gimbal assembly and disk drive unit with the same
WO2015064423A1 (fr) Élément piézoélectrique et procédé permettant de fabriquer un élément piézoélectrique
US9702698B2 (en) Angular velocity sensor and manufacturing method therefor
JP2014060330A (ja) 圧電デバイス及びその使用方法
US20090021119A1 (en) Angular velocity sensor and manufacturing method thereof
CN105008307B (zh) 无铅压电材料
US20070103037A1 (en) Component with a piezoelectric functional layer
JP6346693B2 (ja) 圧電体素子の製造方法
CN104737316A (zh) 磁电传感器和其制造方法
NL1023376C2 (nl) Dunne laag en werkwijze voor het vervaardigen van een dunne laag.
WO2002025325A1 (fr) Element polarisant, isolateur optique, module a diode laser et procede de production d'un element polarisant
US20190214543A1 (en) Monolithic pzt actuator, stage, and method for making
US20070228871A1 (en) Thin-film piezoelectric device and method of manufacturing the same
JP6426061B2 (ja) 積層薄膜構造体の製造方法、積層薄膜構造体及びそれを備えた圧電素子
CN108640078B (zh) 一种压力传感器及其形成方法
EP3811744A1 (fr) Structure electronique souple et son procede d'elaboration
CN111384229B (zh) 薄膜层叠体、薄膜元件及层叠型基板
WO2005001526A1 (fr) Procede de production d'un dispositif optique multicouches
CN111146974B (zh) 静电吸头

Legal Events

Date Code Title Description
PD2B A search report has been drawn up
VD1 Lapsed due to non-payment of the annual fee

Effective date: 20071201