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MX2019008513A - Material de terminal para conectores y metodo para producir el mismo. - Google Patents

Material de terminal para conectores y metodo para producir el mismo.

Info

Publication number
MX2019008513A
MX2019008513A MX2019008513A MX2019008513A MX2019008513A MX 2019008513 A MX2019008513 A MX 2019008513A MX 2019008513 A MX2019008513 A MX 2019008513A MX 2019008513 A MX2019008513 A MX 2019008513A MX 2019008513 A MX2019008513 A MX 2019008513A
Authority
MX
Mexico
Prior art keywords
alloy layer
nickel
inclusive
copper
tin
Prior art date
Application number
MX2019008513A
Other languages
English (en)
Inventor
Maki Kazunari
Inoue Yuki
Nakaya Kiyotaka
FUNAKI Shinichi
Tamagawa Takashi
Original Assignee
Mitsubishi Shindo Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Shindo Kk filed Critical Mitsubishi Shindo Kk
Publication of MX2019008513A publication Critical patent/MX2019008513A/es

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • C25D5/12Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48After-treatment of electroplated surfaces
    • C25D5/50After-treatment of electroplated surfaces by heat-treatment
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48After-treatment of electroplated surfaces
    • C25D5/50After-treatment of electroplated surfaces by heat-treatment
    • C25D5/505After-treatment of electroplated surfaces by heat-treatment of electroplated tin coatings, e.g. by melting
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/605Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C25D5/611Smooth layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/615Microstructure of the layers, e.g. mixed structure
    • C25D5/617Crystalline layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • H01B1/026Alloys based on copper
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R13/00Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
    • H01R13/02Contact members
    • H01R13/03Contact members characterised by the material, e.g. plating, or coating materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01RELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R43/00Apparatus or processes specially adapted for manufacturing, assembling, maintaining, or repairing of line connectors or current collectors or for joining electric conductors
    • H01R43/16Apparatus or processes specially adapted for manufacturing, assembling, maintaining, or repairing of line connectors or current collectors or for joining electric conductors for manufacturing contact members, e.g. by punching and by bending
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12708Sn-base component
    • Y10T428/12715Next to Group IB metal-base component

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacturing Of Electrical Connectors (AREA)
  • Conductive Materials (AREA)

Abstract

Proporcionar un material de terminal para conectores que tengan excelentes propiedades de inserción-remoción, que disminuya en el coeficiente de fricción cinética hasta un mínimo de 0.3 o menos, al tiempo que exhibe excelentes características de conexión eléctrica. Un material de terminal para conectores, que se obtiene mediante laminación secuencial sobre un sustrato que está formado de cobre o una aleación de cobre, una capa de níquel o aleación de níquel, una capa de aleación de cobre-estaño y una capa de estaño en este orden, y: la capa de estaño tiene un espesor promedio de 0.2 µm a 1.2 µm (ambos inclusive); la capa de aleación de cobre-estaño es una capa de aleación compuesta que está compuesta principalmente por Cu6Sn5, con parte del cobre en el Cu6Sn5 siendo sustituido por níquel, y tiene un diámetro de grano cristalino promedio de 0.2 µm a 1.5 µm (ambos inclusive); una parte de la capa de aleación de cobre-estaño se expone desde la superficie de la capa de estaño, con una relación del área de exposición del 1% al 60% (ambos inclusive); la capa de níquel o aleación de níquel tiene un espesor promedio de 0.05 µm a 1.0 µm (ambos inclusive) y un diámetro de grano cristalino promedio de 0.01 µm a 0.5 µm (ambos inclusive), con la relación (desviación estándar)/(diámetro de grano cristalino promedio) de los diámetros de grano cristalino que sea 1.0 o menos; la rugosidad de la superficie Ra de una superficie de la capa de níquel o aleación de níquel, la superficie que está en contacto con la capa de aleación de cobre-estaño, es de 0.005 µm a 0.5 µm (ambos inclusive); y el coeficiente de fricción cinética de la superficie es 0.3 o menos.
MX2019008513A 2017-01-17 2018-01-16 Material de terminal para conectores y metodo para producir el mismo. MX2019008513A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017006184A JP6423025B2 (ja) 2017-01-17 2017-01-17 挿抜性に優れた錫めっき付銅端子材及びその製造方法
PCT/JP2018/000996 WO2018135482A1 (ja) 2017-01-17 2018-01-16 コネクタ用端子材及びその製造方法

Publications (1)

Publication Number Publication Date
MX2019008513A true MX2019008513A (es) 2019-12-02

Family

ID=62908690

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2019008513A MX2019008513A (es) 2017-01-17 2018-01-16 Material de terminal para conectores y metodo para producir el mismo.

Country Status (9)

Country Link
US (1) US10923245B2 (es)
EP (1) EP3572558A4 (es)
JP (1) JP6423025B2 (es)
KR (1) KR102390232B1 (es)
CN (1) CN110177904A (es)
MX (1) MX2019008513A (es)
MY (1) MY194439A (es)
TW (1) TWI799404B (es)
WO (1) WO2018135482A1 (es)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7040224B2 (ja) * 2018-03-30 2022-03-23 三菱マテリアル株式会社 錫めっき付銅端子材及びその製造方法
JP7293829B2 (ja) 2019-04-11 2023-06-20 富士フイルムビジネスイノベーション株式会社 定着部材、定着装置、及び画像形成装置
JP7354719B2 (ja) 2019-09-24 2023-10-03 富士フイルムビジネスイノベーション株式会社 定着部材、定着装置、及び画像形成装置
JP7272224B2 (ja) * 2019-09-30 2023-05-12 三菱マテリアル株式会社 コネクタ用端子材
CN110592515B (zh) * 2019-09-30 2022-06-17 凯美龙精密铜板带(河南)有限公司 一种热浸镀锡铜材及其制造方法
CN111009759B (zh) * 2019-12-23 2021-08-20 苏州威贝斯特电子科技有限公司 一种端子组合物及其插座连接器用制品
JP2023061782A (ja) * 2021-10-20 2023-05-02 Jx金属株式会社 めっき材及び電子部品
DE102021130188A1 (de) * 2021-11-18 2023-05-25 Te Connectivity Germany Gmbh Verfahren zur oberflächenbehandlung eines elektrischen kontaktlements und kontaktelement
JP7670224B1 (ja) * 2024-01-24 2025-04-30 三菱マテリアル株式会社 コネクタ用端子材及びその製造方法、並びにコネクタ
JP7579476B1 (ja) 2024-02-21 2024-11-07 有限会社 ナプラ 端子
JP2025145843A (ja) * 2024-03-22 2025-10-03 三菱マテリアル株式会社 めっき皮膜付銅端子材及びその製造方法
JP7736142B1 (ja) * 2024-10-23 2025-09-09 三菱マテリアル株式会社 コネクタ用端子材及びその製造方法
JP7732566B1 (ja) * 2024-10-23 2025-09-02 三菱マテリアル株式会社 コネクタ用端子材及びその製造方法
CN119320922B (zh) * 2024-12-13 2025-10-28 河南凯美龙新材料科技股份有限公司 一种降低铜带表面摩擦系数的热浸镀锡铜板带及其制造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100870334B1 (ko) * 2004-09-10 2008-11-25 가부시키가이샤 고베 세이코쇼 접속 부품용 도전 재료 및 그의 제조방법
JP4503620B2 (ja) 2007-01-25 2010-07-14 株式会社神戸製鋼所 接続部品用導電材料及びその製造方法
JP5319101B2 (ja) * 2007-10-31 2013-10-16 Jx日鉱日石金属株式会社 電子部品用Snめっき材
US8698002B2 (en) * 2009-01-20 2014-04-15 Mitsubishi Shindoh Co., Ltd. Conductive member and method for producing the same
JP5278630B1 (ja) * 2012-01-26 2013-09-04 三菱マテリアル株式会社 挿抜性に優れた錫めっき銅合金端子材及びその製造方法
TW201413068A (zh) * 2012-07-02 2014-04-01 Mitsubishi Materials Corp 插拔性優良之鍍錫銅合金端子材料及其製造方法
JP5522300B1 (ja) 2012-07-02 2014-06-18 三菱マテリアル株式会社 挿抜性に優れた錫めっき銅合金端子材及びその製造方法
JP2015063750A (ja) 2013-08-26 2015-04-09 三菱マテリアル株式会社 挿抜性に優れた錫めっき銅合金端子材
JP6160582B2 (ja) * 2014-09-11 2017-07-12 三菱マテリアル株式会社 錫めっき銅合金端子材及びその製造方法
JP5984980B2 (ja) * 2015-02-24 2016-09-06 Jx金属株式会社 電子部品用Snめっき材
JP6558971B2 (ja) 2015-06-17 2019-08-14 株式会社日立ハイテクノロジーズ 採血装置

Also Published As

Publication number Publication date
CN110177904A (zh) 2019-08-27
TW201832643A (zh) 2018-09-01
JP6423025B2 (ja) 2018-11-14
MY194439A (en) 2022-11-30
JP2018115361A (ja) 2018-07-26
TWI799404B (zh) 2023-04-21
WO2018135482A1 (ja) 2018-07-26
US20190362865A1 (en) 2019-11-28
US10923245B2 (en) 2021-02-16
EP3572558A1 (en) 2019-11-27
KR20190101465A (ko) 2019-08-30
KR102390232B1 (ko) 2022-04-22
EP3572558A4 (en) 2020-10-28

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