[go: up one dir, main page]

Lin et al., 2025 - Google Patents

Advancing Manufacturing Limits: Ultrafast Laser Nanofabrication Techniques

Lin et al., 2025

View HTML
Document ID
17912168304134144733
Author
Lin Z
Ji L
Hong M
Publication year
Publication venue
Engineering

External Links

Snippet

In recent decades, the pursuit of miniaturization has been crucial in nanofabrication, fostering innovation, and enabling novel applications in chip manufacturing, nanophotonics, and quantum devices [1],[2]. Advancements in nanofabrication technology are driven by the …
Continue reading at www.sciencedirect.com (HTML) (other versions)

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANO-TECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE OR TREATMENT OF NANO-STRUCTURES
    • B82Y10/00—Nano-technology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANO-TECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE OR TREATMENT OF NANO-STRUCTURES
    • B82Y40/00—Manufacture or treatment of nano-structures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/70375—Imaging systems not otherwise provided for, e.g. multiphoton lithography; Imaging systems comprising means for converting one type of radiation into another type of radiation, systems comprising mask with photo-cathode
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANO-TECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANO-STRUCTURES; MEASUREMENT OR ANALYSIS OF NANO-STRUCTURES; MANUFACTURE OR TREATMENT OF NANO-STRUCTURES
    • B82Y30/00—Nano-technology for materials or surface science, e.g. nano-composites

Similar Documents

Publication Publication Date Title
Li et al. O-FIB: far-field-induced near-field breakdown for direct nanowriting in an atmospheric environment
Pan et al. Maskless plasmonic lithography at 22 nm resolution
Stoian et al. Advances in ultrafast laser structuring of materials at the nanoscale
Chong et al. Laser precision engineering: from microfabrication to nanoprocessing
Li et al. Laser nano-manufacturing–state of the art and challenges
Mcleod et al. Subwavelength direct-write nanopatterning using optically trapped microspheres
Guo et al. Near-field laser parallel nanofabrication of arbitrary-shaped patterns
Yalizay et al. Fabrication of nanometer-size structures in metal thin films using femtosecond laser Bessel beams
Rahimian et al. Spatially controlled nano-structuring of silicon with femtosecond vortex pulses
Wen et al. High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field
Fedoruk et al. Subdiffraction-limited milling by an optically driven single gold nanoparticle
Imboden et al. Top-down nanomanufacturing
Geng et al. Artificial seeds‐regulated femtosecond laser plasmonic nanopatterning
Ali et al. Review of laser nanomachining
Afanasiev et al. Two-color beam improvement of the colloidal particle lens array assisted surface nanostructuring
He et al. Maskless laser nano-lithography of glass through sequential activation of multi-threshold ablation
Tseng Recent developments in nanofabrication using scanning near-field optical microscope lithography
Gil-Villalba et al. Single shot femtosecond laser nano-ablation of CVD monolayer graphene
Lin et al. Advancing Manufacturing Limits: Ultrafast Laser Nanofabrication Techniques
Wang et al. High-resolution nanopatterning by achromatic spatial frequency multiplication with electroplated grating structures
Cao et al. Cylindrical vector beams of light from an electrically excited plasmonic lens
Pavel et al. 2 nm quantum optical lithography
Zhou et al. Recent progress of laser micro-and nano manufacturing
Quentin et al. Optical trap assisted laser nanostructuring in the near-field of microparticles
Jipa et al. Laser parallel nanofabrication by single femtosecond pulse near-field ablation using photoresist masks