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Li et al., 2020 - Google Patents

Layer by layer exposure of subsurface defects and laser-induced damage mechanism of fused silica

Li et al., 2020

Document ID
11135153937389568203
Author
Li B
Hou C
Tian C
Guo J
Xiang X
Jiang X
Wang H
Liao W
Yuan X
Jiang X
Zu X
Publication year
Publication venue
Applied Surface Science

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Snippet

Inert ion beams with large incident angle were used for layer by layer etching of chemical- mechanical polished fused silica. The evolution of the impurities, subsurface defects, surface roughness, and surface molecular structure after ion beam etching and their effects on the …
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