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Wang et al., 2022 - Google Patents

High-performance polymer top-contact thin-film transistor with orthogonal photolithographic process

Wang et al., 2022

Document ID
7468137491121388418
Author
Wang L
Cai K
Liu Y
Xie Y
Publication year
Publication venue
Microelectronics Journal

External Links

Snippet

Based on fluorinated photoresist, an orthogonal lift-off process was introduced to directly fabricate patterning metallic source and drain contacts on polymeric thin films to obtain the top-contact structure device. Top-contact polymeric thin-film transistors (TFTs) on the wafer …
Continue reading at www.sciencedirect.com (other versions)

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