Ghannam et al., 1988 - Google Patents
Trends in Heterojunction Silicon Bipolar TransistorsGhannam et al., 1988
- Document ID
- 6496936684726181097
- Author
- Ghannam M
- Nijs J
- Mertens R
- Publication year
- Publication venue
- Ultra-Fast Silicon Bipolar Technology
External Links
Snippet
7.1 Background As a result of the enormous improvement achieved in microelectronics technology during the last twenty years, it has become possible to combine Very Large Scale Integration (VLSI) and very high speed of operation. The minimum lateral dimension …
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon data:image/svg+xml;base64,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 data:image/svg+xml;base64,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 [Si] 0 title description 35
Classifications
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
- H01L29/737—Hetero-junction transistors
- H01L29/7371—Vertical transistors
- H01L29/7378—Vertical transistors comprising lattice mismatched active layers, e.g. SiGe strained layer transistors
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
- H01L29/732—Vertical transistors
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66234—Bipolar junction transistors [BJT]
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/08—Semiconductor bodies; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/0821—Collector regions of bipolar transistors
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
- H01L29/88—Tunnel-effect diodes
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02373—Group 14 semiconducting materials
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0684—Semiconductor bodies; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions
- H01L29/0688—Semiconductor bodies; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions characterised by the particular shape of a junction between semiconductor regions
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies; Multistep manufacturing processes therefor characterised by the materials of which they are formed
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/02546—Arsenides
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies; Multistep manufacturing processes therefor
- H01L29/36—Semiconductor bodies; Multistep manufacturing processes therefor characterised by the concentration or distribution of impurities in the bulk material
- H01L29/365—Planar doping, e.g. atomic-plane doping, delta-doping
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
-
- H—ELECTRICITY
- H01—BASIC ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/082—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only
- H01L27/0823—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only including vertical bipolar transistors only
- H01L27/0825—Combination of vertical direct transistors of the same conductivity type having different characteristics,(e.g. Darlington transistors)
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5656514A (en) | Method for making heterojunction bipolar transistor with self-aligned retrograde emitter profile | |
| EP0541971B1 (en) | A graded bandgap single-crystal emitter heterojunction bipolar transistor | |
| US5620907A (en) | Method for making a heterojunction bipolar transistor | |
| Iyer et al. | Silicon-germanium base heterojunction bipolar transistors by molecular beam epitaxy | |
| US5834800A (en) | Heterojunction bipolar transistor having mono crystalline SiGe intrinsic base and polycrystalline SiGe and Si extrinsic base regions | |
| Lanzerotti et al. | Suppression of boron transient enhanced diffusion in SiGe heterojunction bipolar transistors by carbon incorporation | |
| Oda et al. | 130-GHz f/sub T/SiGe HBT technology | |
| US5326992A (en) | Silicon carbide and SiCAlN heterojunction bipolar transistor structures | |
| JP2004521485A (en) | Bipolar transistor with lattice matched base layer | |
| JP3600591B2 (en) | Method for manufacturing semiconductor device | |
| US6861324B2 (en) | Method of forming a super self-aligned hetero-junction bipolar transistor | |
| US6049099A (en) | Cadmium sulfide layers for indium phosphide-based heterojunction bipolar transistors | |
| US5912481A (en) | Heterojunction bipolar transistor having wide bandgap, low interdiffusion base-emitter junction | |
| JP2001068479A (en) | Hetero bipolar transistor and manufacturing method thereof | |
| US20040084692A1 (en) | Graded- base- bandgap bipolar transistor having a constant - bandgap in the base | |
| EP0779652A2 (en) | Method for making a heterojunction bipolar transistor | |
| Ghannam et al. | Trends in Heterojunction Silicon Bipolar Transistors | |
| Vook et al. | Double-diffused graded SiGe-base bipolar transistors | |
| Ghannam¹ et al. | in Heterojunction Silicon Bipolar Transistors | |
| Terpstra et al. | High-performance SiSiGe HBTs SiGe-technology development in Esprit Project 8001 TIBIA: An overview | |
| Ryum et al. | MBE-grown SiGe base HBT with polysilicon-emitter and TiSi2 base ohmic layer | |
| JPH0744185B2 (en) | Semiconductor device and manufacturing method thereof | |
| Symons et al. | The use of amorphous and microcrystalline silicon for silicon heterojunction bipolar transistors | |
| Kawai et al. | A collector-up AlGaAs/GaAs heterojunction bipolar transistor fabricated using three-stage MOCVD | |
| ITO et al. | Self-Aligned SiGe HBTs with Doping Level Inversion Using Selective Epitaxy |