[go: up one dir, main page]

Fabricant et al., 1999 - Google Patents

Optical specifications for the MMT conversion

Fabricant et al., 1999

View PDF
Document ID
473866663360340600
Author
Fabricant D
McLeod B
West S
Publication year
Publication venue
Multiple Mirror Telescope Observatory Technical Report

External Links

Snippet

This document is meant to define the error budgets for the fabrication and collimation of the optics for the converted MMT. Important background information can be found in a number of publications and technical memoranda these are listed in section 10 below. In the case of a …
Continue reading at www.mmto.org (PDF) (other versions)

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/70216—Systems for imaging mask onto workpiece
    • G03F7/70258—Projection system adjustment, alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Exposure apparatus for microlithography
    • G03F7/708—Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals, windows for passing light in- and out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/198—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors with means for adjusting the mirror relative to its support
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B26/00—Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating
    • G02B26/08—Optical devices or arrangements using movable or deformable optical elements for controlling the intensity, colour, phase, polarisation or direction of light, e.g. switching, gating, modulating for controlling the direction of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B23/00—Telescopes, e.g. binoculars; Periscopes; Instruments for viewing the inside of hollow bodies; Viewfinders; Optical aiming or sighting devices
    • G02B23/02—Telescopes, e.g. binoculars; Periscopes; Instruments for viewing the inside of hollow bodies; Viewfinders; Optical aiming or sighting devices involving prisms or mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B27/00—Other optical systems; Other optical apparatus
    • G02B27/64—Imaging systems using optical elements for stabilisation of the lateral and angular position of the image
    • G02B27/646—Imaging systems using optical elements for stabilisation of the lateral and angular position of the image compensating for small deviations, e.g. due to vibration or shake
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/003—Alignment of optical elements
    • G02B7/004—Manual alignment, e.g. micromanipulators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infra-red or ultra-violet radiation

Similar Documents

Publication Publication Date Title
Fabricant et al. Binospec: a wide-field imaging spectrograph for the MMT
Noethe Active optics in modern large optical telescopes
US7995884B2 (en) Device consisting of at least one optical element
Cayrel E-ELT optomechanics: overview
Arsenault et al. MACAO-VLTI: an adaptive optics system for the ESO Interferometer
Henselmans Non-contact measurement machine for freeform optics
Vernet et al. Specifications and design of the E-ELT M4 adaptive unit
Fabricant et al. Optical specifications for the MMT conversion
Swat et al. Optical design of the southern african large telescope
Brusa et al. From adaptive secondary mirrors to extra-thin extra-large adaptive primary mirrors
Hadaway et al. The optical metrology system for cryogenic testing of the JWST primary mirror segments
West et al. Alignment and use of the optical test for the 8.4-m off-axis primary mirrors of the Giant Magellan Telescope
Pirnay et al. OAJ: 2.6 m wide field survey telescope
Martin et al. Design and manufacture of 8.4 m primary mirror segments and supports for the GMT
Cho et al. Design of the fast steering secondary mirror assembly for the Giant Magellan Telescope
West et al. Wavefront control of the large optics test and integration site (LOTIS) 6.5 m collimator
Yang et al. Pre-construction of giant steerable science mirror for TMT
Haldeman et al. Design and performance characterization of the LCOGTN One-meter Telescope Optical Tube Assembly
Lee et al. Design optimization of a lightweight secondary mirror assembly for a 1-m class ground telescope for satellite laser ranging
Noethe et al. Active thin-mirror telescopes
Agócs et al. Preliminary optical design for the WEAVE two-degree prime focus corrector
Szeto et al. Design and implementation of an atmospheric dispersion compensator/corrector for the Gemini multi-object spectrograph
Wells et al. Assembly integration and ambient testing of the James Webb Space Telescope primary mirror
Murowinski et al. Gemini-north multi-object spectrograph optical performance
Szeto et al. Design of a convex and camera mirror support system for Altair, the Gemini-North adaptive optics system