| Textured nanoporous Mo:BiVO4 photoanodes with high charge transport and charge transfer quantum efficiencies for oxygen evolution V Nair, C Perkins, Q Lin, M Law Energy and Environmental Science, 2016 | 177 | 2016 |
| A study of the methane tolerance of LSCM–YSZ composite anodes with Pt, Ni, Pd and ceria catalysts JS Kim, VV Nair, JM Vohs, RJ Gorte Scripta Materialia 65 (2), 90-95, 2011 | 88 | 2011 |
| Metal layer single EUV expose at pitch 28 nm: how bright field and NTD resist advantages align JH Franke, A Frommhold, N Davydova, R Aubert, VV Nair, T Kovalevich, ... Extreme Ultraviolet (EUV) Lithography XII 11609, 43-62, 2021 | 22 | 2021 |
| Evaluation of Nanostructured β-Mn2V2O7 Thin Films as Photoanodes for Photoelectrochemical Water Oxidation Y Gargasya, MK Gish, VV Nair, JC Johnson, M Law Chemistry of Materials 33 (19), 7743-7754, 2021 | 12 | 2021 |
| Tomorrow’s pitches on today’s 0.33 NA scanner: pupil and imaging conditions to print P24 L/S and P28 contact holes JH Franke, N Davydova, J Bekaert, V Wiaux, VV Nair, A van Dijk, E Wang, ... Extreme Ultraviolet Lithography 2020 11517, 115-127, 2021 | 12 | 2021 |
| Study of EUV reticle storage effects through exposure on EBL2 and NXE R Jonckheere, CC Wu, V de Rooij-Lohmann, D Elstgeest, H Lensen, ... Extreme Ultraviolet Lithography 2020 11517, 78-90, 2020 | 12 | 2020 |
| CNT pellicles: Imaging results of the first full-field EUV exposures J Bekaert, E Gallagher, R Jonckheere, L Van Look, R Aubert, VV Nair, ... Extreme Ultraviolet (EUV) Lithography XII 11609, 95-103, 2021 | 10 | 2021 |
| Carbon nanotube pellicles: imaging results of the first full-field extreme ultraviolet exposures J Bekaert, E Gallagher, R Jonckheere, L Van Look, R Aubert, VV Nair, ... Journal of Micro/Nanopatterning, Materials, and Metrology 20 (2), 021005-021005, 2021 | 7 | 2021 |
| Resistive switching of Al/Sol-Gel ZnO/Al devices for resistive random access memory applications S Deshpande, VV Nair 2009 International Conference on Advances in Computing, Control, and …, 2009 | 7 | 2009 |
| Accurate mapping of dose variations on EUV scanners using dose-to-clear exposures and optical ellipsometry VV Nair, L Van Look, R Aubert, E Hendrickx Extreme Ultraviolet Lithography 2020 11517, 29-39, 2020 | 6 | 2020 |
| Enhanced EUV photolithography control for overcoming defectivity challenges A Ohri, S Snyder, VV Nair, B Watson, K Ahn, ES Ege, Y Singh, E Lee, ... International Conference on Extreme Ultraviolet Lithography 2024 13215, 164-168, 2024 | 4 | 2024 |
| Novel monitoring of EUV litho cluster for manufacturing insertion V Truffert, K Ausschnitt, VV Nair, K D'have Extreme Ultraviolet (EUV) Lithography XI 11323, 192-204, 2020 | 4 | 2020 |
| Impact of developer chemistry on EUV photolithography defects: PFAS vs. PFAS-free surfactants A Ohri, VV Nair, D Pratt, S Light, B Watson, SK Vadivel Advances in Patterning Materials and Processes XLII 13428, 578-582, 2025 | 1 | 2025 |
| Impact of annealing temperature on DSA process: toward faster assembly kinetics HS Suh, VV Nair, P Rincon Delgadillo, J Doise, G Lorusso, P Nealey, ... | 1 | 2018 |
| Overcoming throughput and defects tradeoffs in EUV photolithography for 2D patterning A Ohri, L Hoffman, T Chou, VV Nair, S Light, J Hobbs, R Kothari, D Pratt, ... International Conference on Extreme Ultraviolet Lithography 2025 13686, 275-284, 2025 | | 2025 |
| EUV mask lifetime evaluation using stochastic process window through mask clean cycles VV Nair, D Kewley, G Yoon, RA Shoemake, B Yang, T Boettiger, ... Optical and EUV Nanolithography XXXVIII 13424, 72-79, 2025 | | 2025 |
| Breaking down ADI line edge roughness from a DUV scanner into components B Watson, T van Hemert, J van den Broeke, A Bouma, V Temchenko, ... Optical and EUV Nanolithography XXXVIII 13424, 208-213, 2025 | | 2025 |
| Textured nanoporous Mo: BiVO V Nair, CL Perkins, Q Lin Energy Environ, 2016 | | 2016 |
| Enhanced Low Bias Performance in Textured BiVO4 Photoanodes through Halide and Phosphate Treatments VV Nair, CL Perkins, M Law Electrochemical Society Meeting Abstracts 227, 2009-2009, 2015 | | 2015 |
| Semiconductor photochemistry of BiVO4 photoanodes and sensitized wide gap p-type oxides for tandem water-splitting devices VV Nair University of California, Irvine, 2015 | | 2015 |
J. M. VohsChemical Engineering, University of PennsylvaniaVerified email at seas.upenn.edu
