| Resist hardening and development processes for semiconductor device manufacturing P Xie, CD Bencher, H Dai, T Michaelson, S Deshmukh US Patent 9,411,237, 2016 | 484 | 2016 |
| Optically tuned hardmask for multi-patterning applications CD Bencher, DL Diehl, H Dai, Y Cao, T XU, W Zeng, P Xie US Patent 9,177,796, 2015 | 292 | 2015 |
| Development of an inorganic photoresist for DUV, EUV, and electron beam imaging M Trikeriotis, WJ Bae, E Schwartz, M Krysak, N Lafferty, P Xie, B Smith, ... Advances in Resist Materials and Processing Technology XXVII 7639, 120-129, 2010 | 99 | 2010 |
| Double pattern EDA solutions for 32nm HP and beyond GE Bailey, A Tritchkov, JW Park, L Hong, V Wiaux, E Hendrickx, ... Design for Manufacturability through Design-Process Integration 6521, 476-487, 2007 | 96 | 2007 |
| Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193nm lithography M Krysak, M Trikeriotis, E Schwartz, N Lafferty, P Xie, B Smith, ... Advances in Resist Materials and Processing Technology XXVIII 7972, 408-413, 2011 | 91 | 2011 |
| Photopatternable inorganic hardmask A Telecky, P Xie, J Stowers, A Grenville, B Smith, DA Keszler Journal of Vacuum Science & Technology B 28 (6), C6S19-C6S22, 2010 | 44 | 2010 |
| Electric/magnetic field guided acid diffusion P Xie, L Godet, T Ma, JC Olson, C Bencher US Patent 9,377,692, 2016 | 30 | 2016 |
| Aqueous developable dual switching photoresists for nanolithography L Chen, YK Goh, HH Cheng, BW Smith, P Xie, W Montgomery, ... Journal of Polymer Science Part A: Polymer Chemistry 50 (20), 4255-4265, 2012 | 23 | 2012 |
| Field guided exposure and post-exposure bake process P Xie, L Godet US Patent 9,280,070, 2016 | 17 | 2016 |
| Analysis of higher order pitch division for sub-32nm lithography P Xie, BW Smith Optical Microlithography XXII 7274, 650-657, 2009 | 17 | 2009 |
| Electric/magnetic field guided acid profile control in a photoresist layer P Xie, L Godet US Patent 9,366,966, 2016 | 15 | 2016 |
| Controlling photo acid diffusion in lithography processes P Xie, L Godet, C Bencher US Patent 9,798,240, 2017 | 14 | 2017 |
| Tooling configuration for electric/magnetic field guided acid profile control in a photoresist layer SK Nam, P Xie, Q Liang, L Godet US Patent 9,733,579, 2017 | 13 | 2017 |
| Understanding device impact of line edge/width roughness in frequency domain P Xie, H Ren, A Nainani, H Dai, C Bencher, C Ngai Design for Manufacturability through Design-Process Integration VII 8684 …, 2013 | 8 | 2013 |
| Resist hardening and development processes for semiconductor device manufacturing P Xie, CD Bencher, H Dai, T Michaelson, S Deshmukh US Patent App. 15/216,521, 2016 | 6 | 2016 |
| Scanning interference evanescent wave lithography for sub-22-nm generations P Xie, BW Smith Journal of Micro/Nanolithography, MEMS, and MOEMS 12 (1), 013011-013011, 2013 | 6 | 2013 |
| Alternatives to chemical amplification for 193nm lithography B Baylav, M Zhao, R Yin, P Xie, C Scholz, B Smith, T Smith, P Zimmerman Advances in Resist Materials and Processing Technology XXVII 7639, 367-378, 2010 | 6 | 2010 |
| Post-litho line edge/width roughness smoothing by ion implantations TY Ma, P Xie, L Godet, PM Martin, C Campbell, J Xue, L Miao, Y Chen, ... Advances in Resist Materials and Processing Technology XXX 8682, 34-41, 2013 | 5 | 2013 |
| Projection lithography below lambda/7 through deep-ultraviolet evanescent optical imaging P Xie, BW Smith Journal of Vacuum Science & Technology B 28 (6), C6Q12-C6Q19, 2010 | 5 | 2010 |
| Scanning evanescent wave lithography for sub-22 nm generations P Xie Rochester Institute of Technology, 2012 | 4 | 2012 |
