| Ionized physical vapor deposition (IPVD): A review of technology and applications U Helmersson, M Lattemann, J Bohlmark, AP Ehiasarian, ... Thin solid films 513 (1-2), 1-24, 2006 | 1469 | 2006 |
| A novel pulsed magnetron sputter technique utilizing very high target power densities V Kouznetsov, K Macak, JM Schneider, U Helmersson, I Petrov Surface and coatings technology 122 (2-3), 290-293, 1999 | 1448 | 1999 |
| Growth of single‐crystal TiN/VN strained‐layer superlattices with extremely high mechanical hardness U Helmersson, S Todorova, SA Barnett, JE Sundgren, LC Markert, ... Journal of Applied Physics 62 (2), 481-484, 1987 | 974 | 1987 |
| High power impulse magnetron sputtering discharge JT Gudmundsson, N Brenning, D Lundin, U Helmersson Journal of vacuum science & technology A 30 (3), 2012 | 891 | 2012 |
| On the film density using high power impulse magnetron sputtering M Samuelsson, D Lundin, J Jensen, MA Raadu, JT Gudmundsson, ... Surface and Coatings Technology 205 (2), 591-596, 2010 | 536 | 2010 |
| Optical properties of anatase TiO2 thin films prepared by aqueous sol–gel process at low temperature Z Wang, U Helmersson, PO Käll Thin Solid Films 405 (1-2), 50-54, 2002 | 457 | 2002 |
| Influence of high power densities on the composition of pulsed magnetron plasmas AP Ehiasarian, R New, WD Münz, L Hultman, U Helmersson, ... Vacuum 65 (2), 147-154, 2002 | 437 | 2002 |
| The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge J Bohlmark, M Lattemann, JT Gudmundsson, AP Ehiasarian, ... Thin Solid Films 515 (4), 1522-1526, 2006 | 419 | 2006 |
| Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge K Macák, V Kouznetsov, J Schneider, U Helmersson, I Petrov Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18 (4 …, 2000 | 386 | 2000 |
| Microstructure modification of TiN by ion bombardment during reactive sputter deposition I Petrov, L Hultman, U Helmersson, JE Sundgren, JE Greene Thin Solid Films 169 (2), 299-314, 1989 | 385 | 1989 |
| Ionization of sputtered metals in high power pulsed magnetron sputtering J Bohlmark, J Alami, C Christou, AP Ehiasarian, U Helmersson Journal of Vacuum Science & Technology A 23 (1), 18-22, 2005 | 368 | 2005 |
| Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces J Alami, PO Persson, D Music, JT Gudmundsson, J Bohlmark, ... Journal of Vacuum Science & Technology A 23 (2), 278-280, 2005 | 320 | 2005 |
| Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered … AP Ehiasarian, PE Hovsepian, L Hultman, U Helmersson Thin solid films 457 (2), 270-277, 2004 | 308 | 2004 |
| Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge JT Gudmundsson, J Alami, U Helmersson Surface and Coatings Technology 161 (2-3), 249-256, 2002 | 287 | 2002 |
| High power pulsed magnetron sputtered CrNx films AP Ehiasarian, WD Münz, L Hultman, U Helmersson, I Petrov Surface and coatings technology 163, 267-272, 2003 | 263 | 2003 |
| A spectroscopic ellipsometry study of cerium dioxide thin films grown on sapphire by rf magnetron sputtering S Guo, H Arwin, SN Jacobsen, K Järrendahl, U Helmersson Journal of Applied physics 77 (10), 5369-5376, 1995 | 240 | 1995 |
| Low‐temperature superionic conductivity in strained yttria‐stabilized zirconia M Sillassen, P Eklund, N Pryds, E Johnson, U Helmersson, J Bøttiger Advanced Functional Materials 20 (13), 2071-2076, 2010 | 208 | 2010 |
| Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel M Lattemann, AP Ehiasarian, J Bohlmark, PÅO Persson, U Helmersson Surface and Coatings Technology 200 (22-23), 6495-6499, 2006 | 202 | 2006 |
| Hysteresis-free reactive high power impulse magnetron sputtering E Wallin, U Helmersson Thin Solid Films 516 (18), 6398-6401, 2008 | 195 | 2008 |
| Cross-field ion transport during high power impulse magnetron sputtering D Lundin, P Larsson, E Wallin, M Lattemann, N Brenning, U Helmersson Plasma Sources Science and Technology 17 (3), 035021, 2008 | 192 | 2008 |
Daniel LundinSenior Associate Professor, Linköping UniversityVerified email at liu.se
