| Atomic layer deposition (ALD): from precursors to thin film structures M Leskelä, M Ritala Thin solid films 409 (1), 138-146, 2002 | 1938 | 2002 |
| Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends V Miikkulainen, M Leskelä, M Ritala, RL Puurunen Journal of Applied Physics 113 (2), 2013 | 1823 | 2013 |
| Atomic layer deposition chemistry: recent developments and future challenges M Leskelä, M Ritala Angewandte Chemie International Edition 42 (45), 5548-5554, 2003 | 1481 | 2003 |
| Atomic layer deposition M Ritala, M Leskelä Handbook of Thin Films, 103-159, 2002 | 885 | 2002 |
| Atomic layer deposition of oxide thin films with metal alkoxides as oxygen sources M Ritala, K Kukli, A Rahtu, PI Raisanen, M Leskela, T Sajavaara, ... Science 288 (5464), 319-321, 2000 | 660 | 2000 |
| Atomic layer deposition of platinum thin films T Aaltonen, M Ritala, T Sajavaara, J Keinonen, M Leskelä Chemistry of materials 15 (9), 1924-1928, 2003 | 547 | 2003 |
| Method of depositing rare earth oxide thin films J Niinistō, M Putkonen, M Ritala, P Räisänen, A Niskanen, M Leskelä US Patent 6,858,546, 2005 | 541 | 2005 |
| Handbook of thin film materials M Ritala, M Leskela, HS Nalwa Deposition and processing of thin films 1, 103, 2002 | 525 | 2002 |
| Perfectly Conformal TiN and Al2O3 Films Deposited by Atomic Layer Deposition M Ritala, M Leskelä, JP Dekker, C Mutsaers, PJ Soininen, J Skarp Chemical Vapor Deposition 5 (1), 7-9, 1999 | 482 | 1999 |
| Synthesis and use of precursors for ALD of group VA element containing thin films V Pore, T Hatanpää, M Ritala, M Leskelä US Patent 10,208,379, 2019 | 460 | 2019 |
| Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures K Väyrynen, M Ritala, M Leskelä US Patent 10,468,261, 2019 | 458 | 2019 |
| Atomic layer deposition of noble metals and their oxides J Hamalainen, M Ritala, M Leskela Chemistry of Materials 26 (1), 786-801, 2014 | 458 | 2014 |
| WO3 photocatalysts: Influence of structure and composition IM Szilágyi, B Fórizs, O Rosseler, Á Szegedi, P Németh, P Király, ... Journal of catalysis 294, 119-127, 2012 | 456 | 2012 |
| Atomic layer deposition of noble metal oxides J Hamalainen, M Ritala, M Leskela US Patent App. 11/182,734, 2007 | 456 | 2007 |
| Thin Film Deposition Methods for CuInSe 2 Solar Cells M Kemell, M Ritala, M Leskelä Critical Reviews in Solid State and Materials Sciences 30 (1), 1-31, 2005 | 444 | 2005 |
| A frustrated-Lewis-pair approach to catalytic reduction of alkynes to cis-alkenes K Chernichenko, Á Madarász, I Pápai, M Nieger, M Leskelä, T Repo Nature Chemistry 5 (8), 718-723, 2013 | 439 | 2013 |
| Growth of titanium dioxide thin films by atomic layer epitaxy M Ritala, M Leskelä, E Nykänen, P Soininen, L Niinistö Thin Solid Films 225 (1-2), 288-295, 1993 | 438 | 1993 |
| Atomic layer epitaxy-a valuable tool for nanotechnology? M Ritala, M Leskelä Nanotechnology 10 (1), 19, 1999 | 430 | 1999 |
| Molecular tweezers for hydrogen: synthesis, characterization, and reactivity V Sumerin, F Schulz, M Atsumi, C Wang, M Nieger, M Leskela, T Repo, ... Journal of the American Chemical Society 130 (43), 14117-14119, 2008 | 428 | 2008 |
| Process for producing oxide films T Hatanpaa, M Vehkamaki, M Ritala, M Leskela US Patent 7,713,584, 2010 | 421 | 2010 |
