| Interconnect limits on gigascale integration (GSI) in the 21st century JA Davis, R Venkatesan, A Kaloyeros, M Beylansky, SJ Souri, K Banerjee, ... Proceedings of the IEEE 89 (3), 305-324, 2001 | 994 | 2001 |
| Process for low-temperature metal-organic chemical vapor deposition of tungsten nitride and tungsten nitride films AE Kaloyeros, BC Arkles US Patent 6,884,466, 2005 | 629 | 2005 |
| Methodology for in-situ doping of aluminum coatings AE Kaloyeros, A Knorr, J Faltermeier US Patent 6,534,133, 2003 | 509 | 2003 |
| Ultrathin diffusion barriers/liners for gigascale copper metallization AE Kaloyeros, E Eisenbraun Annual review of materials science 30 (1), 363-385, 2000 | 500 | 2000 |
| Advanced multilayer metallization schemes with copper as interconnection metal SP Murarka, RJ Gutmann, AE Kaloyeros, WA Lanford Thin Solid Films 236 (1-2), 257-266, 1993 | 332 | 1993 |
| Silicon nitride and silicon nitride-rich thin film technologies: trends in deposition techniques and related applications AE Kaloyeros, FA Jové, J Goff, B Arkles ECS Journal of Solid State Science and Technology 6 (10), P691, 2017 | 210 | 2017 |
| Silicon nitride and silicon nitride-rich thin film technologies: state-of-the-art processing technologies, properties, and applications AE Kaloyeros, Y Pan, J Goff, B Arkles ECS Journal of Solid State Science and Technology 9 (6), 063006, 2020 | 176 | 2020 |
| Method of interlayer mediated epitaxy of cobalt silicide from low temperature chemical vapor deposition of cobalt AE Kaloyeros, A Londergan, B Arkles US Patent 6,346,477, 2002 | 155 | 2002 |
| Low-temperature metal-organic chemical vapor deposition (LTMOCVD) of device-quality copper films for microelectronic applications AE Kaloyeros, A Feng, J Garhart, KC Brooks, SK Ghosh, AN Saxena, ... Journal of electronic materials 19 (3), 271-276, 1990 | 154 | 1990 |
| Organometallic route to the chemical vapor deposition of titanium carbide films at exceptionally low temperatures GS Girolami, JA Jensen, DM Pollina, CM Allocca, AE Kaloyeros, ... Journal of the American Chemical Society 109 (5), 1579-1580, 1987 | 134 | 1987 |
| Tantalum nitride films grown by inorganic low temperature thermal chemical vapor deposition diffusion barrier properties in copper metallization AE Kaloyeros, X Chen, T Stark, K Kumar, SC Seo, GG Peterson, HL Frisch, ... Journal of the electrochemical society 146 (1), 170, 1999 | 119 | 1999 |
| White light emission from amorphous silicon oxycarbide (a-SiCxOy) thin films: Role of composition and postdeposition annealing S Gallis, V Nikas, H Suhag, M Huang, AE Kaloyeros Applied Physics Letters 97 (8), 2010 | 99 | 2010 |
| Development of antifouling surfaces to reduce bacterial attachment MV Graham, AP Mosier, TR Kiehl, AE Kaloyeros, NC Cady Soft Matter 9 (27), 6235-6244, 2013 | 98 | 2013 |
| Chemical vapor deposition of copper for multilevel metallization AE Kaloyeros, MA Fury MRS bulletin 18 (6), 22-29, 1993 | 95 | 1993 |
| The effects of processing parameters in the chemical vapor deposition of cobalt from cobalt tricarbonyl nitrosyl AR Ivanova, G Nuesca, X Chen, C Goldberg, AE Kaloyeros, B Arkles, ... Journal of The Electrochemical Society 146 (6), 2139, 1999 | 82 | 1999 |
| Low temperature metal-organic chemical vapor deposition of tungsten nitride as diffusion barrier for copper metallization JE Kelsey, C Goldberg, G Nuesca, G Peterson, AE Kaloyeros, B Arkles Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1999 | 82 | 1999 |
| Comparative study of the effects of thermal treatment on the optical properties of hydrogenated amorphous silicon-oxycarbide S Gallis, V Nikas, M Huang, E Eisenbraun, AE Kaloyeros Journal of Applied Physics 102 (2), 2007 | 77 | 2007 |
| The origin of white luminescence from silicon oxycarbide thin films V Nikas, S Gallis, M Huang, AE Kaloyeros, APD Nguyen, A Stesmans, ... Applied Physics Letters 104 (6), 2014 | 75 | 2014 |
| Low temperature plasma-assisted chemical vapor deposition of tantalum nitride from tantalum pentabromide for copper metallization X Chen, HL Frisch, AE Kaloyeros, B Arkles, J Sullivan Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1999 | 74 | 1999 |
| Review—Cobalt Thin Films: Trends in Processing Technologies and Emerging Applications AE Kaloyeros, Y Pan, J Goff, B Arkles ECS Journal of Solid State Science and Technology 8 (2), P119-P152, 2019 | 73 | 2019 |
Barry ArklesDepartment of Chemistry, Temple UniversityVerified email at temple.edu
