| Titanium dioxide photocatalysis in atmospheric chemistry H Chen, CE Nanayakkara, VH Grassian Chemical reviews 112 (11), 5919-5948, 2012 | 938 | 2012 |
| Sulfur dioxide adsorption and photooxidation on isotopically-labeled titanium dioxide nanoparticle surfaces: roles of surface hydroxyl groups and adsorbed water in the … CE Nanayakkara, J Pettibone, VH Grassian Physical Chemistry Chemical Physics 14 (19), 6957-6966, 2012 | 138 | 2012 |
| Titanium Dioxide Nanoparticle Surface Reactivity with Atmospheric Gases, CO2, SO2, and NO2: Roles of Surface Hydroxyl Groups and Adsorbed Water in the … CE Nanayakkara, WA Larish, VH Grassian The Journal of Physical Chemistry C 118 (40), 23011-23021, 2014 | 122 | 2014 |
| Surface Photochemistry of Adsorbed Nitrate: The Role of Adsorbed Water in the Formation of Reduced Nitrogen Species on α-Fe2O3 Particle Surfaces CE Nanayakkara, PM Jayaweera, G Rubasinghege, J Baltrusaitis, ... The Journal of Physical Chemistry A 118 (1), 158-166, 2014 | 101 | 2014 |
| Enhancing the reactivity of Al/CuO nanolaminates by Cu incorporation at the interfaces L Marín, CE Nanayakkara, JF Veyan, B Warot-Fonrose, S Joulie, A Estève, ... ACS Applied Materials & Interfaces 7 (22), 11713-11718, 2015 | 90 | 2015 |
| Surface Adsorption and Photochemistry of Gas-Phase Formic Acid on TiO2 Nanoparticles: The Role of Adsorbed Water in Surface Coordination, Adsorption … CE Nanayakkara, JK Dillon, VH Grassian The Journal of Physical Chemistry C 118 (44), 25487-25495, 2014 | 69 | 2014 |
| Atomic Layer Deposition of Silicon Dioxide Using Aminosilanes Di-sec-butylaminosilane and Bis(tert-butylamino)silane with Ozone LF Pena, CE Nanayakkara, A Mallikarjunan, H Chandra, M Xiao, X Lei, ... The Journal of Physical Chemistry C 120 (20), 10927-10935, 2016 | 60 | 2016 |
| Role of initial precursor chemisorption on incubation delay for molybdenum oxide atomic layer deposition CE Nanayakkara, A Vega, G Liu, CL Dezelah, RK Kanjolia, YJ Chabal Chemistry of Materials 28 (23), 8591-8597, 2016 | 37 | 2016 |
| Selective Atomic Layer Deposition Mechanism for Titanium Dioxide Films with (EtCp)Ti(NMe2)3: Ozone versus Water JP Klesko, R Rahman, A Dangerfield, CE Nanayakkara, T L’Esperance, ... Chemistry of Materials 30 (3), 970-981, 2018 | 32 | 2018 |
| Low-index, smooth Al2O3 films by aqueous solution process CK Perkins, RH Mansergh, JC Ramos, CE Nanayakkara, DH Park, ... Optical Materials Express 7 (1), 273-280, 2016 | 25 | 2016 |
| In situ infrared absorption study of plasma-enhanced atomic layer deposition of silicon nitride LF Peña, EC Mattson, CE Nanayakkara, KA Oyekan, A Mallikarjunan, ... Langmuir 34 (8), 2619-2629, 2018 | 14 | 2018 |
| Aqueous process to limit hydration of thin-film inorganic oxides CK Perkins, RH Mansergh, DH Park, CE Nanayakkara, JC Ramos, ... Solid State Sciences 61, 106-110, 2016 | 11 | 2016 |
| Basic mechanisms of Al interaction with the ZnO surface Y Gao, L Marin, EC Mattson, J Cure, CE Nanayakkara, JF Veyan, ... The Journal of Physical Chemistry C 121 (23), 12780-12788, 2017 | 10 | 2017 |
| Role of Trimethylaluminum in low temperature atomic layer deposition of silicon nitride A Dangerfield, CE Nanayakkara, A Mallikarjunan, X Lei, RM Pearlstein, ... Chemistry of Materials 29 (14), 6022-6029, 2017 | 7 | 2017 |
| Reaction mechanisms of the atomic layer deposition of tin oxide thin films using tributyltin ethoxide and ozone CE Nanayakkara, G Liu, A Vega, CL Dezelah, RK Kanjolia, YJ Chabal Langmuir 33 (24), 5998-6004, 2017 | 7 | 2017 |
| Multi process air gap formation J Hautala, C NANAYAKKARA US Patent 12,183,627, 2024 | 2 | 2024 |
| Method of forming structure including a doped adhesion film MB Mousa, J Kim, CE Nanayakkara, P Ma, CD Wang, YC Byun, J Wrench, ... US Patent App. 18/141,694, 2023 | 1 | 2023 |
| Etch back for enhanced directional deposition Z Huang, C NANAYAKKARA, S Bhatia, M Sachan, J Hautala US Patent App. 19/213,874, 2025 | | 2025 |
| Compounds and methods for selectively forming metal-containing films C NANAYAKKARA, E Joby, J Woodruff, C DEZELAH, SS HONG, ... US Patent 12,297,537, 2025 | | 2025 |
| Method for depositing layers directly adjacent uncovered vias or contact holes J Hautala, C NANAYAKKARA US Patent 12,255,067, 2025 | | 2025 |
