| Backscattering spectrometry WK Chu Elsevier, 2012 | 5460 | 2012 |
| Principles and applications of ion beam techniques for the analysis of solids and thin films WK Chu, JW Mayer, MA Nicolet, TM Buck, G Amsel, F Eisen Thin Solid Films 17 (1), 1-41, 1973 | 421 | 1973 |
| Calculation of energy straggling for protons and helium ions WK Chu Physical Review A 13 (6), 2057, 1976 | 344 | 1976 |
| Implanted noble gas atoms as diffusion markers in silicide formation WK Chu, SS Lau, JW Mayer, H Müller, KN Tu Thin Solid Films 25 (2), 393-402, 1975 | 329 | 1975 |
| Structure and growth kinetics of Ni2Si on silicon KN Tu, WK Chu, JW Mayer Thin Solid Films 25 (2), 403-413, 1975 | 258 | 1975 |
| Superconductor and magnet levitation devices KB Ma, YV Postrekhin, WK Chu Review of scientific instruments 74 (12), 4989-5017, 2003 | 243 | 2003 |
| Epitaxial ferroelectric thin films for room-temperature tunable element applications CL Chen, HH Feng, Z Zhang, A Brazdeikis, ZJ Huang, WK Chu, CW Chu, ... Applied physics letters 75 (3), 412-414, 1999 | 228 | 1999 |
| Profiling hydrogen in materials using ion beams JF Ziegler, CP Wu, P Williams, CW White, B Terreault, BMU Scherzer, ... nuclear instruments and methods 149 (1-3), 19-39, 1978 | 228 | 1978 |
| Stopping cross sections and backscattering factors for 4He ions in matter Z= 1–92, E (4He)= 400–4000 keV JF Ziegler, WK Chu Atomic Data and Nuclear Data Tables 13 (5), 463-489, 1974 | 197 | 1974 |
| Alpha-particle stopping cross section in solids from 400 kev to 2 mev WK Chu, D Powers Physical Review 187 (2), 478, 1969 | 197 | 1969 |
| Comparative study of CdS thin films deposited by single, continuous, and multiple dip chemical processes IO Oladeji, L Chow, JR Liu, WK Chu, ANP Bustamante, C Fredricksen, ... Thin solid films 359 (2), 154-159, 2000 | 179 | 2000 |
| Method for manufacture of ultra-thin film capacitor A Bhattacharyya, WK Chu, JK Howard, FW Wiedman US Patent 4,333,808, 1982 | 168 | 1982 |
| Stopping Cross Sections of Gases for α Particles from 0.3 to 2 MeV PD Bourland, WK Chu, D Powers Physical Review B 3 (11), 3625, 1971 | 150 | 1971 |
| Reactive ion etching of diamond GS Sandhu, WK Chu Applied physics letters 55 (5), 437-438, 1989 | 147 | 1989 |
| Identification of the dominant diffusing species in silicide formation WK Chu, H Kraütle, JW Mayer, H Müller, MA Nicolet, KN Tu Applied Physics Letters 25 (8), 454, 1974 | 144 | 1974 |
| Ion-energy effects in silicon ion-beam epitaxy JW Rabalais, AH Al-Bayati, KJ Boyd, D Marton, J Kulik, Z Zhang, WK Chu Physical Review B 53 (16), 10781, 1996 | 135 | 1996 |
| Transient enhanced diffusion during rapid thermal annealing of boron implanted silicon K Cho, M Numan, TG Finstad, WK Chu, J Liu, JJ Wortman Applied physics letters 47 (12), 1321-1323, 1985 | 133 | 1985 |
| Calculation of mean excitation energy for all elements WK Chu, D Powerd Physics Letters A 40 (1), 23-24, 1972 | 133 | 1972 |
| Negative transconductance and negative differential resistance in a grid‐gate modulation‐doped field‐effect transistor K Ismail, W Chu, A Yen, DA Antoniadis, HI Smith Applied physics letters 54 (5), 460-462, 1989 | 131 | 1989 |
| Stoichiometry of thin silicon oxide layers on silicon TW Sigmon, WK Chu, E Lugujjo, JW Mayer Applied Physics Letters 24 (3), 105-107, 1974 | 128 | 1974 |
Quark Yungsung ChenNational Sun Yat-Sen UniversityVerified email at mail.nsysu.edu.tw
