| Generation of neutral and high-density electron–positron pair plasmas in the laboratory G Sarri, K Poder, JM Cole, W Schumaker, A Di Piazza, B Reville, ... Nature communications 6 (1), 6747, 2015 | 411 | 2015 |
| Table-top laser-based source of femtosecond, collimated, ultrarelativistic positron beams G Sarri, W Schumaker, A Di Piazza, M Vargas, B Dromey, ME Dieckmann, ... Physical review letters 110 (25), 255002, 2013 | 229 | 2013 |
| Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling I Fomenkov, D Brandt, A Ershov, A Schafgans, Y Tao, G Vaschenko, ... Advanced Optical Technologies 6 (3-4), 173-186, 2017 | 190 | 2017 |
| Scaling high-order harmonic generation from laser-solid interactions to ultrahigh intensity F Dollar, P Cummings, V Chvykov, L Willingale, M Vargas, V Yanovsky, ... Physical review letters 110 (17), 175002, 2013 | 111 | 2013 |
| Improvements to laser wakefield accelerated electron beam stability, divergence, and energy spread using three-dimensional printed two-stage gas cell targets M Vargas, W Schumaker, ZH He, Z Zhao, K Behm, V Chvykov, B Hou, ... Applied Physics Letters 104 (17), 2014 | 69 | 2014 |
| Industrialization of a robust EUV source for high-volume manufacturing and power scaling beyond 250W M Purvis, IV Fomenkov, AA Schafgans, M Vargas, S Rich, Y Tao, ... Extreme Ultraviolet (EUV) Lithography IX 10583, 476-485, 2018 | 59 | 2018 |
| Measurements of high-energy radiation generation from laser-wakefield accelerated electron beams W Schumaker, G Sarri, M Vargas, Z Zhao, K Behm, V Chvykov, B Dromey, ... Physics of Plasmas 21 (5), 2014 | 56 | 2014 |
| Laser-driven generation of collimated ultra-relativistic positron beams G Sarri, W Schumaker, A Di Piazza, K Poder, JM Cole, M Vargas, D Doria, ... Plasma Physics and Controlled Fusion 55 (12), 124017, 2013 | 44 | 2013 |
| Making pions with laser light W Schumaker, T Liang, R Clarke, JM Cole, G Grittani, S Kuschel, ... New Journal of Physics 20 (7), 073008, 2018 | 17 | 2018 |
| X-ray phase contrast imaging of additive manufactured structures using a laser wakefield accelerator M Vargas, W Schumaker, ZH He, K Behm, V Chvykov, B Hou, ... Plasma Physics and Controlled Fusion 61 (5), 054009, 2019 | 16 | 2019 |
| Advancements in predictive plasma formation modeling MA Purvis, A Schafgans, DJW Brown, I Fomenkov, R Rafac, J Brown, ... Extreme Ultraviolet (EUV) Lithography VII 9776, 159-170, 2016 | 13 | 2016 |
| Extreme Ultraviolet (EUV) Lithography IX M Purvis, IV Fomenkov, AA Schafgans, M Vargas, S Rich, Y Tao, ... International Society for Optics and Photonics SPIE 10583, 476-85, 2018 | 6 | 2018 |
| A table-top laser-based source of short, collimated, ultra-relativistic positron beams G Sarri, W Schumaker, A Di Piazza, M Vargas, B Dromey, ME Dieckmann, ... Laser Acceleration of Electrons, Protons, and Ions II; and Medical …, 2013 | 4 | 2013 |
| On the properties of synchrotron-like X-ray emission from laser wakefield accelerated electron beams C McGuffey, W Schumaker, T Matsuoka, V Chvykov, F Dollar, ... Physics of Plasmas 25 (4), 2018 | 3 | 2018 |
| Light sources for high-volume manufacturing EUV lithography: Technology, performance, and power scaling I Fomenkov, D Brandt, A Ershov, A Schafgans, Y Tao, G Vaschenko, ... (No Title), 2018 | 3 | 2018 |
| Industrialization of a laser produced plasma EUV light source for lithography I Fomenkov, A Schafgans, S Rokitski, M Kats, J Stewart, A LaForge, ... CLEO: Applications and Technology, ATu4C. 4, 2017 | 3 | 2017 |
| Laser seeded electron beam filamentation in high intensity laser wakefield acceleration M Vargas, W Schumaker, P Cummings, V Chvykov, V Yanovsky, ... AIP Conference Proceedings 1507 (1), 336-340, 2012 | 3 | 2012 |
| Generation of a neutral, high-density electron-positron plasma in the laboratory G Sarri, K Poder, JM Cole, W Schumaker, A Di Piazza, B Reville, D Doria, ... arXiv preprint arXiv:1312.0211, 2013 | 2 | 2013 |
| Sarri et al. Reply: G Sarri, W Schumaker, A Di Piazza, M Vargas, B Dromey, ME Dieckmann, ... Physical Review Letters 124 (17), 179502, 2020 | 1 | 2020 |
| High-Power, High-Repetition-Rate Pulsed CO2 Lasers and their application in EUV lithography sources Y Tao, A Schafgans, S Rokitski, M Kats, J Stewart, J Grava, P Das, ... CLEO: Applications and Technology, AM2K. 4, 2016 | 1 | 2016 |
