| Enhancement of high-order harmonic generation at tuned wavelengths through adaptive control DH Reitze, S Kazamias, F Weihe, G Mullot, D Douillet, F Augé, O Albert, ... Optics letters 29 (1), 86-88, 2004 | 118 | 2004 |
| Stable, tunable, quasimonoenergetic electron beams produced in a laser wakefield<? format?> near the threshold for self-injection S Banerjee, SY Kalmykov, ND Powers, G Golovin, V Ramanathan, ... Physical Review Special Topics—Accelerators and Beams 16 (3), 031302, 2013 | 64 | 2013 |
| Submillimeter-resolution radiography of shielded structures<? format?> with laser-accelerated electron beams V Ramanathan, S Banerjee, N Powers, N Cunningham, ... Physical Review Special Topics—Accelerators and Beams 13 (10), 104701, 2010 | 35 | 2010 |
| Characterization of the terahertz frequency optical constants of montmorillonite I Wilke, V Ramanathan, J LaChance, A Tamalonis, M Aldersley, PC Joshi, ... Applied Clay Science 87, 61-65, 2014 | 34 | 2014 |
| Feed forward of metrology data in a metrology system A Levy, D Kandel, ME Adel, L Poslavsky, J Robinson, T Marciano, ... US Patent 9,903,711, 2018 | 29 | 2018 |
| Signal response metrology (SRM): a new approach for lithography metrology S Pandev, F Fang, YK Kim, J Tsai, A Vaid, L Subramany, D Sanko, ... Metrology, Inspection, and Process Control for Microlithography XXIX 9424 …, 2015 | 23 | 2015 |
| Analysis of thermal aberrations in a high average power single-stage Ti: sapphire regenerative chirped pulse amplifier: Simulation and experiment V Ramanathan, J Lee, S Xu, X Wang, L Williams, W Malphurs, DH Reitze Review of scientific instruments 77 (10), 2006 | 22 | 2006 |
| Improving OCD time to solution using Signal Response Metrology F Fang, X Zhang, A Vaid, S Pandev, D Sanko, V Ramanathan, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778, 51-60, 2016 | 17 | 2016 |
| Analyzing root causes of process variation in scatterometry metrology T Marciano, ME Adel, M Ghinovker, B Bringoltz, D Klein, T Itzkovich, ... US Patent 10,203,200, 2019 | 12 | 2019 |
| Integrated production overlay field-by-field control for leading edge technology nodes WJ Chung, J Tristan, K Gutjahr, L Subramany, C Li, Y Sun, M Yelverton, ... Metrology, Inspection, and Process Control for Microlithography XXVIII 9050 …, 2014 | 7 | 2014 |
| The colouring matters of Ponderosa Pine bark. Part II. A synthesis of pinoquercetin and pinomyricetin. R Mani, V Ramanathan, K Venkataraman | 7 | 1956 |
| Process monitoring and control with tunable wavelength overlay coupled with simulation-to-measurement analysis P Herrera, K Gao, C Dror, E Hajaj, AA Volfman, R Yohanan, ... Metrology, Inspection, and Process Control for Microlithography XXXIII 10959 …, 2019 | 5 | 2019 |
| CPE run-to-run overlay control for High Volume Manufacturing L Subramany, WJ Chung, K Gutjhar, M Garcia-Medina, C Sparka, L Yap, ... 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2015 | 5 | 2015 |
| Development of a Source of Quasi‐Monochromatic MeV Energy Photons D Umstadter, S Banerjee, V Ramanathan, N Powers, N Cunningham, ... AIP conference proceedings 1099 (1), 606-609, 2009 | 5 | 2009 |
| Process drift compensation by tunable wavelength homing in scatterometry-based overlay K Gao, P Herrera, V Ramanathan, V Naipak, M Wang, R Milo, T Yaziv, ... Metrology, Inspection, and Process Control for Microlithography XXXIII 10959 …, 2019 | 4 | 2019 |
| Root cause analysis of overlay metrology excursions with scatterometry overlay technology (SCOL) K Gutjahr, D Park, Y Zhou, W Cho, KC Ahn, P Snow, R McGowan, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 4 | 2016 |
| Run time scanner data analysis for HVM lithography process monitoring and stability control WJ Chung, YK Kim, J Tristan, JS Kim, L Subramany, C Li, B Riggs, ... Metrology, Inspection, and Process Control for Microlithography XXVIII 9050 …, 2014 | 4 | 2014 |
| High‐energy Laser‐accelerated Electron Beams for Long‐range Interrogation NJ Cunningham, S Banerjee, V Ramanathan, N Powers, ... AIP Conference Proceedings 1099 (1), 638-642, 2009 | 4 | 2009 |
| Synthetical experiments in the chromone group: Part XXIX. A method for the reduction of 5: 7-dihydroxyflavones to 5-hydroxyflavones V Ramanathan, K Venkataraman Proceedings of the Indian Academy of Sciences-Section A 38 (1), 40-44, 1953 | 4 | 1953 |
| Raney nickel reductions: Part III. Reduction of anthraquinone and its derivatives V Ramanathan, BD Tilak, K Venkataraman Proceedings of the Indian Academy of Sciences-Section A 38 (2), 161-175, 1953 | 3 | 1953 |
Donald UmstadterOlson Professor, Physics and Astronomy Department, University of Nebraska, LincolnVerified email at unl.edu
