| Steps toward automated deprocessing of integrated circuits EL Principe, N Asadizanjani, D Forte, M Tehranipoor, R Chivas, ... International Symposium for Testing and Failure Analysis 81504, 285-298, 2017 | 45 | 2017 |
| Visible light LVP on bulk silicon devices J Beutler, VC Hodges, JJ Clement, J Stevens, EI Cole Jr, S Silverman, ... International Symposium for Testing and Failure Analysis 81030, 6-13, 2015 | 27 | 2015 |
| Contactless fault isolation for FinFET technologies with visible light and GaP SIL H Lohrke, P Scholz, A Beyreuther, C Boit, E Uhlmann, S Kühne, ... International Symposium for Testing and Failure Analysis 81368, 19-26, 2016 | 26 | 2016 |
| High definition scintillation detector for medicine, homeland security and non-destructive evaluation TF Morse, R Gupta, CB Roberts, RD Chivas US Patent 8,477,906, 2013 | 24 | 2013 |
| Plasma FIB deprocessing of integrated circuits from the backside EL Principe, N Asadizanjani, D Forte, M Tehranipoor, R Chivas, ... ASM International 19 (4), 36-44, 2017 | 21 | 2017 |
| Synthesis and photoluminescence of ultra-pure germanium nanoparticles R Chivas, S Yerci, R Li, L Dal Negro, TF Morse Optical Materials 33 (11), 1829-1832, 2011 | 19 | 2011 |
| Adaptive Grinding and Polishing of Silicon Integrated Circuits to Ultra-thin Remaining Thickness R Chivas, S Silverman, M DiBattista International Symposium for Testing and Failure Analysis 81030, 460-465, 2015 | 15 | 2015 |
| Fast, full chip image stitching of nanoscale integrated circuits D Zhang, G Van Der Wal, P Miller, D Stoker, E Matlin, N Marri, G Gan, ... | 14 | 2019 |
| Preparation of Wafer Level Packaged Integrated Circuits Using Pulsed Laser Assisted Chemical Etching R Chivas, N Dandekar, S Silverman, R Cruz, M DiBattista International Symposium for Testing and Failure Analysis 39791, 491-497, 2012 | 9 | 2012 |
| Pulsed Laser Assisted Chemical Etch for analytic surface preparation R Chivas, S Silverman, N Dandekar 2012 IEEE International Reliability Physics Symposium (IRPS), 2D. 6.1-2D. 6.8, 2012 | 7 | 2012 |
| Laser-assisted chemical polishing of silicon (112) wafers N Dandekar, R Chivas, S Silverman, X Kou, M Goorsky Journal of electronic materials 41 (10), 2790-2794, 2012 | 6 | 2012 |
| Submicron thinning of finFET devices with high power density observed in 10/7nm process nodes using high aspect ratio trenches N Bakken, V Vlasyuk, M Beal, I Artishuk, R Chivas, M DiBattista, ... International Symposium for Testing and Failure Analysis 82747, 454-459, 2019 | 5 | 2019 |
| Adaptive grinding and polishing of packaged integrated circuits R Chivas, S Silverman 2014 IEEE International Reliability Physics Symposium, FA. 4.1-FA. 4.6, 2014 | 5 | 2014 |
| Laser Chemical Etching Trench Refinements for Backside Debug Journey to the Circuit Layer MM Mulholland, S Tan, MU Raza, M Levesque, J Furlong, CGL Ferri, ... International Symposium for Testing and Failure Analysis 83348, 357-361, 2020 | 2 | 2020 |
| Electrical Invasiveness of Grinding and Polishing Silicon Integrated Circuits Down to 1 μm Remaining Silicon Thickness R Chivas, S Silverman, M DiBattista, U Kindereit International Symposium for Testing and Failure Analysis 81368, 166-171, 2016 | 2 | 2016 |
| Full Chip Backside Delayering of 10 nm Node Integrated Circuits with Chemically Assisted Focused Ion Beam Deprocessing M DiBattista, AT Yazdi, J Sheeder, S Silverman, R Chivas EDFA Technical Articles 27 (1), 3-7, 2025 | | 2025 |
| Large Area Circuit Delayering from the Backside Using Chemically Assisted Focused Ion Beam Sputtering with Optical Metrology Feedback M DiBattista, R Chivas, J Sheeder, S Silverman, H Beaulieu International Symposium for Testing and Failure Analysis 84918, 454-459, 2024 | | 2024 |
| Photo: What a difference a micron makes. J Beutler, KD Greth, S Silverman, R Chivas Sandia National Lab.(SNL-NM), Albuquerque, NM (United States), 2015 | | 2015 |
| Visible Light LVP on Bulk Silicon Substrates. J Beutler, JJ Clement, J Stevens, VC Hodges, S Silverman, R Chivas Sandia National Lab.(SNL-NM), Albuquerque, NM (United States), 2015 | | 2015 |
| Aerosol deposition process for synthesizing optically active nano-scale materials RD Chivas Dissertation Abstracts International 68 (04), 2007 | | 2007 |
