WO2002006862A1 - Optical device having wavelength selectivity and its manufacturing method - Google Patents
Optical device having wavelength selectivity and its manufacturing method Download PDFInfo
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- WO2002006862A1 WO2002006862A1 PCT/JP2001/006012 JP0106012W WO0206862A1 WO 2002006862 A1 WO2002006862 A1 WO 2002006862A1 JP 0106012 W JP0106012 W JP 0106012W WO 0206862 A1 WO0206862 A1 WO 0206862A1
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- Prior art keywords
- optical
- substrate
- optical element
- film
- base
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- 230000003287 optical effect Effects 0.000 title claims abstract description 168
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 20
- 239000012788 optical film Substances 0.000 claims abstract description 17
- 239000000758 substrate Substances 0.000 claims description 52
- 239000010408 film Substances 0.000 claims description 49
- 239000013307 optical fiber Substances 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 14
- 230000007423 decrease Effects 0.000 claims description 2
- 238000004891 communication Methods 0.000 description 15
- 239000011521 glass Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 4
- 230000002238 attenuated effect Effects 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/28—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals
- G02B6/293—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals with wavelength selective means
- G02B6/29346—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals with wavelength selective means operating by wave or beam interference
- G02B6/29361—Interference filters, e.g. multilayer coatings, thin film filters, dichroic splitters or mirrors based on multilayers, WDM filters
- G02B6/29362—Serial cascade of filters or filtering operations, e.g. for a large number of channels
- G02B6/29364—Cascading by a light guide path between filters or filtering operations, e.g. fibre interconnected single filter modules
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/28—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals
- G02B6/293—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals with wavelength selective means
- G02B6/29346—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals with wavelength selective means operating by wave or beam interference
- G02B6/29361—Interference filters, e.g. multilayer coatings, thin film filters, dichroic splitters or mirrors based on multilayers, WDM filters
- G02B6/2937—In line lens-filtering-lens devices, i.e. elements arranged along a line and mountable in a cylindrical package for compactness, e.g. 3- port device with GRIN lenses sandwiching a single filter operating at normal incidence in a tubular package
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/43—Arrangements comprising a plurality of opto-electronic elements and associated optical interconnections
Definitions
- the present invention relates to an optical element used for optical communication such as wavelength division multiplexing communication, and is particularly suitable for multiplexing (multiplexing) of light having different wavelengths or demultiplexing of multiplexed light for each wavelength.
- the present invention relates to an optical element having wavelength selectivity and a method for manufacturing the same.
- optical elements such as an optical fiber / collimator lens have been used for optical communication equipment.
- optical communication becomes more widespread in the future, it will become increasingly necessary to downsize and integrate optical communication equipment.
- optical communication requires a technology for splitting light by selectively transmitting or reflecting light for each wavelength. Therefore, for example, an optical filter such as an edge filter or a narrow-band filter, which is a multilayer filter in which high-refractive-index dielectric layers and low-refractive-index dielectric layers are alternately stacked, has been proposed.
- FIG. 9 is a schematic diagram of a conventional optical communication device 100 using an optical filter.
- the optical communication device 100 demultiplexes a mixed optical signal of optical signals (Chl to 8) having eight different wavelengths and outputs a plurality of optical signals.
- the optical communication device 100 includes collimator lenses 101, 102, 104 to 119, each of which is a rod lens, an attenuator 103, and optical filters F1 to F9.
- the attenuator 103 attenuates the light intensity of the incident light to a predetermined value.
- An optical signal is sent between the lens, the attenuator 103, and the filter via the optical fiber.
- the mixed optical signal incident on the optical communication device 100 is separated into a transmitted optical signal (optical signal Ch5) and a reflected optical signal (optical signals Ch1 to 4, 6 to 8) by the optical filter F5.
- the optical intensity of the optical signal Ch5, which is a transmitted optical signal, is attenuated to a predetermined value by the attenuator 103, and the attenuated optical signal Ch5 is emitted from the attenuator 103.
- the optical signals Ch 1 to 4 and 6 to 8 which are the reflected light signals of the optical filter F 5 are transmitted by the optical filter F 9 to the transmitted light signal (optical signal Ch 6 to 8) and the reflected light signal (optical signal Ch 1 to 4).
- Optical signal C that is the transmitted optical signal h 6 to 8 are separated into a transmitted light signal (optical signal Ch 6) and a reflected light signal (optical signals Ch 7 and 8) by the optical filter F 6, and the transmitted optical signal Ch 6 is a collimator The light exits through the lens 107.
- the optical signals Ch7 and 8, which are the reflected light signals of the optical filter F6, are separated into a transmitted light signal (optical signal Ch7) and a reflected light signal (optical signal Ch8) by the optical filter F7.
- the optical signal Ch 7 is emitted through the collimator lens 109, and the optical signal Ch 8 is transmitted through the optical filter F 8 and emitted through the collimator lens 111.
- optical filter F 9 which is the reflected light signal of the optical filter F 9 is divided into the transmitted light signal (optical signal Ch i) and the reflected light signal (optical signal Ch 2 to 4) by the optical filter F 1.
- the optical signal Ch1 is emitted through the collimator lens 113.
- the optical signals Ch2 to Ch4 which are the reflected optical signals of the optical filter F1 are separated by the optical filter F2 into a transmitted optical signal (optical signal Ch2) and a reflected optical signal (optical signals Ch3, 4).
- the optical signal Ch 2 is emitted through the collimator lens 115.
- the optical signals Ch3 and Ch4, which are reflected optical signals of the optical filter F2 are separated into a transmitted optical signal (optical signal Ch3) and a reflected optical signal (optical signal Ch4) by the optical filter F3.
- the optical signal Ch3, which is the transmitted light signal is emitted through the collimator lens 117, and the optical signal Ch4, which is the reflected light signal of the optical filter F3, passes through the optical filter F4 and passes through the collimator lens 119. And is emitted. .
- the optical communication device 100 of FIG. 9 has the following problems.
- An object of the present invention is to provide an optical element having a wavelength selectivity which can be easily manufactured and whose manufacturing cost is reduced, and a method for manufacturing the same.
- an optical element having wavelength selectivity includes a substrate having a curved surface or a plurality of planes, and an optical film formed on a surface of the substrate and having a film thickness varying between different positions on the curved surface or the plurality of planes.
- a method for manufacturing an optical element having wavelength selectivity includes a step of preparing a substrate having a curved surface or a plurality of planes, and changing between different positions on the curved surface or the plurality of planes by forming a film on a surface of the substrate from a predetermined direction. Forming an optical film having a thickness.
- an optical element disposed at one end of an optical fiber.
- the optical element has a curved surface or a plurality of planes, and has a light-transmitting substrate, and a film thickness formed on a surface of the substrate and varying between different positions on the curved surface or the plurality of planes.
- An optical film is provided.
- a wavelength selection device in a fourth aspect of the present invention, includes: an optical fiber; a parallel light emitting element that converts light emitted from the optical fiber into parallel light; and an optical element that receives parallel light emitted from the light emitting element and has wavelength selectivity.
- the optical element includes a substrate having a curved surface or a plurality of planes, and an optical film formed on the surface of the substrate and having a different thickness depending on the position on the curved surface or the plurality of planes.
- the wavelength of the light to be selected can be changed by rotating or moving the optical element to change the incident position of the parallel light on the optical film.
- FIG. 1 is a schematic front view of an optical element according to a first embodiment of the present invention.
- FIG. 2 is a schematic configuration diagram of an optical element according to a second embodiment of the present invention.
- FIG. 3 is a schematic front view of an optical element according to a third embodiment of the present invention.
- FIG. 4 is a schematic front view of an optical element according to a fourth embodiment of the present invention.
- FIG. 5 is an explanatory view showing how to use the optical element of FIG.
- FIG. 6 is a schematic side view of an optical element according to a fifth embodiment of the present invention.
- FIG. 5 is a schematic configuration of an optical element according to a sixth embodiment of the present invention.
- FIG. 8 is a perspective view of a three-dimensional structure of a modification of the optical element in FIG.
- FIG. 9 is a schematic plan view of a conventional optical communication device.
- the optical element 11 is made of a translucent material, preferably transparent glass, and has a spherical base 12, and a multilayer filter 1 as an optical film formed on the surface of the base 12. Including 3.
- the multilayer filter 13 is formed, for example, by alternately stacking high-refractive-index dielectric layers and low-refractive-index dielectric layers.
- the multilayer filter 13 has a different thickness depending on the position on the surface of the substrate 12. Specifically, the multilayer film filter 13 is applied to the surface of the substrate 12 from a predetermined direction indicated by an arrow A in FIG. It is formed using a method. Due to such film formation, the film thickness of the multilayer film finoletor 13 formed on the surface of the substrate 12 is different at each part of the surface of the substrate 12 according to the normal angle ⁇ ⁇ ⁇ ⁇ to the film formation direction A.
- the film thickness at the reference position B on the surface of the substrate 12 where the film forming direction A and the normal direction coincide with each other is the largest, and the normal line from the reference position B As the angle ⁇ increases, the film thickness gradually decreases.
- Substrate 1 2 Multilayer filter at surface position at normal angle ⁇ on surface is expressed by the following equation.
- D is the film thickness during vertical film formation (that is, the film thickness at the reference position B).
- the film thickness of the multilayer filter 13 is determined by multiplying the film thickness D at the reference position B by c os ⁇ ⁇ according to the normal angle ⁇ ⁇ ⁇ ⁇ with respect to the film forming direction (the flying direction of the film-formed particles) A.
- the selected wavelength that can be extracted at the surface position at the normal angle ⁇ on the surface of the substrate 12 is expressed by the following equation.
- ⁇ 0 is a design wavelength at the time of vertical film formation.
- the selected wavelength extracted from the multilayer filter 13 can be determined based on the position of the incident light with respect to the multilayer filter 13.
- a multilayer filter 13 is formed around an axis passing through the center (spherical center) ⁇ of the substrate 12. What is necessary is just to rotate the base 12 within the set area.
- the multilayer filter 13 may be formed by a vacuum deposition method, a magnetron sputtering method, an ion beam sputtering method, an ion assist deposition method, or the like, in addition to the sputtering method.
- the optical element 11 of the first embodiment has the following advantages.
- the multilayer filter 13 has a substrate 1 such that its film thickness d varies according to a normal angle 0 to the film forming direction ⁇ (the film thickness varies according to the position on the surface of the substrate 12). 2 is formed on the surface. Therefore, by rotating the base 12 about the axis, the surface position of the multilayer filter 13 on which light enters is changed, and as a result, the selected wavelength ( ⁇ ) extracted from the multilayer filter 13 is changed. 1 to ⁇ ⁇ ) can be easily changed.
- the substrate 12 Since the substrate 12 is made of transparent glass, the substrate 12 is rotated to rotate the multilayer film.
- the wavelength of the light passing through the multilayer filter 13 can be easily changed only by changing the incident position of the light on the filter 13.
- the substrate 12 is a sphere, a multilayer filter 13 whose film thickness is continuously reduced as the normal angle ⁇ from the reference position B increases is obtained. Therefore, the selected wavelength extracted from the multilayer filter 13 can be continuously changed by changing the light incident position on the multilayer filter 13.
- a multilayer filter 13 is formed on the surface of the substrate 12 from a predetermined direction (film formation direction A). Therefore, the film thickness of the multilayer filter 13 varies depending on the normal angle 0 of each part of the surface of the substrate 12. Therefore, the multilayer filter 13 having a variable thickness can be easily formed on the surface of the substrate 12 without performing a difficult film thickness correction technique using a tool such as a correction plate.
- the optical element 20 includes an optical fiber 21, a base 12 A formed at an end of the optical fiber 21, and a multilayer filter 13 A formed on the surface of the base 12 A.
- the substrate 12A is made of a light-transmitting material, preferably transparent glass, and has a cap-like sphere shape.
- the multilayer filter 13A is formed in the same manner as the multilayer filter 13 of the first embodiment.
- the optical element 20 of the second embodiment has the following advantages.
- the film thickness of the multilayer H13 filter 13A differs depending on the position on the surface of the substrate 12A. Therefore, by selecting the transmitted light signal in any direction that passes through the optical fiber 121, the base 12A, and the multilayer filter 13A, the selected wavelength of the light extracted from the multilayer filter 13A can be reduced. Changes are easy. For example, by receiving the transmitted light signal T1 through the optical fiber 22, a transmitted light signal having the wavelength 1 can be selected. By receiving the transmitted light signal T i through the optical fiber 23, a transmitted light signal having a wavelength ⁇ i can be selected. Further, by receiving the transmitted light signal Tn through the optical fiber 24, it is possible to select a transmitted light signal having a wavelength; L ⁇ .
- the child 30 includes a base 31 having a spheroidal shape, and a multilayer film finoletor 13B formed on the surface of the base 31.
- the base 31 is made of a translucent material, preferably transparent glass.
- the surface of the base 31 is formed by rotating the ellipsoid about the major axis of the ellipse.
- the multilayer filter 13A is formed on a surface (spheroid) of the substrate 31 having a relatively small change in radius of curvature from a predetermined direction by a physical vapor phase method such as a sputtering method.
- the multilayer filter 13A is formed on the surface of the base 31 having a spheroidal shape, where the rate of change of the radius of curvature is relatively small. Accordingly, as compared with the first embodiment, the wavelength change ratio ⁇ with respect to the change in the surface position of the multilayer filter 13A is reduced, and the selected wavelength extracted from the multilayer filter 13A is reduced. The selection can be made more finely.
- the optical element 40 includes a base 41 having an octahedral shape and a multilayer filter 13 C formed on an outer peripheral surface (surface) having a plurality of contact surfaces (planes) adjacent to each other at a predetermined angle.
- the multilayer filter 13 C is formed on the plane of the base 41.
- the base 41 is made of a light-transmitting material, preferably transparent glass.
- the multilayer filter 13 C is formed in the same manner as the multilayer filter 13 in FIG.
- the film thickness of the multilayer filter 13C of the first contact surface and the multilayer film finoleta 13C of the second contact surface adjacent to the first contact surface is different. That is, as shown in FIG. 5, the film thickness of the multilayer filter 13 C formed on the contact surface (first side surface) 42 whose normal / normal angle is ⁇ i is represented by ⁇
- the optical element 40 of the fourth embodiment has the following advantages.
- the optical element 40 is rotated to make the multilayer filter 13 C and light is incident.
- the selected wavelength extracted from the filter 13C can be discontinuously changed. Can be changed to
- the optical element 50 has a substrate 52 and a base 51 formed on the substrate 52.
- the base 51 includes a plurality of prism-shaped inclined protrusions 53-57 each having inclined surfaces having different angles.
- the substrate 51 is made of a light-transmitting material, preferably transparent glass.
- a multilayer filter 13D having a film thickness corresponding to each inclination angle is formed on each slope of each of the inclined protrusions 53 to 57. That is, the film thickness of the multilayer filter 13D is different for each inclined surface of the inclined protrusions 53 to 57. That is, the film thickness of the multilayer filter 13D becomes smaller as the inclined surface becomes larger.
- the optical element 50 of the fifth embodiment has the following advantages.
- the film thickness of the multilayer filter 13D differs between adjacent inclined surfaces of the inclined protrusions 53 to 57. Therefore, by sliding the substrate 51 in the direction indicated by the arrow C in FIG. 6 to change one or more inclined surfaces on which the mixed optical signal including a plurality of wavelengths is to be incident, the multilayer filter 1 is formed.
- the selected wavelength extracted from 3D can be changed discontinuously. For example, as shown in FIG. 6, when a mixed optical signal is incident from below the substrate 52 toward the base 51, one or a plurality of inclined projections to which the mixed optical signal is to be incident are selected.
- the wavelength selection device 60 includes a main body 63, and converts the light transmitted through the optical element 61 and the optical fiber 61 into parallel light in the main body 63, and converts the parallel light to the optical element 11 1.
- a collimator lens (parallel light emitting portion) 62 for emitting light is provided.
- the optical fiber 61 is supported by the main body 63 via a capillary 64.
- the wavelength to be selected is changed by rotating the optical element 11 to change the incident position of the parallel light on the multilayer filter 13.
- the wavelength selection device 60 of the sixth embodiment has the following advantages.
- the optical element 11 is arranged in the main body 63, and by rotating the optical element 111 by a movable mechanism or the like, the incident position of the parallel light on the multilayer filter 13 changes, and the optical element 11 is extracted from the optical element 11.
- the selected wavelength of the light to be emitted is changed. Therefore, a tunable device for extracting the selected wavelength is obtained.
- An optical element 30 or 40 may be provided in the main body 63 instead of the optical element 11. In this case, by rotating the optical element 30 or 40, the selected wavelength of light extracted from the optical element is changed.
- the selected wavelength extracted from the optical element 50 can be changed by horizontally moving the optical element 50.
- a multilayer filter 13 is formed on the surface of the base 12 having a spherical shape, a multilayer filter is formed on the outer peripheral surface 71 of a cylindrical body 70 made of, for example, transparent glass as shown in FIG. You can.
- a base 12A made of a hemisphere may be provided at the end of the optical fiber 121.
- a base 41 made of a polyhedron other than the octahedron may be formed.
- the optical fiber 61, the capillary 64, and the collimator lens 62 may be formed from one element.
- the cavities 64 and the collimator lenses 62 may be arrayed.
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Abstract
An optical device produced at lowered cost and having a wavelength selectivity and its manufacturing method are disclosed. The optical device has a base (12) having a curved surface and an optical film (13) formed on the base and having a thickness varying from one position to another on the curved surface. The optical film (13) is formed on the base from a predetermined direction.
Description
波長選択性を有する光学素子及びその製造方法 Optical element having wavelength selectivity and method for manufacturing the same
C技術分野] C technical field]
本発明は、 波長多重通信等の光通信に用いられる光学素子に関し、 特に、 異なる波長 を有する光の多重ィ匕 (合波) 、 あるいは多重ィ匕された光の波長毎の分波に好適な波長選 択性を有する光学素子及びその製造方法に関する。 The present invention relates to an optical element used for optical communication such as wavelength division multiplexing communication, and is particularly suitable for multiplexing (multiplexing) of light having different wavelengths or demultiplexing of multiplexed light for each wavelength. The present invention relates to an optical element having wavelength selectivity and a method for manufacturing the same.
[背景技術] [Background technology]
従来より、 光通信用器材には光ファイバーゃコリメータレンズ等の光学素子が用いら れている。 今後、 光通信が広く普及すると、 光通信用器材の小型化及び集積化がますま す必要となる。 また、 光通信には、 光を波長毎に選択的に透過或いは反射させることに より光を分波する技術が必要となる。 そこで、 例えば、 高屈折率誘電体層と低屈折率誘 電体層とが交互に積層された多層膜フィルタであるエッジフィルタ又は狭帯域フィルタ 等の光学フィルタが提案されている。 Conventionally, optical elements such as an optical fiber / collimator lens have been used for optical communication equipment. As optical communication becomes more widespread in the future, it will become increasingly necessary to downsize and integrate optical communication equipment. In addition, optical communication requires a technology for splitting light by selectively transmitting or reflecting light for each wavelength. Therefore, for example, an optical filter such as an edge filter or a narrow-band filter, which is a multilayer filter in which high-refractive-index dielectric layers and low-refractive-index dielectric layers are alternately stacked, has been proposed.
図 9は、 光学フィルタを用いた従来の光通信用器材 100の概略図である。 光通信用 器材 100は、 8種類の異なる波長を有する光信号 (Ch l〜8) の混合光信号を分波 して複数の光信号を出力する。 光通信用器材 100は、 各々がロッドレンズからなるコ リメータレンズ 101, 102, 104〜119と、 減衰器 103と、 光学フィルタ F 1〜F 9とを含む。減衰器 103は入射光の光強度を所定の値まで減衰させる。 レンズ、 減衰器 103、 及ぴフィルタ間では、 光信号が光ファイバ一を介して送られる。 FIG. 9 is a schematic diagram of a conventional optical communication device 100 using an optical filter. The optical communication device 100 demultiplexes a mixed optical signal of optical signals (Chl to 8) having eight different wavelengths and outputs a plurality of optical signals. The optical communication device 100 includes collimator lenses 101, 102, 104 to 119, each of which is a rod lens, an attenuator 103, and optical filters F1 to F9. The attenuator 103 attenuates the light intensity of the incident light to a predetermined value. An optical signal is sent between the lens, the attenuator 103, and the filter via the optical fiber.
光通信用器材 100に入射した混合光信号は、 まず、 光学フィルタ F 5により透過光 信号 (光信号 Ch 5) と反射光信号 (光信号 Ch l〜4, 6〜8) に分けられる。 透過 光信号である光信号 Ch 5の光強度は、 減衰器 103により所定の値に減衰され、 減衰 器 103から減衰された光信号 Ch 5が出射される。 光学フィルタ F 5の反射光信号で ある光信号 Ch l〜4, 6〜8は、 光学フィルタ F 9により透過光信号 (光信号 Ch 6 〜8) と反射光信号 (光信号 Ch l〜4) とに分けられる。 透過光信号である光信号 C
h 6〜 8は、 光学フィルタ F 6により透過光信号 (光信号 C h 6 ) と反射光信号 (光信 号 Ch 7, 8) とに分けられ、 その透過光信号である光信号 Ch 6はコリメータレンズ 107を通って出射される。一方、光学フィルタ F 6の反射光信号である光信号 Ch 7, 8は、 光学フィルタ F 7により透過光信号 (光信号 C h 7 ) と反射光信号 (光信号 C h 8) とに分けられる。 光信号 Ch 7はコリメータレンズ 109を通って出射され、 光信 号 Ch 8は光学フィルタ F 8を透過し、 コリメータレンズ 111を通って出射される。 光学フィルタ F 9の反射光信号である光信号 Ch:!〜 4は、 光学フィルタ F 1により 透過光信号 (光信号 Ch i) と反射光信号 (光信号 Ch 2〜4) とに分けられ、 光信号 Ch 1はコリメータレンズ 113を通って出射される。 一方、 光学フィルタ F 1の反射 光信号である光信号 Ch 2〜4は、光学フィルタ F 2により透過光信号(光信号 Ch 2) と反射光信号 (光信号 Ch 3, 4) とに分けられ、 光信号 Ch 2はコリメータレンズ 1 15を通って出射される。 一方、 光学フィルタ F 2の反射光信号である光信号 Ch 3, 4は、 光学フィルタ F 3により透過光信号 (光信号 C h 3 ) と反射光信号 (光信号 C h 4) とに分けられる。 透過光信号である光信号 Ch 3はコリメータレンズ 1 17を通つ て出射され、 光学フィルタ F 3の反射光信号である光信号 Ch 4は、 光学フィルタ F 4 を透過し、 コリメータレンズ 119を通って出射される。 . First, the mixed optical signal incident on the optical communication device 100 is separated into a transmitted optical signal (optical signal Ch5) and a reflected optical signal (optical signals Ch1 to 4, 6 to 8) by the optical filter F5. The optical intensity of the optical signal Ch5, which is a transmitted optical signal, is attenuated to a predetermined value by the attenuator 103, and the attenuated optical signal Ch5 is emitted from the attenuator 103. The optical signals Ch 1 to 4 and 6 to 8 which are the reflected light signals of the optical filter F 5 are transmitted by the optical filter F 9 to the transmitted light signal (optical signal Ch 6 to 8) and the reflected light signal (optical signal Ch 1 to 4). And divided into Optical signal C that is the transmitted optical signal h 6 to 8 are separated into a transmitted light signal (optical signal Ch 6) and a reflected light signal (optical signals Ch 7 and 8) by the optical filter F 6, and the transmitted optical signal Ch 6 is a collimator The light exits through the lens 107. On the other hand, the optical signals Ch7 and 8, which are the reflected light signals of the optical filter F6, are separated into a transmitted light signal (optical signal Ch7) and a reflected light signal (optical signal Ch8) by the optical filter F7. . The optical signal Ch 7 is emitted through the collimator lens 109, and the optical signal Ch 8 is transmitted through the optical filter F 8 and emitted through the collimator lens 111. The optical signal Ch :! to 4 which is the reflected light signal of the optical filter F 9 is divided into the transmitted light signal (optical signal Ch i) and the reflected light signal (optical signal Ch 2 to 4) by the optical filter F 1. The optical signal Ch1 is emitted through the collimator lens 113. On the other hand, the optical signals Ch2 to Ch4, which are the reflected optical signals of the optical filter F1, are separated by the optical filter F2 into a transmitted optical signal (optical signal Ch2) and a reflected optical signal (optical signals Ch3, 4). The optical signal Ch 2 is emitted through the collimator lens 115. On the other hand, the optical signals Ch3 and Ch4, which are reflected optical signals of the optical filter F2, are separated into a transmitted optical signal (optical signal Ch3) and a reflected optical signal (optical signal Ch4) by the optical filter F3. . The optical signal Ch3, which is the transmitted light signal, is emitted through the collimator lens 117, and the optical signal Ch4, which is the reflected light signal of the optical filter F3, passes through the optical filter F4 and passes through the collimator lens 119. And is emitted. .
ところで、 図 9の光通信用器材 100は、 下記の問題点を有する。 By the way, the optical communication device 100 of FIG. 9 has the following problems.
(1) 混合光信号を異なる波長を有する光に分けるために、 多数の光学フィルタが必 要となり、 これらの光学フィルタの製膜作業に時間がかかり、 光通信用器材 100の製 造コストが増大する。 (1) A large number of optical filters are required to divide the mixed optical signal into light having different wavelengths, and it takes time to form these optical filters, and the manufacturing cost of optical communication equipment 100 increases. I do.
(2) 複数の光学フィルタを使う場合、 各光信号の強度を略一致させるために光信号 の減衰や増幅を行う必要があり、 その減衰器や増幅器を用!/、ることによりコストが増大 する。 (2) If multiple optical filters are used, it is necessary to attenuate or amplify the optical signal to make the optical signal intensities approximately equal, and the use of the attenuator or amplifier increases the cost. I do.
(3) 多数の光学フィルタを対応する複数のコリメータレンズの端面に個別に組み付 ける必要があり、 しかも、 コリメータレンズは小型であるため光学フィルタの組付け作 業は非常に細かい。 このため、 光通信用器材 100の製造が難しく、 作業効率が低下し て製造コストが増大する。
( 4 ) 各光学フィルタの前後にあるコリメータレンズの光軸を一致させるァライメン ト作業が必要になり、 これらのァライメント作業を光学フィルタの数だけ行う必要があ る。 従って、 光通信用器材 1 0 0の製造コストが増大する。 (3) It is necessary to individually assemble a large number of optical filters on the end faces of a plurality of corresponding collimator lenses. In addition, since the collimator lenses are small, the work of assembling the optical filters is very detailed. For this reason, it is difficult to manufacture the optical communication device 100, and the working efficiency is reduced and the manufacturing cost is increased. (4) Alignment work is required to match the optical axes of the collimator lenses before and after each optical filter, and it is necessary to perform these alignment work by the number of optical filters. Therefore, the manufacturing cost of the optical communication device 100 increases.
[発明の開示] [Disclosure of the Invention]
本発明の目的は、 製造が容易で、 カゝっ製造コストが低減された波長選択性を有する光 学素子及びその製造方法を提供することにある。 SUMMARY OF THE INVENTION An object of the present invention is to provide an optical element having a wavelength selectivity which can be easily manufactured and whose manufacturing cost is reduced, and a method for manufacturing the same.
本発明の第 1の態様では、 波長選択性を有する光学素子が提供される。 光学素子は、 曲面、 或いは複数の平面を有する基体と、 基体の表面上に形成され、 前記曲面或いは複 数の平面上の異なる位置の間で変化する膜厚を有する光学膜とを含む。 According to a first aspect of the present invention, there is provided an optical element having wavelength selectivity. The optical element includes a substrate having a curved surface or a plurality of planes, and an optical film formed on a surface of the substrate and having a film thickness varying between different positions on the curved surface or the plurality of planes.
本発明の第 2の態様では、 波長選択性を有する光学素子の製造方法が提供される。 そ の製造方法は、 曲面、 或いは複数の平面を有する基体を準備する工程と、 基体の表面に 所定の方向から成膜を行うことにより前記曲面或いは複数の平面上の異なる位置の間で 変化する膜厚を有する光学膜を形成する工程とを含む。 According to a second aspect of the present invention, there is provided a method for manufacturing an optical element having wavelength selectivity. The manufacturing method includes a step of preparing a substrate having a curved surface or a plurality of planes, and changing between different positions on the curved surface or the plurality of planes by forming a film on a surface of the substrate from a predetermined direction. Forming an optical film having a thickness.
本発明の第 3の態様では、 光ファイバ一の端部に配置された光学素子が提供される。 光学素子は、 曲面、 或いは複数の平面を有し、 かつ透光性を有する基体と、 基体の表面 上に形成され、 前記曲面或いは複数の平面上の異なる位置の間で変化する膜厚を有する 光学膜とを含む。 According to a third aspect of the present invention, there is provided an optical element disposed at one end of an optical fiber. The optical element has a curved surface or a plurality of planes, and has a light-transmitting substrate, and a film thickness formed on a surface of the substrate and varying between different positions on the curved surface or the plurality of planes. An optical film.
本発明の第 4の態様では、 波長選択デバイスが提供される。 波長選択デバイスは、 光 ファイバーと、 光ファイバ一から出射される光を平行光に変換する平行光出射素子と、 亍光出射素子から出射される平行光を受け取り、 且つ波長選択性を有する光学素子と を含む。 光学素子は、 曲面、 或いは複数の平面を有する基体と、 基体の表面上に形成さ れ、 前記曲面或いは複数の平面上の位置に応じて異なる膜厚を有する光学膜とを含む。 光学素子を回転或いは移動させて光学膜への平行光の入射位置を変ィ匕させることにより、 選択する光の波長が変更可能となる。 [図面の簡単な説明]
本発明を本発明の目的及び特徴とともにより良く理解するため、 添付図面とともに以 下の代表的な実施の形態の記載を参照する。 In a fourth aspect of the present invention, a wavelength selection device is provided. The wavelength selecting device includes: an optical fiber; a parallel light emitting element that converts light emitted from the optical fiber into parallel light; and an optical element that receives parallel light emitted from the light emitting element and has wavelength selectivity. And. The optical element includes a substrate having a curved surface or a plurality of planes, and an optical film formed on the surface of the substrate and having a different thickness depending on the position on the curved surface or the plurality of planes. The wavelength of the light to be selected can be changed by rotating or moving the optical element to change the incident position of the parallel light on the optical film. [Brief description of drawings] For a better understanding of the invention, together with objects and features of the invention, reference is made to the following description of exemplary embodiments, taken in conjunction with the accompanying drawings.
図 1は、 本発明の第 1の実施形態に係る光学素子の概略的な正面図。 FIG. 1 is a schematic front view of an optical element according to a first embodiment of the present invention.
図 2は、 本発明の第 2の実施形態に係る光学素子の概略的な構成図。 FIG. 2 is a schematic configuration diagram of an optical element according to a second embodiment of the present invention.
図 3は、 本発明の第 3の実施形態に係る光学素子の概略的な正面図。 FIG. 3 is a schematic front view of an optical element according to a third embodiment of the present invention.
図 4は、 本発明の第 4の実施形態に係る光学素子の概略的な正面図。 FIG. 4 is a schematic front view of an optical element according to a fourth embodiment of the present invention.
図 5は、 図 4の光学素子の使用方法を示す説明図。 FIG. 5 is an explanatory view showing how to use the optical element of FIG.
図 6は、 本発明の第 5の実施形態に係る光学素子の概略的な側面図。 FIG. 6 is a schematic side view of an optical element according to a fifth embodiment of the present invention.
図 Ίは、 本発明の第 6の実施形態に係る光学素子の概略的な構 図。 FIG. 5 is a schematic configuration of an optical element according to a sixth embodiment of the present invention.
図 8は、 図 1の光学素子の変形例における立体の斜視図。 FIG. 8 is a perspective view of a three-dimensional structure of a modification of the optical element in FIG.
図 9は、 従来の光通信用器材の概略的な平面図。 FIG. 9 is a schematic plan view of a conventional optical communication device.
[発明を実施するための最良の形態] [Best Mode for Carrying Out the Invention]
[第 1の実施形態] [First Embodiment]
本発明の第 1の実施形態に係る光学素子 1 1及びその製造方法を、 図 1に従って説明 する。 光学素子 1 1は、 透光性のある材料、 好ましくは透明なガラスからなり、 かつ球 体形状を有する基体 1 2と、 基体 1 2の表面に形成された光学膜としての多層膜フィル タ 1 3とを含む。 多層膜フィルタ 1 3は、 例えば、 高屈折率誘電体層と低屈折率誘電体 層とを交互に積層することにより形成される。 An optical element 11 according to a first embodiment of the present invention and a method for manufacturing the same will be described with reference to FIG. The optical element 11 is made of a translucent material, preferably transparent glass, and has a spherical base 12, and a multilayer filter 1 as an optical film formed on the surface of the base 12. Including 3. The multilayer filter 13 is formed, for example, by alternately stacking high-refractive-index dielectric layers and low-refractive-index dielectric layers.
多層膜フィルタ 1 3は、 基体 1 2の表面上の位置に応じて異なる膜厚を有する。 具体 的には、 多層膜フィルタ 1 3は、 図 1の矢印 Aで示す所定方向 (以下、 成月莫方向 Aとい う。 ) 力 ら基体 1 2の表面に例えばスパッタリング法等の物理的気相法を用いて成膜さ れる。 このような成膜により、 基体 1 2の表面に形成される多層膜フイノレタ 1 3の膜厚 は、成膜方向 Aに対する法線角度 Θに応じて基体 1 2の表面各部において異なる。即ち、 成膜方向 Aと法線方向とがー致している基体 1 2表面上の基準位置 Bでの膜厚 (垂直成 膜時の膜厚) が最も厚く、 その基準位置 Bからの法線角度 Θが大きくなるにつれて膜厚 が次第に薄くなる。 基体 1 2表面上における、 法線角度 Θの面位置での多層膜フィルタ
1 3の膜厚 dは、 次の式で表される。 The multilayer filter 13 has a different thickness depending on the position on the surface of the substrate 12. Specifically, the multilayer film filter 13 is applied to the surface of the substrate 12 from a predetermined direction indicated by an arrow A in FIG. It is formed using a method. Due to such film formation, the film thickness of the multilayer film finoletor 13 formed on the surface of the substrate 12 is different at each part of the surface of the substrate 12 according to the normal angle に 対 す る to the film formation direction A. That is, the film thickness at the reference position B on the surface of the substrate 12 where the film forming direction A and the normal direction coincide with each other (the film thickness at the time of vertical film formation) is the largest, and the normal line from the reference position B As the angle Θ increases, the film thickness gradually decreases. Substrate 1 2 Multilayer filter at surface position at normal angle Θ on surface The film thickness d of 13 is expressed by the following equation.
d = D c o s Θ d = D c o s Θ
ここで、 Dは垂直成膜時の膜厚 (即ち、 基準位置 Bの膜厚) である。 Here, D is the film thickness during vertical film formation (that is, the film thickness at the reference position B).
こうして、 成膜方向 (成膜粒子の飛来方向) Aに対する法線角度 Θに応じて基準位置 Bの膜厚 Dを c o s Θ倍することによって多層膜フィルタ 1 3の膜厚が決定される。 また、 基体 1 2表面上における、 法線角度 Θの面位置で取り出せる選択波長は、 次の 式で表される。 In this way, the film thickness of the multilayer filter 13 is determined by multiplying the film thickness D at the reference position B by c os 応 じ according to the normal angle に 対 す る with respect to the film forming direction (the flying direction of the film-formed particles) A. The selected wavelength that can be extracted at the surface position at the normal angle Θ on the surface of the substrate 12 is expressed by the following equation.
λ = 0 c 0 s Θ λ = 0 c 0 s Θ
ここで、 λ 0は垂直成膜時の設計波長である。 Here, λ 0 is a design wavelength at the time of vertical film formation.
このようにして、 多層膜フィルタ 1 3に対する入射光の位置により、 多層膜フィルタ 1 3から取り出される選択波長を決定することができる。 また、 フィルタ 1 3の入射光 の位置を変えるには (選択波長を変更するには) 、 例えば、 基体 1 2の中心 (球心) Ο を通る軸線を中心に、 多層膜フィルタ 1 3が形成された領域内で基体 1 2を回転させれ ばよい。 Thus, the selected wavelength extracted from the multilayer filter 13 can be determined based on the position of the incident light with respect to the multilayer filter 13. In order to change the position of the incident light of the filter 13 (to change the selected wavelength), for example, a multilayer filter 13 is formed around an axis passing through the center (spherical center) の of the substrate 12. What is necessary is just to rotate the base 12 within the set area.
なお、 多層膜フィルタ 1 3は、 スパッタリング法以外に、 真空蒸着法、 マグネトロン スパッタ法、 イオンビームスパッタリング法、 イオンアシスト蒸着法等を用いて成膜し てもよい。 The multilayer filter 13 may be formed by a vacuum deposition method, a magnetron sputtering method, an ion beam sputtering method, an ion assist deposition method, or the like, in addition to the sputtering method.
第 1の実施形態の光学素子 1 1は、 以下の利点を有する。 The optical element 11 of the first embodiment has the following advantages.
(ィ) 多層膜フィルタ 1 3は、 その膜厚 dが成膜方向 Αに対する法線角度 0に応じて 異なる (膜厚が基体 1 2の表面上の位置に応じて変化する) ように基体 1 2の表面上に 形成されている。 従って、 軸線を中心に基体 1 2を回転させることにより光が入射する 多層膜フィルタ 1 3の表面位置が変ィ匕して、 この結果、 多層膜フィルタ 1 3から取り出 される選択波長 (λ 1〜λ η ) の変更が容易となる。 (A) The multilayer filter 13 has a substrate 1 such that its film thickness d varies according to a normal angle 0 to the film forming direction Α (the film thickness varies according to the position on the surface of the substrate 12). 2 is formed on the surface. Therefore, by rotating the base 12 about the axis, the surface position of the multilayer filter 13 on which light enters is changed, and as a result, the selected wavelength (λ) extracted from the multilayer filter 13 is changed. 1 to λ η) can be easily changed.
(口) 多層膜フィルタ 1 3のみで選択波長が変更されるので、 従来技術のように多数 の光学フィルタを使用する必要がない。 したがって、 製造が容易で、 製造コストが低減 された光学素子 1 1が得られる。 (Mouth) Since the selected wavelength is changed only by the multilayer filter 13, it is not necessary to use a large number of optical filters as in the prior art. Therefore, the optical element 11 that can be easily manufactured and has a reduced manufacturing cost can be obtained.
(ハ) 基体 1 2は透明なガラスで作られているので、 基体 1 2を回転させて多層膜フ
ィルタ 1 3に対する光の入射位置を変えるだけで、 多層膜フィルタ 1 3を透過する光の 波長を容易に変更することができる。 (C) Since the substrate 12 is made of transparent glass, the substrate 12 is rotated to rotate the multilayer film. The wavelength of the light passing through the multilayer filter 13 can be easily changed only by changing the incident position of the light on the filter 13.
(二) 基体 1 2が球体であるので、 基準位置 Bからの法線角度 Θが大きくなるにつれ てその膜厚が連続的に薄くなる多層膜フィルタ 1 3が得られる。 したがって、 多層膜フ イノレタ 1 3に対する光の入射位置を変えることにより、 多層膜フィルタ 1 3から取り出 される選択波長を連続的に変更することができる。 (2) Since the substrate 12 is a sphere, a multilayer filter 13 whose film thickness is continuously reduced as the normal angle Θ from the reference position B increases is obtained. Therefore, the selected wavelength extracted from the multilayer filter 13 can be continuously changed by changing the light incident position on the multilayer filter 13.
(ホ) 基体 1 2の表面に多層膜フィルタ 1 3が所定方向 (成膜方向 A) から成膜され る。 従って、 基体 1 2表面各部の法線角度 0に応じて多層膜フィルタ 1 3の膜厚が変ィ匕 する。 したがって、 補正板等の道具を使った難しい膜厚補正技術を行うことなく、 変ィ匕 する膜厚を有する多層膜フィルタ 1 3を基体 1 2の表面に容易に形成することができる。 (E) A multilayer filter 13 is formed on the surface of the substrate 12 from a predetermined direction (film formation direction A). Therefore, the film thickness of the multilayer filter 13 varies depending on the normal angle 0 of each part of the surface of the substrate 12. Therefore, the multilayer filter 13 having a variable thickness can be easily formed on the surface of the substrate 12 without performing a difficult film thickness correction technique using a tool such as a correction plate.
[第 2の実施形態] [Second embodiment]
次に、 本発明の第 2の実施形態に係る光学素子 2 0を図 2に従って説明する。 光学素 子 2 0は、 光ファイバ一 2 1と、 光ファイバ一 2 1の端部に形成された基体 1 2 Aと、 基体 1 2 Aの表面に形成された多層膜フィルタ 1 3 Aとを備える。 基体 1 2 Aは、 透光 性のある材料、 好ましくは透明なガラスからなり、 カゝっ球体形状を有する。 多層膜フィ ルタ 1 3 Aは、 第 1実施形態の多層膜フィルタ 1 3と同様の方法で形成される。 Next, an optical element 20 according to a second embodiment of the present invention will be described with reference to FIG. The optical element 20 includes an optical fiber 21, a base 12 A formed at an end of the optical fiber 21, and a multilayer filter 13 A formed on the surface of the base 12 A. Prepare. The substrate 12A is made of a light-transmitting material, preferably transparent glass, and has a cap-like sphere shape. The multilayer filter 13A is formed in the same manner as the multilayer filter 13 of the first embodiment.
第 2実施形態の光学素子 2 0は、 以下の利点を有する。 The optical element 20 of the second embodiment has the following advantages.
(へ) 多層 H莫フィルタ 1 3 Aの膜厚は、 基体 1 2 Aの表面上の位置に応じて異なる。 従って、 光ファイバ一 2 1、 基体 1 2 A及び多層膜フィルタ 1 3 Aを透過する任意の方 向の透過光信号を選ぶことにより、 多層膜フィルタ 1 3 Aから取り出される光の選択波 長の変更が容易となる。例えば、透過光信号 T 1を光ファイバ 2 2で受けることにより、 波長え 1を有する透過光信号を選択することができる。 透過光信号 T iを光ファイバ 2 3で受けることにより、 波長 λ iを有する透過光信号を選択することができる。 更に、 透過光信号 T nを光ファイバ 2 4で受けることにより、 波長; L ηを有する透過光信号を 選択することができる。 (F) The film thickness of the multilayer H13 filter 13A differs depending on the position on the surface of the substrate 12A. Therefore, by selecting the transmitted light signal in any direction that passes through the optical fiber 121, the base 12A, and the multilayer filter 13A, the selected wavelength of the light extracted from the multilayer filter 13A can be reduced. Changes are easy. For example, by receiving the transmitted light signal T1 through the optical fiber 22, a transmitted light signal having the wavelength 1 can be selected. By receiving the transmitted light signal T i through the optical fiber 23, a transmitted light signal having a wavelength λ i can be selected. Further, by receiving the transmitted light signal Tn through the optical fiber 24, it is possible to select a transmitted light signal having a wavelength; Lη.
[第 3の実施形態] [Third embodiment]
次に、 本発明の第 3の実施形態に係る光学素子 3 0を図 3に従って説明する。 光学素
子 3 0は、 回転楕円体形状を有する基体 3 1と、 基体 3 1の表面に形成された多層膜フ イノレタ 1 3 Bとを備える。 基体 3 1は、 透光性のある材料、 好ましくは透明なガラスか らなる。 基体 3 1の表面は、 楕円の長軸を中心に楕円面を回転することによって形成さ れる。 多層膜フィルタ 1 3 Aは、 曲率半径が変化する割合の比較的小さい基体 3 1の表 面 (回転楕円面) に所定方向からスパッタリング法等の物理的気相法を用いて成膜され る。 Next, an optical element 30 according to a third embodiment of the present invention will be described with reference to FIG. Optical element The child 30 includes a base 31 having a spheroidal shape, and a multilayer film finoletor 13B formed on the surface of the base 31. The base 31 is made of a translucent material, preferably transparent glass. The surface of the base 31 is formed by rotating the ellipsoid about the major axis of the ellipse. The multilayer filter 13A is formed on a surface (spheroid) of the substrate 31 having a relatively small change in radius of curvature from a predetermined direction by a physical vapor phase method such as a sputtering method.
第 3実施形態によれば、 以下の利点を有する。 According to the third embodiment, the following advantages are provided.
回転楕円体形状を有する基体 3 1の曲率半径の変化割合の比較的小さい表面に多層膜 フィルタ 1 3 Aが形成されている。 従って、 第 1の実施形態と比較して、 多層膜フィル タ 1 3 Aの表面位置の変化に対する波長の変ィ匕率 Δ λが小さくなり、 多層膜フィルタ 1 3 Β力ら取り出される選択波長の選択をより細かく行うことができる。 The multilayer filter 13A is formed on the surface of the base 31 having a spheroidal shape, where the rate of change of the radius of curvature is relatively small. Accordingly, as compared with the first embodiment, the wavelength change ratio Δλ with respect to the change in the surface position of the multilayer filter 13A is reduced, and the selected wavelength extracted from the multilayer filter 13A is reduced. The selection can be made more finely.
[第 4の実施形態] [Fourth embodiment]
本発明の第 4の実施形態に係る光学素子 4 0を図 4及び図 5に従って説明する。 光学 素子 4 0は、 8面体形状を有する基体 4 1と、 互いに所定の角度にて隣接する複数の接 面 (平面) を有する外周面 (表面) に形成された多層膜フィルタ 1 3 Cとを備える。 即 ち、 多層膜フィルタ 1 3 Cは、 基体 4 1の平面上に形成されている。 基体 4 1は、 透光 性のある材料、 好ましくは透明なガラスからなる。 多層膜フィルタ 1 3 Cは、 図 1の多 層膜フィルタ 1 3と同様の方法で形成される。 8面体である基体 4 1の外周面のうち、 第 1の接面の多層膜フィルタ 1 3 Cの膜厚と第 1の接面と隣接する第 2の接面の多層膜 フイノレタ 1 3 Cの膜厚が異なる。 即ち、 図 5に示すように、 その法/線角度が Θ iである 接面 (第 1の側面) 4 2に形成される多層膜フィルタ 1 3 Cの膜厚は、 その法線角度が θ η ( θ η > θ i ) である接面 4 3 (隣接する第 2の側面) に形成される多層膜フィル タ 1 3 Cの B莫厚より大きい。 An optical element 40 according to a fourth embodiment of the present invention will be described with reference to FIGS. The optical element 40 includes a base 41 having an octahedral shape and a multilayer filter 13 C formed on an outer peripheral surface (surface) having a plurality of contact surfaces (planes) adjacent to each other at a predetermined angle. Prepare. That is, the multilayer filter 13 C is formed on the plane of the base 41. The base 41 is made of a light-transmitting material, preferably transparent glass. The multilayer filter 13 C is formed in the same manner as the multilayer filter 13 in FIG. Of the outer peripheral surface of the base 41, which is an octahedron, the film thickness of the multilayer filter 13C of the first contact surface and the multilayer film finoleta 13C of the second contact surface adjacent to the first contact surface The film thickness is different. That is, as shown in FIG. 5, the film thickness of the multilayer filter 13 C formed on the contact surface (first side surface) 42 whose normal / normal angle is Θi is represented by θ The multilayer filter 13C formed on the contact surface 43 (adjacent second side surface) where η (θ η> θ i) is larger than B in thickness.
第 4実施形態の光学素子 4 0は、 以下の利点を有する。 The optical element 40 of the fourth embodiment has the following advantages.
多角形基体 4 1の外周面において各接面 (隣接する側面) の多層膜フィルタ 1 3 Cの 膜厚が異なるので、 光学素子 4 0を回転させて多層膜フィルタ 1 3 Cにして光が入射す る表面位置を変えることにより、 フィルタ 1 3 Cから取り出される選択波長を非連続的
に変更することができる。 Since the thickness of the multilayer filter 13 C at each contact surface (adjacent side surface) on the outer peripheral surface of the polygonal base 41 is different, the optical element 40 is rotated to make the multilayer filter 13 C and light is incident. By changing the surface position, the selected wavelength extracted from the filter 13C can be discontinuously changed. Can be changed to
[第 5の実施形態] [Fifth Embodiment]
本発明の第 5の実施形態に係る光学素子 5 0を図 6に従って説明する。 光学素子 5 0 は、 基板 5 2と、 基板 5 2上に形成された基体 5 1とを有する。 基体 5 1は、 角度の異 なる傾斜面をそれぞれ有する複数のプリズム型の傾斜突部 5 3 - 5 7を含む。 基体 5 1 は、 透光性のある材料、 好ましくは透明なガラスからなる。 傾斜突部 5 3〜 5 7の各ィ頃 斜面には、 各々の傾斜角度に応じた膜厚を有する多層膜フィルタ 1 3 Dが形成されてい る。即ち、多層膜フィルタ 1 3 Dの膜厚は、傾斜突部 5 3〜5 7の各傾斜面毎に異なる。 即ち、 傾斜角度の大きい傾斜面ほど多層膜フィルタ 1 3 Dの膜厚が小さくなつている。 第 5実施形態の光学素子 5 0は、 以下の利点を有する。 An optical element 50 according to a fifth embodiment of the present invention will be described with reference to FIG. The optical element 50 has a substrate 52 and a base 51 formed on the substrate 52. The base 51 includes a plurality of prism-shaped inclined protrusions 53-57 each having inclined surfaces having different angles. The substrate 51 is made of a light-transmitting material, preferably transparent glass. A multilayer filter 13D having a film thickness corresponding to each inclination angle is formed on each slope of each of the inclined protrusions 53 to 57. That is, the film thickness of the multilayer filter 13D is different for each inclined surface of the inclined protrusions 53 to 57. That is, the film thickness of the multilayer filter 13D becomes smaller as the inclined surface becomes larger. The optical element 50 of the fifth embodiment has the following advantages.
多層膜フィルタ 1 3 Dの膜厚は、 傾斜突部 5 3〜5 7の隣接する傾斜面間で異なる。 このため、 基体 5 1を図 6の矢印 Cで示す方向にスライドさせて、 複数の波長を含む混 合光信号を入射させるべき 1つあるいは複数の傾斜面を変えることにより、 多層膜フィ ルタ 1 3 Dから取り出される選択波長を非連続的に変更することができる。 例えば、 図 6に示すように混合光信号を基板 5 2の下方から基体 5 1に向かって入射させる場合、 その混合光信号を入射させるべき 1つあるいは複数の傾斜突部が選択される。 そして、 選択された傾斜突部の傾斜面に対して垂直方向に透過する光を受光することにより、 混 合光信号が透過した傾斜面の膜厚に応じた波長を有する光を取り出すことができる。 これとは逆に、 傾斜突部 5 3〜5 7の上方から基体 5 1に向かって混合光信号を入射 させる場合、 その混合光信号を入射させるべき 1つあるいは複数の傾斜突部が選択され る。 そして、 選択された傾斜突部の傾斜面に対して垂直方向に透過する光を受光するこ とにより、 混合光信号が透過した傾斜面の膜厚に応じた波長を有する光を取り出すこと ができる。 The film thickness of the multilayer filter 13D differs between adjacent inclined surfaces of the inclined protrusions 53 to 57. Therefore, by sliding the substrate 51 in the direction indicated by the arrow C in FIG. 6 to change one or more inclined surfaces on which the mixed optical signal including a plurality of wavelengths is to be incident, the multilayer filter 1 is formed. The selected wavelength extracted from 3D can be changed discontinuously. For example, as shown in FIG. 6, when a mixed optical signal is incident from below the substrate 52 toward the base 51, one or a plurality of inclined projections to which the mixed optical signal is to be incident are selected. Then, by receiving light that is transmitted in a direction perpendicular to the inclined surface of the selected inclined protrusion, light having a wavelength corresponding to the film thickness of the inclined surface through which the mixed optical signal has passed can be extracted. . Conversely, when a mixed optical signal is incident on the base 51 from above the inclined projections 53 to 57, one or a plurality of inclined projections to which the mixed optical signal is to be incident are selected. You. Then, by receiving light that is transmitted in a direction perpendicular to the inclined surface of the selected inclined protrusion, light having a wavelength corresponding to the film thickness of the inclined surface through which the mixed optical signal has passed can be extracted. .
[第 6の実施形態] [Sixth embodiment]
次に、 光学素子 1 1 (図 1 ) , 3 0 (図 3 ) , 4 0 (図 4 ) 及ぴ 5 0 (図 6 ) のいず れか 1つを用いた本発明の第 6実施形態の波長選択デバイス 6 0を、 図 7に従って説明 する。
波長選択デバィス 6 0は本体 6 3を含み、 本体 6 3内には光学素子 1 1と、 光フアイ バー 6 1を介して送られる光を平行光に変換し、 平行光を光学素子 1 1へ出射するコリ メータレンズ (平行光出射部) 6 2とが設けられている。 光ファイバ一 6 1は、 キヤピ ラリ 6 4を介して本体 6 3に支持されている。 光学素子 1 1を回転させて多層膜フィル タ 1 3に対する平行光の入射位置を変化させることにより、選択する波長が変更される。 第 6実施形態の波長選択デバィス 6 0は、 以下の利点を有する。 Next, a sixth embodiment of the present invention using one of the optical elements 11 (FIG. 1), 30 (FIG. 3), 40 (FIG. 4) and 50 (FIG. 6). The wavelength selection device 60 will be described with reference to FIG. The wavelength selection device 60 includes a main body 63, and converts the light transmitted through the optical element 61 and the optical fiber 61 into parallel light in the main body 63, and converts the parallel light to the optical element 11 1. A collimator lens (parallel light emitting portion) 62 for emitting light is provided. The optical fiber 61 is supported by the main body 63 via a capillary 64. The wavelength to be selected is changed by rotating the optical element 11 to change the incident position of the parallel light on the multilayer filter 13. The wavelength selection device 60 of the sixth embodiment has the following advantages.
本体 6 3内に光学素子 1 1を配置し、 その光学素子 1 1を可動機構等により回転させ ることにより多層膜フィルタ 1 3に対する平行光の入射位置が変化して、 光学素子 1 1 から取り出される光の選択波長が変更される。 したがって、 選択された波長を取り出す 波長可変デパイスが得られる。 The optical element 11 is arranged in the main body 63, and by rotating the optical element 111 by a movable mechanism or the like, the incident position of the parallel light on the multilayer filter 13 changes, and the optical element 11 is extracted from the optical element 11. The selected wavelength of the light to be emitted is changed. Therefore, a tunable device for extracting the selected wavelength is obtained.
光学素子 1 1に代えて、 光学素子 3 0或いは 4 0を本体 6 3内に設けてもよい。 この 場合、 光学素子 3 0或いは 4 0を回転させることにより、 光学素子から取り出される光 の選択波長が変更される。 An optical element 30 or 40 may be provided in the main body 63 instead of the optical element 11. In this case, by rotating the optical element 30 or 40, the selected wavelength of light extracted from the optical element is changed.
図 6の光学素子 5 0を本体 6 3内に設ける場合、 光学素子 5 0を水平移動させること により、 光学素子 5 0から取り出される選択波長を変更することができる。 When the optical element 50 of FIG. 6 is provided in the main body 63, the selected wavelength extracted from the optical element 50 can be changed by horizontally moving the optical element 50.
本発明の精神及ぴ範囲から逸脱することなく、 本発明が他の代替例に具体ィ匕され得る ことは当業者にとって明らかである。 特に、 本発明は以下のように変更されてもよい。 球体形状を有する基体 1 2の表面に多層膜フィルタ 1 3を形成する代わりに、 図 8に 示すように例えば透明なガラスからなる円柱体 7 0の外周面 7 1に多層膜フィルタを形 成してもよレ、。 It will be apparent to one skilled in the art that the present invention may be embodied in other alternatives without departing from the spirit and scope of the invention. In particular, the present invention may be modified as follows. Instead of forming the multilayer filter 13 on the surface of the base 12 having a spherical shape, a multilayer filter is formed on the outer peripheral surface 71 of a cylindrical body 70 made of, for example, transparent glass as shown in FIG. You can.
第 2の実施形態において、 光ファイバ一 2 1の端部に半球体からなる基体 1 2 Aを設 けてもよい。, In the second embodiment, a base 12A made of a hemisphere may be provided at the end of the optical fiber 121. ,
第 4の実施形態において、 8面体以外の多面体からなる基体 4 1を形成してもよい。 第 6の実施形態において、 光フアイパー 6 1と、 キヤビラリ 6 4と、 コリメータレン ズ 6 2とを 1つの素子から形成してもよい。 In the fourth embodiment, a base 41 made of a polyhedron other than the octahedron may be formed. In the sixth embodiment, the optical fiber 61, the capillary 64, and the collimator lens 62 may be formed from one element.
また、 キヤビラリ 6 4、 コリメータレンズ 6 2はアレイ状であってもよレヽ。
In addition, the cavities 64 and the collimator lenses 62 may be arrayed.
Claims
1. 波長選択性を有する光学素子 (11, 20, 30, 40, 50, 60) であつ て、 1. An optical element (11, 20, 30, 40, 50, 60) having wavelength selectivity,
曲面、 或レヽは複数の平面を有する基体 (12, 12 A, 31, 41, 51) と、 前記基体の表面上に形成され、 前記曲面或いは複数の平面上の位置に応じて変化する 膜厚を有する光学膜 (13, 13A, 13B, 13C, 13D) とを備える光学素子。 A curved surface or a layer having a plurality of planes, a substrate (12, 12A, 31, 41, 51), and a film thickness formed on the surface of the substrate and varying according to the position on the curved surface or the plurality of planes An optical element comprising: an optical film (13, 13A, 13B, 13C, 13D) having:
2. 請求項 1に記載の光学素子において、 光学膜は、 基体の表面上の所定の基準位 置に対する法線角度が大きくなるにつれて薄くなるような膜厚を有する。 2. The optical element according to claim 1, wherein the optical film has a thickness such that the optical film becomes thinner as a normal angle to a predetermined reference position on the surface of the substrate increases.
3. 請求項 1又は 2に記載の光学素子において、 前記基体は透光性を有する。 3. The optical element according to claim 1, wherein the base has a light transmitting property.
4. 請求項 1〜 3のいずれ力一項に記載の光学素子において、 前記基体は、 球体或 いは楕円体である。 4. The optical element according to any one of claims 1 to 3, wherein the base is a sphere or an ellipsoid.
5. 請求項:!〜 3のいずれか一項に記載の光学素子において、 前記基体は、 多面体 である。 5. Claim :! In the optical element according to any one of (1) to (3), the base is a polyhedron.
6. 請求項 1〜 3の!/、ずれか一項に記載の光学素子にぉレ、て、 前記基体は、 基板 (52) と、 6. The optical element according to any one of claims 1 to 3, wherein the base is a substrate (52);
前記基板上に配置され、 各々が角度の異なる傾斜面を有する複数の傾斜突部 (53〜 57) とを有する。 A plurality of inclined protrusions (53 to 57) each having an inclined surface having a different angle disposed on the substrate.
7. 波長選択性を有する光学素子 (11, 20, 30, 40, 50, 60) の製造 方法であって、 ' 曲面、 或いは複数の平面を有する基体 (12, 12 A, 31, 41, 51) を準備す
る工程と、 7. A method for producing an optical element (11, 20, 30, 40, 50, 60) having wavelength selectivity, comprising: 'a substrate having a curved surface or a plurality of flat surfaces (12, 12A, 31, 41, 51, 51); Prepare Process,
前記基体の表面に所定の方向から成膜を行うことにより前記曲面或いは複数の平面上 の異なる位置の間で変ィ匕する膜厚を有する光学膜 (13, 13A, 13B, 13 C, 1 3D) を形成する工程とを備える光学素子の製造方法。 An optical film (13, 13A, 13B, 13C, 13D) having a film thickness that changes between different positions on the curved surface or a plurality of planes by forming a film on the surface of the substrate from a predetermined direction. A) forming an optical element.
8. 請求項 7に記載の光学素子の製造方法において、前記光学膜を形成する工程は、 基体の表面上の所定の基準位置に対する法線角度が大きくなるにつれてその膜厚が薄く なるように光学膜を形成することを含む。 8. In the method of manufacturing an optical element according to claim 7, the step of forming the optical film is performed such that the film thickness decreases as the normal angle to a predetermined reference position on the surface of the substrate increases. Forming a film.
9. 請求項 7又は 8に記載の光学素子の製造方法にぉレ、て、 前記基体は透光性を有す る。 9. According to the method for manufacturing an optical element according to claim 7 or 8, the base has a light-transmitting property.
10. 請求項 7〜 9のいずれか一項に記載の光学素子の製造方法にぉレ、て、 前記基 体は、 球体或いは楕円体である。 10. In the method of manufacturing an optical element according to any one of claims 7 to 9, wherein the base is a sphere or an ellipsoid.
11. 請求項 7〜 9のレ、ずれ力一項に記載の光学素子の製造方法にお!/、て、 前記基 体は、 多面体である。 11. The method for manufacturing an optical element according to claim 7, wherein the substrate is a polyhedron.
12. 請求項 7〜 9のいずれ力一項に記載の光学素子の製造方法にぉレ、て、 前記基 体は、 12. The method for producing an optical element according to any one of claims 7 to 9, wherein the base is:
基板 (52) と、 Substrate (52),
前記基板上に配置され、 各々が角度の異なる傾斜面を有する複数の傾斜突部 (53〜 A plurality of inclined projections (53 to 53) each having an inclined surface having a different angle disposed on the substrate;
57) とを有する。 57)
13. 光ファイバ一の端部に配置された光学素子 (11, 20, 30, 40, 50,13. The optical element (11, 20, 30, 40, 50,
60) であって、 60)
曲面、 或いは複数の平面を有し、 力つ透光性を有する基体 (12, 12A, 31, 4
1, 51) と、 A substrate that has a curved surface or a plurality of flat surfaces and is light-transmissive (12, 12A, 31, 4 1, 51)
前記基体の表面上に形成され、 前記曲面或いは複数の平面上の異なる位置の間で変ィ匕 する膜厚を有する光学膜 (13, 13A, 13B, 13 C, 13D) とを備える光学素 子。 An optical film (13, 13A, 13B, 13C, 13D) formed on the surface of the substrate and having a film thickness changing between different positions on the curved surface or the plurality of planes. .
14. 波長選択デバィス (60) であって、 14. A wavelength selection device (60),
光ファイバ一 (61) と、 Optical fiber (61),
光ファイバ一から出射される光を平行光に変換する 光出射素子 (62) と、 平行光出射素子から出射される平行光を受け取り、 且つ波長選択性を有する光学素子 (11, 30, 40, 50) と、 当該光学素子は、 A light emitting element (62) for converting light emitted from the optical fiber into parallel light, and an optical element (11, 30, 40, 40) for receiving parallel light emitted from the parallel light emitting element and having wavelength selectivity. 50) and the optical element is
曲面、 或いは所定の角度で隣接する複数の平面を有する基体 (12, 31, 41, 51) と、 A substrate (12, 31, 41, 51) having a curved surface or a plurality of planes adjacent at a predetermined angle;
前記基体の表面上に形成され、 前記曲面或レ、は複数の平面上の異なる位置の間で変 化する膜厚を有する光学膜 (13, 13B, 13C, 13D) とを含み、 前記光学素子 を回転或いは移動させて前記光学膜への平行光の入射位置を変ィ匕させることにより、 選 択する光の波長が変更可能である波長選択デバィス。 An optical film (13, 13B, 13C, 13D) formed on a surface of the substrate, wherein the curved surface or the layer has a film thickness that changes between different positions on a plurality of planes; A wavelength selection device that can change the wavelength of the light to be selected by rotating or moving to change the incident position of the parallel light on the optical film.
15. 請求項 14に記載の波長選択デパイスにおいて、 光学膜は、 基体の表面上の 所定の基準位置に対する法線角度が大きくなるにつれて薄くなるような膜厚を有する。 15. In the wavelength selection device according to claim 14, the optical film has a film thickness that becomes thinner as the normal angle to a predetermined reference position on the surface of the substrate increases.
16. 請求項 14又は 15に記載の波長選択デバィスにお!/、て、 前記基体は透光性 を有する。 16. A wavelength selective device according to claim 14 or 15! / The base has translucency.
17. 請求項 14〜 16のいずれか一項に記載の波長選択デバイスにおいて、 前記 基体は、 球体或いは楕円体である。 17. The wavelength selection device according to any one of claims 14 to 16, wherein the base is a sphere or an ellipsoid.
18. 請求項 14〜: L 6のいずれか一項に記載の波長選択デバィスにお 、て、 前記
基体は、 多面体である。 18. Claim 14-: In the wavelength selection device according to any one of L6, The substrate is a polyhedron.
19. 請求項 14〜 16のいずれか一項に記載の波長選択デパイスにおいて、 前記 基体は、 19. The wavelength selection device according to any one of claims 14 to 16, wherein the substrate comprises:
基板 (52) と、 Substrate (52),
前記基板上に配置され、 各々が角度の異なる傾斜面を有する複数の傾斜突部 (53〜 57) とを有する。
And a plurality of inclined projections (53 to 57) arranged on the substrate, each having an inclined surface having a different angle.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000212555A JP2002022939A (en) | 2000-07-13 | 2000-07-13 | Optical element having wavelength selectivity, method for manufacturing the same, and wavelength selective device |
| JP2000-212555 | 2000-07-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2002006862A1 true WO2002006862A1 (en) | 2002-01-24 |
Family
ID=18708466
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2001/006012 WO2002006862A1 (en) | 2000-07-13 | 2001-07-11 | Optical device having wavelength selectivity and its manufacturing method |
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| Country | Link |
|---|---|
| JP (1) | JP2002022939A (en) |
| WO (1) | WO2002006862A1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US9826356B2 (en) | 2015-09-02 | 2017-11-21 | Estimote Polska Sp. Z O. O. | Systems and methods for object tracking with wireless beacons |
| US9998863B2 (en) | 2013-08-19 | 2018-06-12 | Estimote Polska Sp. Z O. O. | System and method for providing content using beacon systems |
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| US9998863B2 (en) | 2013-08-19 | 2018-06-12 | Estimote Polska Sp. Z O. O. | System and method for providing content using beacon systems |
| US9826356B2 (en) | 2015-09-02 | 2017-11-21 | Estimote Polska Sp. Z O. O. | Systems and methods for object tracking with wireless beacons |
| US9930486B2 (en) | 2015-09-02 | 2018-03-27 | Estimote Polska Sp. Z O. O. | Systems and methods for object tracking with wireless beacons |
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|---|---|
| JP2002022939A (en) | 2002-01-23 |
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