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WO1997008595A1 - Device for compensating guide tolerance in multi-axis positioners - Google Patents

Device for compensating guide tolerance in multi-axis positioners Download PDF

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Publication number
WO1997008595A1
WO1997008595A1 PCT/DE1996/001149 DE9601149W WO9708595A1 WO 1997008595 A1 WO1997008595 A1 WO 1997008595A1 DE 9601149 W DE9601149 W DE 9601149W WO 9708595 A1 WO9708595 A1 WO 9708595A1
Authority
WO
WIPO (PCT)
Prior art keywords
measuring
deviation
guide
axis
inclination
Prior art date
Application number
PCT/DE1996/001149
Other languages
German (de)
French (fr)
Inventor
Hans-Jürgen HESSE
Original Assignee
Hesse Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hesse Gmbh filed Critical Hesse Gmbh
Priority to EP96922733A priority Critical patent/EP0847548A1/en
Priority to AU63526/96A priority patent/AU6352696A/en
Publication of WO1997008595A1 publication Critical patent/WO1997008595A1/en

Links

Classifications

    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00Programme-control systems
    • G05B19/02Programme-control systems electric
    • G05B19/18Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
    • G05B19/401Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by control arrangements for measuring, e.g. calibration and initialisation, measuring workpiece for machining purposes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/25Movable or adjustable work or tool supports
    • B23Q1/44Movable or adjustable work or tool supports using particular mechanisms
    • B23Q1/56Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism
    • B23Q1/60Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism
    • B23Q1/62Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides
    • B23Q1/621Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides a single sliding pair followed perpendicularly by a single sliding pair
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q17/00Arrangements for observing, indicating or measuring on machine tools
    • B23Q17/24Arrangements for observing, indicating or measuring on machine tools using optics or electromagnetic waves

Definitions

  • the invention relates to a device for guiding tolerance compensation on multi-axis positioners, a second guiding bracket being displaceably or pivotably mounted on a first guiding bracket with respect to a first axis by means of an associated positioning drive, and a further guiding bracket or on the second guide bracket with respect to a second axis an object is mounted displaceably or pivotably by an associated positioning drive and the respective displacement on the guide supports is continuously determined by an associated coordinate measuring device.
  • the object-side positioning device for example a so-called cross support
  • the latter works in its direction of positioning, ie towards the cross support, just as precisely as its direct or indirect, ie spindle-related, scale and the associated measuring device are designed.
  • the object-side positioning device works in the same direction in relation to the movable object as the associated scale and the measuring system cooperates with it.
  • the position of the object in the two directions based on a fixed basis, differs from the specifications of the two measuring systems, which are each transverse to the positioning directions in the associated guides.
  • the same problem occurs twice with three-axis positioning, since the respective position measurement value indicates the position between the object and the base, each with guide deviations lying in two different guides.
  • Such a multi-axis positioning device has become known from DE 43 12 255 AI.
  • This publication describes an x, y coordinate table in which a y guide plate is arranged on a y base plate with the interposition of actuators and on which there is an x base plate which can be moved in the y direction.
  • the movement of the x-base plate is realized by a nut-spindle gear, whereby a y-guide rod with an associated y-guide bearing is additionally provided.
  • On the x-base plate there is also an x-guide plate, on which a table element is mounted displaceably in the x direction via a further nut-spindle gear.
  • any adjustment of the coordinate table in the x or y direction leads to a slight change in position in the z direction.
  • These changes in position are corrected with the aid of measuring devices which actuate the actuators, so that they can carry out an opposite change in position to compensate for the changes in z-position.
  • Such a coordinate table is therefore technically very complex to implement.
  • the solution is that at least one measuring radiator with a narrow aperture is arranged parallel to the guide on each of the guide carriers and a deviation measuring device is arranged on each of the guided parts of the individual measuring beams so that their deviation measuring signal each transverses at least one position deviation signaled to the direction of the incident measuring beam.
  • narrowly focused beams e.g. Laser beams
  • receivers measuring the tolerance ranges of the respective guides, the measured values of which are output in each case the transverse deviation state the position of the guided part in at least one of the other axial directions.
  • the base-related object position for the individual axis directions thus results in each case as a sum of the position measurement value in the relevant axis and the position deviation measurement value (s) lying in the same direction and measured by the further position device (s) .
  • the respective sums relating to the corresponding coordinate direction are supplied to the associated position controllers as actual coordinate values.
  • the measuring beam is preferably sent coaxially to the axis of rotation, for example through a hollow axis, and directed onto a two-dimensionally operating offset measuring device on the part which is mounted in a rotatable manner.
  • the assignment of the light transmitter, for example the laser, and the measuring receiver to the two mutually positionable parts is arbitrary, but the pivoting of the guided part that occurs in the guide has a much smaller effect on the accuracy of the measurements of the deviation when the receiver on the ge ⁇ led part is arranged.
  • An arrangement with a beam and with a two-dimensional receiver e.g. a two-dimensional CCD array.
  • the center of the beam can be determined from the image data of the beam thus obtained and its coordinates can be obtained as the two dimensions of the deviations.
  • the coordinates are expediently measured with reference to those initial coordinates which are recorded in a basic positioning position used for calibration.
  • pure relative position measurements and relative positioning can also be carried out without prior calibration to a specific starting position.
  • linear arrays of photosensitive cells can also be used, whereby optical means and / or suitable evaluation must ensure that deviations in only one direction affect the measurement in this direction of deviation and the deviation in the other direction does not cause the beam to leave the linear array feed area.
  • the length of a conventional CCD array with, for example, 256 or 512 positions is greater than the length of the deviation range to be recorded. For this reason, the beam path is expanded in this direction towards the end positions in such a way that there is roughly a match between the two lengths.
  • a cylindrical scattering optics or also a collecting optics can be used if the array is arranged behind the focal point.
  • the simplest way to adapt the deviation range to the length of the linear array is to arrange the array at an angle.
  • a collection of the beam paths in this area is made focusing on the array by placing a correspondingly cylindrical converging lens in this direction or a cylindrical concave mirror in the beam path.
  • a collecting and a scattering optical element In general, one will cross a collecting and a scattering optical element, so that extensive use of the beam always occurs in the entire array area.
  • the array output signals are each evaluated by determining a center of gravity with respect to the beam component that is incident in each case, that is to say on its central position.
  • the radiation source When using the method it is a prerequisite for achieving usable deviation measurement values that the beam is always in a defined position in space.
  • the radiation source must advantageously be arranged on the guide or so that the measuring beam is always parallel to this.
  • the radiation source is attached particularly simply to the end of the guide or the guide support and if the latter are subject to a noticeably changing deflection when the load changes, then accordingly a different inclination of the support ends and thus the radiation source mounted there also usually occurs.
  • a resulting beam inclination to the guideway leads to a change in the deviation measurement depending on the distance from the radiation source to the Sensor array.
  • This change can advantageously be determined and corrected by pointing a part of the beam or a parallel beam over the preferably entire length of the guide track to an inclination measuring array.
  • an inclination correction value is formed in relation to the travel distance to the length of the inclination measurement beam, which value must be added to the position deviation measurement value in order to relate the position of the positioned part to an original basis even in the case of a load-dependent change in beam inclination.
  • Such inclination changes will usually occur in the load direction, that is to say in particular in the vertical direction, and therefore i.a. the inclination sensor should also be provided there.
  • a beam split by a beam splitter can be passed on partly to the deviation sensor and partly to the inclination sensor.
  • the sensor preferably consists of a linear array with a beam spread by suitable inclination of the sensor. Since i.a. in the event of a load a change in inclination occurs only in one direction, the Z direction, the measuring beam need not be focused in the transverse direction.
  • Fig. 1 shows a section of a two-axis positioning device
  • Fig. 3 shows a tilt measuring device schematically.
  • FIG. 1 shows a two-axis positioning device in an XY plane with two deviation measuring devices AMX, AMZ1 per positioning device; AMY, AMZ2, each with a laser beam light source S1-S4 and with one positioning device, one axis position measuring device APX, APY, which consists of a measuring ruler LX, LY and an associated coordinate sensor exist.
  • the two coordinate drives consist of motors MX, MY, which are controlled by a position control device ST.
  • Setpoint values Xsoll, Ysoll are fed to this positioning device, which are continuously compared with the actual position values Xist, Yist for a controlled position control, so that the differences between the setpoint and actual values are used as the controller control variable of the motors MX, MY serve.
  • the actual position signal of the X positioning Xactual results from the sum of the X coordinate measurement value SPX and the deviation measurement signal SMX lying in the X direction; The same applies to the actual position signal Yact in the Y direction.
  • the corresponding reference characters contain the letter Y.
  • the two deviation values SMZ1, SMZ2 in the Z direction are also summed and used as a Z coordinate deviation DZ. Depending on the application, these can be omitted. If there is also a Z positioning device, this is provided with further X or Y coordinate deviation measuring devices, and their measured values are also added to the rectified sums.
  • the various deviation measuring devices AMX, AMZ1; AMY, AMZ2 are designed as linear CCD arrays and connected to the control device ST via a multiplexer MPX, so that the signal sequences from the arrays are read out and evaluated one after the other and then fed to the sum formation.
  • the switching elements shown are preferably implemented by a program in the control device ST equipped with a microprocessor.
  • the two linear sensor arrays of each axis positioner can also be replaced by a two-dimensional array. Then only a single measuring source S1, S3 is required for this.
  • the measuring radiators S1, S2; S3, S4 are each mounted on the head on the guides FX, FY and the deviation measuring device AMX, AMZ1; AMY, AMZ2 are each arranged on the slides mounted thereon, the cross slide K or the object slide 0.
  • FIG. 2 shows a first sensor arrangement with a measuring emitter S1, the laser beam of which strikes the deviation measuring device AMY, which is mounted on the cross slide K, parallel to the X axis and to the guide FX.
  • beam scattering is provided via a cylindrical arched mirror WS.
  • a concave curvature can be superimposed on the convex cylinder rotated by 90 °, so that in the event of positional deviations perpendicular to the image plane, the measuring beam always falls on the linear array LSA and does not migrate laterally beyond it.
  • the sensor array LSA is preceded by a cylinder lens ZL whose cylinder axis is parallel to the array LSA and whose focal line lies on it.
  • FIG. 3 shows an arrangement of a long guide support FX with a cross slide K.
  • the measuring source S1 is mounted at the end of the support FX and on the slide K the deviation sensor AMZ1, which in particular determines the load deflection of the support FX. Since the ends of the carrier F incline towards an unloaded starting position during load deflection, the beam path S1 'also inclines to the same extent, whereby the deviation sensor AMZ1 measures the deviation with respect to the inclined measuring beam S1 and not to the output beam path.
  • a parallel beam S1 is therefore advantageously guided to an inclination sensor NZ at the other end of the carrier FX.
  • Its inclination measurement value SNZ is proportional to the length LS 'of the first measurement section of the first measurement beam S1", which is known as the X-displacement measurement signal SPX, and fed in reverse proportion to the length LS "of the second measuring beam S1" to the Z coordinate summer, as are the Z deviation values SMZ1, SMZ2 and possibly a Z coordinate measurement value SPZ, so that a Z actual value Zi ⁇ t is available as the summation result and can be used in the control device ST with a Z coordinate setpoint Zsetpoint to control the controlled actuation of a Z positioning motor.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Human Computer Interaction (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

A device for compensating guide tolerance in multi-axis positioners in which a second guide substrate (FY) can be moved or pivoted on a first guide substrate (FX) in relation to a first axis (X) and a further guide substrate or an object (O) can move or pivot via an appropriate positioning drive (MY) on the second guide substrate (FY) in relation to a second axis (Y) and the movement on the guide substrates (FX, FY) is continuously detected by an appropriate coordinate measuring device (APX, APY), where at least one measuring emitter (S1-S4) with a narrow aperture is fitted on the guide substrates (FX, FY) oriented parallel to the guide, and on the guided component (FY, O) on which the individual measuring beams impinge is arranged a deviation measuring device (AMX, AMY, AMZ1, AMZ2) in such a way that its deviation measurement signal (SMX, SMY, SMZ1, SMZ2) indicates at least one position deviation transversely to the direction of the impinging measuring beam.

Description

Vorrichtung zum Führungstoleranzausgleich bei Mehrachsen- positionierern Device for compensating guide tolerances in multi-axis positioners
Die Erfindung betrifft eine Vorrichtung zum Führungstoleranz¬ ausgleich an Mehrachsenpositionierern, wobei auf einem ersten Führungsträger bezüglich einer ersten Achse ein zweiter Füh¬ rungsträger durch einen zugehörigen Positionierantrieb ver- schieblich oder verschwenkbar gelagert ist und an dem zweiten Führungsträger bezüglich einer zweiten Achse ein weiterer Führungsträger oder ein Objekt durch einen zugehörigen Posi¬ tionierantrieb verschieblich oder verschwenkbar gelagert ist und die jeweilige Verschiebung auf den Führungsträgern durch eine jeweils zugehörige Koordinatenmeßvorrichtung laufend ermittelt wird.The invention relates to a device for guiding tolerance compensation on multi-axis positioners, a second guiding bracket being displaceably or pivotably mounted on a first guiding bracket with respect to a first axis by means of an associated positioning drive, and a further guiding bracket or on the second guide bracket with respect to a second axis an object is mounted displaceably or pivotably by an associated positioning drive and the respective displacement on the guide supports is continuously determined by an associated coordinate measuring device.
Bekanntlich ist in Mehrachsenpositioniersystemen, z.B. X-/Y-Tischen, Portalen, Meßmaschinen, Positioniereinrichtun- gen, in denen hochgenaues Anfahren einer Position gefordert wird, die erreichbare Genauigkeit der Positionierung abhängig von den Toleranzen der Achsführungen. Toleranzen treten sowohl in vertikaler als auch in der horizontalen Richtung der Füh¬ rungen, d.h. jeweils quer zu der Positionierrichtung, auf. Extreme Genauigkeitsanforderungen an Führungen, wie sie bei¬ spielsweise bei Meßmaschinen gestellt werden, erhöhen den Systempreis erheblich, und solche Führungen sind beispiels¬ weise aufgrund zu geringer Tragzahlen für den Einsatz in Be¬ arbeitungsmaschinen ungeeignet.It is known in multi-axis positioning systems, e.g. X- / Y-tables, portals, measuring machines, positioning devices in which a highly precise approach to a position is required, the achievable accuracy of the positioning depending on the tolerances of the axis guides. Tolerances occur both in the vertical and in the horizontal direction of the guides, i.e. each transverse to the positioning direction. Extreme accuracy requirements for guides, such as those placed on measuring machines, for example, increase the system price considerably, and such guides are unsuitable for use in processing machines, for example, because the load capacities are too low.
Wird ein Objekt, z.B. ein Meßstift oder Werkzeug, in zwei Achsen in Bezug auf eine ruhende Basis positioniert, so wird die objektseitige Positioniervorrichtung, z.B. ein sogenannter Kreuzsupport, von der basisseitigen Positioniereinrichtung getragen und verfahren. Letztere arbeitet in ihrer Positio¬ nierrichtung, also auf den Kreuzsupport zu, so genau wie ihr direkter oder indirekter, d. h. spindelbezogener, Maßstab und die zugehörige Meßvorrichtung ausgebildet ist. In der zweiten Richtung arbeitet die objektseitige Positioniervorrichtung ebenso in Bezug auf das verfahrbare Objekt so genau wie der zugehörige Maßstab ist und das Meßsystem damit zusammenarbei¬ tet. Die Position des Objektes weist in den beiden Richtungen bezogen auf eine feste Basis jedoch gegenüber den Angaben der beiden Meßsysteme die Abweichung auf, die jeweils quer zu den Positionierrichtungen in den zugehörigen Führungen liegen. Das gleiche Problem tritt bei einer Dreiachsenpositionierung je¬ weils doppelt auf, da der jeweilige Positionsmeßwert die Lage zwischen dem Objekt und der Basis je mit in zwei verschiedenen Führungen liegenden Führungsabweichungen behaftet angibt.If an object, for example a measuring pin or tool, is positioned in two axes with respect to a stationary base, the object-side positioning device, for example a so-called cross support, is carried and moved by the base-side positioning device. The latter works in its direction of positioning, ie towards the cross support, just as precisely as its direct or indirect, ie spindle-related, scale and the associated measuring device are designed. In the second The object-side positioning device works in the same direction in relation to the movable object as the associated scale and the measuring system cooperates with it. However, the position of the object in the two directions, based on a fixed basis, differs from the specifications of the two measuring systems, which are each transverse to the positioning directions in the associated guides. The same problem occurs twice with three-axis positioning, since the respective position measurement value indicates the position between the object and the base, each with guide deviations lying in two different guides.
Eine solche Mehrachsenpositioniervorrichtung ist aus der DE 43 12 255 AI bekannt geworden. In dieser Druckschrift wird ein x-, y-Koordinatentisch beschrieben, bei dem auf einer y- Basisplatte unter Zwischenschaltung von Aktuatoren eine y- Führungsplatte angeordnet ist, auf der sich eine in y-Richtung bewegbare x-Basisplatte befindet. Die Bewegung der x-Basis- platte wird durch ein Mutter-Spindel-Getriebe realisiert, wobei zusätzlich noch eine y-Führungsstange mit einem zugehö¬ rigen y-Führungslager vorgesehen ist. Auf der x-Basisplatte befindet sich weiterhin eine x-Führungsplatte, auf der über ein weiteres Mutter-Spindel-Getriebe ein Tischelement in x- Richtung verschieblich gelagert iεt. Da die Gewindespindel und die Führungsstangen nicht auf einen exakten Rundlauf gearbei¬ tet sein können, führt jede Verstellung des Koordinatentisches in x- oder y-Richtung zu einer geringfügigen Lageänderung in z-Richtung. Die Korrektur dieser Lageänderungen erfolgt mit Hilfe von Meßvorrichtungen, die die Aktuatoren betätigen, so daß diese eine entgegengesetzte Lageänderung zur Kompensation der z-Lageänderungen ausführen können. Ein derartiger Koordi¬ natentisch ist damit technisch nur sehr aufwendig zu realisie¬ ren.Such a multi-axis positioning device has become known from DE 43 12 255 AI. This publication describes an x, y coordinate table in which a y guide plate is arranged on a y base plate with the interposition of actuators and on which there is an x base plate which can be moved in the y direction. The movement of the x-base plate is realized by a nut-spindle gear, whereby a y-guide rod with an associated y-guide bearing is additionally provided. On the x-base plate there is also an x-guide plate, on which a table element is mounted displaceably in the x direction via a further nut-spindle gear. Since the threaded spindle and the guide rods cannot be machined to an exact concentricity, any adjustment of the coordinate table in the x or y direction leads to a slight change in position in the z direction. These changes in position are corrected with the aid of measuring devices which actuate the actuators, so that they can carry out an opposite change in position to compensate for the changes in z-position. Such a coordinate table is therefore technically very complex to implement.
Es ist Aufgabe der Erfindung, mit einfachen Mitteln eine ba¬ sisbezogene wesentlich genauere Mehrachsenpositionierung eines Objektes auch bei statischer oder lastbedingter Verformung der Führung zu erbringen. Die Lösung besteht darin, daß auf den Führungsträgern jeweils mindestens ein Meßstrahler mit enger Apertur parallel zur Führung ausgerichtet angeordnet ist und an dem jeweils geführ¬ ten Teil von den einzelnen Meßstrahlen beaufschlagt jeweils eine Abweichungsmeßvorrichtung so angeordnet ist, daß deren Abweichungsmeßsignal jeweils mindestens eine Lageabweichung quer zur Richtung des auftreffenden Meßstrahls signalisiert.It is an object of the invention to provide a base-related, substantially more precise multi-axis positioning of an object with simple means, even with static or load-related deformation of the guide. The solution is that at least one measuring radiator with a narrow aperture is arranged parallel to the guide on each of the guide carriers and a deviation measuring device is arranged on each of the guided parts of the individual measuring beams so that their deviation measuring signal each transverses at least one position deviation signaled to the direction of the incident measuring beam.
Vorteilhafte Ausgestaltungen sind in den Unteransprüchen ange- geben.Advantageous configurations are given in the subclaims.
Für die Messung der jeweiligen Führungsabweichungen werden vorzugsweise eng gebündelte Strahlen, z.B. Laserstrahlen, einmal von der Basis an dem Führungsträger zum Kreuzsupport hin und zum zweiten von letzterem zum Objekttisch hinaus ge¬ sendet und jeweils da bzw. dort mit, die Toleranzbereiche der jeweiligen Führungen meßtechnisch erfassenden, Empfängern aufgenommen, deren abgegebenen Meßwerte jeweils die Querabwei¬ chung der Lage des geführten Teiles in mindestens einer der jeweils anderen Achsrichtungen angeben.For the measurement of the respective guide deviations, narrowly focused beams, e.g. Laser beams, once sent from the base on the guide support to the cross support and the second from the latter to the object table and recorded there and there with receivers measuring the tolerance ranges of the respective guides, the measured values of which are output in each case the transverse deviation state the position of the guided part in at least one of the other axial directions.
Die basisbezogene Objektlage ergibt sich für die einzelnen Achsrichtungen somit jeweils als eine Summe aus dem Positions¬ meßwert in der betreffenden Achse und der oder den Lageabwei- chungsmeßwerten, die in der gleichen Richtung liegen und von der (den) weiteren Positionsvorrichtung(en) gemessen werden.The base-related object position for the individual axis directions thus results in each case as a sum of the position measurement value in the relevant axis and the position deviation measurement value (s) lying in the same direction and measured by the further position device (s) .
Bei einem Meßsystem, bei dem eine Positionierung auf ein ba¬ sisgelagertes Meßobjekt beispielsweise mit einem Meßfühler erfolgt, lassen sich die genannten Summen unmittelbar als genaue, basisbezogene Koordinatenmeßwerte verwenden.In the case of a measuring system in which positioning is carried out on a base-mounted measurement object, for example with a sensor, the sums mentioned can be used directly as precise, base-related coordinate measurement values.
Für eine basisbezogene Positionierung eines Objektes mit Posi¬ tionsreglern werden die jeweiligen Summen, die die entspre- chende Koordinatenrichtung betreffen, als Ist-Koordinatenwerte den zugehörigen Positionsreglern zugeführt.For a base-related positioning of an object with position controllers, the respective sums relating to the corresponding coordinate direction are supplied to the associated position controllers as actual coordinate values.
Die Abweichungen der Lage des positionierbaren Objektes lassen sich für Achsen entlang denen das zu positionierende Teil geführt wird, als auch für Dreh- oder Schwenkachsen messen und zur Ergänzung der gleichgerichteten Positionsmeßwerte verwen¬ den. Bei der Messung der Lageabweichungen von rotatorisch zu positionierenden Teilen, wird der Meßstrahl bevorzugt koaxial zur Drehachse, z.B. durch eine Hohlachse geschickt und auf eine zweidimensional arbeitende Versatzmeßvorrichtung am dreh¬ bar gelagerten Teil gerichtet. Prinzipiell ist die Zuordnung des Lichtsenders, z.B. des Lasers, und des Meßempfängers zu den beiden zueinander positionierbaren Teilen beliebig, jedoch wirken sich in der Führung auftretende Verschwenkungen des geführten Teiles wesentlich geringer auf die Genauigkeit der Messungen der Abweichung auf, wenn der Empfänger auf dem ge¬ führten Teil angeordnet ist.Leave the deviations in the position of the positionable object are measured for axes along which the part to be positioned is guided, as well as for rotary or swivel axes and used to supplement the rectified position measurement values. When measuring the positional deviations of parts to be positioned in rotation, the measuring beam is preferably sent coaxially to the axis of rotation, for example through a hollow axis, and directed onto a two-dimensionally operating offset measuring device on the part which is mounted in a rotatable manner. In principle, the assignment of the light transmitter, for example the laser, and the measuring receiver to the two mutually positionable parts is arbitrary, but the pivoting of the guided part that occurs in the guide has a much smaller effect on the accuracy of the measurements of the deviation when the receiver on the ge ¬ led part is arranged.
Besonders einfach ist eine Anordnung mit einem Strahl und mit einem zweidimensional arbeitenden Empfänger, z.B. einem zwei¬ dimensionalen CCD-Array. Aus den damit gewonnenen Bilddaten des Strahles läßt sich der Strahlmittelpunkt ermitteln und dessen Koordinaten als die beiden Maße der Abweichungen gewin¬ nen. Die Koordinaten werden zweckmäßig bezüglich solcher An¬ fangskoordinaten gemessen, die in einer zur Eichung dienenden Positioniergrundstellung aufgenommen werden. Selbstverständ¬ lich lassen sich auch reine Relativpositionsmessungen und Relativpositionierungen vornehmen ohne daß vorher eine Eichung auf eine bestimmte Ausgangsposition vorgenommen wird.An arrangement with a beam and with a two-dimensional receiver, e.g. a two-dimensional CCD array. The center of the beam can be determined from the image data of the beam thus obtained and its coordinates can be obtained as the two dimensions of the deviations. The coordinates are expediently measured with reference to those initial coordinates which are recorded in a basic positioning position used for calibration. Of course, pure relative position measurements and relative positioning can also be carried out without prior calibration to a specific starting position.
Statt eines zweidimensionalen Meßarrays lassen sich auch li¬ neare Arrays von lichtempfindlichen Zellen verwenden, wobei durch optische Mittel und/oder geeignete Auswertung dafür gesorgt werden muß, daß jeweils Abweichungen in nur einer Richtung sich auf die Messung in dieser Abweichungsrichtung auswirken und die Abweichung in der anderen Richtung nicht dazu führt, daß der Strahl den Einzugsbereich des linearen Arrays verläßt.Instead of a two-dimensional measuring array, linear arrays of photosensitive cells can also be used, whereby optical means and / or suitable evaluation must ensure that deviations in only one direction affect the measurement in this direction of deviation and the deviation in the other direction does not cause the beam to leave the linear array feed area.
Im allgemeinen ist davon auszugehen, daß die Länge eines übli¬ chen CCD-Arrays mit z.B. 256 oder 512 Positionen größer ist als die Längenausdehnung des zu erfassenden Abweichungsbe¬ reichs . Aus diesem Grund wird in dieser Richtung eine Sprei¬ zung des Strahlverlaufs zu den Endpositionen hin so vorgenom¬ men, daß etwa eine Übereinstimmung der beiden Längen vorliegt. Hierzu kann eine zylindrische Streuoptik oder auch eine Sam¬ meloptik, wenn das Array hinter dem Brennpunkt angeordnet wird, benutzt werden.In general, it can be assumed that the length of a conventional CCD array with, for example, 256 or 512 positions is greater than the length of the deviation range to be recorded. For this reason, the beam path is expanded in this direction towards the end positions in such a way that there is roughly a match between the two lengths. For this purpose, a cylindrical scattering optics or also a collecting optics can be used if the array is arranged behind the focal point.
Die einfachste Art, eine Anpassung des Abweichungsbereiches an die Länge des linearen Arrays vorzunehmen, ist es, das Array unter einem Winkel geneigt anzuordnen.The simplest way to adapt the deviation range to the length of the linear array is to arrange the array at an angle.
Weiterhin kann dann, wenn senkrecht, d.h. quer, zu dem Array ein größerer Abweichungsbereich als die Arraybreite gegeben ist, eine Sammlung der Strahlengänge in diesem Bereich fokos- sierend auf das Array vorgenommen werden, indem eine in dieser Richtung entsprechend zylindrische Sammellinse oder ein zylin¬ drischer Hohlspiegel in den Strahlengang gesetzt wird. Im allgemeinen wird man also jeweils ein sammelndes und ein streuendes optisches Element kreuzen, so daß im ganzen Array- bereich stets eine weitgehende Ausnutzung des Strahls auf¬ tritt. Die Arrayausgangssignale werden jeweils durch eine Schwerpunktsermittlung bezüglich des jeweils auftreffenden Strahlanteils, also auf dessen Mittenlage, ausgewertet.Furthermore, when vertical, i.e. transversely, to the array there is a larger deviation range than the array width, a collection of the beam paths in this area is made focusing on the array by placing a correspondingly cylindrical converging lens in this direction or a cylindrical concave mirror in the beam path. In general, one will cross a collecting and a scattering optical element, so that extensive use of the beam always occurs in the entire array area. The array output signals are each evaluated by determining a center of gravity with respect to the beam component that is incident in each case, that is to say on its central position.
Bei der Anwendung des Verfahrens ist es zur Erreichung brauch¬ barer Abweichungsmeßwerte eine Vorraussetzung, daß der Strahl stets eine definierte Lage im Raum hat. Dies bedeutet, daß die Strahlenquelle vorteilhaft so an der Führung oder so zu dieser angeordnet sein muß, daß der Meßstrahl stets parallel zu die¬ ser ist. Wird die Strahlenquelle jedoch besonders einfach am Ende der Führung oder des Führungsträgers befestigt und unter¬ liegen letztere bei veränderter Belastung einer merklich wech¬ selnden Durchbiegung, so tritt demgemäß gewöhnlich auch eine unterschiedliche Neigung der Trägerenden und damit der dort montierten Strahlungsquelle auf. Eine dadurch auftretende Strahlneigung zur Führungsbahn führt zu einer Veränderung der Abweichungsmessung abhängig vom Abstand der Strahlenquelle zum Sensorarray. Diese Veränderung läßt sich vorteilhaft bestimmen und korrigieren, indem ein Teil des Strahles oder ein paralleler Strahl über die vorzugsweise ganze Länge der Füh¬ rungsbahn auf ein Neigungsmeßarray gerichtet wird. Mit dessen Neigungsmeßsignal wird im Verhältnis des Verfahrweges zur Länge des Neigungsmeßstrahles ein Neigungskorrekturwert ge¬ bildet, der zu dem Lageabweichungsmeßwert summiert werden muß, um die Position des positionierten Teiles auch bei lastabhän¬ giger Strahlneigungsänderung auf eine Ursprungsbasis zu bezie- hen.When using the method it is a prerequisite for achieving usable deviation measurement values that the beam is always in a defined position in space. This means that the radiation source must advantageously be arranged on the guide or so that the measuring beam is always parallel to this. However, if the radiation source is attached particularly simply to the end of the guide or the guide support and if the latter are subject to a noticeably changing deflection when the load changes, then accordingly a different inclination of the support ends and thus the radiation source mounted there also usually occurs. A resulting beam inclination to the guideway leads to a change in the deviation measurement depending on the distance from the radiation source to the Sensor array. This change can advantageously be determined and corrected by pointing a part of the beam or a parallel beam over the preferably entire length of the guide track to an inclination measuring array. With its inclination measurement signal, an inclination correction value is formed in relation to the travel distance to the length of the inclination measurement beam, which value must be added to the position deviation measurement value in order to relate the position of the positioned part to an original basis even in the case of a load-dependent change in beam inclination.
Gewöhnlich werden solche Neigungsänderungen in der Lastrich¬ tung, also insbesondere in der Vertikalen, auftreten, und deshalb ist i.a. dort der Neigungssensor zusätzlich vorzuse- hen. Es kann ein Strahl durch einen Strahlteiler gesplittet teilweise zu dem Abweichungssensor und teilweise zu dem Nei¬ gungssensor weitergeführt werden. Der Sensor besteht zur Nei¬ gungsmessung vorzugsweise aus einem Lineararray mit einer Strahlspreizung durch geeignete Neigung des Sensors. Da i.a. bei einer Belastung eine Neigungsänderung nur in einer Rich¬ tung, der Z-Richtung, auftritt, ist eine Fokussierung des Meßstrahles in der Querrichtung dazu nicht erforderlich.Such inclination changes will usually occur in the load direction, that is to say in particular in the vertical direction, and therefore i.a. the inclination sensor should also be provided there. A beam split by a beam splitter can be passed on partly to the deviation sensor and partly to the inclination sensor. For the inclination measurement, the sensor preferably consists of a linear array with a beam spread by suitable inclination of the sensor. Since i.a. in the event of a load a change in inclination occurs only in one direction, the Z direction, the measuring beam need not be focused in the transverse direction.
Vorteilhafte Ausgestaltungen sind in den Figuren 1 bis 3 dar- gestellt.Advantageous configurations are shown in FIGS. 1 to 3.
Fig.l zeigt einen Abschnitt einer Zweiachsenpositionier- vorrichtung;Fig. 1 shows a section of a two-axis positioning device;
Fig. 2 zeigt eine Sensoranordnung vergrößert;2 shows an enlarged sensor arrangement;
Fig. 3 zeigt eine Neigungsmeßvorrichtung schematisch.Fig. 3 shows a tilt measuring device schematically.
Figur 1 zeigt eine Zweiachsen-Positioniervorrichtung in einer X-Y-Ebene mit pro Positioniervorrichtung zwei Abweichungsme߬ vorrichtungen AMX, AMZ1; AMY, AMZ2 mit je einer Laserstrahl¬ lichtquelle Sl - S4 und mit pro Positioniervorrichtung einer Achspositionsmeßvorrichtung APX, APY, die aus einem Meßlineal LX, LY und einem zugehörigen Koordinatensensor bestehen. Die beiden Koordinatenantriebe bestehen aus Motoren MX, MY, die von einer Positionssteuervorrichtung ST angesteuert werden. Dieser Positioniervorrichtung werden Soll-Positionswerte Xsoll,Ysoll zugeführt, die für eine geregelte Positionsan¬ steuerung mit den Ist-Positionswerten Xist, Yist laufend ver¬ glichen werden, so daß jeweils die Differenzen der Soll- und Ist-Werte als Regeler-Ansteuergröße der Motoren MX, MY dienen.FIG. 1 shows a two-axis positioning device in an XY plane with two deviation measuring devices AMX, AMZ1 per positioning device; AMY, AMZ2, each with a laser beam light source S1-S4 and with one positioning device, one axis position measuring device APX, APY, which consists of a measuring ruler LX, LY and an associated coordinate sensor exist. The two coordinate drives consist of motors MX, MY, which are controlled by a position control device ST. Setpoint values Xsoll, Ysoll are fed to this positioning device, which are continuously compared with the actual position values Xist, Yist for a controlled position control, so that the differences between the setpoint and actual values are used as the controller control variable of the motors MX, MY serve.
Das Ist-Positionssignal der X-Positionierung Xist ergibt εich aus der Summe des X-Koordinatenmeßwertes SPX und dem in X-Richtung liegenden Abweichungsmeßsignal SMX; entsprechendes gilt für das Ist-Positionssignal Yist in der Y-Richtung. Die entsprechenden Referenzzeichen enthalten den Buchstaben Y.The actual position signal of the X positioning Xactual results from the sum of the X coordinate measurement value SPX and the deviation measurement signal SMX lying in the X direction; The same applies to the actual position signal Yact in the Y direction. The corresponding reference characters contain the letter Y.
Die beiden Abweichungswerte SMZ1, SMZ2 in der Z-Richtung wer¬ den ebenfalls summiert und als Z-Koordinatenabweichung DZ weiterverwertet. Je nach Anwendung können diese entfallen. Ist auch eine Z-Positionierungsvorrichtung vorhanden, εo wird diese mit weiteren X- bzw. Y-Koordinatenabweichungs-Meßvor- richtungen versehen, und auch deren Meßwerte den gleichge¬ richteten Summen hinzusummiert.The two deviation values SMZ1, SMZ2 in the Z direction are also summed and used as a Z coordinate deviation DZ. Depending on the application, these can be omitted. If there is also a Z positioning device, this is provided with further X or Y coordinate deviation measuring devices, and their measured values are also added to the rectified sums.
Die verschiedenen Abweichungs-Meßvorrichtungen AMX, AMZ1; AMY, AMZ2 sind als lineare CCD-Arrays ausgebildet und über einen Multiplexer MPX an die Steuervorrichtung ST angeschlosεen, so daß die Signalfolgen aus den Arrays nacheinander ausgelesen und ausgewertet werden und dann der Summenbildung zugeführt werden. Die dargestellten Schaltelemente sind vorzugsweise in der mit einem Mikroprozessor ausgerüsteten Steuervorrichtung ST durch ein Programm realisiert.The various deviation measuring devices AMX, AMZ1; AMY, AMZ2 are designed as linear CCD arrays and connected to the control device ST via a multiplexer MPX, so that the signal sequences from the arrays are read out and evaluated one after the other and then fed to the sum formation. The switching elements shown are preferably implemented by a program in the control device ST equipped with a microprocessor.
Die beiden linearen Sensorarrays jedes Achspositionierers können auch jeweils durch ein zweidimensionales Array ersetzt werden. Es ist dann dafür jeweils nur ein einziger Meßstrahler Sl, S3 erforderlich. Die gezeigten Meßstrahler Sl, S2; S3, S4 sind jeweils kopfsei¬ tig an den Führungen FX, FY montiert und die Abweichungs-Me߬ vorrichtung AMX, AMZ1; AMY, AMZ2 jeweils an den darauf gela¬ gerten Schlitten, dem Kreuzschlitten K bzw. dem Objektschlit- ten 0 angeordnet.The two linear sensor arrays of each axis positioner can also be replaced by a two-dimensional array. Then only a single measuring source S1, S3 is required for this. The measuring radiators S1, S2; S3, S4 are each mounted on the head on the guides FX, FY and the deviation measuring device AMX, AMZ1; AMY, AMZ2 are each arranged on the slides mounted thereon, the cross slide K or the object slide 0.
Figur 2 zeigt eine erste Sensoranordnung mit einem Meßstrahler Sl, dessen Laserstrahl parallel zur X-Achse und zur Führung FX auf die Abweichungs-Meßvorrichtung AMY fällt, die an dem Kreuzschlitten K montiert ist. Zur Anpassung des maximalen Toleranzbereiches T der zu messenden Abweichung an die Länge L des linearen Sensorarrays LSA ist eine Strahlstreuung über einen zylindrischen Wölbspiegel WS vorgesehen.FIG. 2 shows a first sensor arrangement with a measuring emitter S1, the laser beam of which strikes the deviation measuring device AMY, which is mounted on the cross slide K, parallel to the X axis and to the guide FX. In order to adapt the maximum tolerance range T of the deviation to be measured to the length L of the linear sensor array LSA, beam scattering is provided via a cylindrical arched mirror WS.
Dem konvexen Zylinder kann um 90° gedreht eine konkave Wölbung überlagert sein, so daß bei Lageabweichungen senkrecht zur Bildebene der Meßstrahl stets auf das lineare Array LSA fällt und nicht seitlich darüber hinauswandert. Im vorliegenden Beispiel ist stattdessen dem Sensorarray LSA eine Zylinderlin- se ZL vorgeordnet, deren Zylinderachse parallel zum Array LSA liegt und deren Brennlinie darauf liegt.A concave curvature can be superimposed on the convex cylinder rotated by 90 °, so that in the event of positional deviations perpendicular to the image plane, the measuring beam always falls on the linear array LSA and does not migrate laterally beyond it. In the present example, the sensor array LSA is preceded by a cylinder lens ZL whose cylinder axis is parallel to the array LSA and whose focal line lies on it.
Figur 3 zeigt eine Anordnung eines langen Führungsträgers FX mit einem Kreuzschlitten K. Endseitig des Trägers FX ist der Meßstrahler Sl montiert und auf dem Schlitten K der Abwei¬ chungssensor AMZ1, der insbesondere die Lastdurchbiequng des Trägers FX ermittelt. Da bei der Lastdurchbiequng die Enden des Trägers F sich gegen eine unbelastete Ausgangslage neigen, neigt sich in gleichem Maße auch der Strahlverlauf Sl', wo- durch der Abweichungssensor AMZ1 die Abweichung bezüglich des geneigten Meßstrahles Sl und nicht zum Ausgangsstrahlenverlauf mißt. Deshalb ist vorteilhaft ein Parallelstrahl Sl" zum ande¬ rem Ende des Trägers FX auf einen Neigungssensor NZ geführt. Dessen Neigungsmeßwert SNZ wird proportional zur Länge LS ' der ersten Meßstrecke des ersten Meßstrahles Sl', die als das X-Wegmeßsignal SPX bekannt ist, und umgekehrt proportional zur Länge LS" des zweiten Meßstrahles Sl" dem Z-Koordinaten-Sum- mierer zugeführt, ebenso wie die Z-Abweichungswerte SMZ1, SMZ2 und ggf. ein Z-Koordinatenmeßwert SPZ, so daß als Summier¬ ergebnis ein Z-Istwert Ziεt bereitεteht und in der Steuervor¬ richtung ST mit einem Z-Koordinatensollwert Zsoll verknüpft der geregelten Ansteuerung eines Z-Positionierungsmotors die- nen kann.FIG. 3 shows an arrangement of a long guide support FX with a cross slide K. The measuring source S1 is mounted at the end of the support FX and on the slide K the deviation sensor AMZ1, which in particular determines the load deflection of the support FX. Since the ends of the carrier F incline towards an unloaded starting position during load deflection, the beam path S1 'also inclines to the same extent, whereby the deviation sensor AMZ1 measures the deviation with respect to the inclined measuring beam S1 and not to the output beam path. A parallel beam S1 "is therefore advantageously guided to an inclination sensor NZ at the other end of the carrier FX. Its inclination measurement value SNZ is proportional to the length LS 'of the first measurement section of the first measurement beam S1", which is known as the X-displacement measurement signal SPX, and fed in reverse proportion to the length LS "of the second measuring beam S1" to the Z coordinate summer, as are the Z deviation values SMZ1, SMZ2 and possibly a Z coordinate measurement value SPZ, so that a Z actual value Ziεt is available as the summation result and can be used in the control device ST with a Z coordinate setpoint Zsetpoint to control the controlled actuation of a Z positioning motor.
Das gleiche Prinzip der Neigungskorrektur der Abweichungs¬ messung kann selbstverständlich auch bei zu erwartenden Schrägstellungen oder Neigungen der anderen Führungen ange- wandt werden. The same principle of correcting the inclination of the deviation measurement can of course also be used in the case of expected inclinations or inclinations of the other guides.

Claims

Patentansprüche claims
1. Vorrichtung zum Führungstoleranzausgleich an Mehrachsen- positionierern, wobei auf einem ersten Führungsträger (FX) bezüglich einer ersten Achse (X) ein zweiter Führungs¬ träger (FY) durch einen zugehörigen Positionierantrieb (MX) verschieblich oder verschwenkbar gelagert ist und an dem zweiten Führungsträger (FY) bezüglich einer zweiten Achse (Y) ein weiterer Führungsträger oder ein Objekt (0) durch einen zugehörigen Positionierantrieb (MY) verschieb¬ lich oder verschwenkbar gelagert ist und die jeweilige Verschiebung auf den Führungsträgern (FX, FY) durch eine jeweils zugehörige Koordinatenmeßvorrichtung (APX, APY) laufend ermittelt wird, d a d u r c h g e k e n n - z e i c h n e t, daß auf den Führungsträgern (FX, FY) jeweils mindestens ein Meßstrahler (Sl - S4) mit enger Apertur parallel zur Führung ausgerichtet angeordnet ist und an dem jeweils geführten Teil (FY, 0) von den ein¬ zelnen Meßstrahlen beaufschlagt jeweils eine Abweichungs- meßvorrichtung (AMX, AMY, AMZ1, AMZ2) so angeordnet ist, daß deren Abweichungsmeßsignal (SMX, SMY, SMZ1, SMZ2) jeweils mindestens eine Lageabweichung quer zur Richtung des auftreffenden Meßεtrahls signaliεiert.1. Device for compensating for guide tolerances on multi-axis positioners, a second guide carrier (FY) being mounted displaceably or pivotably on a first guide carrier (FX) with respect to a first axis (X) by an associated positioning drive (MX) and on the second guide carrier (FY) with respect to a second axis (Y) a further guide support or an object (0) is mounted displaceably or pivotably by an associated positioning drive (MY) and the respective displacement on the guide supports (FX, FY) by an associated coordinate measuring device (APX, APY) is continuously determined, characterized in that at least one measuring radiator (S1 - S4) with a narrow aperture is arranged on the guide carriers (FX, FY), aligned parallel to the guide, and on the respective guided part (FY, 0 ) each of the individual measuring beams is acted upon by a deviation measuring device g (AMX, AMY, AMZ1, AMZ2) is arranged in such a way that their deviation measurement signal (SMX, SMY, SMZ1, SMZ2) signals at least one positional deviation transversely to the direction of the incident measuring beam.
2. Vorrichtung nach Anεpruch 1,d a d u r c h g e k e n n ¬ z e i c h n e t, daß die Meßstrahler (Sl - S4) Laser¬ strahler sind.2. Device according to claim 1, so that the measuring emitters (S1-S4) are laser emitters.
3. Vorrichtung nach Anspruch 1, d a d u r c h g e k e n n ¬ z e i c h n e t, daß die Abweichungsmeßvorrichtung (AMX, AMZ2; AMY, AMZ1) zweidimensionale CCD-Arrays sind, aus deren Empfangsεignalen jeweils ein Meßstrahlzentrum er- mittelt wird, dessen Koordinaten im Array als zwei der Abweichungsmeßsignale (SMX, SMZ2; SMY, SMZ1) dienen.3. Device according to claim 1, characterized in that the deviation measuring device (AMX, AMZ2; AMY, AMZ1) are two-dimensional CCD arrays, each of which receives a measuring beam center from the received signals. is averaged, whose coordinates in the array serve as two of the deviation measurement signals (SMX, SMZ2; SMY, SMZ1).
4. Vorrichtung nach Anspruch 1 oder 2,d a d u r c h g e - k e n n z e i c h n e t, daß die Abweichungsmeßvorrichtun¬ gen (AMX,AMY, AMZl, AMZ2) jeweils aus einem linearen CCD-Array bestehen.4. Apparatus according to claim 1 or 2, so that the deviation measurement devices (AMX, AMY, AMZl, AMZ2) each consist of a linear CCD array.
5. Vorrichtung nach Anspruch 4, d a d u r c h g e k e n n - z e i c h n e t, daß der zu vermessende Toleranzbereich5. Apparatus according to claim 4, d a d u r c h g e k e n n - z e i c h n e t that the tolerance range to be measured
(T) der Abweichung jeweils durch ein zylindrisches opti¬ sches Mittel (WS) der Länge (L) von dem nachgeordneten CCD-Array (AMX, AMY, AMZl, AMZ2 )angepaßt ist.(T) the deviation is adapted by a cylindrical optical means (WS) of length (L) from the downstream CCD array (AMX, AMY, AMZl, AMZ2).
6. Vorrichtung nach Anspruch 4 oder 5, d a d u r c h g e ¬ k e n n z e i c h n e t, daß dem CCD-Array (AMX, AMY, AMZl, AMZ2) ein optisches Mittel (ZL) vorgeordnet ist, das den Meßstrahl (Sl- S4) bei Lageabweichungen quer zur Er- streckungsrichtung des CCD-Arrays auf dieses fokussiert.6. Apparatus according to claim 4 or 5, dadurchge ¬ indicates that the CCD array (AMX, AMY, AMZl, AMZ2) is preceded by an optical means (ZL) which the measuring beam (Sl- S4) in the event of positional deviations transverse to the stretching direction of the CCD array focused on this.
7. Vorrichtung nach einem der vorstehenden Ansprüche, d a ¬ d u r c h g e k e n n z e i c h n e t, daß parallel zu oder koaxial abgezweigt aus mindestens einem der Meßstrah¬ len (Sl') ein zweiter Meßstrahl (Sl") auf eine Neigungs- meßvorrichtung (NZ) gerichtet ist, die an dem gleichen Führungsträger (FX) wie der Meßstrahler (Sl) angeordnet ist und das Neigungsmeßεignal (SNZ) von der Neigungsme߬ vorrichtung (NZ) proportional zu der jeweiligen Strahllän¬ ge (LS des ersten Meßεtrahles (Sl') und umgekehrt propor- tional zur Länge (LS") des zweiten Meßstrahles (S") zu dem in gleicher Richtung liegenden Abweichungsmeßsignal (SMZ1) der Abweichungsmeßvorrichtung (AMZl) des ersten Meßstrah¬ les (Sl') summiert.7. Device according to one of the preceding claims, since ¬ characterized in that parallel to or coaxially branched from at least one of the measuring beams (SL ') a second measuring beam (Sl ") is directed to an inclination measuring device (NZ) which the same guide support (FX) as the measuring radiator (Sl) is arranged and the inclination measurement signal (SNZ) from the inclination measuring device (NZ) is proportional to the respective beam length (LS of the first measuring beam (Sl ') and vice versa proportional to Length (LS ") of the second measuring beam (S") summed to the deviation measuring signal (SMZ1) of the deviation measuring device (AMZl) of the first measuring beam (S1 ') lying in the same direction.
8. Vorrichtung nach Anspruch 7, d a d u r c h g e k e n n ¬ z e i c h n e t, daß die Neigungsmeßvorrichtung (NZ) ein lineares CCD-Array enthält. 8. The device according to claim 7, characterized in that the inclination measuring device (NZ) contains a linear CCD array.
9. Vorrichtung nach einem der vorεtehenden Anεprüche, d a ¬ d u r c h g e k e n n z e i c h n e t, daß mindestens einer ihrer Positionierantriebe (MZ) über eine Regelvor¬ richtung (ST) angesteuert ist, der die Summe des zugehöri- gen Koordinatenmeßwertes (SPZ) und der gleichgerichteten Abweichungsmeßwerte (SMZ1, SMZ2) und ggf. der relativier¬ ten Neigungsmeßsignale (SNZ) als Ist-Poεitionεwert (Ziεt) und ein Sollpositionswert (Zsoll) zugeführt ist.9. Device according to one of the preceding claims, since ¬ characterized in that at least one of its positioning drives (MZ) is controlled via a control device (ST) which measures the sum of the associated coordinate measurement value (SPZ) and the rectified deviation measurement values (SMZ1, SMZ2) and possibly the relativized inclination measurement signals (SNZ) as the actual position value (Ziεt) and a set position value (Zsoll).
10. Vorrichtung nach einem der vorstehenden Ansprüche, d a ¬ d u r c h g e k e n n z e i c h n e t, daß die Aus¬ gangssignale der CCD-Arrays (SMX, SMY, SMZl, SMZ2) gemul- tiplext einer Mikroprozessor- Steuer/Regelvorrichtung (ST) zugeführt sind, die diese Signale bezüglich einer Strahl- mittelpunktlage auswertet und aus der jeweiligen Mittel¬ punktlage jeweils den Koordinaten-abweichungswert ermit¬ telt und diesen mit den gleichgerichteten Meßwerten (SPX, SPY, SPZ) summiert. 10. Device according to one of the preceding claims, since ¬ characterized in that the output signals of the CCD arrays (SMX, SMY, SMZl, SMZ2) are multiplexed a microprocessor control / regulating device (ST) are supplied, which these signals with respect evaluates a beam center position and determines the coordinate deviation value from the respective center position and sums it up with the rectified measured values (SPX, SPY, SPZ).
PCT/DE1996/001149 1995-08-29 1996-06-28 Device for compensating guide tolerance in multi-axis positioners WO1997008595A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP96922733A EP0847548A1 (en) 1995-08-29 1996-06-28 Device for compensating guide tolerance in multi-axis positioners
AU63526/96A AU6352696A (en) 1995-08-29 1996-06-28 Device for compensating guide tolerance in multi-axis positioners

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19531676.2 1995-08-29
DE1995131676 DE19531676C1 (en) 1995-08-29 1995-08-29 Measurement of guideways offsets in multiaxis positioning systems for compensation purposes

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106767558A (en) * 2017-03-27 2017-05-31 华中科技大学 A kind of decoupled identification method of guide rail basal plane straightness error

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19757957C2 (en) * 1997-12-24 2000-07-27 Bauer Spezialtiefbau Motorized leveling device
DE19857132A1 (en) 1998-12-11 2000-06-15 Heidenhain Gmbh Dr Johannes Device for reducing temperature-based variations in dimensions of parallel measuring systems in machines with gantry structure by providing light beam bridges between measuring systems

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3668501A (en) * 1969-06-02 1972-06-06 Opt Omechanisms Inc Means for generating compensating control means
EP0126388A1 (en) * 1983-05-13 1984-11-28 Hitachi, Ltd. Method of controlling a numerically controlled machine tool
EP0225588A2 (en) * 1985-12-05 1987-06-16 Odetics, Inc. Micropositioning apparatus for a robotic arm
US4676649A (en) * 1985-11-27 1987-06-30 Compact Spindle Bearing Corp. Multi-axis gas bearing stage assembly
EP0304307A2 (en) * 1987-08-20 1989-02-22 Cincinnati Milacron Inc. Position error sensing and feedback apparatus and method
US4928019A (en) * 1986-03-12 1990-05-22 Toshiba Kikai Kabushiki Kaisha System for compensatively correcting for displacements due to heat in machine tools
EP0437741A2 (en) * 1990-01-16 1991-07-24 International Business Machines Corporation A two-dimensional positioning apparatus

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55134414A (en) * 1979-04-06 1980-10-20 Hitachi Ltd Precise moving unit
US4516029A (en) * 1983-04-28 1985-05-07 Control Data Corporation E beam stage with below-stage X-Y drive
DD261866A1 (en) * 1987-07-02 1988-11-09 Zeiss Jena Veb Carl ARRANGEMENT FOR POSITIONING LOWER OBJECTS
US5164602A (en) * 1991-08-23 1992-11-17 Westinghouse Electric Corp. Machine guidance system utilizing fiber optics
DE4312255C2 (en) * 1993-04-15 1995-07-20 Focus Mestechnik Gmbh & Co Kg Coordinate table

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3668501A (en) * 1969-06-02 1972-06-06 Opt Omechanisms Inc Means for generating compensating control means
EP0126388A1 (en) * 1983-05-13 1984-11-28 Hitachi, Ltd. Method of controlling a numerically controlled machine tool
US4676649A (en) * 1985-11-27 1987-06-30 Compact Spindle Bearing Corp. Multi-axis gas bearing stage assembly
EP0225588A2 (en) * 1985-12-05 1987-06-16 Odetics, Inc. Micropositioning apparatus for a robotic arm
US4928019A (en) * 1986-03-12 1990-05-22 Toshiba Kikai Kabushiki Kaisha System for compensatively correcting for displacements due to heat in machine tools
EP0304307A2 (en) * 1987-08-20 1989-02-22 Cincinnati Milacron Inc. Position error sensing and feedback apparatus and method
EP0437741A2 (en) * 1990-01-16 1991-07-24 International Business Machines Corporation A two-dimensional positioning apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106767558A (en) * 2017-03-27 2017-05-31 华中科技大学 A kind of decoupled identification method of guide rail basal plane straightness error

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EP0847548A1 (en) 1998-06-17
DE19531676C1 (en) 1996-11-14

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