US20070034515A1 - Radiation- or thermally-curable oxetane barrier sealants - Google Patents
Radiation- or thermally-curable oxetane barrier sealants Download PDFInfo
- Publication number
- US20070034515A1 US20070034515A1 US11/502,707 US50270706A US2007034515A1 US 20070034515 A1 US20070034515 A1 US 20070034515A1 US 50270706 A US50270706 A US 50270706A US 2007034515 A1 US2007034515 A1 US 2007034515A1
- Authority
- US
- United States
- Prior art keywords
- oxetane
- group
- electrophoretic device
- accordance
- epoxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 239000000565 sealant Substances 0.000 title claims abstract description 34
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 title claims description 57
- 230000004888 barrier function Effects 0.000 title claims description 39
- 239000000203 mixture Substances 0.000 claims abstract description 59
- -1 oxetane compound Chemical class 0.000 claims abstract description 25
- 239000004593 Epoxy Substances 0.000 claims description 44
- 125000003118 aryl group Chemical group 0.000 claims description 23
- 239000000945 filler Substances 0.000 claims description 22
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 20
- 125000000217 alkyl group Chemical group 0.000 claims description 14
- 239000000454 talc Substances 0.000 claims description 14
- 229910052623 talc Inorganic materials 0.000 claims description 14
- XUCHXOAWJMEFLF-UHFFFAOYSA-N bisphenol F diglycidyl ether Chemical compound C1OC1COC(C=C1)=CC=C1CC(C=C1)=CC=C1OCC1CO1 XUCHXOAWJMEFLF-UHFFFAOYSA-N 0.000 claims description 12
- 125000002091 cationic group Chemical group 0.000 claims description 11
- 150000002921 oxetanes Chemical class 0.000 claims description 11
- 229920000647 polyepoxide Polymers 0.000 claims description 10
- 125000001188 haloalkyl group Chemical group 0.000 claims description 9
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 8
- 239000011521 glass Substances 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- 239000001257 hydrogen Substances 0.000 claims description 8
- 239000003999 initiator Substances 0.000 claims description 8
- 229910000077 silane Inorganic materials 0.000 claims description 8
- 239000002318 adhesion promoter Substances 0.000 claims description 7
- 125000003545 alkoxy group Chemical group 0.000 claims description 7
- 125000004104 aryloxy group Chemical group 0.000 claims description 7
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 claims description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 6
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 6
- 239000003822 epoxy resin Substances 0.000 claims description 6
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 5
- 150000002148 esters Chemical class 0.000 claims description 5
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 claims description 5
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims description 4
- 229910001128 Sn alloy Inorganic materials 0.000 claims description 4
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 4
- 125000003700 epoxy group Chemical group 0.000 claims description 4
- 125000005647 linker group Chemical group 0.000 claims description 4
- 229910052938 sodium sulfate Inorganic materials 0.000 claims description 4
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 claims description 4
- 150000007970 thio esters Chemical class 0.000 claims description 4
- 150000003568 thioethers Chemical class 0.000 claims description 4
- 239000011135 tin Substances 0.000 claims description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims description 4
- 239000002841 Lewis acid Substances 0.000 claims description 3
- 125000001931 aliphatic group Chemical group 0.000 claims description 3
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 3
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 3
- 125000005842 heteroatom Chemical group 0.000 claims description 3
- 150000007517 lewis acids Chemical class 0.000 claims description 3
- 229910052943 magnesium sulfate Inorganic materials 0.000 claims description 3
- 125000003566 oxetanyl group Chemical group 0.000 claims description 3
- FXCXOKOKILDXCL-UHFFFAOYSA-N 1-but-2-enoxybut-2-ene Chemical group CC=CCOCC=CC FXCXOKOKILDXCL-UHFFFAOYSA-N 0.000 claims description 2
- UUODQIKUTGWMPT-UHFFFAOYSA-N 2-fluoro-5-(trifluoromethyl)pyridine Chemical compound FC1=CC=C(C(F)(F)F)C=N1 UUODQIKUTGWMPT-UHFFFAOYSA-N 0.000 claims description 2
- HRDCVMSNCBAMAM-UHFFFAOYSA-N 3-prop-2-ynoxyprop-1-yne Chemical compound C#CCOCC#C HRDCVMSNCBAMAM-UHFFFAOYSA-N 0.000 claims description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 claims description 2
- 229910001316 Ag alloy Inorganic materials 0.000 claims description 2
- 229910001020 Au alloy Inorganic materials 0.000 claims description 2
- 229910052582 BN Inorganic materials 0.000 claims description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 2
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 claims description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 2
- DQFBYFPFKXHELB-UHFFFAOYSA-N Chalcone Natural products C=1C=CC=CC=1C(=O)C=CC1=CC=CC=C1 DQFBYFPFKXHELB-UHFFFAOYSA-N 0.000 claims description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 2
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 claims description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 2
- 239000007832 Na2SO4 Substances 0.000 claims description 2
- 229910000978 Pb alloy Inorganic materials 0.000 claims description 2
- 229920001328 Polyvinylidene chloride Polymers 0.000 claims description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- 125000003342 alkenyl group Chemical group 0.000 claims description 2
- 229910052925 anhydrite Inorganic materials 0.000 claims description 2
- 150000008378 aryl ethers Chemical class 0.000 claims description 2
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Inorganic materials [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 claims description 2
- 239000011324 bead Substances 0.000 claims description 2
- 239000001110 calcium chloride Substances 0.000 claims description 2
- 229910001628 calcium chloride Inorganic materials 0.000 claims description 2
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 claims description 2
- 239000006229 carbon black Substances 0.000 claims description 2
- 235000005513 chalcones Nutrition 0.000 claims description 2
- 239000010949 copper Substances 0.000 claims description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 2
- 229910052593 corundum Inorganic materials 0.000 claims description 2
- 125000000392 cycloalkenyl group Chemical group 0.000 claims description 2
- 239000005350 fused silica glass Substances 0.000 claims description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 229910002804 graphite Inorganic materials 0.000 claims description 2
- 239000010439 graphite Substances 0.000 claims description 2
- 125000001072 heteroaryl group Chemical group 0.000 claims description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N itaconic acid Chemical compound OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 claims description 2
- 150000002576 ketones Chemical class 0.000 claims description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 claims description 2
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 claims description 2
- 239000010445 mica Substances 0.000 claims description 2
- 229910052618 mica group Inorganic materials 0.000 claims description 2
- 229920003986 novolac Polymers 0.000 claims description 2
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 claims description 2
- 239000010453 quartz Substances 0.000 claims description 2
- 239000000741 silica gel Substances 0.000 claims description 2
- 229910002027 silica gel Inorganic materials 0.000 claims description 2
- 125000005373 siloxane group Chemical group [SiH2](O*)* 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- 125000000101 thioether group Chemical group 0.000 claims description 2
- 150000003573 thiols Chemical class 0.000 claims description 2
- DQFBYFPFKXHELB-VAWYXSNFSA-N trans-chalcone Chemical compound C=1C=CC=CC=1C(=O)\C=C\C1=CC=CC=C1 DQFBYFPFKXHELB-VAWYXSNFSA-N 0.000 claims description 2
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 claims description 2
- 239000010455 vermiculite Substances 0.000 claims description 2
- 229910052902 vermiculite Inorganic materials 0.000 claims description 2
- 235000019354 vermiculite Nutrition 0.000 claims description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 2
- 229920002554 vinyl polymer Polymers 0.000 claims description 2
- 229910001845 yogo sapphire Inorganic materials 0.000 claims description 2
- 239000010457 zeolite Substances 0.000 claims description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 claims 1
- 229940114081 cinnamate Drugs 0.000 claims 1
- 230000035699 permeability Effects 0.000 abstract description 18
- 239000000853 adhesive Substances 0.000 abstract description 12
- 230000001070 adhesive effect Effects 0.000 abstract description 12
- 239000003504 photosensitizing agent Substances 0.000 abstract description 3
- 238000009472 formulation Methods 0.000 description 33
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 21
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 21
- 239000000463 material Substances 0.000 description 18
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- 238000001723 curing Methods 0.000 description 15
- 229920005989 resin Polymers 0.000 description 14
- 239000011347 resin Substances 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 12
- 239000012952 cationic photoinitiator Substances 0.000 description 11
- 239000000047 product Substances 0.000 description 11
- 239000000758 substrate Substances 0.000 description 11
- 230000005693 optoelectronics Effects 0.000 description 10
- 230000005855 radiation Effects 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 9
- 0 [1*]C1([2*])OC([5*])([6*])C1([3*])[4*] Chemical compound [1*]C1([2*])OC([5*])([6*])C1([3*])[4*] 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- 238000005160 1H NMR spectroscopy Methods 0.000 description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000000377 silicon dioxide Substances 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 238000003786 synthesis reaction Methods 0.000 description 6
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- NHQDETIJWKXCTC-UHFFFAOYSA-N 3-chloroperbenzoic acid Chemical compound OOC(=O)C1=CC=CC(Cl)=C1 NHQDETIJWKXCTC-UHFFFAOYSA-N 0.000 description 4
- 238000003848 UV Light-Curing Methods 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 4
- 238000005292 vacuum distillation Methods 0.000 description 4
- OXHOPZLBSSTTBU-UHFFFAOYSA-N 1,3-bis(bromomethyl)benzene Chemical group BrCC1=CC=CC(CBr)=C1 OXHOPZLBSSTTBU-UHFFFAOYSA-N 0.000 description 3
- KUBDPQJOLOUJRM-UHFFFAOYSA-N 2-(chloromethyl)oxirane;4-[2-(4-hydroxyphenyl)propan-2-yl]phenol Chemical compound ClCC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 KUBDPQJOLOUJRM-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- MGBZKWOJRYGRTO-UHFFFAOYSA-N 3-(bromomethyl)-3-methyloxetane Chemical compound BrCC1(C)COC1 MGBZKWOJRYGRTO-UHFFFAOYSA-N 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 125000005520 diaryliodonium group Chemical group 0.000 description 3
- 239000003085 diluting agent Substances 0.000 description 3
- 230000005670 electromagnetic radiation Effects 0.000 description 3
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 3
- 230000002209 hydrophobic effect Effects 0.000 description 3
- 238000011068 loading method Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000002390 rotary evaporation Methods 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 239000005361 soda-lime glass Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- NLQMSBJFLQPLIJ-UHFFFAOYSA-N (3-methyloxetan-3-yl)methanol Chemical compound OCC1(C)COC1 NLQMSBJFLQPLIJ-UHFFFAOYSA-N 0.000 description 2
- RBZMSGOBSOCYHR-UHFFFAOYSA-N 1,4-bis(bromomethyl)benzene Chemical group BrCC1=CC=C(CBr)C=C1 RBZMSGOBSOCYHR-UHFFFAOYSA-N 0.000 description 2
- OKVJCVWFVRATSG-UHFFFAOYSA-N 3-hydroxybenzyl alcohol Chemical compound OCC1=CC=CC(O)=C1 OKVJCVWFVRATSG-UHFFFAOYSA-N 0.000 description 2
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical group C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 description 2
- LJWNINULSINDSE-UHFFFAOYSA-N C.C.CC(C)=O.CNC.CNC(=O)NC.CNC(=O)OC.CNC(C)=O.CNC(C)=O.COC.COC(=O)OC.COC(C)=O.COC(C)=O.CSC Chemical compound C.C.CC(C)=O.CNC.CNC(=O)NC.CNC(=O)OC.CNC(C)=O.CNC(C)=O.COC.COC(=O)OC.COC(C)=O.COC(C)=O.CSC LJWNINULSINDSE-UHFFFAOYSA-N 0.000 description 2
- QROWAZRHRBPEPU-UHFFFAOYSA-N C.C.CC1(COCC2=CC=C(COCC3(C)COC3)C=C2)COC1.CC1(COCC2=CC=CC(COCC3(C)COC3)=C2)COC1.CCC1(COCC2=CC=C(COCC3(CC)COC3)C=C2)COC1.CCC1(COCC2=CC=CC(COCC3(CC)COC3)=C2)COC1 Chemical compound C.C.CC1(COCC2=CC=C(COCC3(C)COC3)C=C2)COC1.CC1(COCC2=CC=CC(COCC3(C)COC3)=C2)COC1.CCC1(COCC2=CC=C(COCC3(CC)COC3)C=C2)COC1.CCC1(COCC2=CC=CC(COCC3(CC)COC3)=C2)COC1 QROWAZRHRBPEPU-UHFFFAOYSA-N 0.000 description 2
- VUFRQEMSJJYZFK-UHFFFAOYSA-N C=COCC1CC2C3CC(COC=C)C(C3)C2C1 Chemical compound C=COCC1CC2C3CC(COC=C)C(C3)C2C1 VUFRQEMSJJYZFK-UHFFFAOYSA-N 0.000 description 2
- LMIOYAVXLAOXJI-UHFFFAOYSA-N CCC1(COCC2=CC=C(COCC3(CC)COC3)C=C2)COC1 Chemical compound CCC1(COCC2=CC=C(COCC3(CC)COC3)C=C2)COC1 LMIOYAVXLAOXJI-UHFFFAOYSA-N 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical class [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- AMNPXXIGUOKIPP-UHFFFAOYSA-N [4-(carbamothioylamino)phenyl]thiourea Chemical compound NC(=S)NC1=CC=C(NC(N)=S)C=C1 AMNPXXIGUOKIPP-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000008393 encapsulating agent Substances 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- 239000006254 rheological additive Substances 0.000 description 2
- 235000011152 sodium sulphate Nutrition 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical compound FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 2
- UNMJLQGKEDTEKJ-UHFFFAOYSA-N (3-ethyloxetan-3-yl)methanol Chemical compound CCC1(CO)COC1 UNMJLQGKEDTEKJ-UHFFFAOYSA-N 0.000 description 1
- JVBHTBDIKYHFSC-UHFFFAOYSA-N 1-benzylpyrazin-1-ium Chemical class C=1C=NC=C[N+]=1CC1=CC=CC=C1 JVBHTBDIKYHFSC-UHFFFAOYSA-N 0.000 description 1
- NDZFNTHGIIQMQI-UHFFFAOYSA-N 1-benzylpyridin-1-ium Chemical class C=1C=CC=C[N+]=1CC1=CC=CC=C1 NDZFNTHGIIQMQI-UHFFFAOYSA-N 0.000 description 1
- DIYFBIOUBFTQJU-UHFFFAOYSA-N 1-phenyl-2-sulfanylethanone Chemical class SCC(=O)C1=CC=CC=C1 DIYFBIOUBFTQJU-UHFFFAOYSA-N 0.000 description 1
- YIKSHDNOAYSSPX-UHFFFAOYSA-N 1-propan-2-ylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)C YIKSHDNOAYSSPX-UHFFFAOYSA-N 0.000 description 1
- OVSKIKFHRZPJSS-UHFFFAOYSA-N 2,4-D Chemical compound OC(=O)COC1=CC=C(Cl)C=C1Cl OVSKIKFHRZPJSS-UHFFFAOYSA-N 0.000 description 1
- UBOBVXGQOQTMPE-UHFFFAOYSA-N 2-chloro-4-propoxythioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C(OCCC)=CC(Cl)=C2 UBOBVXGQOQTMPE-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- YNMSFTJBUNDUDA-UHFFFAOYSA-N C.C.C.C1CC2C3CCC(C3)C2C1.CC1(COC2=CC(COCC3CO3)=CC=C2)COC1.CC1(COC2CC3CC2C2C3CC3OC32)COC1.CC1(COCC2=CC=CC(OCC3CO3)=C2)COC1.CCC1(COC2=CC(COCC3CO3)=CC=C2)COC1.CCC1(COC2CC3CC2C2C3CC3OC32)COC1.CCC1(COCC2=CC=CC(OCC3CO3)=C2)COC1.CCOCC1(C)COC1.CCOCC1CO1 Chemical compound C.C.C.C1CC2C3CCC(C3)C2C1.CC1(COC2=CC(COCC3CO3)=CC=C2)COC1.CC1(COC2CC3CC2C2C3CC3OC32)COC1.CC1(COCC2=CC=CC(OCC3CO3)=C2)COC1.CCC1(COC2=CC(COCC3CO3)=CC=C2)COC1.CCC1(COC2CC3CC2C2C3CC3OC32)COC1.CCC1(COCC2=CC=CC(OCC3CO3)=C2)COC1.CCOCC1(C)COC1.CCOCC1CO1 YNMSFTJBUNDUDA-UHFFFAOYSA-N 0.000 description 1
- NPVBMLAEXSFJIQ-UHFFFAOYSA-N C.C1CC2C3CCC(C3)C2C1.C1CC2C3CCC(C3)C2C1.C1CC2C3CCC(C3)C2C1.C1CC2C3CCC(C3)C2C1.C=COCC.CC1(COC2CC3CC2C2C3CC3OC32)COC1.CCC1(COC2CC3CC2C2C3CC3OC32)COC1.CCO.CCOCC1(C)CCC1.CCOCC1(C)COC1.CCOCC1(C)COC1.CCOCC1(C)COC1.CCOCC1(C)COC1.CCOCC1CO1 Chemical compound C.C1CC2C3CCC(C3)C2C1.C1CC2C3CCC(C3)C2C1.C1CC2C3CCC(C3)C2C1.C1CC2C3CCC(C3)C2C1.C=COCC.CC1(COC2CC3CC2C2C3CC3OC32)COC1.CCC1(COC2CC3CC2C2C3CC3OC32)COC1.CCO.CCOCC1(C)CCC1.CCOCC1(C)COC1.CCOCC1(C)COC1.CCOCC1(C)COC1.CCOCC1(C)COC1.CCOCC1CO1 NPVBMLAEXSFJIQ-UHFFFAOYSA-N 0.000 description 1
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- SLKLEBCTGRWDRC-UHFFFAOYSA-N CC1(COC2CC3CC2C2C3CC3OC32)COC1 Chemical compound CC1(COC2CC3CC2C2C3CC3OC32)COC1 SLKLEBCTGRWDRC-UHFFFAOYSA-N 0.000 description 1
- UVJGOUQARONWII-UHFFFAOYSA-N CC1(COCC2=CC=C(COCC3(C)COC3)C=C2)COC1 Chemical compound CC1(COCC2=CC=C(COCC3(C)COC3)C=C2)COC1 UVJGOUQARONWII-UHFFFAOYSA-N 0.000 description 1
- QBPYZFWEGWRSEZ-UHFFFAOYSA-N CC1(COCC2=CC=CC(COCC3(C)COC3)=C2)COC1 Chemical compound CC1(COCC2=CC=CC(COCC3(C)COC3)=C2)COC1 QBPYZFWEGWRSEZ-UHFFFAOYSA-N 0.000 description 1
- NRAOWTHWPFCUAT-UHFFFAOYSA-N CCC1(COCC2=CC=CC(COCC3(CC)COC3)=C2)COC1 Chemical compound CCC1(COCC2=CC=CC(COCC3(CC)COC3)=C2)COC1 NRAOWTHWPFCUAT-UHFFFAOYSA-N 0.000 description 1
- LKMJVFRMDSNFRT-UHFFFAOYSA-N COCC1CO1 Chemical compound COCC1CO1 LKMJVFRMDSNFRT-UHFFFAOYSA-N 0.000 description 1
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical class NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 1
- 229940123973 Oxygen scavenger Drugs 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229910018557 Si O Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- 241000276425 Xiphophorus maculatus Species 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 239000008186 active pharmaceutical agent Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- BHELZAPQIKSEDF-UHFFFAOYSA-N allyl bromide Chemical compound BrCC=C BHELZAPQIKSEDF-UHFFFAOYSA-N 0.000 description 1
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- 238000000137 annealing Methods 0.000 description 1
- 230000003466 anti-cipated effect Effects 0.000 description 1
- 238000007080 aromatic substitution reaction Methods 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- NTBYNMBEYCCFPS-UHFFFAOYSA-N azane boric acid Chemical class N.N.N.OB(O)O NTBYNMBEYCCFPS-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
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- 239000011951 cationic catalyst Substances 0.000 description 1
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- 125000004122 cyclic group Chemical group 0.000 description 1
- RAWMWTYCZYEESB-UHFFFAOYSA-N cyclopenta-1,3-dien-1-ol Chemical compound OC1=CC=CC1 RAWMWTYCZYEESB-UHFFFAOYSA-N 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000002274 desiccant Substances 0.000 description 1
- 238000000113 differential scanning calorimetry Methods 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
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- VZCYOOQTPOCHFL-OWOJBTEDSA-L fumarate(2-) Chemical compound [O-]C(=O)\C=C\C([O-])=O VZCYOOQTPOCHFL-OWOJBTEDSA-L 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
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- 230000031700 light absorption Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000011344 liquid material Substances 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
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- OTLDLKLSNZMTTA-UHFFFAOYSA-N octahydro-1h-4,7-methanoindene-1,5-diyldimethanol Chemical compound C1C2C3C(CO)CCC3C1C(CO)C2 OTLDLKLSNZMTTA-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
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- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 239000003444 phase transfer catalyst Substances 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
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- 238000011160 research Methods 0.000 description 1
- 229920006009 resin backbone Polymers 0.000 description 1
- 239000012812 sealant material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
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- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
- C08G65/16—Cyclic ethers having four or more ring atoms
- C08G65/18—Oxetanes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Definitions
- This invention relates to barrier sealants, adhesives, encapsulants, and coatings for use in electronic and optoelectronic devices.
- adhesives, sealants, encapsulants, and coatings are similar materials, all having adhesive, sealant, and coating properties and functions. When any one is recited, the others are deemed to be included.
- Radiation curable materials have found increased use as coatings, adhesives, and sealants over the past three decades for reasons including low energy consumption during cure, rapid cure speed through both radical and cationic mechanisms, low curing temperature, wide availability of curable materials, and the availability of solvent-free products. These benefits have made such products especially suited for rapidly adhering and sealing electronic and optoelectronic devices that are temperature sensitive or cannot conveniently withstand prolonged curing times. Optoelectronic devices particularly are often thermally sensitive and may need to be optically aligned and spatially immobilized through curing in a very short time period.
- a common approach is to seal the device between an impermeable substrate on which it is positioned and an impermeable glass or metal lid, and seal or adhere the perimeter of the lid to the bottom substrate using a radiation curable adhesive or sealant.
- FIG. 1 A common manifestation of this package geometry is exemplified in FIG. 1 , which discloses the use of a radiation curable perimeter sealant ( 1 ) to bond a metal or glass lid ( 2 ) over an organic light emitting diode (OLED) stack ( 3 ) fabricated on a glass substrate ( 4 ).
- OLED organic light emitting diode
- a typical device also contains an anode ( 5 ), a cathode ( 6 ), and some form of electrical interconnect between the OLED pixel/device and external circuitry ( 7 ).
- no particular device geometry is specified or required aside from one which incorporates an adhesive/sealant material such as a perimeter sealant ( 1 ).
- both the glass substrate and the metal/glass lid are essentially impermeable to oxygen and moisture, and the sealant is the only material that surrounds the device with any appreciable permeability.
- moisture permeability is very often more critical than oxygen permeability; consequently, the oxygen barrier requirements are much less stringent, and it is the moisture barrier properties of the perimeter sealant that are critical to successful performance of the device.
- Good barrier sealants will exhibit low bulk moisture permeability, good adhesion, and strong interfacial adhesive/substrate interactions. If the quality of the substrate to sealant interface is poor, the interface may function as a weak boundary, which allows rapid moisture ingress into the device regardless of the bulk moisture permeability of the sealant. If the interface is at least as continuous as the bulk sealant, then the permeation of moisture typically will be dominated by the bulk moisture permeability of the sealant itself.
- moisture permeability P
- WVTR water vapor transmission rate
- permeability coefficient e.g. g ⁇ mil/(100 in 2 ⁇ day ⁇ atm)
- permeation coefficient e.g. g ⁇ mil/(100 in 2 ⁇ day) at a given temperature and relative humidity
- D diffusion term
- S solubility term
- the solubility term reflects the affinity of the barrier for the permeant, and, in relation to water vapor, a low S term is obtained from hydrophobic materials.
- the diffusion term is a measure of the mobility of a permeant in the barrier matrix and is directly related to material properties of the barrier, such as free volume and molecular mobility. Often, a low D term is obtained from highly crosslinked or crystalline materials (in contrast to less crosslinked or amorphous analogs). Permeability will increase drastically as molecular motion increases (for example as temperature is increased, and particularly when the T g of a polymer is exceeded).
- the attainment of lower molecular mobility within the cured matrix is approached through high crosslink density, microcrystallinity, or close packing of molecular backbones between the crosslinked portions of the matrix.
- FIG. 1 is a perimeter sealed optoelectronic device.
- the inventors have discovered that certain resin and resin/filler systems provide superior barrier performance, particularly to moisture, through the incorporation of an oxetane resin and a cationic initiator into the barrier composition.
- the oxetane resin in general will have the structure in which R 1 , R 2 , R 3 , R 4 , R 5 , and R 6 are selected from the group consisting of hydrogen and alkyl, haloalkyl, alkoxy, aryloxy, aryl, ester groups.
- Such barrier materials may be used alone or in combination with other curable resins and various fillers.
- compositions exhibit a commercially acceptable cure rate, a balance of high crosslink density and molecular packing (low permeant mobility/diffusivity term, D), hydrophobicity (low water solubility term, S), and adhesion (strong adhesive/substrate interfaces) to make them effective for use in sealing and encapsulating electronic, optoelectronic, and MEMS devices.
- D permeant mobility/diffusivity term
- S low water solubility term
- adhesion strong adhesive/substrate interfaces
- This invention is a cationically curable barrier sealant consisting essentially of (a) an oxetane compound and (b) a cationic initiator.
- the barrier adhesive or sealant optionally contains (c) one or more fillers and optionally, (d) one or more adhesion promoters or one or more epoxy resins.
- one or more epoxy resins are selected from the group consisting of bisphenol F diglycidyl ether, resorcinol diglycidyl ether, novolac glycidyl ethers, halogenated glycidyl ethers, naphthalene diglycidyl ether, and cycloaliphatic epoxies.
- the use of the cationic initiators results in a radiation-curable formulation; however, the use of a cationic catalyst that can trigger polymerization at room or elevated temperatures may be used for thermal cure.
- the resulting compositions are suitable for use in sealing and encapsulating electronic and optoelectronic devices.
- actinic radiation is defined as electromagnetic radiation that induces a chemical change in a material, and for purposes within this specification will also include electron-beam curing. In most cases electromagnetic radiation with wavelengths in the ultraviolet (UV) and/or visible regions of the spectrum are most useful.
- UV radiation ultraviolet
- optoelectronic devices are defined broadly as those which involve optical and/or electrical input or output signals.
- Non limiting examples of optoelectronic devices include organic light emitting diode (OLED) displays, OLED microdisplays, liquid crystal displays (LCD), electrophoretic displays, plasma displays, microelectromechanical (MEMS) devices, liquid crystal-on silicon (LCOS) devices, photovoltaic cells, charge coupled device (CCD) sensors, and ceramic-metal oxide semiconductor (CMOS) sensors.
- OLED organic light emitting diode
- LCD liquid crystal displays
- MEMS microelectromechanical
- LCOS liquid crystal-on silicon
- CCD charge coupled device
- CMOS ceramic-metal oxide semiconductor
- oxetane compound refers to any small molecule, oligomer, or polymer carrying an oxetane functionality.
- the oxetane compound in general will have the structure in which R 1 , R 2 , R 3 , R 4 , R 5 , and R 6 are selected from the group consisting of hydrogen and alkyl, haloalkyl, alkoxy, aryloxy, aryl, ester, thio-ester, and sulfide groups.
- the oxetane compounds are selected from the group of oxetane compounds having the structures:
- the oxetane compound will have an aromatic core, onto which aromatic core are substituted in a meta-position with each other, the oxetane functionality and an additional polymerizable functionality.
- the oxetane compound will have the structure: in which R 7 , R 8 , R 9 , R 10 and R 11 are independently selected from the group consisting hydrogen, alkyl, haloalkyl, alkoxy, aryloxy, aryl, alkyloyl, and aryloyl; n is 0, 1, 2, 3, or 4; Z is a cationically reactive functionality selected from the group consisting of
- Exemplary oxetane compounds meeting the above description include, but are not limited to,
- the oxetane compound is a hybrid compound having both oxetane and a second reactive functionality extending from a cycloaliphatic backbone.
- such compounds will have the structure in which L, L′, L′′ and L′′′ are linking groups selected from the group consisting of:
- X can be attached to the cycloaliphatic backbone by a direct bond or can be a part of the cycloaliphatic backbone.
- exemplary embodiments of the cycloaliphatic hybrid compounds include, but are not limited to,
- cycloaliphatic or alicyclic refer generally to a class of organic compounds containing carbon and hydrogen atoms joined to form one or more rings, which may contain other atoms, such as, halogens (e.g. Cl, Br, I), substituent atoms (e.g. O, S, N), or substituent groups (e.g. OR, SR, NR 2 in which R is a linear or branched alkyl or cycloalkyl or aryl group).
- cycloaliphatic resins are defined as resins that contain a cyclic carbon-based ring structure in their backbone, which cyclic carbon backbone may have heteroatoms within the backbone or attached to it. It is preferable that the cycloaliphatic resin backbone be composed primarily of carbon, hydrogen and halogen atoms.
- an initiator for the inventive radiation curable barrier materials is familiar to those skilled in the art of radiation curing.
- the curing initiator be a photoinitiator.
- the selection of an appropriate photoinitiator is highly dependent on the specific application in which the barrier sealant is to be used.
- a suitable photoinitiator is one that exhibits a light absorption spectrum that is distinct from that of the resins, fillers, and other additives in the radiation curable system. If the sealant must be cured through a cover or substrate, the photoinitiator will be one capable of absorbing radiation at wavelengths for which the cover or substrate is transparent.
- the photoinitiator must have significant UV absorbance above ca. 320 nm. UV radiation below 320 nm will be absorbed by the sodalime glass coverplate and not reach the photoinitiator.
- Exemplary photoinitiators are disclosed in Ionic Polymerizations and Related processes, 45-60, 1999, Kluwer Academic Publishers; Netherlands; J. E. Puskas et al. (eds.).
- Preferred cationic photoinitiators include diaryliodonium salts and triarylsulfonium salts.
- Well known commercially available examples include UV9380C (GE Silicones), PC2506 (Polyset), SR1012 (Sartomer), Rhodorsil 2074 (Rhodia), and UVI-6974 (Dow).
- Preferred sensitizers for diaryliodonium salts are isopropylthioxanthone (referred to herein as ITX, often sold as a mixture of 2- and 4-isomers) and 2-chloro-4-propoxythioxanthone.
- ITX isopropylthioxanthone
- 2-chloro-4-propoxythioxanthone 2-chloro-4-propoxythioxanthone.
- catalysts include Br ⁇ nsted acids, Lewis acids, and latent thermal acid generators. Representative examples of Br ⁇ nsted and Lewis acids may be found in literature sources such as Smith, M. B. and March, J. in March's Advanced Organic Chemistry, Reactions, Mechanisms, and Structures, 5 th Edition, 2001, John Wiley & Sons, Inc., New York, N.Y. pp. 327-362.
- latent thermal acid generators include, but not limited to, diaryliodonium salts, benzylsulfonium salts, phenacylsulfonium salts, N-benzylpyridinium salts, N-benzylpyrazinium salts, N-benzylammonium salts, phosphonium salts, hydrazinium salts, ammonium borate salts, etc.
- Common fillers include, but are not limited to ground quartz, fused silica, amorphous silica, talc, glass beads, graphite, carbon black, alumina, clays, mica, vermiculite, aluminum nitride, and boron nitride.
- Metal powders and flakes consisting of silver, copper, gold, tin, tin/lead alloys, and other alloys are contemplated.
- Organic filler powders such as poly(tetrachloroethylene), poly(chlorotriflouroethylene), and poly(vinylidene chloride) may also be used.
- Fillers that act as desiccants or oxygen scavengers including but not limited to, CaO, BaO, Na 2 SO 4 , CaSO 4 , MgSO 4 , zeolites, silica gel, P 2 O 5 , CaCl 2 , and Al 2 O 3 may also be utilized.
- Example 2 The reaction conditions of Example 1 were adopted except 25.0 g ⁇ , ⁇ ′-dibromo-p-xylene (0.095 mol) was used instead of 25.0 g ⁇ , ⁇ ′-dibromo-m-xylene (0.095 mol).
- Example 2 The reaction conditions of Example 1 were adopted except 34.1 g 3-ethyl-3-hydroxymethyl-oxetane (0.29 mol) was used instead of 30.0 g 3-methyl-3-hydroxymethyl-oxetane (0.29 mol).
- Example 3 The reaction conditions of Example 3 were adopted except 25.0 g ⁇ , ⁇ ′-dibromo-p-xylene (0.095 mol) was used instead of 25.0 g ⁇ , ⁇ ′-dibromo-m-xylene (0.095 mol).
- oxetane from example 3 a photoinitiating system (cationic photoinitiator and ITX) were placed in a plastic jar and mixed with a vortex mixer for one hour until clear. Micron sized silica and a nanosilica rheology modifier were then added to the jar and the whole sample was mixed for another hour with the vortex mixer. The resulting paste was further mixed with a ceramic three-roll mill and degassed in a vacuum chamber. The components and parts by weight are disclosed in Table 1.
- Adhesion performance was tested by applying two pieces of tape ( ⁇ 5 mils) approximately a quarter of an inch apart on TEFLON coated aluminum plates. Using a blade, the formulation was drawn into a film between the tapes. The glass slides and the dies were wiped clean with isopropanol and sonicated for ten minutes in isopropanol. The slides and dies were removed from the isopropanol and air-dried followed by 5 min UV ozone cleaning. The dies were then placed in the film of formulation and slightly tapped to wet out the entire die. The dies were picked from the formulation coating and placed onto the slides. The dies were slightly tapped to allow the formulation to wet out between the die and the slide.
- the sealant formulations were cured in a Dymax UV curing unit with 3.3 J UVA.
- the shear adhesion of the cured samples was tested using a Royce Instrument 552 100K equipped with 100 kg head and 300 mil die tool. The adhesion was found to be 44.7 ⁇ 1.6 kg.
- the cationically curable barrier composition will further consist essentially of an adhesion promoter, preferably a silane adhesion promoter.
- an adhesion promoter preferably a silane adhesion promoter.
- the effect of the addition of a silane adhesion promoter was investigated by adding 3.5 wt % Silquest A-186 silane (based on the total formulation) to the formulation in Table 1. Moisture permeation of the cured sample (3.3 J UVA) was found to be 3.1 g ⁇ mil/100 in 2 ⁇ day and the die shear was 17.0 ⁇ 4.0 kg, sufficient for some commercial applications.
- Oxetane resins may be combined with platelet fillers such as talc in order to reduce moisture permeability.
- a formulation was prepared similarly to Example 5. The components and parts by weight are disclosed in Table 2. After curing with 6.0 J UVA, the permeation coefficient was 4.2 g ⁇ mil/100 in 2 ⁇ day at 50° C., 100% relative humidity. TABLE 2 BARRIER SEALANT #2 COMPONENT PARTS BY WEIGHT Oxetane in Example 3 58.8 Photoinitiator 1.2 ITX 0.2 Filler: Vertal 410 talc 39.8 Total: 100.0
- This liquid (40.0 g, 0.19 mol) was combined with allyl bromide (36.3 g, 0.3 mol), NaOH (12.0 g, 0.3 mol), tetrabutylammonium bromide (0.82 g, 0.0025 mol), and 100 mL toluene in a four-neck, 1000 mL round bottom flask equipped with a mechanical stirrer and condenser.
- the reaction was heated to 65° C. with stirring, and the color changed from brown to orange within ten minutes. Heating and stirring were continued overnight. Finally, the solid was filtered off and toluene was removed to give the allylated oxetane product, which was purified by vacuum distillation.
- Epoxidation of the allylated oxetane was conducted by combining 17.5 g (0.1 mol) of 3-chloroperoxybenzoic acid in 225 mL of dichloromethane in a four-neck, 500 mL round bottom flask equipped with a mechanical stirrer and thermometer. The flask was chilled to 0° C. in an ice/water bath, and 20.5 g of the above allylated oxetane product dissolved in 50 mL of CH 2 Cl 2 was added dropwise over 2.5 hours. The flask was warmed to room temperature one hour later, and stirring continued for three days. The solid was filtered off to obtain a clear, orange liquid. The CH 2 Cl 2 solution was washed with saturated NaHCO 3 solution in water and then three times with water.
- This product was mixed with a photoinitiating system (2.0 wt % cationic photoinitiator SR1 012 and 0.12% ITX) and cured with 3.3 J UVA. Permeation of the cured film was 6.3 g ⁇ mil/100 in 2 ⁇ day at 50° C., 100% relative humidity.
- the resin was combined with a photoinitiating system (2.0 wt % cationic photoinitiator SR1012 and 0.24 wt % ITX).
- a photoinitiating system 2.0 wt % cationic photoinitiator SR1012 and 0.24 wt % ITX.
- the formulation cured well and the moisture permeation coefficient was 6.6 mil ⁇ g/100 in 2 ⁇ day at 50° C., 100% relative humidity.
- the oxetanes in Examples 1 to 4 were each blended with a photoinitiating system (2 wt % photoinitiator GE 9380C) and cured with 6.0 J UVA followed by annealing at 175° C. for one hour.
- the permeation coefficient of the cured films were measured and are reported in Table 3.
- the meta-substituted oxetanes in examples 1 and 3 are better moisture barrier materials than their para-substituted counterparts, examples 2 and 4.
- the permeation coefficient of a 50/50 (wt/wt) solution of the oxetane in example 3 and an aromatic epoxy (EPON 862) using a photoinitiating system of 2 wt % cationic photoinitiator (UV 9380C) was compared with the permeation coefficient of the oxetane in example 4. Again, the meta-substituted oxetane formulation resulted in lower permeation coefficient. As shown in table 3, one may also tailor the moisture barrier performance of the cured samples by choosing different epoxies.
- brominated BPADGE is brominated bisphenol A diglycidyl ether and has the structure: TABLE 3 PERMEATION COEFFICIENT (g ⁇ mil/100 in 2 ⁇ day at 50° C., 100% relative humidity) OF VARIOUS FORMULATIONS 50/50 50/50 50/50 (WT) (WT) WITH (WT) WITH WITH BY EPON EPON BROMINATED OXETANE ITSELF 862 828 BPADGE Oxetane in 7.0 — — — example 1 Oxetane in 9.4 — — — example 2 Oxetane in 5.9 6.2 — — example 3 Oxetane in 9.5 10.5 11.0 9.1 example 4 EPON 862 has the structure: EPON 828 has the structure: EPON 828 has the structure: EPON 828 has the structure:
- Oxetanes may be blended with diluents, such as vinyl ethers, in UV curable cationic formulations.
- diluents such as vinyl ethers
- a cycloaliphatic vinyl ether (CAVE) having the below structure was used as a reactive diluent and the resulting formulation exhibited a very low moisture permeation coefficient.
- CAVE cycloaliphatic vinyl ether
- Oxetane/epoxy resin mixtures may also be blended with diluents, such as vinyl ethers or alcohols in UV curable cationic formulations.
- diluents such as vinyl ethers or alcohols
- the formulation and results are reported in Table 6. Cure speed was measured with a Perkin Elmer Differential Scanning Calorimetry 7 equipped with a UV light source.
- UV cure speed and the reactivity of a perimeter sealant is critical to production throughput, and the minimization of thermal processing is generally required for many display applications.
- UV curing kinetics and thermodynamics can be measured using differential photocalorimetry (“photo DSC”).
- photo DSC differential photocalorimetry
- the cure speed for a series of oxetane/epoxy/talc formulations with various oxetane/epoxy ratios are reported in Table 7.
- Differential photocalorimetry was performed on the samples using a Perkin-Elmer Differential Scanning Calorimeter 7 equipped with a Hg-arc lamp UV light source. All samples were cured through an indium/tin oxide (ITO)-coated sodalime glass.
- ITO indium/tin oxide
- Each of the resin combinations contains oxetane (OXT-121, Toagosei), EPON 862 aromatic epoxy, 35 wt % talc (Mistrofil P403 talc), and a photoinitiating system of 2.0 wt % cationic photoinitiator (SR1012), and 0.21 wt % ITX (all based on total weight).
- OXT-121 Toagosei
- EPON 862 aromatic epoxy 35 wt % talc
- Mistrofil P403 talc 35 wt % talc
- SR1012 wt % cationic photoinitiator
- ITX 0.21 wt % ITX
- a series of oxetane (OXT-121) and epoxy (EPON 862) resin blends were prepared and cured by heat.
- the oxetane and epoxy blends at different weight ratios were polymerized using DSC ramp from room temperature to 300° C. at 10° C./min.
- Each sample contained 2.0% cationic photoinitiator (SR1012). The onset, peak temperatures and total heat of polymerization are reported in Table 10.
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Abstract
Description
- This invention is a continuation-in-part application of co-pending U.S. patent application Ser. No. 11/098,116, filed on Apr. 5, 2005.
- This Invention was made with support from the Government of the United States of America under Agreement No. MDA972-93-2-0014 awarded by the Army Research Laboratories. The Government has certain rights in the Invention.
- This invention relates to barrier sealants, adhesives, encapsulants, and coatings for use in electronic and optoelectronic devices. (As used in this specification and claims, adhesives, sealants, encapsulants, and coatings are similar materials, all having adhesive, sealant, and coating properties and functions. When any one is recited, the others are deemed to be included.)
- Radiation curable materials have found increased use as coatings, adhesives, and sealants over the past three decades for reasons including low energy consumption during cure, rapid cure speed through both radical and cationic mechanisms, low curing temperature, wide availability of curable materials, and the availability of solvent-free products. These benefits have made such products especially suited for rapidly adhering and sealing electronic and optoelectronic devices that are temperature sensitive or cannot conveniently withstand prolonged curing times. Optoelectronic devices particularly are often thermally sensitive and may need to be optically aligned and spatially immobilized through curing in a very short time period.
- Numerous optoelectronic devices are also moisture or oxygen sensitive and need to be protected from exposure during their functional lifetime. A common approach is to seal the device between an impermeable substrate on which it is positioned and an impermeable glass or metal lid, and seal or adhere the perimeter of the lid to the bottom substrate using a radiation curable adhesive or sealant.
- A common manifestation of this package geometry is exemplified in
FIG. 1 , which discloses the use of a radiation curable perimeter sealant (1) to bond a metal or glass lid (2) over an organic light emitting diode (OLED) stack (3) fabricated on a glass substrate (4). Although various configurations exist, a typical device also contains an anode (5), a cathode (6), and some form of electrical interconnect between the OLED pixel/device and external circuitry (7). For the purposes of this invention, no particular device geometry is specified or required aside from one which incorporates an adhesive/sealant material such as a perimeter sealant (1). - In many configurations, as for the example in
FIG. 1 , both the glass substrate and the metal/glass lid are essentially impermeable to oxygen and moisture, and the sealant is the only material that surrounds the device with any appreciable permeability. For electronic and optoelectronic devices, moisture permeability is very often more critical than oxygen permeability; consequently, the oxygen barrier requirements are much less stringent, and it is the moisture barrier properties of the perimeter sealant that are critical to successful performance of the device. - Good barrier sealants will exhibit low bulk moisture permeability, good adhesion, and strong interfacial adhesive/substrate interactions. If the quality of the substrate to sealant interface is poor, the interface may function as a weak boundary, which allows rapid moisture ingress into the device regardless of the bulk moisture permeability of the sealant. If the interface is at least as continuous as the bulk sealant, then the permeation of moisture typically will be dominated by the bulk moisture permeability of the sealant itself.
- It is important to note that one must examine moisture permeability (P) as the measure of effective barrier properties and not merely water vapor transmission rate (WVTR), as the latter is not normalized to a defined path thickness or path length for permeation. Generally, permeability can be defined as WVTR multiplied by permeation path length, and is, thus, the preferred way to evaluate whether a sealant is inherently a good barrier material.
- The most common ways to express permeability are the permeability coefficient (e.g. g·mil/(100 in2·day·atm)), which applies to any set of experimental conditions, or the permeation coefficient (e.g. g·mil/(100 in2·day) at a given temperature and relative humidity), which must be quoted with the experimental conditions in order to define the partial pressure/concentration of permeant present in the barrier material. In general, the penetration of a permeant through some barrier material (permeability, P) can be described as the product of a diffusion term (D) and a solubility term (S): P=DS
- The solubility term reflects the affinity of the barrier for the permeant, and, in relation to water vapor, a low S term is obtained from hydrophobic materials. The diffusion term is a measure of the mobility of a permeant in the barrier matrix and is directly related to material properties of the barrier, such as free volume and molecular mobility. Often, a low D term is obtained from highly crosslinked or crystalline materials (in contrast to less crosslinked or amorphous analogs). Permeability will increase drastically as molecular motion increases (for example as temperature is increased, and particularly when the Tg of a polymer is exceeded).
- Logical chemical approaches to producing improved barriers must consider these two fundamental factors (D and S) affecting the permeability of water vapor and oxygen. Superimposed on such chemical factors are physical variables: long permeation pathways and flawless adhesive bondlines (good wetting of the adhesive onto the substrate), which improve barrier performance and should be applied whenever possible. The ideal barrier sealant will exhibit low D and S terms while providing excellent adhesion to all device substrates.
- It is not sufficient to have only a low solubility (S) term or only a low diffusivity (D) term in order to obtain high performance barrier materials. A classic example can be found in common siloxane elastomers. Such materials are extremely hydrophobic (low solubility term, S), yet they are quite poor barriers due to their high molecular mobility due to unhindered rotation about the Si—O bonds (which produces a high diffusivity term (D). Thus, many systems that are merely hydrophobic are not good barrier materials despite the fact that they exhibit low moisture solubility. Low moisture solubility must be combined with low molecular mobility and, thus, low permeant mobility or diffusivity.
- For liquid materials that are radiation cured to solid sealants, such as the inventive compositions, the attainment of lower molecular mobility within the cured matrix is approached through high crosslink density, microcrystallinity, or close packing of molecular backbones between the crosslinked portions of the matrix.
-
FIG. 1 is a perimeter sealed optoelectronic device. - The inventors have discovered that certain resin and resin/filler systems provide superior barrier performance, particularly to moisture, through the incorporation of an oxetane resin and a cationic initiator into the barrier composition. The oxetane resin in general will have the structure
in which R1, R2, R3, R4, R5, and R6 are selected from the group consisting of hydrogen and alkyl, haloalkyl, alkoxy, aryloxy, aryl, ester groups. Such barrier materials may be used alone or in combination with other curable resins and various fillers. The resulting compositions exhibit a commercially acceptable cure rate, a balance of high crosslink density and molecular packing (low permeant mobility/diffusivity term, D), hydrophobicity (low water solubility term, S), and adhesion (strong adhesive/substrate interfaces) to make them effective for use in sealing and encapsulating electronic, optoelectronic, and MEMS devices. - This invention is a cationically curable barrier sealant consisting essentially of (a) an oxetane compound and (b) a cationic initiator. The barrier adhesive or sealant optionally contains (c) one or more fillers and optionally, (d) one or more adhesion promoters or one or more epoxy resins. When one or more epoxy resins are present, they are selected from the group consisting of bisphenol F diglycidyl ether, resorcinol diglycidyl ether, novolac glycidyl ethers, halogenated glycidyl ethers, naphthalene diglycidyl ether, and cycloaliphatic epoxies. The use of the cationic initiators results in a radiation-curable formulation; however, the use of a cationic catalyst that can trigger polymerization at room or elevated temperatures may be used for thermal cure. The resulting compositions are suitable for use in sealing and encapsulating electronic and optoelectronic devices.
- Within this specification, the term radiation is used to describe actinic electromagnetic radiation. Actinic radiation is defined as electromagnetic radiation that induces a chemical change in a material, and for purposes within this specification will also include electron-beam curing. In most cases electromagnetic radiation with wavelengths in the ultraviolet (UV) and/or visible regions of the spectrum are most useful.
- For the purposes of this document optoelectronic devices are defined broadly as those which involve optical and/or electrical input or output signals. Non limiting examples of optoelectronic devices include organic light emitting diode (OLED) displays, OLED microdisplays, liquid crystal displays (LCD), electrophoretic displays, plasma displays, microelectromechanical (MEMS) devices, liquid crystal-on silicon (LCOS) devices, photovoltaic cells, charge coupled device (CCD) sensors, and ceramic-metal oxide semiconductor (CMOS) sensors.
- Within this specification, the term oxetane compound refers to any small molecule, oligomer, or polymer carrying an oxetane functionality. The oxetane compound in general will have the structure
in which R1, R2, R3, R4, R5, and R6 are selected from the group consisting of hydrogen and alkyl, haloalkyl, alkoxy, aryloxy, aryl, ester, thio-ester, and sulfide groups. In one embodiment, the oxetane compounds are selected from the group of oxetane compounds having the structures: - In another embodiment, the oxetane compound will have an aromatic core, onto which aromatic core are substituted in a meta-position with each other, the oxetane functionality and an additional polymerizable functionality. In this embodiment, the oxetane compound will have the structure:
in which R7, R8, R9, R10 and R11 are independently selected from the group consisting hydrogen, alkyl, haloalkyl, alkoxy, aryloxy, aryl, alkyloyl, and aryloyl; n is 0, 1, 2, 3, or 4; Z is a cationically reactive functionality selected from the group consisting of - hydroxyl —OH
- vinyl ether —O—CH═CH—R12
- aliphatic epoxy
and glycidyl ether
cycloaliphatic epoxy, which includes, but is not limited to- in which R11 and R12 are selected from the group consisting of hydrogen, alkyl, haloalkyl, alkoxy, aryloxy, aryl, alkyloyl, and aryloyl; and R13 is a linking group selected from the group consisting of alkyl, haloalkyl, aryl, ether, thio-ether, aryl ether, ester, thio-ester, silane, carbonate, or ketone.
-
-
-
- R is selected from the group consisting of linear alkyl, branched alkyl, cycloalkyl, aryl, heteroaryl, silane or siloxane groups, which optionally contain heteroatoms (such as O, S, and N); X is a reactive group independently selected from epoxies, selected from glycidyl epoxy, aliphatic epoxy, and cycloaliphatic epoxy; acrylate and methacrylate; itaconate; maleimide; vinyl, propenyl, crotyl, allyl, and propargyl ether and thio-ethers of those groups; maleate, fumarate, and cinnamate esters; styrenic; acrylamide and methacrylamide; chalcone; hydroxyl and thiol; allyl, alkenyl, and cycloalkenyl; n, k, and l equal 0 or 1; and y equals 1 to 10.
-
- Within this specification, the terms cycloaliphatic or alicyclic refer generally to a class of organic compounds containing carbon and hydrogen atoms joined to form one or more rings, which may contain other atoms, such as, halogens (e.g. Cl, Br, I), substituent atoms (e.g. O, S, N), or substituent groups (e.g. OR, SR, NR2 in which R is a linear or branched alkyl or cycloalkyl or aryl group). In general, cycloaliphatic resins are defined as resins that contain a cyclic carbon-based ring structure in their backbone, which cyclic carbon backbone may have heteroatoms within the backbone or attached to it. It is preferable that the cycloaliphatic resin backbone be composed primarily of carbon, hydrogen and halogen atoms.
- The selection of an initiator for the inventive radiation curable barrier materials is familiar to those skilled in the art of radiation curing. For photocuring, the curing initiator be a photoinitiator. The selection of an appropriate photoinitiator is highly dependent on the specific application in which the barrier sealant is to be used. A suitable photoinitiator is one that exhibits a light absorption spectrum that is distinct from that of the resins, fillers, and other additives in the radiation curable system. If the sealant must be cured through a cover or substrate, the photoinitiator will be one capable of absorbing radiation at wavelengths for which the cover or substrate is transparent. For example, if a barrier sealant is to be cured through a sodalime glass coverplate, the photoinitiator must have significant UV absorbance above ca. 320 nm. UV radiation below 320 nm will be absorbed by the sodalime glass coverplate and not reach the photoinitiator. In this example, it would be beneficial to include a photosensitizer with the photoinitiator into the photoinitiating system, to augment the transfer of energy to the photoinitiator.
- Exemplary photoinitiators are disclosed in Ionic Polymerizations and Related processes, 45-60, 1999, Kluwer Academic Publishers; Netherlands; J. E. Puskas et al. (eds.). Preferred cationic photoinitiators include diaryliodonium salts and triarylsulfonium salts. Well known commercially available examples include UV9380C (GE Silicones), PC2506 (Polyset), SR1012 (Sartomer), Rhodorsil 2074 (Rhodia), and UVI-6974 (Dow). Preferred sensitizers for diaryliodonium salts are isopropylthioxanthone (referred to herein as ITX, often sold as a mixture of 2- and 4-isomers) and 2-chloro-4-propoxythioxanthone. The selection of an efficient cationic photoinitiating system for a particular curing geometry and resin system is known to those skilled in the art of cationic UV curing, and is not limited within the scope of this invention.
- Less common initiating systems, such as thermally generated acids are also anticipated in cases where such catalysts, initiators, and curing agents are appropriate. Exemplary catalysts include Brφnsted acids, Lewis acids, and latent thermal acid generators. Representative examples of Brφnsted and Lewis acids may be found in literature sources such as Smith, M. B. and March, J. in March's Advanced Organic Chemistry, Reactions, Mechanisms, and Structures, 5th Edition, 2001, John Wiley & Sons, Inc., New York, N.Y. pp. 327-362. Examples of latent thermal acid generators include, but not limited to, diaryliodonium salts, benzylsulfonium salts, phenacylsulfonium salts, N-benzylpyridinium salts, N-benzylpyrazinium salts, N-benzylammonium salts, phosphonium salts, hydrazinium salts, ammonium borate salts, etc.
- Common fillers include, but are not limited to ground quartz, fused silica, amorphous silica, talc, glass beads, graphite, carbon black, alumina, clays, mica, vermiculite, aluminum nitride, and boron nitride. Metal powders and flakes consisting of silver, copper, gold, tin, tin/lead alloys, and other alloys are contemplated. Organic filler powders such as poly(tetrachloroethylene), poly(chlorotriflouroethylene), and poly(vinylidene chloride) may also be used. Fillers that act as desiccants or oxygen scavengers, including but not limited to, CaO, BaO, Na2SO4, CaSO4, MgSO4, zeolites, silica gel, P2O5, CaCl2, and Al2O3 may also be utilized.
-
- Into a 250 mL three-neck round bottom flask equipped with a reflux condenser, a mechanic stirrerwere added 12.0 g NaOH (0.3 mol), 0.6 g n-Bu4N+Br−(0.0019 mol), 30.0 g 3-methyl-3-hydroxymethyl-oxetane (0.29 mol), 25.0 g α, α′-dibromo-m-xylene (0.095 mol), and 100 mL of toluene. The reaction was brought to 110° C. for 3.5 hours. The organic phase was collected by filtration and the solvents were removed. The light yellow crude product was redissolved in 200 mL of toluene and washed with deionized water three times. After drying over magnesium sulfate, the toluene solution was passed through a short column of neutral alumina to remove trace amount of the ammonium salt phase transfer catalyst. Finally, the solvents were removed with rotary evaporator and Kugelrohr and the sample was purified by distillation. 1H NMR (CDCl3): δppm 1.36 (6H), 3.56 (4H), 4.38-4.55 (8H), 4.60 (4H), 7.18-7.38 (4H).
-
- The reaction conditions of Example 1 were adopted except 25.0 g α, α′-dibromo-p-xylene (0.095 mol) was used instead of 25.0 g α,α′-dibromo-m-xylene (0.095 mol). 1H NMR (CDCl3): δppm 1.36 (6H), 3.55 (4H), 4.37-4.55 (8H), 4.59 (4H), 7.36 (4H)
-
- The reaction conditions of Example 1 were adopted except 34.1 g 3-ethyl-3-hydroxymethyl-oxetane (0.29 mol) was used instead of 30.0 g 3-methyl-3-hydroxymethyl-oxetane (0.29 mol). 1H NMR (CDCl3): δppm 0.87-0.91 (6H), 1.77-1.83 (4H) 3.61 (4H), 4.40-4.49 (8H), 4.59 (4H), 7.28-7.38 (4H)
-
- The reaction conditions of Example 3 were adopted except 25.0 g α,α′-dibromo-p-xylene (0.095 mol) was used instead of 25.0 g α, α′-dibromo-m-xylene (0.095 mol). 1H NMR (CDCl3): δppm 0.89-0.92 (6H), 1.77-1.83 (4H) 3.61 (4H), 4.40-4.49 (8H), 4.58 (4H), 7.34 (4H).
- The oxetane from example 3, a photoinitiating system (cationic photoinitiator and ITX) were placed in a plastic jar and mixed with a vortex mixer for one hour until clear. Micron sized silica and a nanosilica rheology modifier were then added to the jar and the whole sample was mixed for another hour with the vortex mixer. The resulting paste was further mixed with a ceramic three-roll mill and degassed in a vacuum chamber. The components and parts by weight are disclosed in Table 1.
TABLE 1 BARRIER SEALANT # 1COMPONENT PARTS BY WEIGHT Oxetane in Example 3 35.3 Photoinitiator 0.7 ITX 0.1 Micron sized silica 63.1 Nanosilica rheology modifier 0.9 Total: 100.0 - After the formulation was thoroughly mixed, 1-2 grams of formulation material were placed on a TEFLON coated aluminum plate. An eight-path variable scraper was used to cast an even thickness of film. The sample was then placed inside a Dymax stationary curing unit and cured for 70 seconds (3.3 J UVA) with a medium pressure mercury lamp. Irradiance on the sample surface was measured with a UV Power Puck high energy UV radiometer (EIT Inc., Sterling, Va.) and was found to be 47 (UVA), 32 (UVB), 3 (UVC), 35 (UVV) mW/cm2 respectively. Moisture permeation coefficient (50° C., 100% relative humidity) of the above film was measured with
Mocon Permeatran 3/33 and was found to be 3.1 g·mil/100 in2·day. - Adhesion performance was tested by applying two pieces of tape (˜5 mils) approximately a quarter of an inch apart on TEFLON coated aluminum plates. Using a blade, the formulation was drawn into a film between the tapes. The glass slides and the dies were wiped clean with isopropanol and sonicated for ten minutes in isopropanol. The slides and dies were removed from the isopropanol and air-dried followed by 5 min UV ozone cleaning. The dies were then placed in the film of formulation and slightly tapped to wet out the entire die. The dies were picked from the formulation coating and placed onto the slides. The dies were slightly tapped to allow the formulation to wet out between the die and the slide. The sealant formulations were cured in a Dymax UV curing unit with 3.3 J UVA. The shear adhesion of the cured samples was tested using a Royce Instrument 552 100K equipped with 100 kg head and 300 mil die tool. The adhesion was found to be 44.7±1.6 kg.
- In another embodiment, the cationically curable barrier composition will further consist essentially of an adhesion promoter, preferably a silane adhesion promoter. The effect of the addition of a silane adhesion promoter was investigated by adding 3.5 wt % Silquest A-186 silane (based on the total formulation) to the formulation in Table 1. Moisture permeation of the cured sample (3.3 J UVA) was found to be 3.1 g·mil/100 in2·day and the die shear was 17.0±4.0 kg, sufficient for some commercial applications.
- Oxetane resins may be combined with platelet fillers such as talc in order to reduce moisture permeability. A formulation was prepared similarly to Example 5. The components and parts by weight are disclosed in Table 2. After curing with 6.0 J UVA, the permeation coefficient was 4.2 g·mil/100 in2·day at 50° C., 100% relative humidity.
TABLE 2 BARRIER SEALANT # 2COMPONENT PARTS BY WEIGHT Oxetane in Example 3 58.8 Photoinitiator 1.2 ITX 0.2 Filler: Vertal 410 talc 39.8 Total: 100.0 -
- 3-Hydroxybenzyl alcohol (24.8 g, 0.2 mol), 3-methyl-3-bromomethyl oxetane (36.3 g, 0.22 mol), potassium carbonate fine powder (30.4 g, 0.22 mol), and 200 mL methyl ethyl ketone were combined in a four neck, 1000 mL round bottom flask equipped with a condenser and mechanical stirrer. The reaction was heated to 65° C. in an oil bath with stirring, and heating and stirring were continued for a total of five days. The solid was filtered off and the liquid portion was washed with 3% aqueous NaOH solution followed by water. Solvent removal by rotary evaporator gave a low viscosity liquid.
- This liquid (40.0 g, 0.19 mol) was combined with allyl bromide (36.3 g, 0.3 mol), NaOH (12.0 g, 0.3 mol), tetrabutylammonium bromide (0.82 g, 0.0025 mol), and 100 mL toluene in a four-neck, 1000 mL round bottom flask equipped with a mechanical stirrer and condenser. The reaction was heated to 65° C. with stirring, and the color changed from brown to orange within ten minutes. Heating and stirring were continued overnight. Finally, the solid was filtered off and toluene was removed to give the allylated oxetane product, which was purified by vacuum distillation.
- Epoxidation of the allylated oxetane was conducted by combining 17.5 g (0.1 mol) of 3-chloroperoxybenzoic acid in 225 mL of dichloromethane in a four-neck, 500 mL round bottom flask equipped with a mechanical stirrer and thermometer. The flask was chilled to 0° C. in an ice/water bath, and 20.5 g of the above allylated oxetane product dissolved in 50 mL of CH2Cl2 was added dropwise over 2.5 hours. The flask was warmed to room temperature one hour later, and stirring continued for three days. The solid was filtered off to obtain a clear, orange liquid. The CH2Cl2 solution was washed with saturated NaHCO3 solution in water and then three times with water.
- The organic layer was collected and dried over sodium sulfate. The CH2Cl2 was removed by rotary evaporation. Purification by vacuum distillation gave 1.5 g of pure hybrid epoxy-oxetane product at 155° C./147 micron. This product was a clear, colorless liquid. 1H NMR (CDCl3): δppm 1.45 (3H), 2.61-2.82 (2H), 3.19 (1H), 3.43-3.80 (2H), 4.04 (2H), 4.45 (2H), 4.46-4.58 (2H), 4.624.64 (2H), 6.86-6.95 (3H), 7.25-7.29 (1H). This product was mixed with a photoinitiating system (2.0 wt % cationic photoinitiator SR1 012 and 0.12% ITX) and cured with 3.3 J UVA. Permeation of the cured film was 6.3 g·mil/100 in2·day at 50° C., 100% relative humidity.
-
- A four-neck, 500 mL round bottom flask equipped with mechanical stirrer and condenser was charged with 150.0 g (0.2 mol) hydroxycyclopentadiene (TCI America), 165.0 g (0.24 mol) 3-methyl-3-bromomethyl oxetane (Chemada), 9.6 g (0.24 mol) sodium hydroxide, 0.64 g (1.0 mol %) tetrabutylammonium bromide (TBAB), and 100 mL toluene. The reaction mixture was heated at 80° C. in an oil bath for two hours, and the temperature was then increased to 110° C. for 24 hours. An additional 26.4 g (0.16 mol) 3-methyl-3-bromomethyl oxetane, 6.4 g (0.16 mol) sodium hydroxide, and 0.64 g TBAB were added and stirring continued for 24 hours. The mixture was filtered and toluene was removed by rotary evaporation, and the oxetane product was separated by vacuum distillation.
- Next, 13.8 g (0.061 mol) of 77% m-chloroperoxybenzoic acid (mCPBA) and 200 mL dichloromethane were combined to form a 0.4 M solution in a 500 mL round bottom flask equipped with mechanical stirrer and thermometer, and chilled to 0° C. in an ice/water bath. Using an additional funnel, 12.3 g (0.0525 mol) above oxetane product dissolved in 65 mL dichloromethane was added dropwise to the mCPBA solution over 1.5 hours. The mixture was warmed to room temperature and allowed to stir for another 24 hours.
- After the reaction, the mixture was filtered, and the dichloromethane solution was washed with 70 mL saturated NaHCO3 solution, and then with 70 mL water three times. The organic layer was collected and dried over sodium sulfate, and the dichloromethane was removed by rotary evaporation. Vacuum distillation gave the desired product as a colorless liquid in 10.5% yield. 1H NMR (CDCl3): δppm 1.29 (3H), 1.27-2.32 (11H), 3.24-3.41 (2H), 3.43-3.50 (2H), 4.32-4.34 (2H), 4.464.50 (2H). The resin was combined with a photoinitiating system (2.0 wt % cationic photoinitiator SR1012 and 0.24 wt % ITX). The formulation cured well and the moisture permeation coefficient was 6.6 mil·g/100 in2·day at 50° C., 100% relative humidity.
- The oxetanes in Examples 1 to 4 were each blended with a photoinitiating system (2 wt % photoinitiator GE 9380C) and cured with 6.0 J UVA followed by annealing at 175° C. for one hour. The permeation coefficient of the cured films were measured and are reported in Table 3. As the data indicate, the meta-substituted oxetanes in examples 1 and 3 are better moisture barrier materials than their para-substituted counterparts, examples 2 and 4.
- The permeation coefficient of a 50/50 (wt/wt) solution of the oxetane in example 3 and an aromatic epoxy (EPON 862) using a photoinitiating system of 2 wt % cationic photoinitiator (UV 9380C) was compared with the permeation coefficient of the oxetane in example 4. Again, the meta-substituted oxetane formulation resulted in lower permeation coefficient. As shown in table 3, one may also tailor the moisture barrier performance of the cured samples by choosing different epoxies.
- In the following formulations brominated BPADGE is brominated bisphenol A diglycidyl ether and has the structure:
TABLE 3 PERMEATION COEFFICIENT (g · mil/100 in2 · day at 50° C., 100% relative humidity) OF VARIOUS FORMULATIONS 50/50 50/50 50/50 (WT) (WT) WITH (WT) WITH WITH BY EPON EPON BROMINATED OXETANE ITSELF 862 828 BPADGE Oxetane in 7.0 — — — example 1 Oxetane in 9.4 — — — example 2 Oxetane in 5.9 6.2 — — example 3 Oxetane in 9.5 10.5 11.0 9.1 example 4 EPON 862 has the structure: EPON 828 has the structure - In this example, epoxy/oxetane formulations with different fillers were tested and compared. The results are reported in Table 4 and indicate that, in general, platy fillers such as talc work better at reducing moisture permeation (formulations A, B, C in table 4) than nanosilica fillers (formulation D), on an equal weight basis. The results further indicate that aromatic epoxy EPON 862 in formulation D is a better barrier material than aromatic epoxy EPON 828 in formulation E, when used in cationic UV curable systems. It is also possible to use both talc and silica as fillers for better barrier performance as shown in formulations F and G. No difference in permeation was observed when nanosilica filler was replaced with micron sized silica.
TABLE 4 PERMEATION COEFFICIENTS OF OXETANE/EPOXY BLENDS WITH VARIOUS FILLERS FORMULATION COMPONENTS A B C D E F G Oxetane in example 3 24.7 24.7 Oxetane in example 4 32.9 32.9 32.9 32.9 32.9 Aromatic epoxy 32.9 32.9 32.9 32.9 24.7 24.7 Epon 862 Aromatic epoxy 32.9 EPON 828 Cationic photoinitiator 1.0 1.0 SR1012 Cationic photoinitiator 1.3 1.3 1.3 1.3 1.3 UV 9380C Photosensitizer ITX 0.1 0.1 Filler Vertal 7 talc32.9 Filler FDC talc 32.9 Filler Mistrofil P403 32.9 33.0 33.0 talc Filler Nanosilica 32.9 32.9 16.5 Filler Micron sized 16.5 silica Total 100.0 100.0 100.0 100.0 100.0 100.0 100.0 Permeation Coefficient 5.7 9.3 5.4 7.7 8.8 3.5 3.5 g · mil/100 in2 · day at 50° C., 100% RH - Oxetanes may be blended with diluents, such as vinyl ethers, in UV curable cationic formulations. In this example, a cycloaliphatic vinyl ether (CAVE) having the below structure was used as a reactive diluent and the resulting formulation exhibited a very low moisture permeation coefficient. The formulation and results are reported in Table 5.
TABLE 5 PERMEATION COEFFICIENT OF OXETANENINYL ETHER FORMULATION COMPONENTS PARTS BY WEIGHT Oxetane in example 3 17.5 CAVE 11.7 Photoinitiator (GE9380C) 0.87 Photosensltlzer (ITX) 0.045 Micron sized silica 69.9 Total 100.0 Viscosity (cP) 10 rpm 6,676 1 rpm 9,420 Permeation Coefficient 2.8 g · mil/100 in2 · day at (3J UVA) 50° C., 100% RH - Oxetane/epoxy resin mixtures may also be blended with diluents, such as vinyl ethers or alcohols in UV curable cationic formulations. The formulation and results are reported in Table 6. Cure speed was measured with a Perkin Elmer
Differential Scanning Calorimetry 7 equipped with a UV light source.TABLE 6 OXETANE/EPOXY BLENDS WITH DIFFERENT ADDITIVES COMPONENT PARTS BY WEIGHT Oxetane in example 3 4.0 4.0 4.0 Aromatic epoxy 4.0 4.0 4.0 EPON 862 Cationic Photoinitiator SR1012 0.16 0.16 0.16 CAVE 0.82 Tricyclodecane dimethanol (Aldrich) 0.82 Curing Speed Excellent Excellent Fair Time to Peak Exotherm(min) 0.13 0.12 0.78 Time to 90% Total Exotherm (min) 0.69 0.69 1.78 ΔH (J/g) 294 271 328 Permeation Coefficient 6.3 6.4 7.2 g · mil/100 in2 · day at 50° C., 100% RH (cured with 3J UVA) - UV cure speed and the reactivity of a perimeter sealant is critical to production throughput, and the minimization of thermal processing is generally required for many display applications. UV curing kinetics and thermodynamics can be measured using differential photocalorimetry (“photo DSC”). The cure speed for a series of oxetane/epoxy/talc formulations with various oxetane/epoxy ratios are reported in Table 7. Differential photocalorimetry was performed on the samples using a Perkin-Elmer
Differential Scanning Calorimeter 7 equipped with a Hg-arc lamp UV light source. All samples were cured through an indium/tin oxide (ITO)-coated sodalime glass. - Each of the resin combinations contains oxetane (OXT-121, Toagosei), EPON 862 aromatic epoxy, 35 wt % talc (Mistrofil P403 talc), and a photoinitiating system of 2.0 wt % cationic photoinitiator (SR1012), and 0.21 wt % ITX (all based on total weight). For each barrier sealant, the time from UV initiation to maximum curing exotherm was recorded, as well as the time taken to reach 90% of the observed UV curing exotherm. Shorter time to peak and time to 90% conversion are indications of good curing performance.
- As the table indicates, good curing performance and good die shear adhesion were observed for formulations K, L, M where the oxetane/epoxy ratio ranged from 75:25 to 25:75. Most significantly, the fastest UV cure speed came from a 50:50 mole ratio of the oxetane and epoxy, which has the sharpest and narrowest exothermic peak. In addition, die shear adhesion of the oxetane rich (H, I) formulations were found to be better than epoxy rich (M, N) formulations.
TABLE 7 PROPERTIES AND PERFORMANCES OF OXETANE/EPOXY/TALC FORMULATIONS WITH VARIOUS OXETANE/EPOXY RATIOS OXT 121: Cure Speed (min) Die shear EPON 862 Viscosity (cPs) Time to Time to Adhesion Formula (mole) 1.0 rpm 10.0 rpm Peak 90% (kg) H 100:0 2,867 1,597 0.43 3.92 40.9 I 95:5 4,096 2,252 0.27 4.44 40.9 J 75:25 8,601 4,198 0.17 0.93 45.2 K 50:50 7,987 4,301 0.12 0.70 44.4 L 25:75 11,870 6,553 0.13 1.73 44.2 M 5:95 15,560 9,093 0.15 2.04 33.1 N 0:100 18,020 10,420 0.20 2.34 35.5 - Several cationic photoinitiators were used to cure 50/50 (by weight) blends of OXT-121 oxetane and EPON 862 epoxy. The results are reported in Table 8 and indicate there is little difference in the permeabilities obtained using these different photoinitiators. The loading of the photoinitiators were normalized so that equal molar amounts of the active catalyst were used. The sulfonium salt catalyst is proprietary to National Starch and Chemical Company.
TABLE 8 PERMEABILITY OF OXETANE/EPOXY BLENDS WITH VARIOUS PHOTOINITIATORS LOADING PERMEATION FORMULA PHOTOINITIATOR (WT %) (g · mil/100 in2 · day) O solid iodonium salt SR1012 1.0 10.1 P solid iodonium salt SR1012 1.0 10.3 with a sensitizer perylene 0.1 Q sulfonium salt proprietary 1.1 9.9 R liquid iodonium salt I UV 9380C 2.0 9.1 - Different levels of photoinitiator SR 1012 were also explored using 50/50 (by weight) blends of OXT-121 oxetane and EPON 862 epoxy and the results are reported in Table 9. Within experimental error, the change in the photoinitiator level did not show significant impact on the moisture permeation performance of the sealant. This clearly demonstrates that the barrier performance of the sealants is mostly dominated by the choice of resins and less affected by ways of curing.
TABLE 9 VARIATIONS IN PHOTOINITIATOR LEVEL PHOTOINITIATOR LOADING PERMEATION (WT %) (g · mil/100 in2 · day) 0.25 9.6 0.50 9.3 1.00 10.1 2.00 9.7 3.00 10.1 - A series of oxetane (OXT-121) and epoxy (EPON 862) resin blends were prepared and cured by heat. The oxetane and epoxy blends at different weight ratios were polymerized using DSC ramp from room temperature to 300° C. at 10° C./min. Each sample contained 2.0% cationic photoinitiator (SR1012). The onset, peak temperatures and total heat of polymerization are reported in Table 10.
TABLE 10 CURING OF OXETANE/EPOXY BLENDS BY HEAT RATIO OXETANE:EPOXY 100:0 67:33 50:50 33:67 0:100 ONSET (° C.) 138 135 133 138 171 PEAK (° C.) 158 153 158 203 214 ΔH (J/G) 627 724 681 637 646
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| US12/179,924 US7887716B2 (en) | 2005-04-04 | 2008-07-25 | Barrier sealant of phenylene oxetane and cationic initiator |
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| US11/098,116 US20060223978A1 (en) | 2005-04-04 | 2005-04-04 | Radiation- or thermally-curable oxetane barrier sealants |
| US11/502,707 US20070034515A1 (en) | 2005-04-04 | 2006-08-10 | Radiation- or thermally-curable oxetane barrier sealants |
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| US11/502,707 Abandoned US20070034515A1 (en) | 2005-04-04 | 2006-08-10 | Radiation- or thermally-curable oxetane barrier sealants |
| US12/147,032 Expired - Fee Related US7902305B2 (en) | 2005-04-04 | 2008-06-26 | Composition of cationic initiator and oxetane compound |
| US12/179,924 Expired - Fee Related US7887716B2 (en) | 2005-04-04 | 2008-07-25 | Barrier sealant of phenylene oxetane and cationic initiator |
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| US12/179,924 Expired - Fee Related US7887716B2 (en) | 2005-04-04 | 2008-07-25 | Barrier sealant of phenylene oxetane and cationic initiator |
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| WO2009099589A1 (en) * | 2008-02-07 | 2009-08-13 | Corning Incorporated | Method for sealing an electronic device |
| US9212244B2 (en) | 2009-03-20 | 2015-12-15 | Merck Patent Gesellschaft Mit Beschrankter Haftung | Polymers made from mixtures comprising vinyl ether monomers |
| WO2013040056A1 (en) * | 2011-09-13 | 2013-03-21 | Switch Bulb Company, Inc. | Scavengers for reducing contaminants in liquid-filled led bulbs |
| US8558436B2 (en) | 2011-09-13 | 2013-10-15 | Switch Bulb Company, Inc. | Scavengers for reducing contaminants in liquid-filled LED bulbs |
| US8853922B2 (en) | 2011-09-13 | 2014-10-07 | Switch Bulb Company, Inc. | Scavengers for reducing contaminants in liquid-filled LED bulbs |
| US10392473B2 (en) | 2014-06-27 | 2019-08-27 | Daicel Corporation | Monomer composition and curable composition containing same |
| US10472466B2 (en) | 2014-06-27 | 2019-11-12 | Daicel Corporation | Monomer composition and curable composition containing same |
| US10882953B2 (en) | 2014-06-27 | 2021-01-05 | Daicel Corporation | Monomer composition and curable composition containing same |
| CN104084061A (en) * | 2014-08-06 | 2014-10-08 | 哈尔滨工业大学 | Preparation method of nano BN (boron nitride) modified hyperfiltration membrane |
| CN104693685A (en) * | 2015-03-19 | 2015-06-10 | 西安交通大学 | Preparation method for acrylamide graft modification nanometer aluminum oxide epoxy composite insulating material |
| EP3421567B1 (en) * | 2017-06-28 | 2024-09-18 | Henkel AG & Co. KGaA | Uv pre-curable epoxide composition for two stage process of assembly |
| WO2020151527A1 (en) * | 2019-01-21 | 2020-07-30 | 江南大学 | Method for implementing mercapto-epoxy deep photocuring and application thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20130054393A (en) | 2013-05-24 |
| US7902305B2 (en) | 2011-03-08 |
| KR101470473B1 (en) | 2014-12-08 |
| TWI393731B (en) | 2013-04-21 |
| PT1866360E (en) | 2011-07-12 |
| JP2008535975A (en) | 2008-09-04 |
| EP1992654B1 (en) | 2012-09-12 |
| KR101306213B1 (en) | 2013-09-09 |
| US20080296159A1 (en) | 2008-12-04 |
| CN101891945A (en) | 2010-11-24 |
| KR20070122526A (en) | 2007-12-31 |
| WO2006107803A2 (en) | 2006-10-12 |
| CN101891945B (en) | 2012-10-24 |
| ATE510872T1 (en) | 2011-06-15 |
| TW200702354A (en) | 2007-01-16 |
| PT1992654E (en) | 2012-11-08 |
| US20080272328A1 (en) | 2008-11-06 |
| WO2006107803A3 (en) | 2006-12-07 |
| EP1992654A1 (en) | 2008-11-19 |
| US7887716B2 (en) | 2011-02-15 |
| CN101155853A (en) | 2008-04-02 |
| EP1866360B1 (en) | 2011-05-25 |
| US20060223978A1 (en) | 2006-10-05 |
| EP1866360A2 (en) | 2007-12-19 |
| JP5297185B2 (en) | 2013-09-25 |
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